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name:-0.043159008026123
name:-0.29577994346619
name:-0.0008389949798584
Puchner; Helmut Patent Filings

Puchner; Helmut

Patent Applications and Registrations

Patent applications and USPTO patent grants for Puchner; Helmut.The latest application filed is for "sonos type stacks for nonvolatile changetrap memory devices and methods to form the same".

Company Profile
0.39.12
  • Puchner; Helmut - Santa Clara CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Memory cell array latchup prevention
Grant 9,842,629 - Kapre , et al. December 12, 2
2017-12-12
High reliability non-volatile static random access memory devices, methods and systems
Grant 9,570,152 - Zain , et al. February 14, 2
2017-02-14
SONOS type stacks for nonvolatile charge trap memory devices and methods to form the same
Grant 9,553,175 - Puchner , et al. January 24, 2
2017-01-24
SONOS Type Stacks for Nonvolatile ChangeTrap Memory Devices and Methods to Form the Same
App 20160104789 - Puchner; Helmut ;   et al.
2016-04-14
Memory controller devices, systems and methods for translating memory requests between first and second formats for high reliability memory devices
Grant 9,304,953 - Zain , et al. April 5, 2
2016-04-05
SONOS type stacks for nonvolatile changetrap memory devices and methods to form the same
Grant 9,105,740 - Puchner , et al. August 11, 2
2015-08-11
High reliability non-volatile static random access memory devices, methods and systems
Grant 8,861,271 - Zain , et al. October 14, 2
2014-10-14
Circuit with electrostatic discharge protection
Grant 8,841,727 - Walker , et al. September 23, 2
2014-09-23
Memory Cell Array Latchup Prevention
App 20140211547 - Kapre; Ravindra M ;   et al.
2014-07-31
Sonos Type Stacks For Nonvolatile Changetrap Memory Devices And Methods To Form The Same
App 20140103418 - PUCHNER; Helmut ;   et al.
2014-04-17
Memory Controller Devices, Systems And Methods For High Reliability Memory Devices
App 20140006730 - Zain; Suhail ;   et al.
2014-01-02
Circuit with electrostatic discharge protection
Grant 8,283,727 - Walker , et al. October 9, 2
2012-10-09
Voltage protection device
Grant 8,278,684 - Walker , et al. October 2, 2
2012-10-02
SONOS type stacks for nonvolatile change trap memory devices and methods to form the same
Grant 8,163,660 - Puchner , et al. April 24, 2
2012-04-24
Circuit with electrostatic discharge protection
Grant 8,143,673 - Walker , et al. March 27, 2
2012-03-27
Capacitor triggered silicon controlled rectifier
Grant 8,129,788 - Walker , et al. March 6, 2
2012-03-06
Method and circuit for reducing degradation in a regulated circuit
Grant 8,063,655 - Puchner , et al. November 22, 2
2011-11-22
High voltage diode
Grant 7,936,023 - Jang , et al. May 3, 2
2011-05-03
Non-volatile memory and method of operating the same
Grant 7,859,899 - Shakeri , et al. December 28, 2
2010-12-28
Circuits providing ESD protection to high voltage laterally diffused metal oxide semiconductor (LDMOS) transistors
Grant 7,838,937 - Walker , et al. November 23, 2
2010-11-23
Drain extended MOS transistor with increased breakdown voltage
Grant 7,768,068 - Jang , et al. August 3, 2
2010-08-03
Electrostatic discharge protection device
Grant 7,667,241 - Walker , et al. February 23, 2
2010-02-23
SONOS Type Stacks for Nonvolatile ChangeTrap Memory Devices and Methods to Form the Same
App 20100041222 - Puchner; Helmut ;   et al.
2010-02-18
Silicon controlled rectifier electrostatic discharge clamp for a high voltage laterally diffused MOS transistor
Grant 7,659,558 - Walker , et al. February 9, 2
2010-02-09
CMOS embedded high voltage transistor
Grant 7,592,661 - Lee , et al. September 22, 2
2009-09-22
Method and circuit for reducing degradation in a regulated circuit
App 20070018678 - Puchner; Helmut ;   et al.
2007-01-25
Methods for forming super-steep diffusion region profiles in MOS devices and resulting semiconductor topographies
Grant 7,105,413 - Nahm , et al. September 12, 2
2006-09-12
Silicon germanium CMOS channel
Grant 6,977,400 - Puchner , et al. December 20, 2
2005-12-20
Methods for forming super-steep diffusion region profiles in MOS devices and resulting semiconductor topographies
App 20050215024 - Nahm, Jeong-Yeop ;   et al.
2005-09-29
Integrated circuit isolation system
Grant 6,831,348 - Puchner , et al. December 14, 2
2004-12-14
Process for etching a controllable thickness of oxide on an integrated circuit structure on a semiconductor substrate using nitrogen plasma and plasma and an rf bias applied to the substrate
Grant 6,759,337 - Aronowitz , et al. July 6, 2
2004-07-06
Shallow trench isolation structure for laser thermal processing
Grant 6,734,081 - Puchner , et al. May 11, 2
2004-05-11
Fabrication of metal contacts for deep-submicron technologies
Grant 6,727,165 - Puchner , et al. April 27, 2
2004-04-27
Integrated circuit isolation system
Grant 6,613,651 - Puchner , et al. September 2, 2
2003-09-02
Integrated circuit isolation system
App 20030162366 - Puchner, Helmut ;   et al.
2003-08-28
Shallow junction formation
Grant 6,605,846 - Puchner August 12, 2
2003-08-12
Silicon germanium CMOS channel
App 20030146494 - Puchner, Helmut ;   et al.
2003-08-07
Shallow junction formation
App 20030045062 - Puchner, Helmut
2003-03-06
Process for forming high dielectric constant gate dielectric for integrated circuit structure
Grant 6,511,925 - Aronowitz , et al. January 28, 2
2003-01-28
System to improve SER immunity and punchthrough
App 20020173087 - Puchner, Helmut ;   et al.
2002-11-21
Reduced soft error rate (SER) construction for integrated circuit structures
Grant 6,472,715 - Liu , et al. October 29, 2
2002-10-29
Process For Forming Thin Gate Oxide With Enhanced Reliability By Nitridation Of Upper Surface Of Gate Of Oxide To Form Barrier Of Nitrogen Atoms In Upper Surface Region Of Gate Oxide, And Resulting Product
Grant 6,413,881 - Aronowitz , et al. July 2, 2
2002-07-02
Silicon carbide CMOS channel
Grant 6,358,806 - Puchner March 19, 2
2002-03-19
Formation of integrated circuit structure using one or more silicon layers for implantation and out-diffusion in formation of defect-free source/drain regions and also for subsequent formation of silicon nitride spacers
Grant 6,331,468 - Aronowitz , et al. December 18, 2
2001-12-18
Dual nitrogen implantation techniques for oxynitride formation in semiconductor devices
Grant 6,323,106 - Huang , et al. November 27, 2
2001-11-27
Isolation trench in semiconductor substrate with nitrogen-containing barrier region, and process for forming same
Grant 6,156,620 - Puchner , et al. December 5, 2
2000-12-05
Well formation For CMOS devices integrated circuit structures
Grant 6,144,076 - Puchner , et al. November 7, 2
2000-11-07

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