loadpatents
name:-0.017380952835083
name:-0.0081210136413574
name:-0.0016880035400391
Oikawa; Fumitoshi Patent Filings

Oikawa; Fumitoshi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Oikawa; Fumitoshi.The latest application filed is for "substrate cleaning device and method of cleaning substrate".

Company Profile
1.9.13
  • Oikawa; Fumitoshi - Tokyo JP
  • Oikawa; Fumitoshi - Kanagawa JP
  • Oikawa; Fumitoshi - Ayase JP
  • Oikawa, Fumitoshi - Ayase-shi JP
  • Oikawa, Fumitoshi - Kanagawa-ken JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Substrate Cleaning Device And Method Of Cleaning Substrate
App 20220203411 - Oikawa; Fumitoshi ;   et al.
2022-06-30
Substrate Cleaning Devices, Substrate Processing Apparatus, Substrate Cleaning Method, And Nozzle
App 20220016651 - Oikawa; Fumitoshi ;   et al.
2022-01-20
Apparatus for cleaning substrate and substrate cleaning method
Grant 11,094,548 - Kajita , et al. August 17, 2
2021-08-17
Cleaning Apparatus And Polishing Apparatus
App 20210202273 - MIYAZAKI; Mitsuru ;   et al.
2021-07-01
Substrate Cleaning Apparatus And Cleaning Method Of Substrate
App 20210111018 - OIKAWA; Fumitoshi ;   et al.
2021-04-15
Substrate Cleaning Device And Substrate Cleaning Method
App 20190164769 - KAJITA; Shinji ;   et al.
2019-05-30
Method And Apparatus For Cleaning Substrate
App 20150287617 - WANG; Xinming ;   et al.
2015-10-08
Method and apparatus for cleaning substrate
Grant 9,089,881 - Wang , et al. July 28, 2
2015-07-28
Roller shaft for semiconductor cleaning
Grant D710,062 - Ishibashi , et al. July 29, 2
2014-07-29
Substrate Cleaning Method
App 20130000671 - WANG; Xinming ;   et al.
2013-01-03
Substrate processing apparatus and substrate processing method
Grant 8,226,771 - Oikawa , et al. July 24, 2
2012-07-24
Method And Apparatus For Cleaning Substrate
App 20110209727 - WANG; Xinming ;   et al.
2011-09-01
Substrate Processing Apparatus and Substrate Processing Method
App 20090301518 - Oikawa; Fumitoshi ;   et al.
2009-12-10
Substrate cleaning apparatus
Grant 6,851,152 - Sotozaki , et al. February 8, 2
2005-02-08
Substrate cleaning apparatus and cleaning member
Grant 6,842,933 - Oikawa , et al. January 18, 2
2005-01-18
Substrate cleaning apparatus and cleaning member
App 20040074029 - Oikawa, Fumitoshi ;   et al.
2004-04-22
Substrate cleaning apparatus and cleaning member
Grant 6,651,287 - Oikawa , et al. November 25, 2
2003-11-25
Substrate cleaning apparatus
App 20020029431 - Oikawa, Fumitoshi ;   et al.
2002-03-14
Substrate cleaning apparatus
App 20020022445 - Sotozaki, Hiroshi ;   et al.
2002-02-21
Substrate cleaning apparatus and cleaning member
App 20020004962 - Oikawa, Fumitoshi ;   et al.
2002-01-17

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