Patent | Date |
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Cryogenic electrostatic chuck Grant 11,437,261 - Sarode Vishwanath , et al. September 6, 2 | 2022-09-06 |
Semiconductor Processing With Cooled Electrostatic Chuck App 20220262664 - SARODE VISHWANATH; Yogananda ;   et al. | 2022-08-18 |
Wafer edge ring lifting solution Grant 11,393,710 - Rice , et al. July 19, 2 | 2022-07-19 |
Cryogenic electrostatic chuck Grant 11,373,893 - Sarode Vishwanath , et al. June 28, 2 | 2022-06-28 |
Process kit with adjustable tuning ring for edge uniformity control Grant 11,201,037 - Sarode Vishwanath December 14, 2 | 2021-12-14 |
In-situ Apparatus For Semiconductor Process Module App 20210351063 - Sarode Vishwanath; Yogananda ;   et al. | 2021-11-11 |
Lift Pin Assembly App 20210233799 - SARODE VISHWANATH; Yogananda ;   et al. | 2021-07-29 |
In-situ apparatus for semiconductor process module Grant 11,075,105 - Sarode Vishwanath , et al. July 27, 2 | 2021-07-27 |
Lift pin assembly Grant 11,004,722 - Sarode Vishwanath , et al. May 11, 2 | 2021-05-11 |
Cryogenic Electrostatic Chuck App 20210082730 - SARODE VISHWANATH; Yogananda ;   et al. | 2021-03-18 |
Process Kit With Adjustable Tuning Ring For Edge Uniformity Control App 20210013014 - SARODE VISHWANATH; Yogananda | 2021-01-14 |
Process Kit Enclosure System App 20200373190 - Lee; Helder ;   et al. | 2020-11-26 |
Plasma chamber with tandem processing regions Grant 10,847,351 - Nguyen , et al. November 24, 2 | 2020-11-24 |
Process kit with adjustable tuning ring for edge uniformity control Grant 10,790,123 - Sarode Vishwanath September 29, 2 | 2020-09-29 |
Apparatus and methods for reducing particles in semiconductor process chambers Grant 10,770,269 - Nguyen , et al. Sep | 2020-09-08 |
Symmetric chamber body design architecture to address variable process volume with improved flow uniformity/gas conductance Grant 10,727,096 - Nguyen , et al. | 2020-07-28 |
Cryogenic Electrostatic Chuck App 20200185248 - SARODE VISHWANATH; Yogananda ;   et al. | 2020-06-11 |
Process kit with adjustable tuning ring for edge uniformity control Grant 10,600,623 - Sarode Vishwanath | 2020-03-24 |
Symmetric Chamber Body Design Architecture To Address Variable Process Volume With Improved Flow Uniformity/gas Conductance App 20190371627 - NGUYEN; Andrew ;   et al. | 2019-12-05 |
Process Kit With Adjustable Tuning Ring For Edge Uniformity Control App 20190362948 - SARODE VISHWANATH; Yogananda | 2019-11-28 |
Process Kit With Adjustable Tuning Ring For Edge Uniformity Control App 20190363003 - SARODE VISHWANATH; Yogananda | 2019-11-28 |
Process Kit With Adjustable Tuning Ring For Edge Uniformity Control App 20190362949 - SARODE VISHWANATH; Yogananda | 2019-11-28 |
Plasma Chamber With Tandem Processing Regions App 20190341236 - NGUYEN; Andrew ;   et al. | 2019-11-07 |
Symmetric chamber body design architecture to address variable process volume with improved flow uniformity/gas conductance Grant 10,446,418 - Nguyen , et al. Oc | 2019-10-15 |
Plasma chamber with tandem processing regions Grant 10,381,200 - Nguyen , et al. A | 2019-08-13 |
Inline Dps Chamber Hardware Design To Enable Axis Symmetry For Improved Flow Conductance And Uniformity App 20190148121 - NGUYEN; Andrew ;   et al. | 2019-05-16 |
In-situ Apparatus For Semiconductor Process Module App 20190088531 - SARODE VISHWANATH; Yogananda ;   et al. | 2019-03-21 |
Inline DPS chamber hardware are design to enable axis symmetry for improved flow conductance and uniformity Grant 10,211,033 - Nguyen , et al. Feb | 2019-02-19 |
Lift Pin Assembly App 20190027394 - SARODE VISHWANATH; Yogananda ;   et al. | 2019-01-24 |
Plasma Chamber With Tandem Processing Regions App 20180261436 - NGUYEN; Andrew ;   et al. | 2018-09-13 |
Apparatus And Methods For Reducing Particles In Semiconductor Process Chambers App 20170345623 - NGUYEN; Andrew ;   et al. | 2017-11-30 |
Apparatus and methods for reducing particles in semiconductor process chambers Grant 9,761,416 - Nguyen , et al. September 12, 2 | 2017-09-12 |
Wafer Edge Ring Lifting Solution App 20170213758 - RICE; Michael R. ;   et al. | 2017-07-27 |
Symmetric Chamber Body Design Architecture To Address Variable Process Volume With Improved Flow Uniformity/gas Conductance App 20150293527 - NGUYEN; Andrew ;   et al. | 2015-10-15 |
Inline Dps Chamber Hardware Design To Enable Axis Symmetry For Improved Flow Conductance And Uniformity App 20150218697 - NGUYEN; Andrew ;   et al. | 2015-08-06 |
Multizone Hollow Cathode Discharge System With Coaxial And Azimuthal Symmetry And With Consistent Central Trigger App 20150097486 - NGUYEN; Andrew ;   et al. | 2015-04-09 |