Schilp; Andrea

Patent Applications and Registrations

Patent applications and USPTO patent grants for Schilp; Andrea.The latest application filed is for "device and method for etching a substrate by using an inductively coupled plasma".

Company Profile

0.28.3

Schilp; Andrea - Schwabisch Gmund DE
Schilp; Andrea - Schwaebisch Gmuend DE
Schilp; Andrea - Stuttgart DE
Schilp; Andrea - Schwaebisch DE
Schilp; Andrea - Gmuend DE
Schilp; Andrea - Schwaebisch Gm und DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Device and method for etching a substrate using an inductively coupled plasma Grant 7,811,941 - Becker , et al. October 12, 2	2010-10-12
Plasma etching equipment Grant 7,648,611 - Laermer , et al. January 19, 2	2010-01-19
Method for removing defects from silicon bodies by a selective etching process Grant 7,201,852 - Spitz , et al. April 10, 2	2007-04-10
Methods for plasma etching of silicon Grant 7,166,536 - Laermer , et al. January 23, 2	2007-01-23
Device and method for etching a substrate by using an inductively coupled plasma Grant 7,094,706 - Breitschwerdt , et al. August 22, 2	2006-08-22
Method for processing silicon using etching processes Grant 7,052,623 - Becker , et al. May 30, 2	2006-05-30
Plasma etching method having pulsed substrate electrode power Grant 6,926,844 - Laermer , et al. August 9, 2	2005-08-09
Device and method for determining the lateral undercut of a structured surface layer Grant 6,911,348 - Becker , et al. June 28, 2	2005-06-28
Device and method for etching a substrate using an inductively coupled plasma Grant 6,899,817 - Becker , et al. May 31, 2	2005-05-31
Device and method for etching a substrate by using an inductively coupled plasma App 20040149388 - Breitschwerdt, Klaus ; et al.	2004-08-05
Method for anisotropic plasma etching of semiconductors Grant 6,720,268 - Laermer , et al. April 13, 2	2004-04-13
Device And Method For The High-frequency Etching Of A Substrate Using A Plasma Etching Installation And Device And Method For Igniting A Plasma And For Pulsing The Plasma Out Put Or Adjusting The Same Upwards Grant 6,720,273 - Becker , et al. April 13, 2	2004-04-13
Device and method for etching a substrate by using an inductively coupled plasma Grant 6,709,546 - Breitschwerdt , et al. March 23, 2	2004-03-23
Method of manufacturing micromechanical surface structures by vapor-phase etching Grant 6,558,559 - Becker , et al. May 6, 2	2003-05-06
Method of anisotropic etching of silicon Grant 6,531,068 - Laermer , et al. March 11, 2	2003-03-11
Method Of Anisotropic Etching Of Silicon App 20020144974 - LAERMER, FRANZ ; et al.	2002-10-10
Device and method for etching a substrate by using an inductively coupled plasma App 20020046987 - Breitschwerdt, Klaus ; et al.	2002-04-25
Method for applying a protecting lacquer on a wafer Grant 6,340,644 - Becker , et al. January 22, 2	2002-01-22
Anisotropic, fluorine-based plasma etching method for silicon Grant 6,303,512 - Laermer , et al. October 16, 2	2001-10-16
Method for anisotropic etching of silicon Grant 6,284,148 - Laermer , et al. September 4, 2	2001-09-04
Method and apparatus for anisotropic etching of substrates Grant 6,214,161 - Becker , et al. April 10, 2	2001-04-10
Method for detecting the transition between different materials in semiconductor structures Grant 6,200,822 - Becker , et al. March 13, 2	2001-03-13
Process for anisotropic plasma etching of different substrates Grant 6,127,273 - Laermer , et al. October 3, 2	2000-10-03
Process for making micromechanical structures Grant 6,008,138 - Laermer , et al. December 28, 1	1999-12-28
Sensor and method for manufacturing a sensor Grant 5,756,901 - Kurle , et al. May 26, 1	1998-05-26
Method of manufacturing sensor Grant 5,616,523 - Benz , et al. April 1, 1	1997-04-01
Method of producing micromechanical structures Grant 5,595,940 - Trah , et al. January 21, 1	1997-01-21
Force sensor and a method for manufacturing a force sensor Grant 5,553,506 - Benz , et al. September 10, 1	1996-09-10
Method for manufacturing micro-mechanical components using selective anodization of silicon Grant 5,542,558 - Benz , et al. August 6, 1	1996-08-06
Method of anisotropically etching silicon Grant 5,501,893 - Laermer , et al. March 26, 1	1996-03-26
Method for anisotropic plasma etching of substrates Grant 5,498,312 - Laermer , et al. March 12, 1	1996-03-12

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