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name:-0.017593145370483
name:-0.013927936553955
name:-0.0052559375762939
Niu; Chengyu Patent Filings

Niu; Chengyu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Niu; Chengyu.The latest application filed is for "low resistance ruthenium-containing contacts".

Company Profile
3.13.13
  • Niu; Chengyu - Niskayuna NY
  • Niu; Chengyu - Albany NY
  • Niu; Chengyu - Fishkill NY
  • Niu; Chengyu - Hopewell Junction NY US
  • Niu; Chengyu - The Colony TX US
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Methods and devices for enhancing mobility of charge carriers
Grant 10,553,497 - Zhang , et al. Fe
2020-02-04
Methods of forming metal-gate semiconductor devices with enhanced mobility of charge carriers
Grant 10,546,789 - Zhang , et al. Ja
2020-01-28
Methods and devices for enhancing mobility of charge carriers
Grant 10,438,856 - Zhang , et al. O
2019-10-08
Low resistance contacts to source or drain region of transistor
Grant 10,283,608 - Zhang , et al.
2019-05-07
Low Resistance Ruthenium-containing Contacts
App 20180269297 - ZHANG; Xunyuan ;   et al.
2018-09-20
Method, apparatus, and system for MOL interconnects without titanium liner
Grant 10,026,693 - Kamineni , et al. July 17, 2
2018-07-17
Method, Apparatus, And System For Mol Interconnects Without Titanium Liner
App 20170243823 - Kamineni; Vimal ;   et al.
2017-08-24
Method, apparatus, and system for MOL interconnects without titanium liner
Grant 9,679,807 - Kamineni , et al. June 13, 2
2017-06-13
Method, Apparatus, And System For Mol Interconnects Without Titanium Liner
App 20170148669 - Kamineni; Vimal ;   et al.
2017-05-25
Methods And Devices For Enhancing Mobility Of Charge Carriers
App 20170011971 - ZHANG; John H. ;   et al.
2017-01-12
Methods And Devices For Enhancing Mobility Of Charge Carriers
App 20160118307 - Zhang; John H. ;   et al.
2016-04-28
Copper interconnect with CVD liner and metallic cap
Grant 9,111,938 - Baumann , et al. August 18, 2
2015-08-18
Copper Interconnect With Cvd Liner And Metallic Cap
App 20150061135 - Baumann; Frieder H. ;   et al.
2015-03-05
Methods And Devices For Enhancing Mobility Of Charge Carriers
App 20140299938 - Zhang; John H. ;   et al.
2014-10-09
Copper Seed Layer For An Interconnect Structure Having A Doping Concentration Level Gradient
App 20140138832 - Niu; Chengyu ;   et al.
2014-05-22
Sandwiched Diffusion Barrier And Metal Liner For An Interconnect Structure
App 20140138837 - Niu; Chengyu ;   et al.
2014-05-22
Copper seed layer for an interconnect structure having a doping concentration level gradient
Grant 8,729,702 - Niu , et al. May 20, 2
2014-05-20
Dual thin film precision resistance trimming
Grant 8,493,171 - Le Neel , et al. July 23, 2
2013-07-23
Via-less thin film resistor with a dielectric cap
Grant 8,400,257 - Lim , et al. March 19, 2
2013-03-19
Dual Thin Film Precision Resistance Trimming
App 20120266452 - Le Neel; Olivier ;   et al.
2012-10-25
Dual thin film precision resistance trimming
Grant 8,242,876 - Le Neel , et al. August 14, 2
2012-08-14
Via-less Thin Film Resistor With A Dielectric Cap
App 20120049997 - Lim; Ting Fang ;   et al.
2012-03-01
Dual Thin Film Precision Resistance Trimming
App 20100073122 - Le Neel; Olivier ;   et al.
2010-03-25
Hybrid ionized physical vapor deposition of via and trench liners
App 20070232060 - Niu; Chengyu
2007-10-04

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