SEAMONS; Martin Jay

Patent Applications and Registrations

Patent applications and USPTO patent grants for SEAMONS; Martin Jay.The latest application filed is for "multi color stack for self aligned dual pattern formation for multi purpose device structures".

Company Profile

7.21.48

SEAMONS; Martin Jay - San Jose CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Multi Color Stack For Self Aligned Dual Pattern Formation For Multi Purpose Device Structures App 20220130722 - PARIKH; Suketu Arun ; et al.	2022-04-28
Plasma processing using multiple radio frequency power feeds for improved uniformity Grant 11,276,562 - Ye , et al. March 15, 2	2022-03-15
Method Of Dielectric Material Fill And Treatment App 20210317580 - YOU; Shi ; et al.	2021-10-14
Oxidation reduction for SiOC film Grant 11,133,177 - Seamons , et al. September 28, 2	2021-09-28
Cure method for cross-linking Si-hydroxyl bonds Grant 11,090,683 - Seamons , et al. August 17, 2	2021-08-17
Methods Of Post Treating Dielectric Films With Microwave Radiation App 20200381248 - SUN; Yong ; et al.	2020-12-03
Plasma Processing Using Multiple Radio Frequency Power Feeds For Improved Uniformity App 20200203132 - YE; Zheng John ; et al.	2020-06-25
Oxidation Reduction For Sioc Film App 20200203154 - SEAMONS; Martin Jay ; et al.	2020-06-25
Cure Method For Cross-linking Si-hydroxyl Bonds App 20200171536 - SEAMONS; Martin Jay ; et al.	2020-06-04
Plasma processing using multiple radio frequency power feeds for improved uniformity Grant 10,580,623 - Ye , et al.	2020-03-03
Methods of dry stripping boron-carbon films Grant 10,510,518 - Lee , et al. Dec	2019-12-17
Edge hump reduction faceplate by plasma modulation Grant 10,100,408 - Ha , et al. October 16, 2	2018-10-16
Method And Apparatus Of Remote Plasmas Flowable Cvd Chamber App 20180230597 - MA; Ying ; et al.	2018-08-16
Methods Of Dry Stripping Boron-carbon Films App 20160133443 - LEE; Kwangduk Douglas ; et al.	2016-05-12
Apparatus and method for substrate clamping in a plasma chamber Grant 9,337,072 - Balasubramanian , et al. May 10, 2	2016-05-10
Methods of dry stripping boron-carbon films Grant 9,299,581 - Lee , et al. March 29, 2	2016-03-29
Methods Of Dry Stripping Boron-carbon Films App 20160064209 - LEE; Kwangduk Douglas ; et al.	2016-03-03
Plasma-enhanced And Radical-based Cvd Of Porous Carbon-doped Oxide Films Assisted By Radical Curing App 20160017495 - CHEN; Yihong ; et al.	2016-01-21
Integrated Pre-clean And Deposition Of Low-damage Layers App 20160017487 - CHEN; Yihong ; et al.	2016-01-21
Amorphous Carbon Deposition Process Using Dual Rf Bias Frequency Applications App 20150371851 - LEE; Kwangduk Douglas ; et al.	2015-12-24
Edge Hump Reduction Faceplate By Plasma Modulation App 20150247237 - HA; Sungwon ; et al.	2015-09-03
Cleaning Process For Cleaning Amorphous Carbon Deposition Residuals Using Low Rf Bias Frequency Applications App 20150228463 - MANNA; Pramit ; et al.	2015-08-13
Plasma Processing Using Multiple Radio Frequency Power Feeds For Improved Uniformity App 20150136325 - YE; Zheng John ; et al.	2015-05-21
Ultra high selectivity doped amorphous carbon strippable hardmask development and integration Grant 8,993,454 - Seamons , et al. March 31, 2	2015-03-31
Carbon Film Hardmask Stress Reduction By Hydrogen Ion Implantation App 20140273461 - LEE; Kwangduk Douglas ; et al.	2014-09-18
Methods Of Dry Stripping Boron-carbon Films App 20140216498 - LEE; Kwangduk Douglas ; et al.	2014-08-07
Ultra High Selectivity Doped Amorphous Carbon Strippable Hardmask Development And Integration App 20140017897 - SEAMONS; Martin Jay ; et al.	2014-01-16
Compensating Concentration Uncertainity App 20130284090 - BALASUBRAMANIAN; Ganesh ; et al.	2013-10-31
Ultra high selectivity doped amorphous carbon strippable hardmask development and integration Grant 8,536,065 - Seamons , et al. September 17, 2	2013-09-17
Planarizing etch hardmask to increase pattern density and aspect ratio Grant 8,513,129 - Seamons , et al. August 20, 2	2013-08-20
Ultra high selectivity ashable hard mask film Grant 8,361,906 - Lee , et al. January 29, 2	2013-01-29
Methods Of Dry Stripping Boron-carbon Films App 20120285492 - Lee; Kwangduk Douglas ; et al.	2012-11-15
Method For Depositing An Amorphous Carbon Film With Improved Density And Step Coverage App 20120208373 - PADHI; DEENESH ; et al.	2012-08-16
Ultra High Selectivity Doped Amorphous Carbon Strippable Hardmask Development And Integration App 20120080779 - SEAMONS; Martin Jay ; et al.	2012-04-05
Method for depositing conformal amorphous carbon film by plasma-enhanced chemical vapor deposition (PECVD) Grant 8,105,465 - Lee , et al. January 31, 2	2012-01-31
Mixing Energized and Non-Energized Gases for Silicon Nitride Deposition App 20120009803 - Jung; Kee Bum ; et al.	2012-01-12
Planarizing Etch Hardmask To Increase Pattern Density And Aspect Ratio App 20110291243 - Seamons; Martin Jay ; et al.	2011-12-01
Ultra High Selectivity Ashable Hard Mask Film App 20110287633 - Lee; Kwangduk Douglas ; et al.	2011-11-24
Pecvd Multi-step Processing With Continuous Plasma App 20110151142 - Seamons; Martin Jay ; et al.	2011-06-23
Plasma Surface Treatment To Prevent Pattern Collapse In Immersion Lithography App 20110111604 - Kim; Eui Kyoon ; et al.	2011-05-12
Method For Depositing An Amorphous Carbon Film With Improved Density And Step Coverage App 20110104400 - Padhi; Deenesh ; et al.	2011-05-05
Apparatus And Method For Substrate Clamping In A Plasma Chamber App 20110090613 - Balasubramanian; Ganesh ; et al.	2011-04-21
Method for depositing an amorphous carbon film with improved density and step coverage Grant 7,867,578 - Padhi , et al. January 11, 2	2011-01-11
Method for Depositing Conformal Amorphous Carbon Film by Plasma-Enhanced Chemical Vapor Deposition (PECVD) App 20100093187 - Lee; Kwangduk Douglas ; et al.	2010-04-15
Elimination Of Photoresist Material Collapse And Poisoning In 45-nm Feature Size Using Dry Or Immersion Lithography App 20090197086 - Rathi; Sudha ; et al.	2009-08-06
Plasma Surface Treatment To Prevent Pattern Collapse In Immersion Lithography App 20090104541 - Kim; Eui Kyoon ; et al.	2009-04-23
Methods For High Temperature Deposition Of An Amorphous Carbon Layer App 20090093128 - SEAMONS; MARTIN JAY ; et al.	2009-04-09
Plasma-induced Charge Damage Control For Plasma Enhanced Chemical Vapor Deposition Processes App 20080254233 - LEE; KWANGDUK DOUGLAS ; et al.	2008-10-16
Liquid precursors for the CVD deposition of amorphous carbon films Grant 7,407,893 - Seamons , et al. August 5, 2	2008-08-05
Method For Depositing An Amorphous Carbon Film With Improved Density And Step Coverage App 20080153311 - Padhi; Deenesh ; et al.	2008-06-26
Apparatus And Method For Substrate Clamping In A Plasma Chamber App 20080084650 - Balasubramanian; Ganesh ; et al.	2008-04-10
Method for plasma processing App 20080008842 - Soo; Jyr Hong ; et al.	2008-01-10
Method For Depositing an Amorphous Carbon Film with Improved Density and Step Coverage App 20080003824 - Padhi; Deenesh ; et al.	2008-01-03
Methods For The Reduction And Elimination Of Particulate Contamination With Cvd Of Amorphous Carbon App 20070286965 - Seamons; Martin Jay ; et al.	2007-12-13
Enhancement of remote plasma source clean for dielectric films App 20070207275 - Nowak; Thomas ; et al.	2007-09-06
Methods For The Reduction And Elimination Of Particulate Contamination With Cvd Of Amorphous Carbon App 20060222771 - Seamons; Martin Jay ; et al.	2006-10-05
Methods for the reduction and elimination of particulate contamination with CVD of amorphous carbon Grant 7,094,442 - Seamons , et al. August 22, 2	2006-08-22
Mixing energized and non-energized gases for silicon nitride deposition App 20060162661 - Jung; Kee Bum ; et al.	2006-07-27
Tensile and compressive stressed materials for semiconductors App 20060105106 - Balseanu; Mihaela ; et al.	2006-05-18
Methods for the reduction and elimination of particulate contamination with CVD of amorphous carbon App 20060014397 - Seamons; Martin Jay ; et al.	2006-01-19
Liquid precursors for the CVD deposition of amorphous carbon films App 20050287771 - Seamons, Martin Jay ; et al.	2005-12-29
Stress-tuned, single-layer silicon nitride film App 20050170104 - Jung, KeeBum ; et al.	2005-08-04

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