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name:-0.034431934356689
name:-0.0099399089813232
name:-0.00037503242492676
Nishimori; Toshihiko Patent Filings

Nishimori; Toshihiko

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nishimori; Toshihiko.The latest application filed is for "semiconductor light-emitting element, protective film for semiconductor light-emitting element, and process for production of the protective film".

Company Profile
0.8.30
  • Nishimori; Toshihiko - Tokyo JP
  • Nishimori; Toshihiko - Minato-ku JP
  • Nishimori; Toshihiko - Takasago JP
  • Nishimori; Toshihiko - Hyogo JP
  • Nishimori; Toshihiko - Takasago-shi JP
  • NISHIMORI; Toshihiko - Yokohama-shi JP
  • Nishimori, Toshihiko - Yokohama JP
  • Nishimori, Toshihiko - Kanagawa-ken JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Semiconductor Light-emitting Element, Protective Film For Semiconductor Light-emitting Element, And Process For Production Of The Protective Film
App 20130049063 - Kafuku; Hidetaka ;   et al.
2013-02-28
Semiconductor Light-emitting Element, Protective Film Of Semiconductor Light-emitting Element, And Method For Fabricating Same
App 20130037850 - Kafuku; Hidetaka ;   et al.
2013-02-14
Insulating film for semiconductor device, process and apparatus for producing insulating film for semiconductor device, semiconductor device, and process for producing the semiconductor device
Grant 8,288,294 - Kafuku , et al. October 16, 2
2012-10-16
Insulating Film For Semiconductor Device, Process And Apparatus For Producing Insulating Film For Semiconductor Device, Semiconductor Device, And Process For Producing The Semiconductor Device
App 20110266660 - Kafuku; Hidetaka ;   et al.
2011-11-03
Barrier metal film production apparatus, barrier metal film production method, metal film production method, and metal film production apparatus
Grant 7,977,243 - Sakamoto , et al. July 12, 2
2011-07-12
Plasma treatment method and plasma treatment device
Grant 7,972,946 - Shimazu , et al. July 5, 2
2011-07-05
Method and apparatus for production of metal film or the like
Grant 7,923,374 - Sakamoto , et al. April 12, 2
2011-04-12
Manufacturing Method Of Semiconductor Device, Insulating Film For Semiconductor Device, And Manufacturing Apparatus Of The Same
App 20100181654 - Fujiwara; Toshihito ;   et al.
2010-07-22
Barrier Metal Film Production Apparatus, Barrier Metal Film Production Method, Metal Film Production Method, And Metal Film Production Apparatus
App 20100124825 - Sakamoto; Hitoshi ;   et al.
2010-05-20
Barrier Metal Film Production Apparatus, Barrier Metal Film Production Method, Metal Film Production Method, And Metal Film Production Apparatus
App 20100047471 - Sakamoto; Hitoshi ;   et al.
2010-02-25
Method And Apparatus For Production Of Metal Film Or The Like
App 20100040802 - Sakamoto; Hitoshi ;   et al.
2010-02-18
Barrier metal film production method
Grant 7,659,209 - Sakamoto , et al. February 9, 2
2010-02-09
Method And Apparatus For Production Of Metal Film Or The Like
App 20090311866 - Sakamoto; Hitoshi ;   et al.
2009-12-17
Method And Apparatus For Production Of Metal Film Or The Like
App 20090233442 - Sakamoto; Hitoshi ;   et al.
2009-09-17
Plasma Treatment Method And Plasma Treatment Device
App 20090176380 - Shimazu; Tadashi ;   et al.
2009-07-09
Apparatus For The Formation Of A Metal Film
App 20090095425 - SAKAMOTO; Hitoshi ;   et al.
2009-04-16
Barrier metal film production method
App 20070272655 - Sakamoto; Hitoshi ;   et al.
2007-11-29
Interconnection structure
Grant 7,262,500 - Sakamoto , et al. August 28, 2
2007-08-28
Barrier metal film production apparatus, barrier metal film production method, metal film production method, and metal film production apparatus
App 20070141274 - Sakamoto; Hitoshi ;   et al.
2007-06-21
Barrier metal film production apparatus, barrier metal film production method, metal film production method, and metal film production apparatus
App 20070117363 - Sakamoto; Hitoshi ;   et al.
2007-05-24
Plasma processing apparatus
App 20070107843 - Kawano; Yuichi ;   et al.
2007-05-17
Method and apparatus for production of metal film or the like
Grant 7,208,421 - Sakamoto , et al. April 24, 2
2007-04-24
Barrier metal film production apparatus, barrier metal film production method, metal film production method, and metal film production apparatus
App 20070087577 - Sakamoto; Hitoshi ;   et al.
2007-04-19
Apparatus for the formation of a metal film
App 20060191481 - Sakamoto; Hitoshi ;   et al.
2006-08-31
Apparatus for the formation of a metal film
App 20060191477 - Sakamoto; Hitoshi ;   et al.
2006-08-31
Method for the formation of a metal film
App 20060177583 - Sakamoto; Hitoshi ;   et al.
2006-08-10
Barrier metal film production apparatus, barrier metal film production method, metal film production method, and metal film production apparatus
App 20060054593 - Sakamoto; Hitoshi ;   et al.
2006-03-16
Method and apparatus for production of metal film or the like
App 20050230830 - Sakamoto, Hitoshi ;   et al.
2005-10-20
Method and apparatus for production of metal film or the like
App 20050217579 - Sakamoto, Hitoshi ;   et al.
2005-10-06
Methods and apparatus for the formation of a metal film
App 20040091636 - Sakamoto, Hitoshi ;   et al.
2004-05-13
Hexagonal boron nitride film with low dielectric constant, layer dielectric film and method of production thereof, and plasma CVD apparatus
App 20040058199 - Sakamoto, Hitoshi ;   et al.
2004-03-25
Method and apparatus for production of metal film or the like
App 20040029384 - Sakamoto, Hitoshi ;   et al.
2004-02-12
Method for forming metallic film and apparatus for forming the same
Grant 6,656,540 - Sakamoto , et al. December 2, 2
2003-12-02
Barrier metal film production apparatus, barrier metal film production method, metal film production method, and metal film production apparatus
App 20030091739 - Sakamoto, Hitoshi ;   et al.
2003-05-15
Method for forming metallic film and apparatus for forming the same
App 20020142572 - Sakamoto, Hitoshi ;   et al.
2002-10-03
Hexagonal boron nitride film with low dielectric constant, layer dielectric film and method of production thereof, and plasma CVD apparatus
App 20020000556 - Sakamoto, Hitoshi ;   et al.
2002-01-03

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