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Selective Passivation And Selective Deposition
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System And Methods For Direct Liquid Injection Of Vanadium Precursors
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Selective Passivation And Selective Deposition
App 20210358745 - Maes; Jan Willem ; et al. | 2021-11-18 |
Selective passivation and selective deposition
Grant 11,145,506 - Maes , et al. October 12, 2 | 2021-10-12 |
Selective Passivation And Selective Deposition
App 20200105515 - Maes; Jan Willem Hub ; et al. | 2020-04-02 |
Locally raised epitaxy for improved contact by local silicon capping during trench silicide processings
Grant 9,305,883 - Naczas , et al. April 5, 2 | 2016-04-05 |
Locally Raised Epitaxy For Improved Contact By Local Silicon Capping During Trench Silicide Processings
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Cyclical physical vapor deposition of dielectric layers
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Corrosion/etching protection in integration circuit fabrications
Grant 9,054,109 - Lin , et al. June 9, 2 | 2015-06-09 |
Locally raised epitaxy for improved contact by local silicon capping during trench silicide processings
Grant 8,999,779 - Naczas , et al. April 7, 2 | 2015-04-07 |
Locally Raised Epitaxy For Improved Contact By Local Silicon Capping During Trench Silicide Processings
App 20150069531 - Naczas; Sebastian ; et al. | 2015-03-12 |
Cyclical Physical Vapor Deposition Of Dielectric Layers
App 20140273425 - Jamison; Paul ; et al. | 2014-09-18 |
Corrosion/etching Protection In Integration Circuit Fabrications
App 20130320544 - Lin; Wei ; et al. | 2013-12-05 |
Threshold adjustment for high-K gate dielectric CMOS
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Gate effective-workfunction modification for CMOS
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Self-aligned CMOS structure with dual workfunction
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Gate Effective-Workfunction Modification for CMOS
App 20110121401 - Park; Dae-Gyu ; et al. | 2011-05-26 |
Gate effective-workfunction modification for CMOS
Grant 7,947,549 - Park , et al. May 24, 2 | 2011-05-24 |
Dielectric spacer removal
Grant 7,919,379 - Cartier , et al. April 5, 2 | 2011-04-05 |
Simple low power circuit structure with metal gate and high-k dielectric
Grant 7,880,243 - Doris , et al. February 1, 2 | 2011-02-01 |
Fabrication of self-aligned CMOS structure
App 20110001195 - Park; Dae-Gyu ; et al. | 2011-01-06 |
Fabrication of a CMOS structure with a high-k dielectric layer oxidizing an aluminum layer in PFET region
Grant 7,863,126 - Park , et al. January 4, 2 | 2011-01-04 |
Metal gate high-K devices having a layer comprised of amorphous silicon
Grant 7,847,356 - Chen , et al. December 7, 2 | 2010-12-07 |
Low power circuit structure with metal gate and high-k dielectric
Grant 7,807,525 - Doris , et al. October 5, 2 | 2010-10-05 |
Method to fabricate metal gate high-k devices
Grant 7,790,592 - Chen , et al. September 7, 2 | 2010-09-07 |
Formation of fully silicided metal gate using dual self-aligned silicide process
Grant 7,785,999 - Cabral, Jr. , et al. August 31, 2 | 2010-08-31 |
Low power circuit structure with metal gate and high-k dielectric
Grant 7,723,798 - Doris , et al. May 25, 2 | 2010-05-25 |
Structure and Method to Fabricate Metal Gate High-K Devices
App 20090302396 - Chen; Tze-Chiang ; et al. | 2009-12-10 |
Threshold Adjustment for High-K Gate Dielectric CMOS
App 20090291553 - Doris; Bruce B. ; et al. | 2009-11-26 |
Fabrication of self-aligned CMOS structure
App 20090283838 - Park; Dae-Gyu ; et al. | 2009-11-19 |
Gate Effective-Workfunction Modification for CMOS
App 20090212369 - Park; Dae-Gyu ; et al. | 2009-08-27 |
Structure And Method To Fabricate Metal Gate High-K Devices
App 20090108366 - Chen; Tze-Chiang ; et al. | 2009-04-30 |
Dielectric Spacer Removal
App 20090065817 - Cartier; Eduard A. ; et al. | 2009-03-12 |
High Performance Metal Gate CMOS with High-K Gate Dielectric
App 20090039436 - Doris; Bruce B. ; et al. | 2009-02-12 |
Simple Low Power Circuit Structure with Metal Gate and High-k Dielectric
App 20090039434 - Doris; Bruce B. ; et al. | 2009-02-12 |
Low Power Circuit Structure with Metal Gate and High-k Dielectric
App 20090039435 - Doris; Bruce B. ; et al. | 2009-02-12 |
Devices with Metal Gate, High-k Dielectric, and Butted Electrodes
App 20080277726 - Doris; Bruce B. ; et al. | 2008-11-13 |
Threshold Adjustment for High-K Gate Dielectric CMOS
App 20080272437 - Doris; Bruce B. ; et al. | 2008-11-06 |
Strained Metal Gate Structure For Cmos Devices With Improved Channel Mobility And Methods Of Forming The Same
App 20080203485 - Chudzik; Michael P. ; et al. | 2008-08-28 |
Formation Of Fully Silicided Metal Gate Using Dual Self-aligned Silicide Process
App 20080026551 - Cabral; Cyril JR. ; et al. | 2008-01-31 |
Formation of fully silicided metal gate using dual self-aligned silicide process
Grant 7,271,455 - Cabral, Jr. , et al. September 18, 2 | 2007-09-18 |
Formation of fully silicided metal gate using dual self-aligned silicide process
App 20060022280 - Cabral; Cyril JR. ; et al. | 2006-02-02 |
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