| Patent | Date |
|---|
High Throughput And Metal Contamination Control Oven For Chamber Component Cleaning Process
App 20220275505 - LIAO; Chien-Min ; et al. | 2022-09-01 |
Method and apparatus for actively tuning a plasma power source
Grant 11,398,369 - Wang , et al. July 26, 2 | 2022-07-26 |
Part-life Estimation Utilizing Feature Metrology
App 20220020565 - LIAO; Chien-Min ; et al. | 2022-01-20 |
Method of reclaiming a seal
Grant 11,090,893 - Maheshwari , et al. August 17, 2 | 2021-08-17 |
Protective yttria coating for semiconductor equipment parts
Grant 11,047,035 - Gopalan , et al. June 29, 2 | 2021-06-29 |
Method And System For Improving The Operation Of Semiconductor Processing
App 20210168979 - YANG; Hsui ; et al. | 2021-06-03 |
Inline Measurement Of Process Gas Dissociation Using Infrared Absorption
App 20210159060 - GOPALAN; Ramesh ; et al. | 2021-05-27 |
Method And Apparatus For Actively Tuning A Plasma Power Source
App 20200411288 - WANG; Rongping ; et al. | 2020-12-31 |
Method Of Reclaiming A Seal
App 20200079044 - MAHESHWARI; Shagun P. ; et al. | 2020-03-12 |
Plasma doping using a solid dopant source
Grant 10,460,941 - Salimian , et al. Oc | 2019-10-29 |
Protective Yttria Coating For Semiconductor Equipment Parts
App 20190264314 - Gopalan; Ramesh ; et al. | 2019-08-29 |
Plasma Doping Using A Solid Dopant Source
App 20180130659 - Salimian; Siamak ; et al. | 2018-05-10 |
Gas distribution system for improved transient phase deposition
Grant 7,722,737 - Gondhalekar , et al. May 25, 2 | 2010-05-25 |
Low-frequency Bias Power In Hdp-cvd Processes
App 20090263594 - Wang; Rongping ; et al. | 2009-10-22 |
Low-frequency bias power in HDP-CVD processes
Grant 7,571,698 - Wang , et al. August 11, 2 | 2009-08-11 |
Gas Distribution System for Improved Transient Phase Deposition
App 20080041821 - Gondhalekar; Sudhir ; et al. | 2008-02-21 |
Temperature Controlled Semiconductor Processing Chamber Liner
App 20070091535 - Noorbakhsh; Hamid ; et al. | 2007-04-26 |
Double slit-valve doors for plasma processing
Grant 7,147,719 - Welch , et al. December 12, 2 | 2006-12-12 |
Low-frequency bias power in HDP-CVD processes
App 20060150913 - Wang; Rongping ; et al. | 2006-07-13 |
Gas distribution system for improved transient phase deposition
App 20060113038 - Gondhalekar; Sudhir ; et al. | 2006-06-01 |
Methods and systems for high-aspect-ratio gapfill using atomic-oxygen generation
Grant 6,958,112 - Karim , et al. October 25, 2 | 2005-10-25 |
Configurable single substrate wet-dry integrated cluster cleaner
Grant 6,899,111 - Luscher , et al. May 31, 2 | 2005-05-31 |
Magnetic barrier for plasma in chamber exhaust
Grant 6,863,835 - Carducci , et al. March 8, 2 | 2005-03-08 |
Dielectric etch chamber with expanded process window
App 20050003675 - Carducci, James D. ; et al. | 2005-01-06 |
Methods and systems for high-aspect-ratio gapfill using atomic-oxygen generation
App 20040241342 - Karim, M. Ziaul ; et al. | 2004-12-02 |
Temperature controlled dome-coil system for high power inductively coupled plasma systems
Grant 6,822,185 - Welch , et al. November 23, 2 | 2004-11-23 |
Dielectric etch chamber with expanded process window
Grant 6,797,639 - Carducci , et al. September 28, 2 | 2004-09-28 |
Magnetic barrier for plasma in chamber exhaust
Grant 6,773,544 - Carducci , et al. August 10, 2 | 2004-08-10 |
Double slit-valve doors for plasma processing
App 20040083978 - Welch, Michael D. ; et al. | 2004-05-06 |
Temperature controlled dome-coil system for high power inductively coupled plasma systems
App 20040065645 - Welch, Michael ; et al. | 2004-04-08 |
Dielectric etch chamber with expanded process window
Grant 6,716,302 - Carducci , et al. April 6, 2 | 2004-04-06 |
Double slit-valve doors for plasma processing
Grant 6,647,918 - Welch , et al. November 18, 2 | 2003-11-18 |
Correction of wafer temperature drift in a plasma reactor based upon continuous wafer temperature measurements using an in-situ wafer temperature optical probe
Grant 6,575,622 - Norrbakhsh , et al. June 10, 2 | 2003-06-10 |
Dielectric etch chamber with expanded process window
App 20030038111 - Carducci, James D. ; et al. | 2003-02-27 |
Dielectric etch chamber with expanded process window
App 20030037880 - Carducci, James D. ; et al. | 2003-02-27 |
Configurable single substrate wet-dry integrated cluster cleaner
App 20020189638 - Luscher, Paul E. ; et al. | 2002-12-19 |
Plasma reactor cooled ceiling with an array of thermally isolated plasma heated mini-gas distribution plates
Grant 6,432,259 - Noorbakhsh , et al. August 13, 2 | 2002-08-13 |
Series chamber for substrate processing
App 20020096114 - Carducci, James D. ; et al. | 2002-07-25 |
Temperature controlled semiconductor processing chamber liner
App 20020069970 - Noorbakhsh, Hamid ; et al. | 2002-06-13 |
Configurable single substrate wet-dry integrated cluster cleaner
App 20020062848 - Luscher, Paul E. ; et al. | 2002-05-30 |
Correction of wafer temperature drift in a plasma reactor based upon continuous wafer temperature measurements using an in-situ wafer temperature optical probe
App 20020048311 - Norrbakhsh, Hamid ; et al. | 2002-04-25 |
Chuck having pressurized zones of heat transfer gas
Grant 6,320,736 - Shamouilian , et al. November 20, 2 | 2001-11-20 |
Magnetic barrier for plasma in chamber exhaust
App 20010032591 - Carducci, James D. ; et al. | 2001-10-25 |
Magnetic barrier for plasma in chamber exhaust
App 20010032590 - Carducci, James D. ; et al. | 2001-10-25 |
Method and apparatus for minimizing plasma destabilization within a semiconductor wafer processing system
Grant 6,304,424 - Mett , et al. October 16, 2 | 2001-10-16 |
Substrate support for plasma processing
Grant 6,273,958 - Shamouilian , et al. August 14, 2 | 2001-08-14 |
Substrate Support For Plasma Processing
App 20010003298 - SHAMOUILIAN, SHAMOUIL ; et al. | 2001-06-14 |
Method and apparatus for supplying a chucking voltage to an electrostatic chuck within a semiconductor wafer processing system
Grant 6,198,616 - Dahimene , et al. March 6, 2 | 2001-03-06 |
Double slit-valve doors for plasma processing
Grant 6,192,827 - Welch , et al. February 27, 2 | 2001-02-27 |
Thin film processing plasma reactor chamber with radially upward sloping ceiling for promoting radially outward diffusion
Grant 6,076,482 - Ding , et al. June 20, 2 | 2000-06-20 |
Apparatus and method for actively controlling the DC potential of a cathode pedestal
Grant 5,737,177 - Mett , et al. April 7, 1 | 1998-04-07 |
Dual-frequency capacitively-coupled plasma reactor for materials processing
Grant 5,656,123 - Salimian , et al. August 12, 1 | 1997-08-12 |
Plasma etch equipment
Grant 5,587,039 - Salimian , et al. December 24, 1 | 1996-12-24 |
Plasma etch process
Grant 5,376,223 - Salimian , et al. December 27, 1 | 1994-12-27 |
| 