PAREEK; Yogita

Patent Applications and Registrations

Patent applications and USPTO patent grants for PAREEK; Yogita.The latest application filed is for "protective multilayer coating for processing chamber components".

Company Profile

7.6.13

PAREEK; Yogita - San Jose CA
Pareek; Yogita - Sunnyvale CA
PAREEK; YOGITA - Jaipur IN

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Protective Multilayer Coating For Processing Chamber Components App 20220277936 - BAJAJ; Geetika ; et al.	2022-09-01
Method for forming a protective coating film for halide plasma resistance Grant 11,118,263 - Pareek , et al. September 14, 2	2021-09-14
Methods For Forming A Protective Coating On Processing Chamber Surfaces Or Components App 20210071300 - BAJAJ; Geetika ; et al.	2021-03-11
Chemical conversion of yttria into yttrium fluoride and yttrium oxyfluoride to develop pre-seasoned corossion resistive coating for plasma components Grant 10,941,303 - Larsson , et al. March 9, 2	2021-03-09
Selective nitride removal Grant 10,886,137 - Goradia , et al. January 5, 2	2021-01-05
Coating For Halide Plasma Resistance App 20200354833 - PAREEK; Yogita ; et al.	2020-11-12
Selective Nitride Removal App 20190333776 - Goradia; Prerna Sonthalia ; et al.	2019-10-31
Method for forming yttrium oxide on semiconductor processing equipment Grant 10,253,406 - Kalita , et al.	2019-04-09
Aluminum electroplating and oxide formation as barrier layer for aluminum semiconductor process equipment Grant 10,233,554 - Pareek , et al.	2019-03-19
Corrosion Resistant Coating For Semiconductor Process Equipment App 20180374706 - PAREEK; YOGITA ; et al.	2018-12-27
In-situ Removal Of Accumulated Process Byproducts From Components Of A Semiconductor Processing Chamber App 20180330929 - ARNEPALLI; Ranga Rao ; et al.	2018-11-15
Chemical Conversion Of Yttria Into Yttrium Fluoride And Yttrium Oxyfluoride To Develop Pre-seasoned Corossion Resistive Coating For Plasma Components App 20180105701 - LARSSON; Mats ; et al.	2018-04-19
Method To Deposit Aluminum Oxy-fluoride Layer For Fast Recovery Of Etch Amount In Etch Chamber App 20180061617 - WANG; Jianqi ; et al.	2018-03-01
Generation of compact alumina passivation layers on aluminum plasma equipment components Grant 9,903,020 - Kim , et al. February 27, 2	2018-02-27
Method For Electrochemically Grown Yttria Or Yttrium Oxide On Semiconductor Processing Equipment App 20170260618 - KALITA; Laksheswar ; et al.	2017-09-14
Aluminum Electroplating And Oxide Formation As Barrier Layer For Aluminum Semiconductor Process Equipment App 20170260639 - PAREEK; Yogita ; et al.	2017-09-14
Method For Removing Aluminum Fluoride Contamination From Semiconductor Processing Equipment App 20170056935 - GOPALAN; Ramesh ; et al.	2017-03-02
Barrier Anodization Methods To Develop Aluminum Oxide Layer For Plasma Equipment Components App 20160258064 - PAREEK; Yogita ; et al.	2016-09-08
Generation Of Compact Alumina Passivation Layers On Aluminum Plasma Equipment Components App 20150275375 - KIM; SUNG JE ; et al.	2015-10-01

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