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Patent applications and USPTO patent grants for Rosler; Richard S..The latest application filed is for "direct wafer temperature control".
Patent | Date |
---|---|
Direct wafer temperature control Grant 4,788,416 - Price , et al. November 29, 1 | 1988-11-29 |
Process for CVD of tungsten Grant 4,749,597 - Mendonca , et al. June 7, 1 | 1988-06-07 |
Apparatus for processing semiconductor wafers or the like Grant 4,610,748 - Engle , et al. September 9, 1 | 1986-09-09 |
Metal-silicide deposition using plasma-enhanced chemical vapor deposition Grant 4,557,943 - Rosler , et al. December 10, 1 | 1985-12-10 |
Spacer for preventing shorting between conductive plates Grant 4,491,606 - Rosler , et al. January 1, 1 | 1985-01-01 |
Reduced pressure induction heated reactor and method Grant 4,263,336 - Thompson , et al. April 21, 1 | 1981-04-21 |
Chemical vapor deposition reactor and process Grant 4,232,063 - Rosler , et al. November 4, 1 | 1980-11-04 |
Susceptor Structure For Chemical Vapor Deposition Reactor Grant 3,796,182 - Rosler March 12, 1 | 1974-03-12 |
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