Patent | Date |
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Methods And Apparatus For Reducing Sputtering Of A Grounded Shield In A Process Chamber App 20200312640 - RITCHIE; Alan ;   et al. | 2020-10-01 |
Methods and apparatus for reducing sputtering of a grounded shield in a process chamber Grant 10,692,706 - Ritchie , et al. | 2020-06-23 |
Process kit for deposition and etching Grant 10,099,245 - Forster , et al. October 16, 2 | 2018-10-16 |
Configurable variable position closed track magnetron Grant 9,812,303 - Ritchie , et al. November 7, 2 | 2017-11-07 |
Process kit with plasma-limiting gap Grant 9,695,502 - Ritchie , et al. July 4, 2 | 2017-07-04 |
Crystalline orientation and overhang control in collision based RF plasmas Grant 9,611,539 - Ge , et al. April 4, 2 | 2017-04-04 |
Deposition apparatus and methods to reduce deposition asymmetry Grant 9,580,796 - Ritchie , et al. February 28, 2 | 2017-02-28 |
Substrate support with radio frequency (RF) return path Grant 9,340,866 - Ritchie , et al. May 17, 2 | 2016-05-17 |
Substrate processing system with mechanically floating target assembly Grant 9,303,311 - Young , et al. April 5, 2 | 2016-04-05 |
Substrate processing system having symmetric RF distribution and return paths Grant 9,255,322 - Young , et al. February 9, 2 | 2016-02-09 |
Methods of forming a metal containing layer on a substrate with high uniformity and good profile control Grant 9,218,961 - Ge , et al. December 22, 2 | 2015-12-22 |
Thin Film Battery with Magnetic Components App 20150349374 - Ishikawa; Tetsuya ;   et al. | 2015-12-03 |
Magnetron design for extended target life in radio frequency (RF) plasmas Grant 9,028,659 - Ritchie , et al. May 12, 2 | 2015-05-12 |
Methods for depositing metal in high aspect ratio features Grant 8,846,451 - Ritchie , et al. September 30, 2 | 2014-09-30 |
Methods And Apparatus For Reducing Sputtering Of A Grounded Shield In A Process Chamber App 20140262764 - RITCHIE; ALAN ;   et al. | 2014-09-18 |
Process Kit For Deposition And Etching App 20140262026 - FORSTER; JOHN ;   et al. | 2014-09-18 |
Configurable Variable Position Closed Track Magnetron App 20140246314 - RITCHIE; ALAN ;   et al. | 2014-09-04 |
Apparatus for physical vapor deposition having centrally fed RF energy Grant 8,795,488 - Rasheed , et al. August 5, 2 | 2014-08-05 |
Physical vapor deposition chamber with rotating magnet assembly and centrally fed RF power Grant 8,795,487 - Ritchie , et al. August 5, 2 | 2014-08-05 |
Apparatus for enabling concentricity of plasma dark space Grant 8,702,918 - Ritchie , et al. April 22, 2 | 2014-04-22 |
Magnetron Design For Extended Target Life In Radio Frequency (rf) Plasmas App 20140042023 - RITCHIE; ALAN ;   et al. | 2014-02-13 |
Methods for depositing metal in high aspect ratio features Grant 8,563,428 - Brown , et al. October 22, 2 | 2013-10-22 |
Process Kit With Plasma-limiting Gap App 20130256128 - RITCHIE; ALAN ;   et al. | 2013-10-03 |
Substrate Support With Radio Frequency (rf) Return Path App 20130256126 - RITCHIE; ALAN ;   et al. | 2013-10-03 |
Substrate Processing System With Mechanically Floating Target Assembly App 20130256125 - YOUNG; DONNY ;   et al. | 2013-10-03 |
Substrate Processing System Having Symmetric Rf Distribution And Return Paths App 20130256127 - YOUNG; DONNY ;   et al. | 2013-10-03 |
Crystalline Orientation And Overhang Control In Collision Based Rf Plasmas App 20130192980 - GE; ZHENBIN ;   et al. | 2013-08-01 |
Apparatus For Enabling Concentricity Of Plasma Dark Space App 20130153412 - RITCHIE; ALAN ;   et al. | 2013-06-20 |
Methods Of Forming A Metal Containing Layer On A Substrate With High Uniformity And Good Profile Control App 20130075246 - Ge; Zhenbin ;   et al. | 2013-03-28 |
Methods For Depositing Metal In High Aspect Ratio Features App 20120149192 - BROWN; KARL ;   et al. | 2012-06-14 |
Methods For Depositing Metal In High Aspect Ratio Features App 20120028461 - Ritchie; Alan ;   et al. | 2012-02-02 |
Deposition Apparatus And Methods To Reduce Deposition Asymmetry App 20120000772 - Ritchie; Alan ;   et al. | 2012-01-05 |
Physical Vapor Deposition Chamber With Rotating Magnet Assembly And Centrally Fed Rf Power App 20110240466 - RITCHIE; ALAN ;   et al. | 2011-10-06 |
Apparatus For Physical Vapor Deposition Having Centrally Fed Rf Energy App 20110240464 - RASHEED; MUHAMMAD ;   et al. | 2011-10-06 |
Ionized Physical Vapor Deposition for Microstructure Controlled Thin Film Deposition App 20100314244 - Brown; Karl ;   et al. | 2010-12-16 |
Ionized Physical Vapor Deposition for Microstructure Controlled Thin Film Deposition App 20100314245 - Brown; Karl ;   et al. | 2010-12-16 |