Park; Joong Jin

Patent Applications and Registrations

Patent applications and USPTO patent grants for Park; Joong Jin.The latest application filed is for "silicon metal oxide encapsulation film comprising metal or metal oxide in thin film, and manufacturing method therefor".

Company Profile

7.6.10

Park; Joong Jin - Daejeon KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Metal triamine compound, method for preparing the same, and composition for depositing metal-containing thin film including the same Grant 11,447,859 - Kim , et al. September 20, 2	2022-09-20
Composition for depositing silicon-containing thin film containing bis(aminosilyl)alkylamine compound and method for manufacturing silicon-containing thin film using the same Grant 11,393,676 - Kim , et al. July 19, 2	2022-07-19
Composition for depositing silicon-containing thin film and method for producing silicon-containing thin film using the same Grant 11,390,635 - Kim , et al. July 19, 2	2022-07-19
Silylamine compound, composition for depositing silicon-containing thin film containing the same, and method for manufacturing silicon-containing thin film using the composition Grant 11,358,974 - Kim , et al. June 14, 2	2022-06-14
Silicon Metal Oxide Encapsulation Film Comprising Metal Or Metal Oxide In Thin Film, And Manufacturing Method Therefor App 20220181578 - KIM; Myoung Woon ; et al.	2022-06-09
Composition For Depositing Silicon-containing Thin Film Containing Bis(aminosilyl)alkylamine Compound And Method For Manufacturing Silicon Containing Thin Film Using The Same App 20220139704 - KIM; Sung Gi ; et al.	2022-05-05
Disilylamine compound, method for preparing the same, and composition for depositing silicon-containing thin film including the same Grant 11,319,333 - Kim , et al. May 3, 2	2022-05-03
Metal Triamine Compound, Method For Preparing The Same, And Composition For Depositing Metal-containing Thin Film Including The Same App 20210222294 - KIM; Myong Woon ; et al.	2021-07-22
Disilylamine Compound, Method For Preparing The Same, And Composition For Depositing Silicon-containing Thin Film Including The Same App 20210147451 - KIM; Sung Gi ; et al.	2021-05-20
Composition for depositing silicon-containing thin film including disilylamine compound and method for manufacturing silicon-containing thin film using the same Grant 10,894,799 - Kim , et al. January 19, 2	2021-01-19
Silylamine Compound, Composition For Depositing Silicon-containing Thin Film Containing The Same, And Method For Manufacturing Silicon-containing Thin Film Using The Composition App 20200392294 - KIM; Sung Gi ; et al.	2020-12-17
Composition For Depositing Silicon-containing Thin Film And Method For Producing Silicon-containing Thin Film Using The Same App 20200361966 - KIM; Sung Gi ; et al.	2020-11-19
Composition For Depositing Silicon-containing Thin Film Including Disilylamine Compound And Method For Manufacturing Silicon-con App 20200131205 - KIM; Sung Gi ; et al.	2020-04-30
Composition For Depositing Silicon-containing Thin Film And Method For Manufacturing Silicon-containing Thin Film Using The Same App 20200111665 - KIM; Sung Gi ; et al.	2020-04-09
Composition For Depositing Silicon-containing Thin Film Containing Bis(aminosilyl)alkylamine Compound And Method For Manufacturi App 20200111664 - KIM; Sung Gi ; et al.	2020-04-09
Method For Manufacturing Silicon Nitride Thin Film Using Plasma Atomic Layer Deposition App 20190249296 - JANG; Se Jin ; et al.	2019-08-15

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