Pandhumsoporn; Tamarak

Patent Applications and Registrations

Patent applications and USPTO patent grants for Pandhumsoporn; Tamarak.The latest application filed is for "components and processes for managing plasma process byproduct materials".

Company Profile

1.6.9

Pandhumsoporn; Tamarak - Fremont CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Components and Processes for Managing Plasma Process Byproduct Materials App 20210225616 - Peng; Gordon Wen-Yin ; et al.	2021-07-22
Edge ring assembly for improving feature profile tilting at extreme edge of wafer Grant 10,854,492 - Bosch , et al. December 1, 2	2020-12-01
Edge Ring Assembly For Improving Feature Profile Tilting At Extreme Edge Of Wafer App 20170053820 - Bosch; William Frederick ; et al.	2017-02-23
Minimization Of Mask Undercut On Deep Etch App 20120298301 - Pandhumsoporn; Tamarak ; et al.	2012-11-29
Minimization of mask undercut on deep silicon etch Grant 8,262,920 - Pandhumsoporn , et al. September 11, 2	2012-09-11
Notch stop pulsing process for plasma processing system Grant 7,985,688 - Pandhumsoporn , et al. July 26, 2	2011-07-26
Minimization of mask undercut on deep silicon etch App 20080308526 - Pandhumsoporn; Tamarak ; et al.	2008-12-18
Methods and apparatus for sequentially alternating among plasma processes in order to optimize a substrate Grant 7,459,100 - Kiermasz , et al. December 2, 2	2008-12-02
Methods for minimizing mask undercuts and notches for plasma processing system Grant 7,351,664 - Pandhumsoporn , et al. April 1, 2	2008-04-01
Methods For Minimizing Mask Undercuts And Notches For Plasma Processing System App 20070281489 - Pandhumsoporn; Tamarak ; et al.	2007-12-06
Notch stop pulsing process for plasma processing system App 20070141847 - Pandhumsoporn; Tamarak ; et al.	2007-06-21
Methods and apparatus for sequentially alternating among plasma processes in order to optimize a substrate App 20060131271 - Kiermasz; Adrian ; et al.	2006-06-22
Methods of processing a substrate with minimal scalloping App 20050211668 - Pandhumsoporn, Tamarak	2005-09-29
Method Of Anisotropic Etching Of Substrates App 20010044213 - PANDHUMSOPORN, TAMARAK ; et al.	2001-11-22
Recessed bonding of target for RF diode sputtering Grant 6,287,437 - Pandhumsoporn , et al. September 11, 2	2001-09-11

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