Pierrat; Christophe

Patent Applications and Registrations

Patent applications and USPTO patent grants for Pierrat; Christophe.The latest application filed is for "lithography modeling and applications".

Company Profile

0.138.106

Pierrat; Christophe - Santa Clara CA US
Pierrat; Christophe - Hsin-Chu City TW
Pierrat; Christophe - Boise ID
Pierrat; Christophe - Hsin-Chu TW
Pierrat; Christophe - Msin-Chu TW
Pierrat; Christophe - Watchung NJ
Pierrat; Christophe - Basking Ridge NJ

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Handling of flat data for phase processing including growing shapes within bins to identify clusters Grant 8,977,989 - Cote , et al. March 10, 2	2015-03-10
Lithography Modeling And Applications App 20130346037 - Pierrat; Christophe	2013-12-26
Layout of phase shifting photolithographic masks with refined shifter shapes Grant 8,566,757 - Cote , et al. October 22, 2	2013-10-22
Lithography modeling and applications Grant 8,479,125 - Pierrat July 2, 2	2013-07-02
System and method for compressed post-OPC data Grant 8,423,925 - Pierrat April 16, 2	2013-04-16
System and method for compressed post-OPC data Grant 8,423,924 - Pierrat April 16, 2	2013-04-16
System and method for applying phase effects of mask diffraction patterns Grant 8,316,326 - Pierrat November 20, 2	2012-11-20
Spacer double patterning for lithography operations Grant 8,278,156 - Pierrat October 2, 2	2012-10-02
Self-alignment for semiconductor patterns Grant 8,252,693 - Pierrat August 28, 2	2012-08-28
Self-aligned VIAS for semiconductor devices Grant 8,198,188 - Pierrat June 12, 2	2012-06-12
System and method for compressed design phase contour data Grant 8,103,984 - Pierrat January 24, 2	2012-01-24
Contact or proximity printing using a magnified mask image App 20110207056 - Pierrat; Christophe ; et al.	2011-08-25
Contact or proximity printing using a magnified mask image Grant 7,932,020 - Pierrat , et al. April 26, 2	2011-04-26
Spacer double patterning for lithography operations Grant 7,927,928 - Pierrat April 19, 2	2011-04-19
Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects Grant 7,926,004 - Pierrat , et al. April 12, 2	2011-04-12
Uniformity for semiconductor patterning operations Grant 7,926,001 - Pierrat April 12, 2	2011-04-12
Self-alignment for semiconductor patterns Grant 7,902,613 - Pierrat March 8, 2	2011-03-08
Spacer Double Patterning For Lithography Operations App 20110018146 - Pierrat; Christophe	2011-01-27
Spacer Double Patterning For Lithography Operations App 20110012237 - PIERRAT; CHRISTOPHE	2011-01-20
Uniformity For Semiconductor Patterning Operations App 20100299646 - Pierrat; Christophe	2010-11-25
Lithography Modelling And Applications App 20100251202 - Pierrat; Christophe	2010-09-30
System And Method For Compressed Post-opc Data App 20100218156 - PIERRAT; Christophe	2010-08-26
Design and layout of phase shifting photolithographic masks Grant 7,739,649 - Cote , et al. June 15, 2	2010-06-15
Design and Layout of Phase Shifting Photolithographic Masks App 20100050149 - Cote; Michel L. ; et al.	2010-02-25
Exposure control for phase shifting photolithographic masks App 20100040965 - Pierrat; Christophe ; et al.	2010-02-18
Full phase shifting mask in damascene process Grant 7,659,042 - Pierrat February 9, 2	2010-02-09
Exposure control for phase shifting photolithographic masks Grant 7,629,109 - Pierrat , et al. December 8, 2	2009-12-08
Mask data preparation Grant 7,614,033 - Pierrat , et al. November 3, 2	2009-11-03
Displacing Edge Segments On A Fabrication Layout Based On Proximity Effects Model Amplitudes For Correcting Proximity Effects App 20090249266 - Pierrat; Christophe ; et al.	2009-10-01
Phase shift mask including sub-resolution assist features for isolated spaces Grant 7,585,595 - Pierrat September 8, 2	2009-09-08
Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects Grant 7,562,319 - Pierrat , et al. July 14, 2	2009-07-14
Full phase shifting mask in damascene process Grant 7,534,531 - Pierrat May 19, 2	2009-05-19
Handling Of Flat Data For Phase Processing Including Growing Shapes Within Bins To Identify Clusters App 20090125867 - Cote; Michel L. ; et al.	2009-05-14
Handling of flat data for phase processing including growing shapes within bins to identify clusters Grant 7,500,217 - Cote , et al. March 3, 2	2009-03-03
Effective proximity effect correction methodology Grant 7,458,056 - Pierrat November 25, 2	2008-11-25
Full Phase Shifting Mask In Damascene Process App 20080286664 - Pierrat; Christophe	2008-11-20
Design and layout of phase shifting photolithographic masks Grant 7,435,513 - Cote , et al. October 14, 2	2008-10-14
Exposure control for phase shifting photolithographic masks Grant 7,422,841 - Pierrat , et al. September 9, 2	2008-09-09
Exposure control for phase shifting photolithographic masks App 20080187869 - Pierrat; Christophe ; et al.	2008-08-07
Design and Layout of Phase Shifting Photolithographic Masks App 20080076042 - Cote; Michel Luc ; et al.	2008-03-27
Design and layout of phase shifting photolithographic masks Grant 7,348,108 - Cote , et al. March 25, 2	2008-03-25
Design and layout of phase shifting photolithographic masks Grant 7,312,003 - Cote , et al. December 25, 2	2007-12-25
Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask Grant 7,236,916 - Pierrat , et al. June 26, 2	2007-06-26
Alternating phase shift mask design conflict resolution Grant 7,178,128 - Liu , et al. February 13, 2	2007-02-13
Phase conflict resolution for photolithographic masks Grant 7,169,515 - Pierrat , et al. January 30, 2	2007-01-30
Model-based data conversion Grant 7,165,234 - Pierrat January 16, 2	2007-01-16
Simplified etching technique for producing multiple undercut profiles App 20070007238 - Huang; Karen ; et al.	2007-01-11
Devices containing multiple undercut profiles App 20070007615 - Huang; Karen ; et al.	2007-01-11
Displacing Edge Segments On A Fabrication Layout Based On Proximity Effects Model Amplitudes For Correcting Proximity Effects App 20070006118 - Pierrat; Christophe ; et al.	2007-01-04
Design-manufacturing interface via a unified model Grant 7,155,689 - Pierrat , et al. December 26, 2	2006-12-26
Phase shift masking for complex patterns with proximity adjustments Grant 7,132,203 - Pierrat November 7, 2	2006-11-07
Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects Grant 7,131,101 - Pierrat , et al. October 31, 2	2006-10-31
Critical dimension control using full phase and trim masks Grant 7,122,281 - Pierrat October 17, 2	2006-10-17
Mask data preparation App 20060218520 - Pierrat; Christophe ; et al.	2006-09-28
Method and apparatus for cleaning and sealing display packages App 20060205100 - Huang; Karen ; et al.	2006-09-14
Method and apparatus for cleaning and sealing display packages App 20060201539 - Huang; Karen ; et al.	2006-09-14
Phase conflict resolution for photolithographic masks Grant 7,083,879 - Pierrat , et al. August 1, 2	2006-08-01
Methods of forming capacitors, and methods of forming DRAM circuitry Grant 7,071,058 - Roberts , et al. July 4, 2	2006-07-04
Effective proximity effect correction methodology App 20060129968 - Pierrat; Christophe	2006-06-15
Simplified etching technique for producing multiple undercut profiles Grant 7,052,617 - Huang , et al. May 30, 2	2006-05-30
Mask data preparation Grant 7,055,127 - Pierrat , et al. May 30, 2	2006-05-30
Method And Apparatus For Cleaning And Sealing Display Packages App 20060105494 - HUANG; KAREN ; et al.	2006-05-18
Standard cell design incorporating phase information Grant 7,028,285 - Cote , et al. April 11, 2	2006-04-11
System and method for indentifying dummy features on a mask layer Grant 7,014,955 - Chang , et al. March 21, 2	2006-03-21
Effective proximity effect correction methodology Grant 7,010,764 - Pierrat March 7, 2	2006-03-07
Mask repair using multiple exposures Grant 7,005,215 - Pierrat February 28, 2	2006-02-28
Dissection of edges with projection points in a fabrication layout for correcting proximity effects Grant 7,003,757 - Pierrat , et al. February 21, 2	2006-02-21
Method and apparatus for mixed-mode optical proximity correction Grant 6,988,259 - Pierrat , et al. January 17, 2	2006-01-17
System and method for process matching Grant 6,985,847 - Burdorf , et al. January 10, 2	2006-01-10
Cutting patterns for full phase shifting masks Grant 6,981,240 - Pierrat , et al. December 27, 2	2005-12-27
Design data format and hierarchy management for phase processing Grant 6,978,436 - Cote , et al. December 20, 2	2005-12-20
High yield reticle with proximity effect halos Grant 6,968,527 - Pierrat November 22, 2	2005-11-22
Contact printing using a magnified mask image Grant 6,961,186 - Pierrat , et al. November 1, 2	2005-11-01
Method and system for simulating resist and etch edges Grant 6,954,911 - Pierrat October 11, 2	2005-10-11
Design data format and hierarchy management for processing App 20050166173 - Cote, Michel L. ; et al.	2005-07-28
Method for optimizing printing of an alternating phase shift mask having a phase shift error Grant 6,917,411 - Pierrat , et al. July 12, 2	2005-07-12
Dissection of printed edges from a fabrication layout for correcting proximity effects Grant 6,918,104 - Pierrat , et al. July 12, 2	2005-07-12
Full phase shifting mask in damascene process App 20050123841 - Pierrat, Christophe	2005-06-09
Mask data preparation App 20050091632 - Pierrat, Christophe ; et al.	2005-04-28
Method of incorporating lens aberration information into various process flows Grant 6,880,135 - Chang , et al. April 12, 2	2005-04-12
Design-manufacturing interface via a unified model App 20050076316 - Pierrat, Christophe ; et al.	2005-04-07
Contact printing using a magnified mask image App 20050068639 - Pierrat, Christophe ; et al.	2005-03-31
Full phase shifting mask in damascene process Grant 6,866,971 - Pierrat March 15, 2	2005-03-15
Design and layout of phase shifting photolithographic masks Grant 6,861,204 - Cote , et al. March 1, 2	2005-03-01
Phase shift mask including sub-resolution assist features for isolated spaces App 20050042527 - Pierrat, Christophe	2005-02-24
Design and layout of phase shifting photolithographic masks App 20050031971 - Cote, Michel Luc ; et al.	2005-02-10
Design and layout of phase shifting photolithographic masks App 20050031972 - Cote, Michel Luc ; et al.	2005-02-10
Exposure control for phase shifting photolithographic masks Grant 6,852,471 - Pierrat , et al. February 8, 2	2005-02-08
Facilitating optical proximity effect correction through pupil filtering Grant 6,846,617 - Pierrat January 25, 2	2005-01-25
Contact or proximity printing using a magnified mask image App 20050007567 - Pierrat, Christophe ; et al.	2005-01-13
Using second exposure to assist a PSM exposure in printing a tight space adjacent to large feature Grant 6,821,689 - Pierrat November 23, 2	2004-11-23
Dynamic random access memory (DRAM) circuitry Grant 6,822,848 - Roberts , et al. November 23, 2	2004-11-23
Dissection of edges with projection points in a fabrication layout for correcting proximity effects App 20040221255 - Pierrat, Christophe ; et al.	2004-11-04
Phase shift mask layout process for patterns including intersecting line segments Grant 6,811,935 - Pierrat November 2, 2	2004-11-02
Performing optical proximity correction on trim-level segments not abutting features to be printed Grant 6,808,850 - Pierrat October 26, 2	2004-10-26
Exposure control for phase shifting photolithographic masks App 20040209193 - Pierrat, Christophe ; et al.	2004-10-21
Model-based data conversion App 20040209176 - Pierrat, Christophe	2004-10-21
Accelerated layout processing using OPC pre-processing Grant 6,807,663 - October 19, 2	2004-10-19
Phase conflict resolution for photolithographic masks App 20040202965 - Pierrat, Christophe ; et al.	2004-10-14
Effective proximity effect correction methodology App 20040205688 - Pierrat, Christophe	2004-10-14
Methods of forming capacitors, and methods of forming DRAM circuitry App 20040190222 - Roberts, Martin Ceredig ; et al.	2004-09-30
Phase shift masking for complex patterns with proximity adjustments App 20040191650 - Pierrat, Christophe	2004-09-30
Dynamic random access memory (DRAM) circuitry App 20040190223 - Roberts, Martin Ceredig ; et al.	2004-09-30
Method and apparatus for using a complementary mask to clear phase conflicts on a phase shifting mask Grant 6,797,441 - Pierrat September 28, 2	2004-09-28
Design and layout of phase shifting photolithographic masks App 20040185351 - Cote, Michel Luc ; et al.	2004-09-23
Method and apparatus for exposing a wafer using multiple masks during an integrated circuit manufacturing process Grant 6,795,168 - Wang , et al. September 21, 2	2004-09-21
Process for detecting defects in photomasks App 20040179726 - Burdorf, James ; et al.	2004-09-16
Dissection of edges with projection points in a fabrication layout for correcting proximity effects Grant 6,792,590 - Pierrat , et al. September 14, 2	2004-09-14
Considering mask writer properties during the optical proximity correction process Grant 6,792,592 - Keogan , et al. September 14, 2	2004-09-14
Design and layout of phase shifting photolithographic masks App 20040175634 - Cote, Michel Luc ; et al.	2004-09-09
Design and layout of phase shifting photolithographic masks Grant 6,787,271 - Cote , et al. September 7, 2	2004-09-07
Model-based data conversion Grant 6,785,879 - Pierrat August 31, 2	2004-08-31
Phase shift mask including sub-resolution assist features for isolated spaces Grant 6,777,141 - Pierrat August 17, 2	2004-08-17
Mask product made by selection of evaluation point locations based on proximity effects model amplitudes for correcting proximity effects in a fabricat layout Grant 6,777,138 - Pierrat , et al. August 17, 2	2004-08-17
Facilitating minimum spacing and/or width control optical proximity correction Grant 6,753,115 - Zhang , et al. June 22, 2	2004-06-22
Method and apparatus for facilitating process-compliant layout optimization Grant 6,745,372 - June 1, 2	2004-06-01
Phase shift masking for complex patterns with proximity adjustments Grant 6,733,929 - Pierrat May 11, 2	2004-05-11
Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects App 20040083439 - Pierrat, Christophe ; et al.	2004-04-29
Mask repair using multiple exposures App 20040081896 - Pierrat, Christophe	2004-04-29
Performing optical proximity correction on trim-level segments not abutting features to be printed App 20040076891 - Pierrat, Christophe	2004-04-22
Method and apparatus for using a complementary mask to clear phase conflicts on a phase shifting mask App 20040076892 - Pierrat, Christophe	2004-04-22
Verification utilizing instance-based hierarchy management Grant 6,721,928 - Pierrat , et al. April 13, 2	2004-04-13
Optical proximity correction for phase shifting photolithographic masks Grant 6,721,938 - Pierrat , et al. April 13, 2	2004-04-13
Capacitor structure Grant 6,717,201 - Roberts , et al. April 6, 2	2004-04-06
Accelerated layout processing using OPC pre-processing App 20040060034 - Cote, Michel Luc ; et al.	2004-03-25
Using second exposure to assist a PSM exposure in printing a tight space adjacent to large feature App 20040053141 - Pierrat, Christophe	2004-03-18
Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask App 20040048170 - Pierrat, Christophe ; et al.	2004-03-11
Considering mask writer properties during the optical proximity correction process App 20040044984 - Keogan, Danny ; et al.	2004-03-04
Phase shifting design and layout for static random access memory Grant 6,681,379 - Pierrat , et al. January 20, 2	2004-01-20
Simplified etching technique for producing multiple undercut profiles App 20040004057 - Huang, Karen ; et al.	2004-01-08
Manufacturing integrated circuits App 20040006485 - Weed, J. Tracy ; et al.	2004-01-08
Method of forming a capacitor structure and DRAM circuitry having a capacitor structure including interior areas spaced apart from one another in a non-overlapping relationship Grant 6,673,670 - Roberts , et al. January 6, 2	2004-01-06
Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects Grant 6,665,856 - Pierrat , et al. December 16, 2	2003-12-16
Model-based data conversion App 20030229879 - Pierrat, Christophe	2003-12-11
Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask Grant 6,653,026 - Pierrat , et al. November 25, 2	2003-11-25
Facilitating optical proximity effect correction through pupil filtering App 20030215616 - Pierrat, Christophe	2003-11-20
Multiple image reticle for forming layers Grant 6,646,722 - Pierrat November 11, 2	2003-11-11
Method and system for simulating resist and etch edges App 20030208728 - Pierrat, Christophe	2003-11-06
Blank for alternating PSM photomask with charge dissipation layer Grant 6,635,393 - Pierrat October 21, 2	2003-10-21
Method and apparatus for facilitating process-compliant layout optimization App 20030192013 - Cote, Michel Luc ; et al.	2003-10-09
Method and apparatus for exposing a wafer using multiple masks during an integrated circuit manufacturing process App 20030190762 - Wang, Yao-Ting ; et al.	2003-10-09
Dissection of printed edges from a fabrication layout for correcting proximity effects Grant 6,625,801 - Pierrat , et al. September 23, 2	2003-09-23
Conflict sensitive compaction for resolving phase-shift conflicts in layouts for phase-shifted features Grant 6,622,288 - Wang , et al. September 16, 2	2003-09-16
Critical dimension control using full phase and trim masks App 20030162102 - Pierrat, Christophe	2003-08-28
Phase shift masking for "double-T" intersecting lines Grant 6,610,449 - Pierrat August 26, 2	2003-08-26
High yield reticle with proximity effect App 20030154461 - Pierrat, Christophe	2003-08-14
Cutting patterns for full phase shifting masks App 20030137886 - Pierrat, Christophe ; et al.	2003-07-24
Methods and apparatus for determining optimum exposure threshold for a given photolithographic model App 20030139833 - Pierrat, Christophe ; et al.	2003-07-24
Facilitating minimum spacing and/or width control during optical proximity correction App 20030118917 - Zhang, Youping ; et al.	2003-06-26
Method and apparatus for mixed-mode optical proximity correction Grant 6,584,609 - Pierrat , et al. June 24, 2	2003-06-24
Dissection of printed edges from a fabrication layout for correcting proximity effects App 20030110460 - Pierrat, Christophe ; et al.	2003-06-12
Stepped photoresist profile and opening formed using the profile Grant 6,577,010 - Batra , et al. June 10, 2	2003-06-10
Method and apparatus for mixed-mode optical proximity correction App 20030097647 - Pierrat, Christophe ; et al.	2003-05-22
Method of incorporating lens aberration information into various process flows App 20030088847 - Chang, Fang-Cheng ; et al.	2003-05-08
Verification utilizing instance-based hierarchy management App 20030088837 - Pierrat, Christophe ; et al.	2003-05-08
Method and apparatus for analyzing a layout using an instance-based representation Grant 6,560,766 - Pierrat , et al. May 6, 2	2003-05-06
Subresolution grating for attenuated phase shifting mask fabrication Grant 6,558,856 - Pierrat May 6, 2	2003-05-06
Method for high yield reticle formation Grant 6,557,162 - Pierrat April 29, 2	2003-04-29
Self-aligned fabrication technique for tri-tone attenuated phase-shifting masks Grant 6,551,750 - Pierrat April 22, 2	2003-04-22
Full phase shifting mask in damascene process App 20030068566 - Pierrat, Christophe	2003-04-10
Phase shift mask sub-resolution assist features Grant 6,541,165 - Pierrat April 1, 2	2003-04-01
Method and apparatus for visualizing optical proximity correction process information and output App 20030061587 - Zhang, Youping ; et al.	2003-03-27
Dissection of corners in a fabrication layout for correcting proximity effects Grant 6,539,521 - Pierrat , et al. March 25, 2	2003-03-25
Alternating phase shift mask design conflict resolution App 20030056190 - Liu, Hua-Yu ; et al.	2003-03-20
System and method for indentifying dummy features on a mask layer App 20030044059 - Chang, Fang-Cheng ; et al.	2003-03-06
Phase shift masking for intersecting lines Grant 6,524,752 - Pierrat February 25, 2	2003-02-25
Alternating phase shift mask design conflict resolution Grant 6,523,165 - Liu , et al. February 18, 2	2003-02-18
Method And Apparatus For Analyzing A Layout Using An Instance-based Representation App 20030023939 - Pierrat, Christophe ; et al.	2003-01-30
System and method for process matching App 20030014235 - Burdorf, James ; et al.	2003-01-16
Phase shift mask including sub-resolution assist features for isolated spaces App 20030013024 - Pierrat, Christophe	2003-01-16
Alternating Phase Shift Mask Design Conflict Resolution App 20030014732 - Liu, Hua-Yu ; et al.	2003-01-16
Phase shift mask layout process for patterns including intersecting line segments App 20030008222 - Pierrat, Christophe	2003-01-09
Phase shift masking for complex patterns Grant 6,503,666 - Pierrat January 7, 2	2003-01-07
Phase conflict resolution for photolithographic masks App 20020197543 - Pierrat, Christophe ; et al.	2002-12-26
Phase shift masking for "double-T" intersecting lines App 20020197546 - Pierrat, Christophe	2002-12-26
Exposure control for phase shifting photolithographic masks App 20020187636 - Pierrat, Christophe ; et al.	2002-12-12
Optical proximity correction for phase shifting photolithographic masks App 20020188924 - Pierrat, Christophe ; et al.	2002-12-12
Multiple image reticle for forming layers App 20020180947 - Pierrat, Christophe	2002-12-05
Multiple image reticle for forming layers App 20020176065 - Pierrat, Christophe	2002-11-28
Design data format and hierarchy management for processing App 20020152454 - Cote, Michel Luc ; et al.	2002-10-17
System and method for process matching Grant 6,463,403 - Burdorf , et al. October 8, 2	2002-10-08
Blank for alternating PSM photomask with charge dissipation layer App 20020136964 - Pierrat, Christophe	2002-09-26
Self-aligned fabrication technique for tri-tone attenuated phase-shifting masks App 20020132174 - Pierrat, Christophe	2002-09-19
Selection of evaluation point locations based on proximity effects model amplitudes for correcting proximity effects in a fabrication layout Grant 6,453,457 - Pierrat , et al. September 17, 2	2002-09-17
Phase shift masking for complex patterns with proximity adjustments App 20020127479 - Pierrat, Christophe	2002-09-12
Phase shifting design and layout for static random access memory App 20020129327 - Pierrat, Christophe ; et al.	2002-09-12
Design and layout of phase shifting photolithographic masks App 20020122994 - Cote, Michel Luc ; et al.	2002-09-05
Stepped photoresist profile and opening formed using the profile App 20020111030 - Batra, Shubneesh ; et al.	2002-08-15
Electrically programmable photolithography mask App 20020102479 - Cutter, Douglas J. ; et al.	2002-08-01
Selection of evaluation point locations based on proximity effects model amplitudes for correcting proximity effects in a fabrication layout App 20020100004 - Pierrat, Christophe ; et al.	2002-07-25
Electrically programmable photolithography mask App 20020098424 - Cutter, Douglas J. ; et al.	2002-07-25
Multiple image reticle for forming layers Grant 6,421,111 - Pierrat July 16, 2	2002-07-16
Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask App 20020076622 - Pierrat, Christophe ; et al.	2002-06-20
Enhanced capacitor shape Grant 6,391,709 - Jost , et al. May 21, 2	2002-05-21
Electrically programmable photolithography mask Grant 6,379,847 - Cutter , et al. April 30, 2	2002-04-30
Enhanced capacitor shape App 20020048141 - Jost, Mark ; et al.	2002-04-25
Enhanced capacitor shape Grant 6,369,432 - Jost , et al. April 9, 2	2002-04-09
Capacitor Structure App 20020017674 - ROBERTS, MARTIN CEREDIG ; et al.	2002-02-14
Method for reducing photolithographic steps in a semiconductor interconnect process App 20020009675 - Jeng, Nanseng ; et al.	2002-01-24
Electrically Programmable Photolithography Mask App 20010049063 - CUTTER, DOUGLAS J. ; et al.	2001-12-06
Subresolution grating for attenuated phase shifting mask fabrication App 20010044057 - Pierrat, Christophe	2001-11-22
Methods of reducing proximity effects in lithographic processes Grant 6,319,644 - Pierrat , et al. November 20, 2	2001-11-20
Method for forming a spacer for semiconductor manufacture App 20010041409 - Jeng, Nanseng ; et al.	2001-11-15
Method and apparatus for determining optimum exposure threshold for a given photolithographic model App 20010029403 - Pierrat, Christophe ; et al.	2001-10-11
Inspection method and apparatus for detecting defects on photomasks Grant 6,297,879 - Yang , et al. October 2, 2	2001-10-02
Simplified etching technique for producing multiple undercut profiles App 20010024883 - Huang, Karen ; et al.	2001-09-27
Methods of reducing proximity effects in lithographic processes App 20010023045 - Pierrat, Christophe ; et al.	2001-09-20
Methods of reducing proximity effects in lithographic processes Grant 6,284,419 - Pierrat , et al. September 4, 2	2001-09-04
Photolithographic apparatus App 20010015796 - Pierrat, Christophe	2001-08-23
Inspection technique of photomask Grant 6,272,236 - Pierrat , et al. August 7, 2	2001-08-07
Method for patterning and fabricating wordlines App 20010011199 - Pierrat, Christophe	2001-08-02
Subresolution grating for attenuated phase shifting mask fabrication Grant 6,268,091 - Pierrat July 31, 2	2001-07-31
Methods of reducing proximity effects in lithographic processes App 20010002304 - Pierrat, Christophe ; et al.	2001-05-31
Method for designing and making photolithographic reticle, reticle, and photolithographic process Grant 6,238,824 - Futrell , et al. May 29, 2	2001-05-29
Process for forming features on a semiconductor wafer using a phase shifting mask that can be used with two different wavelengths of light App 20010001693 - Pierrat, Christophe ; et al.	2001-05-24
Method for forming a spacer out of photosensitive material Grant 6,221,564 - Jeng , et al. April 24, 2	2001-04-24
Method for fabrication of and apparatus for use as a semiconductor photomask Grant 6,136,480 - Pierrat October 24, 2	2000-10-24
Methods of reducing proximity effects in lithographic processes Grant 6,120,952 - Pierrat , et al. September 19, 2	2000-09-19
Inspection technique of photomask Grant 6,091,845 - Pierrat , et al. July 18, 2	2000-07-18
Subresolution grating for attenuated phase shifting mask fabrication Grant 6,077,630 - Pierrat June 20, 2	2000-06-20
Method for multiple process parameter matching Grant 6,033,814 - Burdorf , et al. March 7, 2	2000-03-07
Photomask inspection method and apparatus Grant 6,023,328 - Pierrat February 8, 2	2000-02-08
Electrically programmable photolithography mask Grant 5,998,069 - Cutter , et al. December 7, 1	1999-12-07
Multiple image reticle for forming layers Grant 5,995,200 - Pierrat November 30, 1	1999-11-30
Lithographic imaging system Grant 5,922,497 - Pierrat July 13, 1	1999-07-13
Phase shifting mask and process for forming comprising a phase shift layer for shifting two wavelengths of light Grant 5,876,878 - Pierrat , et al. March 2, 1	1999-03-02
Process for designing and checking a mask layout Grant 5,801,954 - Le , et al. September 1, 1	1998-09-01
Repair of reflective photomask used in semiconductor process Grant 5,780,187 - Pierrat July 14, 1	1998-07-14
Method for reducing photolithographic steps in a semiconductor interconnect process Grant 5,741,624 - Jeng , et al. April 21, 1	1998-04-21
Phase shift structure and method of fabrication Grant 5,718,829 - Pierrat February 17, 1	1998-02-17
Process for fabricating a phase shifting mask Grant 5,695,896 - Pierrat December 9, 1	1997-12-09
Method for fabricating and using defect-free phase shifting masks Grant 5,582,939 - Pierrat December 10, 1	1996-12-10
Fabrication of phase-shifting lithographic masks Grant 5,338,626 - Garofalo , et al. August 16, 1	1994-08-16
Self-aligned method of making phase-shifting lithograhic masks having three or more phase-shifts Grant 5,308,721 - Garofalo , et al. May 3, 1	1994-05-03
Single-alignment-level lithographic technique for achieving self-aligned features Grant 5,275,896 - Garofalo , et al. January 4, 1	1994-01-04
Method of removing excess material, for repairing phase-shifting lithographic masks Grant 5,246,799 - Pierrat September 21, 1	1993-09-21
Method of repairing indentations in phase-shifting lithographic masks Grant 5,246,801 - Pierrat September 21, 1	1993-09-21
Single-alignment-level lithographic technique for achieving self-aligned features Grant 5,244,759 - Pierrat September 14, 1	1993-09-14