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name:-0.0029590129852295
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Nogami; Syouji Patent Filings

Nogami; Syouji

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nogami; Syouji.The latest application filed is for "contamination control method of vapor deposition apparatus and method of producing epitaxial silicon wafer".

Company Profile
0.15.15
  • Nogami; Syouji - Tokyo JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Contamination control method of vapor deposition apparatus and method of producing epitaxial silicon wafer
Grant 10,379,094 - Nogami A
2019-08-13
Contamination Control Method Of Vapor Deposition Apparatus And Method Of Producing Epitaxial Silicon Wafer
App 20160097144 - NOGAMI; Syouji
2016-04-07
Method for manufacturing semiconductor substrate
Grant 9,034,721 - Nogami , et al. May 19, 2
2015-05-19
Method for manufacturing semiconductor substrate
Grant 8,956,947 - Nogami , et al. February 17, 2
2015-02-17
Method For Manufacturing Semiconductor Substrate
App 20140342535 - NOGAMI; Syouji ;   et al.
2014-11-20
Method For Manufacturing Semiconductor Substrate
App 20140342525 - NOGAMI; Syouji ;   et al.
2014-11-20
Method For Manufacturing Semiconductor Substrate
App 20140342526 - NOGAMI; Syouji ;   et al.
2014-11-20
Method for manufacturing semiconductor substrate
Grant 8,835,276 - Nogami , et al. September 16, 2
2014-09-16
Semiconductor substrate, semiconductor device, and method of producing semiconductor substrate
Grant 8,501,598 - Nogami , et al. August 6, 2
2013-08-06
Method for manufacturing semiconductor device
Grant RE44,236 - Yamauchi , et al. May 21, 2
2013-05-21
Semiconductor Substrate, Semiconductor Device, And Method Of Producing Semiconductor Substrate
App 20120032312 - Nogami; Syouji ;   et al.
2012-02-09
Semiconductor device having P-N column layer and method for manufacturing the same
Grant 8,097,511 - Shibata , et al. January 17, 2
2012-01-17
Method For Manufacturing Semiconductor Substrate
App 20110076830 - NOGAMI; Syouji ;   et al.
2011-03-31
Method for manufacturing semiconductor device and epitaxial growth equipment
Grant 7,811,907 - Shibata , et al. October 12, 2
2010-10-12
Manufacturing method of semiconductor wafer having a trench structure and epitaxial layer
Grant 7,776,710 - Nogami , et al. August 17, 2
2010-08-17
Semiconductor device, method for manufacturing the same and method for evaluating the same
Grant 7,642,178 - Yamauchi , et al. January 5, 2
2010-01-05
Semiconductor Substrate and Method for Manufacturing the Same
App 20090273102 - Nogami; Syouji ;   et al.
2009-11-05
Method for manufacturing semiconductor device
Grant 7,601,603 - Yamauchi , et al. October 13, 2
2009-10-13
Semiconductor device having P-N column layer and method for manufacturing the same
App 20080303114 - Shibata; Takumi ;   et al.
2008-12-11
Manufacturing method of semiconductor substrate
Grant 7,364,980 - Nogami , et al. April 29, 2
2008-04-29
Method For Manufacturing A Semiconductor Substrate
App 20080001261 - Nogami; Syouji ;   et al.
2008-01-03
Manufacturing method of semiconductor wafer and semiconductor wafer manufactured by this method
App 20070128836 - Nogami; Syouji
2007-06-07
Semiconductor Substrate And Manufacturing Method Thereof
App 20070108444 - Nogami; Syouji ;   et al.
2007-05-17
Manufacturing Method Of Semiconductor Substrate
App 20070082455 - NOGAMI; Syouji ;   et al.
2007-04-12
Semiconductor device, method for manufacturing the same and method for evaluating the same
App 20070072397 - Yamauchi; Shoichi ;   et al.
2007-03-29
Method for manufacturing semiconductor device and epitaxial growth equipment
App 20070072398 - Shibata; Takumi ;   et al.
2007-03-29
Method for manufacturing semiconductor device
App 20050221547 - Yamauchi, Shoichi ;   et al.
2005-10-06

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