loadpatents
name:-0.037117004394531
name:-0.022142887115479
name:-0.00057601928710938
Sakai; Itsuko Patent Filings

Sakai; Itsuko

Patent Applications and Registrations

Patent applications and USPTO patent grants for Sakai; Itsuko.The latest application filed is for "plasma processing apparatus and plasma processing method".

Company Profile
0.19.25
  • Sakai; Itsuko - Mie JP
  • Sakai; Itsuko - Kuwana Mie JP
  • Sakai; Itsuko - Kuwana JP
  • Sakai; Itsuko - Yokohama N/A JP
  • Sakai; Itsuko - Yokohama-shi JP
  • Sakai; Itsuko - Kanagawa JP
  • Sakai, Itsuko - Kanagawa-ken JP
  • Sakai; Itsuko - Kawasaki JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Plasma processing apparatus and plasma processing method
Grant 10,672,615 - Sato , et al.
2020-06-02
Method for manufacturing semiconductor device
Grant 10,026,622 - Omura , et al. July 17, 2
2018-07-17
Plasma Processing Apparatus and Plasma Processing Method
App 20180012768 - SATO; Yosuke ;   et al.
2018-01-11
Method For Manufacturing Semiconductor Device
App 20170271170 - OMURA; Mitsuhiro ;   et al.
2017-09-21
Semiconductor device and manufacturing method thereof
Grant 8,580,652 - Kawasaki , et al. November 12, 2
2013-11-12
Edge detection method for transparent substrate by detecting non-light-emitting region of transparent substrate
Grant 8,339,615 - Dohi , et al. December 25, 2
2012-12-25
Semiconductor Device Manufacturing Method
App 20120315758 - SAKURAI; Noriko ;   et al.
2012-12-13
Semiconductor Device And Manufacturing Method Thereof
App 20110068476 - KAWASAKI; Atsuko ;   et al.
2011-03-24
Capacitive coupling plasma processing apparatus
Grant 7,767,055 - Himori , et al. August 3, 2
2010-08-03
Edge Detection Method
App 20100027032 - Dohi; Masayuki ;   et al.
2010-02-04
Processing method for conservation of processing gases
Grant 7,628,931 - Saito , et al. December 8, 2
2009-12-08
Plasma processing apparatus
Grant 7,368,876 - Hayami , et al. May 6, 2
2008-05-06
Substrate Transferring Apparatus, Substrate Processing Apparatus, And Substrate Processing Method
App 20070227033 - Kobayashi; Yoshiyuki ;   et al.
2007-10-04
Plasma treatment apparatus
Grant 7,186,315 - Himori , et al. March 6, 2
2007-03-06
Plasma processing method
Grant 7,182,879 - Sakai , et al. February 27, 2
2007-02-27
Semiconductor device
App 20060231877 - Takenaka; Keiichi ;   et al.
2006-10-19
Semiconductor manufacturing apparatus and manufacturing method of semiconductor device
App 20060137988 - Yahashi; Katsunori ;   et al.
2006-06-29
Method of manufacturing semiconductor device
App 20060128093 - Takenaka; Keiichi ;   et al.
2006-06-15
Capacitive coupling plasma processing apparatus
App 20060118044 - Himori; Shinji ;   et al.
2006-06-08
High speed silicon etching method
Grant 7,022,616 - Mimura , et al. April 4, 2
2006-04-04
Processing method for conservation of processing gases
App 20050279731 - Saito, Masashi ;   et al.
2005-12-22
Gas circulating-processing apparatus
Grant 6,938,638 - Kubota , et al. September 6, 2
2005-09-06
Plasma processing apparatus
App 20050011452 - Hayami, Toshihiro ;   et al.
2005-01-20
Plasma processing apparatus
App 20040244688 - Himori, Shinji ;   et al.
2004-12-09
Plasma processing apparatus with reduced parasitic capacity and loss in RF power
App 20040238126 - Hayashi, Hisataka ;   et al.
2004-12-02
Semiconductor device including trench capacitor and manufacturing method of the same
App 20040188739 - Takenaka, Keiichi ;   et al.
2004-09-30
Plasma processing method
App 20040168766 - Sakai, Itsuko ;   et al.
2004-09-02
Gas recirculation flow control method and apparatus for use in vacuum system
Grant 6,782,907 - Kawasaki , et al. August 31, 2
2004-08-31
Plasma processing apparatus with reduced parasitic capacity and loss in RF power
Grant 6,780,278 - Hayashi , et al. August 24, 2
2004-08-24
High speed silicon etching method
App 20040097079 - Mimura, Takanori ;   et al.
2004-05-20
Method for manufacturing a semiconductor device using recirculation of a process gas
Grant 6,689,699 - Sakai , et al. February 10, 2
2004-02-10
Plasma treatment apparatus
App 20040020431 - Himori, Shinji ;   et al.
2004-02-05
Plasma processing method
Grant 6,642,149 - Suemasa , et al. November 4, 2
2003-11-04
Plasma processing method
App 20030054647 - Suemasa, Tomoki ;   et al.
2003-03-20
Gas circulating-processing apparatus
App 20020134429 - Kubota, Hiroshi ;   et al.
2002-09-26
Gas recirculation flow control method and apparatus for use in vacuum system
App 20020134439 - Kawasaki, Hiroyuki ;   et al.
2002-09-26
Plasma processing apparatus with reduced parasitic capacity and loss in RF power
App 20020042204 - Hayashi, Hisataka ;   et al.
2002-04-11
Semiconductor processing apparatus and method for manufacturing a semiconductor device
App 20020034880 - Sakai, Itsuko ;   et al.
2002-03-21
Plasma processing method
App 20010051232 - Sakai, Itsuko ;   et al.
2001-12-13
Gas recovery system and gas recovery method
App 20010015133 - Sakai, Itsuko ;   et al.
2001-08-23
Plasma process apparatus
Grant 5,717,294 - Sakai , et al. February 10, 1
1998-02-10
Charged beam apparatus having cleaning function and method of cleaning charged beam apparatus
Grant 5,539,211 - Ohtoshi , et al. July 23, 1
1996-07-23
Method of cleaning a charged beam apparatus
Grant 5,312,519 - Sakai , et al. May 17, 1
1994-05-17

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