loadpatents
name:-0.047966003417969
name:-0.026275873184204
name:-0.00040483474731445
Owada; Tamotsu Patent Filings

Owada; Tamotsu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Owada; Tamotsu.The latest application filed is for "semiconductor device and manufacturing method of semiconductor device".

Company Profile
0.28.38
  • Owada; Tamotsu - Yokohama JP
  • Owada; Tamotsu - Kawasaki JP
  • Owada; Tamotsu - Tokyo JP
  • Owada; Tamotsu - Shinjuku N/A JP
  • Owada; Tamotsu - Kawasaki-shi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Semiconductor device and manufacturing method of semiconductor device
Grant 9,236,302 - Ohira , et al. January 12, 2
2016-01-12
Semiconductor device and method for manufacturing semiconductor device
Grant 9,123,728 - Kono , et al. September 1, 2
2015-09-01
Semiconductor Device And Manufacturing Method Of Semiconductor Device
App 20150235901 - Ohira; Hikaru ;   et al.
2015-08-20
Semiconductor device manufacturing method
Grant 9,087,873 - Owada July 21, 2
2015-07-21
Semiconductor Device And Method Of Manufacturing The Same
App 20150069586 - Owada; Tamotsu ;   et al.
2015-03-12
Semiconductor Device Manufacturing Method And Support Substrate-attached Wafer
App 20150014820 - Owada; Tamotsu
2015-01-15
Semiconductor device and method of manufacturing the same
Grant 8,916,423 - Owada , et al. December 23, 2
2014-12-23
Manufacturing method of semiconductor device, processing method of semiconductor wafer, semiconductor wafer
Grant 8,883,613 - Owada November 11, 2
2014-11-11
Semiconductor Device And Manufacturing Method Of Semiconductor Device
App 20140306339 - Ohira; Hikaru ;   et al.
2014-10-16
Silicon oxycarbide, growth method of silicon oxycarbide layer, semiconductor device and manufacture method for semiconductor device
Grant 8,778,814 - Owada , et al. July 15, 2
2014-07-15
Semiconductor Device And Method For Manufacturing Semiconductor Device
App 20140131873 - Kouno; Takahiro ;   et al.
2014-05-15
Semiconductor device and method for manufacturing semiconductor device
Grant 8,669,177 - Kouno , et al. March 11, 2
2014-03-11
Silicon Oxycarbide, Growth Method Of Silicon Oxycarbide Layer, Semiconductor Device And Manufacture Method For Semiconductor Device
App 20130330912 - Owada; Tamotsu ;   et al.
2013-12-12
Semiconductor device and method for fabricating semiconductor device
Grant 8,604,552 - Owada , et al. December 10, 2
2013-12-10
Semiconductor Device And Method Of Manufacturing The Same
App 20130320508 - Owada; Tamotsu ;   et al.
2013-12-05
Method Of Manufacturing Semiconductor Device And Semiconductor Device Manufacturing Apparatus
App 20130247825 - Owada; Tamotsu
2013-09-26
Manufacturing Method Of Semiconductor Device, Processing Method Of Semiconductor Wafer, Semiconductor Wafer
App 20130161795 - Owada; Tamotsu
2013-06-27
Silicon oxycarbide, growth method of silicon oxycarbide layer, semiconductor device and manufacture method for semiconductor device
Grant 8,349,722 - Owada , et al. January 8, 2
2013-01-08
Semiconductor Device And Method For Fabricating Semiconductor Device
App 20120322272 - Owada; Tamotsu ;   et al.
2012-12-20
Silicon Oxycarbide, Growth Method Of Silicon Oxycarbide Layer, Semiconductor Device And Manufacture Method For Semiconductor Device
App 20120252227 - Owada; Tamotsu ;   et al.
2012-10-04
Method of manufacturing a semiconductor device
Grant 8,105,935 - Ohara , et al. January 31, 2
2012-01-31
Method Of Manufacturing Semiconductor Device And Semiconductor Device Manufacturing Apparatus
App 20110244677 - Owada; Tamotsu
2011-10-06
Semiconductor device and method of manufacturing the same
Grant 8,026,164 - Takesako , et al. September 27, 2
2011-09-27
Semiconductor Device And Method Of Manufacturing The Same
App 20110183515 - Kudo; Hiroshi ;   et al.
2011-07-28
Semiconductor device and method of manufacturing the same
Grant 7,928,476 - Kudo , et al. April 19, 2
2011-04-19
Method of manufacturing semiconductor device including forming two stress films and irradiation of one stress film
Grant 7,763,509 - Pidin , et al. July 27, 2
2010-07-27
Method of manufacturing semiconductor device
Grant 7,749,897 - Sugimoto , et al. July 6, 2
2010-07-06
Semiconductor Device And Method Of Manufacturing The Same
App 20100164119 - Takesako; Satoshi ;   et al.
2010-07-01
Semiconductor Device And Method For Fabricating Semiconductor Device
App 20100012991 - OWADA; Tamotsu ;   et al.
2010-01-21
Insulating film forming method capable of enhancing adhesion of silicon carbide film, etc. and semiconductor device
Grant 7,642,185 - Owada , et al. January 5, 2
2010-01-05
Semiconductor Device And Method For Manufacturing Semiconductor Device
App 20090278259 - KOUNO; Takahiro ;   et al.
2009-11-12
Semiconductor device and method for fabricating the same
Grant 7,579,277 - Owada , et al. August 25, 2
2009-08-25
Semiconductor Device And Method Of Manufacturing The Same
App 20090146309 - KUDO; Hiroshi ;   et al.
2009-06-11
Method for forming insulating film, method for forming multilayer structure and method for manufacturing semiconductor device
Grant 7,541,296 - Owada , et al. June 2, 2
2009-06-02
Silicon oxycarbide, growth method of silicon oxycarbide layer, semiconductor device and manufacture method for semiconductor device
App 20090093130 - Owada; Tamotsu ;   et al.
2009-04-09
Silicon oxycarbide, growth method of silicon oxycarbide layer, semiconductor device and manufacture method for semiconductor device
Grant 7,485,570 - Owada , et al. February 3, 2
2009-02-03
Method of manufacturing semiconductor device
App 20080305645 - Sugimoto; Ken ;   et al.
2008-12-11
Method Of Manufacturing A Semiconductor Device
App 20080233734 - OHARA; Naoki ;   et al.
2008-09-25
Method of manufacturing semiconductor device
App 20080124856 - Pidin; Sergey ;   et al.
2008-05-29
Semiconductor Device Manufacturing Method
App 20080057717 - OWADA; Tamotsu ;   et al.
2008-03-06
Semiconductor device and method for fabricating the same
App 20070197032 - Owada; Tamotsu ;   et al.
2007-08-23
Semiconductor device using low-K material as interlayer insulating film and its manufacture method
Grant 7,256,118 - Fukuyama , et al. August 14, 2
2007-08-14
Insulating film forming method capable of enhancing adhesion of silicon carbide film, etc. and semiconductor device
App 20070173054 - Owada; Tamotsu ;   et al.
2007-07-26
Low dielectric constant film material, film and semiconductor device using such material
Grant 7,235,866 - Nakata , et al. June 26, 2
2007-06-26
Method of manufacturing semiconductor device
App 20070123035 - Sugimoto; Ken ;   et al.
2007-05-31
Insulating film forming method capable of enhancing adhesion of silicon carbide film, etc. and semiconductor device
Grant 7,208,405 - Owada , et al. April 24, 2
2007-04-24
Method for forming SiC-based film and method for fabricating semiconductor device
App 20060205193 - Sugimoto; Ken ;   et al.
2006-09-14
Method for forming insulating film, method for forming multilayer structure and method for manufacturing semiconductor device
App 20060178017 - Owada; Tamotsu ;   et al.
2006-08-10
Semiconductor device
App 20060087041 - Fukuyama; Shun-ichi ;   et al.
2006-04-27
Low dielectric constant film material, film and semiconductor device using such material
App 20060022357 - Nakata; Yoshihiro ;   et al.
2006-02-02
Silicon oxycarbide, growth method of silicon oxycarbide layer, semiconductor device and manufacture method for semiconductor device
App 20050287790 - Owada, Tamotsu ;   et al.
2005-12-29
Semiconductor device using low-K material as interlayer insulating film and its manufacture method
App 20050250309 - Fukuyama, Shun-ichi ;   et al.
2005-11-10
Insulating film forming method capable of enhancing adhesion of silicon carbide film, etc. and semiconductor device
App 20050242440 - Owada, Tamotsu ;   et al.
2005-11-03
Low dielectric constant film material, film and semiconductor device using such material
Grant 6,958,525 - Nakata , et al. October 25, 2
2005-10-25
Silicon oxycarbide, growth method of silicon oxycarbide layer, semiconductor device and manufacture method for semiconductor device
Grant 6,949,830 - Owada , et al. September 27, 2
2005-09-27
Semiconductor device using low-k material as interlayer insulating film and including a surface modifying layer
Grant 6,943,431 - Fukuyama , et al. September 13, 2
2005-09-13
Silicon oxycarbide, growth method of silicon oxycarbide layer, semiconductor device and manufacture method for semiconductor device
App 20040155340 - Owada, Tamotsu ;   et al.
2004-08-12
Semiconductor device using low-k material as interlayer insulating film and its manufacture method
App 20040021224 - Fukuyama, Shun-ichi ;   et al.
2004-02-05
Low dielectric constant film material, film and semiconductor device using such material
App 20030207131 - Nakata, Yoshihiro ;   et al.
2003-11-06
Low dielectric constant film material, film and semiconductor device using such material
Grant 6,613,834 - Nakata , et al. September 2, 2
2003-09-02
Semiconductor device including porous insulating material and manufacturing method therefor
App 20030057561 - Fukuyama, Shun-Ichi ;   et al.
2003-03-27
Composition for forming low dielectric constant insulating film, method of forming insulating film using the composition and electronic parts having the insulating film produced thereby
App 20030010961 - Fukuyama, Shun-Ichi ;   et al.
2003-01-16
Low dielectric constant film material, film and semiconductor device using such material
App 20010033026 - Nakata, Yoshihiro ;   et al.
2001-10-25
Excimer laser processing method and apparatus
Grant 5,386,430 - Yamagishi , et al. January 31, 1
1995-01-31

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed