Patent | Date |
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Integrated two-terminal device with logic device for embedded application Grant 10,608,046 - Yi , et al. | 2020-03-31 |
Integrated Two-terminal Device With Logic Device For Embedded Application App 20190326352 - YI; Wanbing ;   et al. | 2019-10-24 |
Integrated two-terminal device with logic device for embedded application Grant 10,446,607 - Yi , et al. Oc | 2019-10-15 |
Method and device for reducing contamination for reliable bond pads Grant 10,410,854 - Mou , et al. Sept | 2019-09-10 |
Method And Device For Reducing Contamination For Reliable Bond Pads App 20190206676 - MOU; Honghui ;   et al. | 2019-07-04 |
Methods for removal of hard mask Grant 10,115,625 - Li , et al. October 30, 2 | 2018-10-30 |
CD control Grant 10,103,097 - Zou , et al. October 16, 2 | 2018-10-16 |
Methods For Removal Of Hard Mask App 20180190537 - LI; Liang ;   et al. | 2018-07-05 |
Integrated Two-terminal Device With Logic Device For Embedded Application App 20180182810 - YI; Wanbing ;   et al. | 2018-06-28 |
Integrated circuits with overlay marks and methods of manufacturing the same Grant 9,646,934 - Wang , et al. May 9, 2 | 2017-05-09 |
CMP wafer edge control of dielectric Grant 9,627,219 - Wang , et al. April 18, 2 | 2017-04-18 |
Methods for fabricating integrated circuits with improved active regions Grant 9,620,418 - Li , et al. April 11, 2 | 2017-04-11 |
Integrated circuits having nickel silicide contacts and methods for fabricating the same Grant 9,548,371 - Huang , et al. January 17, 2 | 2017-01-17 |
Small pitch and high density contact array Grant 9,543,502 - Zou , et al. January 10, 2 | 2017-01-10 |
Integrated circuits with memory cells and methods of manufacturing the same Grant 9,537,092 - Zou , et al. January 3, 2 | 2017-01-03 |
Planar passivation for pads Grant 9,520,371 - Lin , et al. December 13, 2 | 2016-12-13 |
CMP head structure with retaining ring Grant 9,511,470 - Lin , et al. December 6, 2 | 2016-12-06 |
CMP head structure with retaining ring Grant 9,511,474 - Lin , et al. December 6, 2 | 2016-12-06 |
Integrated Circuits With Overlay Marks And Methods Of Manufacturing The Same App 20160351507 - Wang; Shijie ;   et al. | 2016-12-01 |
Small Pitch And High Density Contact Array App 20160351791 - ZOU; Zheng ;   et al. | 2016-12-01 |
Integrated Circuits With Memory Cells And Methods Of Manufacturing The Same App 20160284991 - Zou; Zheng ;   et al. | 2016-09-29 |
Through silicon vias Grant 9,437,547 - Lin , et al. September 6, 2 | 2016-09-06 |
Slot Designs In Wide Metal Lines App 20160233157 - LIM; Yeow Kheng ;   et al. | 2016-08-11 |
Through Silicon Vias App 20160190066 - LIN; Benfu ;   et al. | 2016-06-30 |
Isolation for embedded devices Grant 9,349,654 - Li , et al. May 24, 2 | 2016-05-24 |
Cmp Head Structure App 20160136774 - LIN; Benfu ;   et al. | 2016-05-19 |
Cmp Head Structure App 20160136781 - Lin; Benfu ;   et al. | 2016-05-19 |
Methods For Fabricating Integrated Circuits With Improved Active Regions App 20160133524 - Li; Liang ;   et al. | 2016-05-12 |
Uniform Polishing With Fixed Abrasive Pad App 20160114457 - LEONG; Lup San ;   et al. | 2016-04-28 |
Planar Passivation For Pads App 20160118355 - LIN; Benfu ;   et al. | 2016-04-28 |
Slot designs in wide metal lines Grant 9,318,378 - Lim , et al. April 19, 2 | 2016-04-19 |
Through silicon vias Grant 9,287,197 - Lin , et al. March 15, 2 | 2016-03-15 |
CMP head structure Grant 9,242,341 - Lin , et al. January 26, 2 | 2016-01-26 |
Integrated circuits with memory cells and methods of manufacturing the same Grant 9,209,275 - Zou , et al. December 8, 2 | 2015-12-08 |
Integrated circuits with improved gap fill dielectric and methods for fabricating same Grant 9,202,746 - Wang , et al. December 1, 2 | 2015-12-01 |
Integrated Circuits Having Nickel Silicide Contacts And Methods For Fabricating The Same App 20150311221 - Huang; Jingyan ;   et al. | 2015-10-29 |
Cmp Wafer Edge Control Of Dielectric App 20150303068 - WANG; Lei ;   et al. | 2015-10-22 |
Isolation For Embedded Devices App 20150279743 - LI; Liang ;   et al. | 2015-10-01 |
Integrated Circuits With Improved Gap Fill Dielectric And Methods For Fabricating Same App 20150187641 - Wang; Lei ;   et al. | 2015-07-02 |
Filament free silicide formation Grant 9,023,725 - Yeo , et al. May 5, 2 | 2015-05-05 |
Cmp Head Structure App 20150111467 - LIN; Benfu ;   et al. | 2015-04-23 |
Cmp Head Structure App 20150111469 - LIN; Benfu ;   et al. | 2015-04-23 |
Cd Control App 20140374920 - ZOU; Zheng ;   et al. | 2014-12-25 |
STI CMP under polish monitoring Grant 8,852,968 - Li , et al. October 7, 2 | 2014-10-07 |
Through Silicon Vias App 20140264911 - LIN; Benfu ;   et al. | 2014-09-18 |
CD control Grant 8,836,139 - Zou , et al. September 16, 2 | 2014-09-16 |
Spacer profile engineering using films with continuously increased etch rate from inner to outer surface Grant 8,828,858 - Rao , et al. September 9, 2 | 2014-09-09 |
Sti Cmp Under Polish Monitoring App 20140234993 - LI; Liang ;   et al. | 2014-08-21 |
Integrated circuit with self-aligned line and via Grant 8,766,454 - Lim , et al. July 1, 2 | 2014-07-01 |
Filament Free Silicide Formation App 20140167121 - YEO; Kwee Liang ;   et al. | 2014-06-19 |
Copper Hillock Prevention With Hydrogen Plasma Treatment In A Dedicated Chamber App 20140117545 - LIU; Huang ;   et al. | 2014-05-01 |
Cd Control App 20140110855 - ZOU; Zheng ;   et al. | 2014-04-24 |
Methods of protecting elevated polysilicon structures during etching processes Grant 8,569,173 - Li , et al. October 29, 2 | 2013-10-29 |
Spacer Profile Engineering Using Films With Continuously Increased Etch Rate From Inner To Outer Surface App 20130187202 - Rao; Xuesong ;   et al. | 2013-07-25 |
Step-like spacer profile Grant 8,492,236 - Rao , et al. July 23, 2 | 2013-07-23 |
Step-like Spacer Profile App 20130181259 - Rao; Xuesong ;   et al. | 2013-07-18 |
Methods of Protecting Elevated Polysilicon Structures During Etching Processes App 20130149851 - Li; Liang ;   et al. | 2013-06-13 |
Through Silicon Via For Stacked Wafer Connections App 20130119543 - YU; Hong ;   et al. | 2013-05-16 |
Implementation of temperature-dependent phase switch layer for improved temperature uniformity during annealing Grant 8,324,011 - Poon , et al. December 4, 2 | 2012-12-04 |
Grain boundary blocking for stress migration and electromigration improvement in CU interconnects Grant 7,989,338 - Zhang , et al. August 2, 2 | 2011-08-02 |
Combined copper plating method to improve gap fill Grant 7,585,768 - Bu , et al. September 8, 2 | 2009-09-08 |
Implementation Of Temperature-dependent Phase Switch Layer For Improved Temperature Uniformity During Annealing App 20090068825 - POON; CHYIU HYIA ;   et al. | 2009-03-12 |
Combined copper plating method to improve gap fill App 20070293039 - Bu; Xiaomei ;   et al. | 2007-12-20 |
Integrated Circuit With Self-aligned Line And Via App 20070075371 - Lim; Yeow Kheng ;   et al. | 2007-04-05 |
Grain boundary blocking for stress migration and electromigration improvement in CU interconnects App 20060286797 - Zhang; Fan ;   et al. | 2006-12-21 |
Integrated circuit with self-aligned line and via and manufacturing method therefor Grant 7,119,010 - Lim , et al. October 10, 2 | 2006-10-10 |
Dual step source/drain extension junction anneal to reduce the junction depth: multiple-pulse low energy laser anneal coupled with rapid thermal anneal Grant 7,112,499 - Poon , et al. September 26, 2 | 2006-09-26 |
Structure and method of liner air gap formation Grant 7,094,669 - Bu , et al. August 22, 2 | 2006-08-22 |
Process flow for a performance enhanced MOSFET with self-aligned, recessed channel Grant 7,091,092 - Sneelal , et al. August 15, 2 | 2006-08-15 |
Method and apparatus for performing nickel salicidation Grant 7,030,451 - Lee , et al. April 18, 2 | 2006-04-18 |
Slot designs in wide metal lines App 20060040491 - Lim; Yeow Kheng ;   et al. | 2006-02-23 |
Structure and method of liner air gap formation App 20060030128 - Bu; Xiaomei ;   et al. | 2006-02-09 |
Dual step source/drain extension junction anneal to reduce the junction depth: multiple-pulse low energy laser anneal coupled with rapid thermal anneal App 20050158956 - Poon, Chyiu Hyia ;   et al. | 2005-07-21 |
Method and apparatus for performing nickel salicidation App 20050156269 - Lee, Pooi See ;   et al. | 2005-07-21 |
Method of fabricating self-aligned metal barriers by atomic layer deposition on the copper layer Grant 6,905,964 - Lim , et al. June 14, 2 | 2005-06-14 |
Method for forming a region of low dielectric constant nanoporous material using a microemulsion technique Grant 6,899,857 - Pheng , et al. May 31, 2 | 2005-05-31 |
Method of multiple pulse laser annealing to activate ultra-shallow junctions Grant 6,897,118 - Poon , et al. May 24, 2 | 2005-05-24 |
Method and apparatus for performing nickel salicidation Grant 6,890,854 - Lee , et al. May 10, 2 | 2005-05-10 |
Technique to achieve thick silicide film for ultra-shallow junctions Grant 6,878,623 - Tan , et al. April 12, 2 | 2005-04-12 |
Dual silicon-on-insulator device wafer die Grant 6,849,928 - Cha , et al. February 1, 2 | 2005-02-01 |
Method to form C54 TiSi2 for IC device fabrication Grant 6,777,329 - Chen , et al. August 17, 2 | 2004-08-17 |
Method of forming a high K metallic dielectric layer Grant 6,764,914 - See , et al. July 20, 2 | 2004-07-20 |
Replacement of silicon nitride copper barrier with a self-aligning metal barrier App 20040137721 - Lim, Boon Kiat ;   et al. | 2004-07-15 |
Method of fabricating a MOSFET device using a spike rapid thermal oxidation procedure Grant 6,734,072 - Chong , et al. May 11, 2 | 2004-05-11 |
Method to fabricate elevated source/drain structures in MOS transistors Grant 6,727,151 - Chong , et al. April 27, 2 | 2004-04-27 |
Method To Fabricate Elevated Source/drain Structures In Mos Transistors App 20040029320 - Chong, Yung Fu ;   et al. | 2004-02-12 |
Effective isolation with high aspect ratio shallow trench isolation and oxygen or field implant Grant 6,680,239 - Cha , et al. January 20, 2 | 2004-01-20 |
Parallel spiral stacked inductor on semiconductor material Grant 6,650,220 - Sia , et al. November 18, 2 | 2003-11-18 |
Novel technique to achieve thick silicide film for ultra-shallow junctions App 20030207565 - Tan, Cheng Cheh ;   et al. | 2003-11-06 |
Method for obtaining clean silicon surfaces for semiconductor manufacturing Grant 6,638,365 - Ye , et al. October 28, 2 | 2003-10-28 |
Integrated circuit with self-aligned line and via and manufacturing method therefor App 20030197279 - Lim, Yeow Kheng ;   et al. | 2003-10-23 |
Parallel Spiral Stacked Inductor On Semiconductor Material App 20030197586 - Sia, Choon-Beng ;   et al. | 2003-10-23 |
Method of gate patterning for sub-0.1 .mu.m technology Grant 6,630,405 - Hong , et al. October 7, 2 | 2003-10-07 |
Formation of silicided shallow junctions using implant through metal technology and laser annealing process Grant 6,624,489 - Chong , et al. September 23, 2 | 2003-09-23 |
Method for fabricating SOI devices with option of incorporating air-gap feature for better insulation and performance Grant 6,613,652 - Lim , et al. September 2, 2 | 2003-09-02 |
Method for buffer STI scheme with a hard mask layer as an oxidation barrier Grant 6,613,649 - Lim , et al. September 2, 2 | 2003-09-02 |
Method for forming a region of low dielectric constant nanoporous material Grant 6,602,801 - Kong , et al. August 5, 2 | 2003-08-05 |
Dual silicon-on-insulator device wafer die App 20030107083 - Cha, Randall Cher Liang ;   et al. | 2003-06-12 |
Method for buffer STI scheme with a hard mask layer as an oxidation barrier App 20030104675 - Lim, Seng-Keong Victor ;   et al. | 2003-06-05 |
Method of forming a high K metallic dielectric layer App 20030104673 - See, Alex ;   et al. | 2003-06-05 |
Method For Forming A Region Of Low Dielectric Constant Nanoporous Material App 20030092240 - Kong, Siew Yong ;   et al. | 2003-05-15 |
Method for forming a region of low dielectric constant nanoporous material using a microemulsion technique App 20030092251 - Pheng, Soo Choi ;   et al. | 2003-05-15 |
Dual silicon-on-insulator device wafer die Grant 6,558,994 - Cha , et al. May 6, 2 | 2003-05-06 |
Method for obtaining clean silicon surfaces for semiconductor manufacturing App 20030069151 - Ye, Jianhui ;   et al. | 2003-04-10 |
Method of forming of high K metallic dielectric layer Grant 6,492,242 - See , et al. December 10, 2 | 2002-12-10 |
Novel method to form C54 TiSi2 for IC device fabrication App 20020155703 - Chen, Shaoyin ;   et al. | 2002-10-24 |
Method for fabricating SOI devices with option of incorporating air-gap feature for better insulation and performance App 20020132448 - Lim, Yeow Kheng ;   et al. | 2002-09-19 |
Assorted aluminum wiring design to enhance chip-level performance for deep sub-micron application App 20020127834 - Lim, Yeow Kheng ;   et al. | 2002-09-12 |
Dual silicon-on-insulator device wafer die App 20020127816 - Cha, Randall Cher Liang ;   et al. | 2002-09-12 |
Method for pre-STI-CMP planarization using poly-si thermal oxidation Grant 6,436,833 - Pang , et al. August 20, 2 | 2002-08-20 |
Novel technique to achieve thick silicide film for ultra-shallow junctions App 20020102802 - Tan, Cheng Cheh ;   et al. | 2002-08-01 |
Formation of silicided shallow junctions using implant through metal technology and laser annealing process App 20020098689 - Chong, Yung Fu ;   et al. | 2002-07-25 |
Simplified Method To Reduce Or Eliminate Sti Oxide Divots App 20020098661 - Cha, Randall Cher Liang ;   et al. | 2002-07-25 |
Process flow for a performance enhanced MOSFET with self-aligned, recessed channel App 20020094622 - Sneelal, Sneedharan Pillai ;   et al. | 2002-07-18 |
Method for fabricating an air gap shallow trench isolation (STI) structure Grant 6,406,975 - Lim , et al. June 18, 2 | 2002-06-18 |
Method and apparatus for performing nickel salicidation App 20020064918 - Lee, Pooi See ;   et al. | 2002-05-30 |
Activating source and drain junctions and extensions using a single laser anneal Grant 6,391,731 - Chong , et al. May 21, 2 | 2002-05-21 |
Method to fabricate RF inductors with minimum area Grant 6,387,747 - Cha , et al. May 14, 2 | 2002-05-14 |
Method for fabricating an air gap metallization scheme that reduces inter-metal capacitance of interconnect structures Grant 6,380,106 - Lim , et al. April 30, 2 | 2002-04-30 |
Method to form high performance copper damascene interconnects by de-coupling via and metal line filling Grant 6,380,084 - Lim , et al. April 30, 2 | 2002-04-30 |
Methods for eliminating metal corrosion by FSG Grant 6,380,066 - See , et al. April 30, 2 | 2002-04-30 |
Formation of silicided ultra-shallow junctions using implant through metal technology and laser annealing process Grant 6,365,446 - Chong , et al. April 2, 2 | 2002-04-02 |
Versatile copper-wiring layout design with low-k dielectric integration Grant 6,355,563 - Cha , et al. March 12, 2 | 2002-03-12 |
Method to form MOS transistors with shallow junctions using laser annealing Grant 6,335,253 - Chong , et al. January 1, 2 | 2002-01-01 |
Method to eliminate top metal corner shaping during bottom metal patterning for MIM capacitors via plasma ashing and hard masking technique Grant 6,319,767 - Cha , et al. November 20, 2 | 2001-11-20 |
Method of fabricating CMOS devices featuring dual gate structures and a high dielectric constant gate insulator layer Grant 6,303,418 - Cha , et al. October 16, 2 | 2001-10-16 |
Method to form MOS transistors with a common shallow trench isolation and interlevel dielectric gap fill Grant 6,281,082 - Chen , et al. August 28, 2 | 2001-08-28 |
Method of forming contact to polysilicon gate for MOS devices Grant 6,261,935 - See , et al. July 17, 2 | 2001-07-17 |
Method to form transistors and local interconnects using a silicon nitride dummy gate technique Grant 6,204,137 - Teo , et al. March 20, 2 | 2001-03-20 |