Patent | Date |
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Methods Of Filling Isolation Trenches For Semiconductor Devices And Resulting Structures App 20130009276 - Rudeck; Paul J. ;   et al. | 2013-01-10 |
Methods of filling isolation trenches for semiconductor devices and resulting structures Grant 8,304,322 - Rudeck , et al. November 6, 2 | 2012-11-06 |
Semiconductor contact device Grant 7,932,557 - Rudeck April 26, 2 | 2011-04-26 |
Use of selective oxidation to form asymmetrical oxide features during the manufacture of a semiconductor device Grant 7,429,514 - Rudeck , et al. September 30, 2 | 2008-09-30 |
Method to remove an oxide seam along gate stack edge, when nitride space formation begins with an oxide liner surrounding gate stack Grant 7,420,240 - Rudeck September 2, 2 | 2008-09-02 |
Semiconductor contact device and method Grant 7,294,567 - Rudeck November 13, 2 | 2007-11-13 |
Methods of filling isolation trenches for semiconductor devices and resulting structures App 20070243692 - Rudeck; Paul J. ;   et al. | 2007-10-18 |
Minimizing adjacent wordline disturb in a memory device Grant 7,272,039 - Rudeck , et al. September 18, 2 | 2007-09-18 |
Modified source/drain re-oxidation method and system Grant 7,271,435 - Rudeck , et al. September 18, 2 | 2007-09-18 |
Minimizing adjacent wordline disturb in a memory device Grant 7,257,024 - Rudeck , et al. August 14, 2 | 2007-08-14 |
Minimizing adjacent wordline disturb in a memory device Grant 7,212,435 - Rudeck , et al. May 1, 2 | 2007-05-01 |
Non-volatile memory cells without diffusion junctions App 20060278913 - Mihnea; Andrei ;   et al. | 2006-12-14 |
Semiconductor contact device Grant 7,148,547 - Rudeck December 12, 2 | 2006-12-12 |
Gate coupling in floating-gate memory cells App 20060267070 - Rudeck; Paul J. | 2006-11-30 |
Semiconductor Contact Device App 20060237800 - Rudeck; Paul J. | 2006-10-26 |
Gate coupling in floating-gate memory cells Grant 7,115,458 - Rudeck October 3, 2 | 2006-10-03 |
Minimizing adjacent wordline disturb in a memory device App 20060198222 - Rudeck; Paul J. ;   et al. | 2006-09-07 |
Minimizing adjacent wordline disturb in a memory device App 20060198221 - Rudeck; Paul J. ;   et al. | 2006-09-07 |
Programmable memory devices supported by semiconductor substrates Grant 7,091,549 - Rudeck , et al. August 15, 2 | 2006-08-15 |
Use of selective oxidation to form asymmetrical oxide features during the manufacture of a semiconductor device App 20060166460 - Rudeck; Paul J. ;   et al. | 2006-07-27 |
Modified source/drain re-oxidation method and system Grant 7,037,860 - Rudeck , et al. May 2, 2 | 2006-05-02 |
Use of selective oxidation to form asymmetrical oxide features during the manufacture of a semiconductor device Grant 7,015,111 - Rudeck , et al. March 21, 2 | 2006-03-21 |
Methods and structure for an improved floating gate memory cell Grant 7,015,098 - Rudeck March 21, 2 | 2006-03-21 |
Gate coupling in floating-gate memory cells App 20060043458 - Rudeck; Paul J. | 2006-03-02 |
Minimizing adjacent wordline disturb in a memory device App 20060002167 - Rudeck; Paul J. ;   et al. | 2006-01-05 |
Modified source/drain re-oxidation method and system App 20050272203 - Rudeck, Paul J. ;   et al. | 2005-12-08 |
Method to remove an oxide seam along gate stack edge, when nitride space formation begins with an oxide liner surrounding gate stack App 20050098820 - Rudeck, Paul J. | 2005-05-12 |
Programmable memory devices supported by semiconductor substrates App 20050098825 - Rudeck, Paul J. ;   et al. | 2005-05-12 |
Use of selective oxidation to form asymmetrical oxide features during the manufacture of a semiconductor device App 20050090061 - Rudeck, Paul J. ;   et al. | 2005-04-28 |
Programmable memory devices supported by semiconductor substrates Grant 6,873,005 - Rudeck , et al. March 29, 2 | 2005-03-29 |
Semiconductor contact device App 20050026350 - Rudeck, Paul J. | 2005-02-03 |
Methods for fabricating an improved floating gate memory cell Grant 6,849,501 - Rudeck February 1, 2 | 2005-02-01 |
Methods and structure for an improved floating gate memory cell App 20050009276 - Rudeck, Paul J. | 2005-01-13 |
Programmable memory devices supported by semiconductor substrates App 20040201060 - Rudeck, Paul J. ;   et al. | 2004-10-14 |
Programmable memory devices supported by semiconductive substrates Grant 6,803,624 - Rudeck , et al. October 12, 2 | 2004-10-12 |
Modified source/drain re-oxidation method and system App 20040185620 - Rudeck, Paul J. ;   et al. | 2004-09-23 |
Methods of forming programmable memory devices comprising tungsten Grant 6,777,291 - Rudeck , et al. August 17, 2 | 2004-08-17 |
Modified source/drain re-oxidation method and system Grant 6,756,268 - Rudeck , et al. June 29, 2 | 2004-06-29 |
Method and structure for an oxide layer overlying an oxidation-resistant layer App 20040113196 - Rudeck, Paul J. ;   et al. | 2004-06-17 |
Method to remove an oxide seam along gate stack edge, when nitride space formation begins with an oxide liner surrounding gate stack Grant 6,713,350 - Rudeck March 30, 2 | 2004-03-30 |
Method To Remove An Oxide Seam Along Gate Stack Edge, When Nitride Space Formation Begins With An Oxide Liner Surrounding Gate Stack App 20040029319 - Rudeck, Paul J. | 2004-02-12 |
Programmable memory devices comprising tungsten App 20040004243 - Rudeck, Paul J. ;   et al. | 2004-01-08 |
Programmable memory devices comprising tungsten, and methods of forming programmable memory devices comprising tungsten App 20040005760 - Rudeck, Paul J. ;   et al. | 2004-01-08 |
Method and structure for an improved floating gate memory cell App 20030203557 - Rudeck, Paul J. | 2003-10-30 |
Advanced metallization approach for forming self-aligned contacts and local area interconnects for memory and logic devices App 20030170954 - Rudeck, Paul J. | 2003-09-11 |
Method and structure for an improved floating gate memory cell Grant 6,611,019 - Rudeck August 26, 2 | 2003-08-26 |
Method and structure for an improved floating gate memory cell Grant 6,608,346 - Rudeck August 19, 2 | 2003-08-19 |
Method and structure for an improved floating gate memory cell Grant 6,566,195 - Rudeck May 20, 2 | 2003-05-20 |
Flash memory cell for high efficiency programming App 20030053338 - Mihnea, Andrei ;   et al. | 2003-03-20 |
Flash memory cell for high efficiency programming App 20030031055 - Mihnea, Andrei ;   et al. | 2003-02-13 |
Modified source/drain re-oxidation method and system App 20020132427 - Rudeck, Paul J. ;   et al. | 2002-09-19 |
Flash memory cell for high efficiency programming Grant 6,449,189 - Mihnea , et al. September 10, 2 | 2002-09-10 |
Flash memory cell for high efficiency programming Grant 6,445,619 - Mihnea , et al. September 3, 2 | 2002-09-03 |
Modified source/drain re-oxidation method and system App 20020096707 - Rudeck, Paul J. ;   et al. | 2002-07-25 |
Modified source/drain re-oxidation method and system App 20020096706 - Rudeck, Paul J. ;   et al. | 2002-07-25 |
Method And Structure For An Improved Floating Gate Memory Cell App 20020094636 - RUDECK, PAUL J. | 2002-07-18 |
Method and structure for an improved floating gate memory cell App 20020084483 - Rudeck, Paul J. | 2002-07-04 |
Method and structure for an improved floating gate memory cell App 20020086482 - Rudeck, Paul J. | 2002-07-04 |
Method and structure for an improved floating gate memory cell App 20020081805 - Rudeck, Paul J. | 2002-06-27 |
Flash memory cell for high efficiency programming Grant 6,384,447 - Mihnea , et al. May 7, 2 | 2002-05-07 |
Flash memory cell for high efficiency programming App 20020031010 - Mihnea, Andrei ;   et al. | 2002-03-14 |
Method and structure for an oxide layer overlying an oxidation-resistant layer App 20020014654 - Rudeck, Paul J. ;   et al. | 2002-02-07 |
Flash memory cell for high efficiency programming App 20020001228 - Mihnea, Andrei ;   et al. | 2002-01-03 |
Flash memory cell for high efficiency programming App 20020001232 - Mihnea, Andrei ;   et al. | 2002-01-03 |
Flash memory cell for high efficiency programming App 20010055224 - Mihnea, Andrei ;   et al. | 2001-12-27 |
Flash memory cell for high efficiency programming App 20010043490 - Mihnea, Andrei ;   et al. | 2001-11-22 |
Method and structure for an oxide layer overlaying an oxidation-resistant layer Grant 6,297,092 - Rudeck , et al. October 2, 2 | 2001-10-02 |
Flash memory cell Grant 6,272,047 - Mihnea , et al. August 7, 2 | 2001-08-07 |
Alignment mark system for electron beam/optical mixed lithography Grant 4,893,163 - Rudeck January 9, 1 | 1990-01-09 |