NISHI; Tsunehiro

Patent Applications and Registrations

Patent applications and USPTO patent grants for NISHI; Tsunehiro.The latest application filed is for "method of manufacturing semiconductor device".

Company Profile

1.67.81

NISHI; Tsunehiro - Suwon-si KR
NISHI; TSUNEHIRO - Seongnam-si KR
Nishi; Tsunehiro - Joetsu JP
Nishi; Tsunehiro - Joetsu-shi JP
Nishi; Tsunehiro - Joestu JP
Nishi; Tsunehiro - Kubiki-mura JP
Nishi; Tsunehiro - Niigata-ken JP
Nishi; Tsunehiro - Nakakubiki-gun JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method Of Manufacturing Semiconductor Device App 20220299874 - KOH; Chawon ; et al.	2022-09-22
Photoresist Compositions And Methods For Fabricating Semiconductor Devices Using The Same App 20220260906 - KOH; CHAWON ; et al.	2022-08-18
Photoresist compositions and methods for fabricating semiconductor devices using the same Grant 11,327,398 - Koh , et al. May 10, 2	2022-05-10
Method Of Manufacturing Integrated Circuit Device Using A Metal-containing Photoresist Composition App 20220059345 - Koh; Chawon ; et al.	2022-02-24
Photoresist Compositions App 20210380612 - Koh; Chawon ; et al.	2021-12-09
Resist Compositions And Semiconductor Fabrication Methods Using The Same App 20210181628 - NGUYEN; THANH CUONG ; et al.	2021-06-17
Photoresist Compositions And Methods For Fabricating Semiconductor Devices Using The Same App 20200348594 - KOH; CHAWON ; et al.	2020-11-05
Positive resist compositions and patterning process Grant 8,921,025 - Kaneko , et al. December 30, 2	2014-12-30
Pattern forming process, chemically amplified positive resist composition, and resist-modifying composition Grant 8,658,346 - Watanabe , et al. February 25, 2	2014-02-25
Resist-modifying composition and pattern forming process Grant 8,426,105 - Watanabe , et al. April 23, 2	2013-04-23
Acetal compounds and their preparation, polymers, resist compositions and patterning process Grant 8,420,290 - Hasegawa , et al. April 16, 2	2013-04-16
Pattern forming process and resist-modifying composition Grant 8,367,310 - Watanabe , et al. February 5, 2	2013-02-05
Resist-modifying composition and pattern forming process Grant 8,329,384 - Watanabe , et al. December 11, 2	2012-12-11
Double patterning process Grant 8,247,166 - Takemura , et al. August 21, 2	2012-08-21
Double patterning process Grant 8,129,099 - Takemura , et al. March 6, 2	2012-03-06
Carboxyl-containing lactone compound, polymer, resist composition, and patterning process Grant 8,062,831 - Shinachi , et al. November 22, 2	2011-11-22
Positive resist composition and patterning process Grant 7,985,528 - Nishi , et al. July 26, 2	2011-07-26
Fluorinated monomer, fluorinated polymer, resist composition and patterning process Grant 7,981,589 - Hasegawa , et al. July 19, 2	2011-07-19
Resist Polymer, Preparing Method, Resist Composition And Patterning Process App 20110054133 - Tachibana; Seiichiro ; et al.	2011-03-03
Pattern Forming Process, Chemically Amplified Positive Resist Composition, And Resist-modifying Composition App 20110033799 - Watanabe; Takeru ; et al.	2011-02-10
Lactone-containing compound, polymer, resist composition, and patterning process Grant 7,871,752 - Hasegawa , et al. January 18, 2	2011-01-18
Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process Grant 7,868,199 - Hasegawa , et al. January 11, 2	2011-01-11
Positive Resist Compositions And Patterning Process App 20100310986 - KANEKO; Tatsushi ; et al.	2010-12-09
Resist-modifying Composition And Pattern Forming Process App 20100297554 - Watanabe; Takeru ; et al.	2010-11-25
Resist-modifying Composition And Pattern Forming Process App 20100297563 - Watanabe; Takeru ; et al.	2010-11-25
Lactone-containing compound, polymer, resist composition, and patterning process Grant 7,833,694 - Hasegawa , et al. November 16, 2	2010-11-16
Lactone-containing compounds, polymers, resist compositions, and patterning method Grant RE41,580 - Hasegawa , et al. August 24, 2	2010-08-24
Pattern Forming Process And Resist-modifying Composition App 20100209849 - Watanabe; Takeru ; et al.	2010-08-19
Acetal Compounds And Their Preparation, Polymers, Resist Compositions And Patterning Process App 20100136485 - HASEGAWA; Koji ; et al.	2010-06-03
Positive resist compositions and patterning process Grant 7,727,704 - Taniguchi , et al. June 1, 2	2010-06-01
Polymers, resist compositions and patterning process Grant 7,718,342 - Funatsu , et al. May 18, 2	2010-05-18
Positive resist compositions and patterning process Grant 7,691,561 - Taniguchi , et al. April 6, 2	2010-04-06
Double Patterning Process App 20100062380 - Takemura; Katsuya ; et al.	2010-03-11
Positive Resist Composition And Patterning Process App 20100062366 - Nishi; Tsunehiro ; et al.	2010-03-11
Positive resist compositions and patterning process Grant 7,638,260 - Seki , et al. December 29, 2	2009-12-29
Positive resist composition and patterning process Grant 7,618,765 - Nishi , et al. November 17, 2	2009-11-17
Positive resist compositions and patterning process Grant 7,618,764 - Tanaka , et al. November 17, 2	2009-11-17
Carboxyl-containing Lactone Compound, Polymer, Resist Composition, And Patterning Process App 20090274984 - SHINACHI; Satoshi ; et al.	2009-11-05
Positive resist compositions and patterning process Grant 7,611,821 - Nishi , et al. November 3, 2	2009-11-03
Polymer, resist composition and patterning process Grant 7,601,479 - Tachibana , et al. October 13, 2	2009-10-13
Polymer, resist composition and patterning process Grant 7,598,015 - Tachibana , et al. October 6, 2	2009-10-06
Lactone-containing Compound, Polymer, Resist Composition, And Patterning Process App 20090233242 - HASEGAWA; Koji ; et al.	2009-09-17
Double Patterning Process App 20090208886 - TAKEMURA; Katsuya ; et al.	2009-08-20
Positive resist composition and patterning process Grant 7,541,133 - Nishi , et al. June 2, 2	2009-06-02
Fluorinated Monomer, Fluorinated Polymer, Resist Composition And Patterning Process App 20090035699 - HASEGAWA; Koji ; et al.	2009-02-05
Positive resist compositions and patterning process App 20080268370 - Tanaka; Shigeo ; et al.	2008-10-30
Positive resist composition and patterning process App 20080254386 - Nishi; Tsunehiro ; et al.	2008-10-16
Positive resist composition and patterning process App 20080124652 - Nishi; Tsunehiro ; et al.	2008-05-29
Positive resist compositions and patterning process App 20080124653 - Seki; Akihiro ; et al.	2008-05-29
Lactone-containing compound, polymer, resist composition, and patterning process App 20080026331 - HASEGAWA; Koji ; et al.	2008-01-31
Positive Resist Compositions And Patterning Process App 20080008961 - NISHI; Tsunehiro ; et al.	2008-01-10
Positive Resist Compositions And Patterning Process App 20080008959 - TANIGUCHI; Ryosuke ; et al.	2008-01-10
Positive Resist Compositions And Patterning Process App 20080008960 - TANIGUCHI; Ryosuke ; et al.	2008-01-10
Resist polymer, preparing method, resist composition and patterning process App 20070264592 - Tachibana; Seiichiro ; et al.	2007-11-15
Resist composition and patterning process App 20070231741 - Nishi; Tsunehiro ; et al.	2007-10-04
Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process App 20070179309 - Hasegawa; Koji ; et al.	2007-08-02
Polymers, resist compositions and patterning process App 20070148594 - Funatsu; Kenji ; et al.	2007-06-28
Photo acid generator, chemical amplification resist material Grant 7,211,367 - Kobayashi , et al. May 1, 2	2007-05-01
Polymer, resist material and patterning processing Grant 7,157,207 - Funatsu , et al. January 2, 2	2007-01-02
Resist polymer, resist composition and patterning process Grant 7,135,270 - Watanabe , et al. November 14, 2	2006-11-14
Photo acid generator, chemical amplification resist material and pattern formation method Grant 7,090,961 - Kobayashi , et al. August 15, 2	2006-08-15
Photo acid generator, chemical amplification resist material and pattern formation method App 20060160023 - Kobayashi; Tomohiro ; et al.	2006-07-20
Polymer, resist composition and patterning process App 20050282083 - Funatsu, Kenji ; et al.	2005-12-22
Polymer, resist composition and patterning process App 20050282082 - Tachibana, Seiichiro ; et al.	2005-12-22
Acetal compound, polymer, resist composition and patterning process Grant 6,962,767 - Watanabe , et al. November 8, 2	2005-11-08
Polymer, resist composition and patterning process App 20050208424 - Hasegawa, Koji ; et al.	2005-09-22
Polymer, resist material and patterning method Grant 6,946,233 - Nishi , et al. September 20, 2	2005-09-20
Epoxy compound having alicyclic structure, polymer, resist composition and patterning process Grant 6,899,990 - Hasegawa , et al. May 31, 2	2005-05-31
Polymer, resist material and patterning processing App 20050089796 - Funatsu, Kenji ; et al.	2005-04-28
Polymer, resist composition and patterning process App 20050058938 - Tachibana, Seiichiro ; et al.	2005-03-17
Resist polymer, resist composition and patterning process App 20050031988 - Watanabe, Takeru ; et al.	2005-02-10
Resist polymer, resist composition and patterning process App 20050031989 - Watanabe, Takeru ; et al.	2005-02-10
Polymer, resist composition and patterning process Grant 6,844,133 - Nishi , et al. January 18, 2	2005-01-18
Polymer, resist composition and patterning process Grant 6,835,525 - Nishi , et al. December 28, 2	2004-12-28
Resist composition and patterning process Grant 6,830,866 - Kobayashi , et al. December 14, 2	2004-12-14
Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparation Grant 6,794,111 - Nishi , et al. September 21, 2	2004-09-21
Ether, polymer, resist composition and patterning process Grant 6,784,268 - Tachibana , et al. August 31, 2	2004-08-31
Polymer, resist composition and patterning process Grant 6,780,563 - Hasegawa , et al. August 24, 2	2004-08-24
Cyclic acetal compound, polymer, resist composition and patterning process Grant 6,743,566 - Nakashima , et al. June 1, 2	2004-06-01
Polymer, resist composition and patterning process Grant 6,703,183 - Nishi , et al. March 9, 2	2004-03-09
Ether, polymer, resist composition and patterning process App 20040013973 - Tachibana, Seiichiro ; et al.	2004-01-22
Polymers, resist materials, and pattern formation method Grant 6,677,101 - Nishi , et al. January 13, 2	2004-01-13
Polymer, resist composition and patterning process Grant 6,673,515 - Nishi , et al. January 6, 2	2004-01-06
Polymer, resist composition and patterning process Grant 6,673,518 - Nishi , et al. January 6, 2	2004-01-06
Polymer, resist composition and patterning process Grant 6,673,517 - Nishi , et al. January 6, 2	2004-01-06
Polymer, resist composition and patterning process Grant 6,670,094 - Nishi , et al. December 30, 2	2003-12-30
Ester compounds, polymers, resist compositions and patterning process Grant 6,670,498 - Nishi , et al. December 30, 2	2003-12-30
Resist composition and patterning process Grant 6,667,145 - Nishi , et al. December 23, 2	2003-12-23
Polymer, resist composition and patterning process Grant 6,660,448 - Tachibana , et al. December 9, 2	2003-12-09
Photo acid generator, chemical amplification resist material and pattern formation method App 20030224290 - Kobayashi, Tomohiro ; et al.	2003-12-04
Chemical amplification type resist composition Grant 6,653,044 - Takeda , et al. November 25, 2	2003-11-25
Novel ester compounds polymers, resist compositions and patterning process App 20030198891 - Hasegawa, Koji ; et al.	2003-10-23
Ether, polymer, resist composition and patterning process Grant 6,624,335 - Tachibana , et al. September 23, 2	2003-09-23
Acetal compound, polymer, resist composition and patterning response App 20030153706 - Watanabe, Takeru ; et al.	2003-08-14
Resist composition and patterning process Grant 6,605,408 - Nishi , et al. August 12, 2	2003-08-12
Polymer, resist composition and patterning process Grant 6,605,678 - Nishi , et al. August 12, 2	2003-08-12
Polymer, resist composition and patterning process App 20030120009 - Nishi, Tsunehiro ; et al.	2003-06-26
Polymers, resist compositions and patterning process Grant 6,566,038 - Nishi , et al. May 20, 2	2003-05-20
Polymer, resist composition and patterning process App 20030091929 - Nishi, Tsunehiro ; et al.	2003-05-15
Polymer, resist composition and patterning process App 20030087183 - Nishi, Tsunehiro ; et al.	2003-05-08
Novel ester compounds, polymers, resist compositions and patterning process App 20030088115 - Nishi, Tsunehiro ; et al.	2003-05-08
Polymers, resist compositions and patterning process App 20030087181 - Nishi, Tsunehiro ; et al.	2003-05-08
Polymer, resist material and patterning method App 20030054290 - Nishi, Tsunehiro ; et al.	2003-03-20
Polymer, resist composition and patterning process App 20030054289 - Nishi, Tsunehiro ; et al.	2003-03-20
Cyclic acetal compound, polymer, resist composition and patterning process App 20030045731 - Nakashima, Mutsuo ; et al.	2003-03-06
Polymer, resist composition and patterning process Grant 6,524,765 - Nishi , et al. February 25, 2	2003-02-25
Novel epoxy compound having alicyclic structure, polymer, resist composition and patterning process App 20030036603 - Hasegawa, Koji ; et al.	2003-02-20
Resist composition and patterning process App 20030013039 - Kobayashi, Tomohiro ; et al.	2003-01-16
Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparation App 20020197559 - Nishi, Tsunehiro ; et al.	2002-12-26
Ether, polymer, resist composition and patterning process App 20020161150 - Tachibana, Seiichiro ; et al.	2002-10-31
Polymer, resist composition and patterning process App 20020150835 - Nishi, Tsunehiro ; et al.	2002-10-17
Cyclic acetal compound, polymer, resist composition and patterning process App 20020147290 - Nakashima, Mutsuo ; et al.	2002-10-10
Polymers, resist materials, and pattern formation method App 20020132182 - Nishi, Tsunehiro ; et al.	2002-09-19
Acetal compound, polymer, resist composition and patterning response App 20020132970 - Watanabe, Takeru ; et al.	2002-09-19
Acid-decomposable ester compound suitable for use in resist material Grant 6,448,420 - Kinsho , et al. September 10, 2	2002-09-10
Ester compounds, polymers, resist composition and patterning process Grant 6,444,396 - Watanabe , et al. September 3, 2	2002-09-03
Acid-decomposable Ester Compound Suitable For Use In Resist Material App 20020115874 - Kinsho, Takeshi ; et al.	2002-08-22
Polymer, resist composition and patterning process App 20020115821 - Nishi, Tsunehiro ; et al.	2002-08-22
Polymer, resist composition and patterning process App 20020115807 - Nishi, Tsunehiro ; et al.	2002-08-22
Polymer, resist composition and patterning process App 20020102493 - Nishi, Tsunehiro ; et al.	2002-08-01
Polymer, resist composition and patterning process App 20020091215 - Tachibana, Seiichiro ; et al.	2002-07-11
Polymer, resist composition and patterning process App 20020061463 - Nishi, Tsunehiro ; et al.	2002-05-23
Polymer, resist composition and patterning process App 20020061465 - Hasegawa, Koji ; et al.	2002-05-23
Novel ester compounds having alicyclic and oxirane structures and method for preparing the same App 20020035279 - Watanabe, Takeru ; et al.	2002-03-21
Novel lactone compounds having alicyclic structure and their manufacturing method App 20020019545 - Kinsho, Takeshi ; et al.	2002-02-14
Novel lactone compounds having alicyclic structure and their manufacturing method App 20020016477 - Kinsho, Takeshi ; et al.	2002-02-07
Novel ester compounds, polymers, resist compositions and patterning process App 20020007031 - Nishi, Tsunehiro ; et al.	2002-01-17
Novel ester compounds, polymers, resist compositions and patterning process App 20020004178 - Hasegawa, Koji ; et al.	2002-01-10
Resist composition and patterning process App 20020001772 - Nishi, Tsunehiro ; et al.	2002-01-03
Polymers, resist compositions and patterning process App 20010051315 - Nishi, Tsunehiro ; et al.	2001-12-13
Novel ester compounds having alicyclic structure and method for preparing same App 20010051742 - Hasegawa, Koji ; et al.	2001-12-13
Polymers, resist compositions and patterning process App 20010051316 - Nishi, Tsunehiro ; et al.	2001-12-13
Novel ester compounds having alicyclic structure and method for preparing same App 20010051741 - Watanabe, Takeru ; et al.	2001-12-13
Novel ester compounds, polymers, resist compositions and patterning process App 20010044071 - Hasegawa, Koji ; et al.	2001-11-22
Ester compounds, polymers, resist compositions and patterning process Grant 6,312,867 - Kinsho , et al. November 6, 2	2001-11-06
Chemical amplification type resist composition App 20010036593 - Takeda, Takanobu ; et al.	2001-11-01
Resist compositions and patterning process App 20010033990 - Hatakeyama, Jun ; et al.	2001-10-25
Polymer, resist composition and patterning process App 20010031424 - Nishi, Tsunehiro ; et al.	2001-10-18
Polymer, resist composition and patterning process App 20010026904 - Nishi, Tsunehiro ; et al.	2001-10-04
Ester compounds, polymers, resist composition and patterning process Grant 6,147,249 - Watanabe , et al. November 14, 2	2000-11-14
Polymeric compounds, chemically amplified positive type resist materials and process for pattern formation Grant 6,048,661 - Nishi , et al. April 11, 2	2000-04-11
Di- and triphenyl monoterpene hydrocarbon derivatives, dissolution inhibitors, and chemically amplified positive resist compositions Grant 6,030,746 - Nagata , et al. February 29, 2	2000-02-29
Bisphenol carboxylic acid tertiary ester derivatives and chemically amplified positive resist compositions Grant 5,856,561 - Nagata , et al. January 5, 1	1999-01-05

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