Samukawa; Seiji
Patent Applications and Registrations
Patent applications and USPTO patent grants for Samukawa; Seiji.The latest application filed is for "method of manufacturing semiconductor device".
Company Profile
1.37.44
- Samukawa; Seiji - Miyagi JP
- Samukawa; Seiji - Sendai-shi JP
- Samukawa; Seiji - Sendai JP
- Samukawa, Seiji - Imosawa Aoba-ku Sendai-shi JP
- Samukawa, Seiji - Fujisawa-shi JP
- Samukawa; Seiji - Tokyo JP
Patent Activity
| Patent | Date |
|---|---|
| Method Of Manufacturing Semiconductor Device App 20210257219 - Sugawara; Kenta ; et al. | 2021-08-19 |
| Molding Die And Lens App 20210247550 - SAMUKAWA; Seiji ; et al. | 2021-08-12 |
| Method Of Forming Structures Using A Neutral Beam, Structures Formed Using The Method And Reactor System For Performing The Method App 20210017648 - Kubota; Tomohiro ; et al. | 2021-01-21 |
| Thermoelectric Conversion Material And Method For Producing Same App 20180212131 - KIKUCHI; Akiou ; et al. | 2018-07-26 |
| Substrate Processing Apparatus App 20170253972 - ISHIBASHI; Kiyotaka ; et al. | 2017-09-07 |
| System, method, and program for predicting processing shape by plasma process Grant 9,620,338 - Samukawa , et al. April 11, 2 | 2017-04-11 |
| Plasma Processing Apparatus App 20170011886 - NOZAWA; Toshihisa ; et al. | 2017-01-12 |
| Film Forming Method And Heat Treatment Apparatus App 20160336190 - KIKUCHI; Yoshiyuki ; et al. | 2016-11-17 |
| Method For Etching Group Iii-v Semiconductor And Apparatus For Etching The Same App 20160211145 - Gu; Xun ; et al. | 2016-07-21 |
| Carbon Film Formation Method, And Carbon Film App 20160017484 - KIKUCHI; Yoshiyuki ; et al. | 2016-01-21 |
| Method for etching film having transition metal Grant 9,096,937 - Gu , et al. August 4, 2 | 2015-08-04 |
| FILM FORMING APPARATUS, METHOD OF FORMING LOW-PERMITTIVITY FILM, SiCO FILM, AND DAMASCENE INTERCONNECT STRUCTURE App 20150214015 - Kikuchi; Yoshiyuki ; et al. | 2015-07-30 |
| Substrate Processing Apparatus App 20150197853 - ISHIBASHI; Kiyotaka ; et al. | 2015-07-16 |
| Plasma Monitoring Method And Plasma Monitoring System App 20150179417 - TATSUMI; Tomohiko ; et al. | 2015-06-25 |
| Plasma monitoring method and plasma monitoring system Grant 9,005,461 - Tatsumi , et al. April 14, 2 | 2015-04-14 |
| Method For Etching Film Having Transition Metal App 20140291288 - GU; Xun ; et al. | 2014-10-02 |
| Low dielectric constant insulating film and method for forming the same Grant 8,828,886 - Samukawa , et al. September 9, 2 | 2014-09-09 |
| Quantum Nanodots, Two-dimensional Quantum Nanodot Array As Well As Semiconductor Device Using The Same And Production Method Therefor App 20140116502 - Samukawa; Seiji | 2014-05-01 |
| Plasma monitoring method Grant 8,427,168 - Tatsumi , et al. April 23, 2 | 2013-04-23 |
| System, Method, And Program For Predicting Processing Shape By Plasma Process App 20130013253 - Samukawa; Seiji ; et al. | 2013-01-10 |
| Nanostructure Forming Method And Base Having Nanostructure App 20120308765 - NUKAGA; Osamu ; et al. | 2012-12-06 |
| Surface Nanostructure Forming Method And Base Having Surface Nanostructure App 20120295066 - NUKAGA; Osamu ; et al. | 2012-11-22 |
| Low Dielectric Constant Insulating Film And Method For Forming The Same App 20120190212 - SAMUKAWA; Seiji ; et al. | 2012-07-26 |
| Method of measuring resistivity of sidewall of contact hole Grant 7,923,268 - Yatagai , et al. April 12, 2 | 2011-04-12 |
| Dry etching method and production method of magnetic memory device Grant 7,808,026 - Shiraiwa , et al. October 5, 2 | 2010-10-05 |
| Plasma Monitoring Method App 20100244861 - Tatsumi; Tomohiko ; et al. | 2010-09-30 |
| Ultraviolet light monitoring system Grant 7,732,783 - Hashimoto , et al. June 8, 2 | 2010-06-08 |
| Method Of Measuring Resistivity Of Sidewall Of Contact Hole App 20100068836 - Yatagai; Youichi ; et al. | 2010-03-18 |
| Plasma processing apparatus and plasma processing method App 20090325328 - Samukawa; Seiji ; et al. | 2009-12-31 |
| On-wafer monitoring system Grant 7,520,956 - Samukawa , et al. April 21, 2 | 2009-04-21 |
| Plasma monitoring method and plasma monitoring system App 20090058424 - Tatsumi; Tomohiko ; et al. | 2009-03-05 |
| Ultraviolet light monitoring system App 20090058432 - Hashimoto; Jun ; et al. | 2009-03-05 |
| Dry etching method and production method of magnetic memory device Grant 7,473,646 - Shiraiwa , et al. January 6, 2 | 2009-01-06 |
| Dry etching method and production method of magnetic memory device App 20080286883 - Shiraiwa; Toshiaki ; et al. | 2008-11-20 |
| Surface-treating apparatus App 20080169064 - Samukawa; Seiji ; et al. | 2008-07-17 |
| Plasma Treatment Method and Plasma Etching Method App 20080085604 - Hoshino; Yasuyuki ; et al. | 2008-04-10 |
| Etching method and apparatus Grant 7,314,574 - Ichiki , et al. January 1, 2 | 2008-01-01 |
| Real-time monitoring apparatus for plasma process Grant 7,184,134 - Samukawa February 27, 2 | 2007-02-27 |
| Dry etching process and method for manufacturing magnetic memory device App 20070026681 - Shiraiwa; Toshiaki ; et al. | 2007-02-01 |
| Etching method and apparatus Grant 7,144,520 - Ichiki , et al. December 5, 2 | 2006-12-05 |
| Deposition apparatus and deposition method App 20060213444 - Samukawa; Seiji ; et al. | 2006-09-28 |
| Beam source and beam processing apparatus Grant 7,078,862 - Fukuda , et al. July 18, 2 | 2006-07-18 |
| Beam source and beam processing apparatus Grant 7,034,285 - Ichiki , et al. April 25, 2 | 2006-04-25 |
| Plasma surface treatment system and plasma surface treatment method Grant 7,000,565 - Fukuda , et al. February 21, 2 | 2006-02-21 |
| Plasma processing apparatus and plasma processing method App 20050263247 - Samukawa, Seiji ; et al. | 2005-12-01 |
| Real-time monitoring apparatus for plasma process App 20050185171 - Samukawa, Seiji | 2005-08-25 |
| Method of processing a surface of a workpiece Grant 6,909,087 - Ichiki , et al. June 21, 2 | 2005-06-21 |
| Neutral particle beam processing apparatus Grant 6,909,086 - Samukawa , et al. June 21, 2 | 2005-06-21 |
| On-wafer monitoring system App 20050115673 - Samukawa, Seiji ; et al. | 2005-06-02 |
| Plasma processing method, plasma etching method and manufacturing method of solid-state image sensor App 20050085087 - Okigawa, Mitsuru ; et al. | 2005-04-21 |
| Neutral particle beam processing apparatus Grant 6,861,643 - Ichiki , et al. March 1, 2 | 2005-03-01 |
| Neutral particle beam processing apparatus Grant 6,861,642 - Ichiki , et al. March 1, 2 | 2005-03-01 |
| Neutral particle beam processing apparatus Grant 6,858,838 - Ichiki , et al. February 22, 2 | 2005-02-22 |
| Beam processing apparatus Grant 6,849,857 - Ichiki , et al. February 1, 2 | 2005-02-01 |
| Etching method and apparatus App 20050020070 - Ichiki, Katsunori ; et al. | 2005-01-27 |
| Plasma surface treatment system and plasma surface treatment method App 20040259380 - Fukuda, Seiichi ; et al. | 2004-12-23 |
| Etching method and apparatus App 20040244687 - Ichiki, Katsunori ; et al. | 2004-12-09 |
| Beam source and beam processing apparatus App 20040221815 - Fukuda, Akira ; et al. | 2004-11-11 |
| Beam source and beam processing apparatus App 20040222367 - Ichiki, Katsunori ; et al. | 2004-11-11 |
| Neutral particle beam processing apparatus App 20040119006 - Samukawa, Seiji ; et al. | 2004-06-24 |
| Beam processing apparatus App 20040108469 - Ichiki, Katsunori ; et al. | 2004-06-10 |
| Neutral particle beam processing apparatus App 20040108470 - Ichiki, Katsunori ; et al. | 2004-06-10 |
| Method of processing a surface of a workpiece App 20040094400 - Ichiki, Kasunori ; et al. | 2004-05-20 |
| Neutral particle beam processing apparatus App 20040074604 - Ichiki, Katsunori ; et al. | 2004-04-22 |
| Neutral particle beam processing apparatus App 20040070348 - Ichiki, Katsunori ; et al. | 2004-04-15 |
| Plasma processing with energy supplied Grant 6,348,158 - Samukawa February 19, 2 | 2002-02-19 |
| Method for plasma treatment and apparatus for plasma treatment Grant 6,054,063 - Ohtake , et al. April 25, 2 | 2000-04-25 |
| Plasma processing apparatus Grant 6,043,608 - Samukawa , et al. March 28, 2 | 2000-03-28 |
| Plasma processing method and equipment used therefor Grant 5,827,435 - Samukawa October 27, 1 | 1998-10-27 |
| Neutral particle beam irradiation apparatus Grant 5,818,040 - Kinoshita , et al. October 6, 1 | 1998-10-06 |
| Plasma processing apparatus which uses a uniquely shaped antenna to reduce the overall size of the apparatus with respect to the plasma chamber Grant 5,565,738 - Samukawa , et al. October 15, 1 | 1996-10-15 |
| Plasma-etching method and apparatus therefor Grant 5,468,341 - Samukawa November 21, 1 | 1995-11-21 |
| Radio frequency electron cyclotron resonance plasma etching apparatus Grant 5,401,351 - Samukawa March 28, 1 | 1995-03-28 |
| Plasma formation using electron cyclotron resonance and method for processing substrate by using the same Grant 5,366,586 - Samukawa November 22, 1 | 1994-11-22 |
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