Patent | Date |
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Low temperature lift-off patterning for glassy carbon films Grant 11,220,742 - Holmes , et al. January 11, 2 | 2022-01-11 |
Enhanced adhesive materials and processes for 3D applications Grant 11,168,234 - Hedrick , et al. November 9, 2 | 2021-11-09 |
Low Temperature Lift-off Patterning For Glassy Carbon Films App 20200299832 - Holmes; Steven J. ;   et al. | 2020-09-24 |
Interconnect structure including airgaps and substractively etched metal lines Grant 10,727,114 - Bruce , et al. | 2020-07-28 |
On-chip biosensors with nanometer scale glass-like carbon electrodes and improved adhesive coupling Grant 10,684,246 - Deligianni , et al. | 2020-06-16 |
Enhanced Adhesive Materials And Processes For 3d Applications App 20200165494 - Hedrick; James L. ;   et al. | 2020-05-28 |
On-chip biosensors with nanometer scale glass-like carbon electrodes and improved adhesive coupling Grant 10,585,060 - Deligianni , et al. | 2020-03-10 |
Disposable laser/flash anneal absorber for embedded neuromorphic memory device fabrication Grant 10,541,151 - Lee , et al. Ja | 2020-01-21 |
Disposable Laser/flash Anneal Absorber For Embedded Neuromorphic Memory Device Fabrication App 20200020542 - Lee; Kam-Leung ;   et al. | 2020-01-16 |
On-chip Biosensors With Nanometer Scale Glass-like Carbon Electrodes And Improved Adhesive Coupling App 20190101503 - Deligianni; Hariklia ;   et al. | 2019-04-04 |
On-chip Biosensors With Nanometer Scale Glass-like Carbon Electrodes And Improved Adhesive Coupling App 20190101504 - Deligianni; Hariklia ;   et al. | 2019-04-04 |
Laser doping of crystalline semiconductors using a dopant-containing amorphous silicon stack for dopant source and passivation Grant 10,043,923 - Neumayer , et al. August 7, 2 | 2018-08-07 |
Interconnect Structure Including Airgaps And Substractively Etched Metal Lines App 20180204759 - BRUCE; ROBERT L. ;   et al. | 2018-07-19 |
Selective and conformal passivation layer for 3D high-mobility channel devices Grant 9,984,940 - Chu , et al. May 29, 2 | 2018-05-29 |
Neutral hard mask and its application to graphoepitaxy-based directed self-assembly (DSA) patterning Grant 9,881,793 - Engelmann , et al. January 30, 2 | 2018-01-30 |
Shallow trench isolation for semiconductor devices Grant 9,698,043 - Chan , et al. July 4, 2 | 2017-07-04 |
Magnetic tunnel junction encapsulation using hydrogenated amorphous semiconductor material Grant 9,698,339 - Annunziata , et al. July 4, 2 | 2017-07-04 |
Magnetic Tunnel Junction Encapsulation Using Hydrogenated Amorphous Semiconductor Material App 20170186943 - Annunziata; Anthony J. ;   et al. | 2017-06-29 |
Low temperature encapsulation for magnetic tunnel junction Grant 9,691,972 - Annunziata , et al. June 27, 2 | 2017-06-27 |
Low Temperature Encapsulation For Magnetic Tunnel Junction App 20170179194 - Annunziata; Anthony J. ;   et al. | 2017-06-22 |
Selective dopant junction for a group III-V semiconductor device Grant 9,679,775 - Chan , et al. June 13, 2 | 2017-06-13 |
Low temperature spacer for advanced semiconductor devices Grant 9,590,054 - Chan , et al. March 7, 2 | 2017-03-07 |
Neutral Hard Mask And Its Application To Graphoepitaxy-based Directed Self-assembly (dsa) Patterning App 20170025274 - Engelmann; Sebastian U. ;   et al. | 2017-01-26 |
Low degradation MRAM encapsulation process using silicon-rich silicon nitride film Grant 9,515,252 - Annunziata , et al. December 6, 2 | 2016-12-06 |
Selective Dopant Junction For A Group Iii-v Semiconductor Device App 20160329211 - Chan; Kevin K. ;   et al. | 2016-11-10 |
Patternable dielectric film structure with improved lithography and method of fabricating same Grant 9,484,248 - Lin , et al. November 1, 2 | 2016-11-01 |
Boron rich nitride cap for total ionizing dose mitigation in SOI devices Grant 9,484,403 - Grill , et al. November 1, 2 | 2016-11-01 |
Graphene cap for copper interconnect structures Grant 9,472,450 - Bonilla , et al. October 18, 2 | 2016-10-18 |
Selective Dopant Junction For A Group Iii-v Semiconductor Device App 20160254150 - Chan; Kevin K. ;   et al. | 2016-09-01 |
Selective dopant junction for a group III-V semiconductor device Grant 9,418,846 - Chan , et al. August 16, 2 | 2016-08-16 |
Low Temperature Spacer For Advanced Semiconductor Devices App 20160141377 - Chan; Kevin K. ;   et al. | 2016-05-19 |
Low temperature spacer for advanced semiconductor devices Grant 9,293,557 - Chan , et al. March 22, 2 | 2016-03-22 |
Boron Rich Nitride Cap For Total Ionizing Dose Mitigation In Soi Devices App 20160064481 - Grill; Alfred ;   et al. | 2016-03-03 |
Boron rich nitride cap for total ionizing dose mitigation in SOI devices Grant 9,231,063 - Grill , et al. January 5, 2 | 2016-01-05 |
Boron Rich Nitride Cap For Total Ionizing Dose Mitigation In Soi Devices App 20150243740 - Grill; Alfred ;   et al. | 2015-08-27 |
Low Temperature Spacer For Advanced Semiconductor Devices App 20150236115 - Chan; Kevin K. ;   et al. | 2015-08-20 |
Laser doping of crystalline semiconductors using a dopant-containing amorphous silicon stack for dopant source and passivation Grant 9,112,068 - Neumayer , et al. August 18, 2 | 2015-08-18 |
Laser Doping of Crystalline Semiconductors Using a Dopant-Containing Amorphous Silicon Stack for Dopant Source and Passivation App 20150228487 - Neumayer; Deborah A. ;   et al. | 2015-08-13 |
Method of forming a graphene cap for copper interconnect structures Grant 8,895,433 - Bonilla , et al. November 25, 2 | 2014-11-25 |
Method Of Forming A Graphene Cap For Copper Interconnect Structures App 20140127896 - Bonilla; Griselda ;   et al. | 2014-05-08 |
Laser Doping of Crystalline Semiconductors Using a Dopant-Containing Amorphous Silicon Stack For Dopant Source and Passivation App 20140099780 - Neumayer; Deborah A. ;   et al. | 2014-04-10 |
Laser Doping of Crystalline Semiconductors Using a Dopant-Containing Amorphous Silicon Stack For Dopant Source and Passivation App 20140096820 - Neumayer; Deborah A. ;   et al. | 2014-04-10 |
Bilayer gate dielectric with low equivalent oxide thickness for graphene devices Grant 8,680,511 - Dimitrakopoulos , et al. March 25, 2 | 2014-03-25 |
Materials Containing Voids With Void Size Controlled On The Nanometer Scale App 20140050860 - Gates; Stephen M. ;   et al. | 2014-02-20 |
Method of forming a graphene cap for copper interconnect structures Grant 8,623,761 - Bonilla , et al. January 7, 2 | 2014-01-07 |
Materials containing voids with void size controlled on the nanometer scale Grant 08618183 - | 2013-12-31 |
Materials containing voids with void size controlled on the nanometer scale Grant 8,618,183 - Gates , et al. December 31, 2 | 2013-12-31 |
Patternable dielectric film structure with improved lithography and method of fabricating same Grant 8,618,663 - Lin , et al. December 31, 2 | 2013-12-31 |
Method to evaluate effectiveness of substrate cleanness and quantity of pin holes in an antireflective coating of a solar cell Grant 8,604,337 - Cotte , et al. December 10, 2 | 2013-12-10 |
Graphene Cap For Copper Interconnect Structures App 20130299988 - Bonilla; Griselda ;   et al. | 2013-11-14 |
Method Of Forming A Graphene Cap For Copper Interconnect Structures App 20130302978 - Bonilla; Griselda ;   et al. | 2013-11-14 |
Nitride gate dielectric for graphene MOSFET Grant 8,530,886 - Avouris , et al. September 10, 2 | 2013-09-10 |
Method to evaluate effectiveness of substrate cleanness and quantity of pin holes in an antireflective coating of a solar cell Grant 8,519,260 - Cotte , et al. August 27, 2 | 2013-08-27 |
Bilayer Gate Dielectric With Low Equivalent Oxide Thickness For Graphene Devices App 20130207080 - Dimitrakopoulos; Christos D. ;   et al. | 2013-08-15 |
Soi Structures Including A Buried Boron Nitride Dielectric App 20130193445 - Dennard; Robert H. ;   et al. | 2013-08-01 |
Soi Structures Including A Buried Boron Nitride Dielectric App 20130196483 - Dennard; Robert H. ;   et al. | 2013-08-01 |
Patternable low-K dielectric interconnect structure with a graded cap layer and method of fabrication Grant 8,461,039 - Lin , et al. June 11, 2 | 2013-06-11 |
Deposition of germanium film Grant 8,455,292 - Assefa , et al. June 4, 2 | 2013-06-04 |
Deposition of Germanium Film App 20130065349 - Assefa; Solomon ;   et al. | 2013-03-14 |
Interconnect structure with an oxygen-doped SiC antireflective coating and method of fabrication Grant 8,373,271 - Goldfarb , et al. February 12, 2 | 2013-02-12 |
Materials Containing Voids With Void Size Controlled On The Nanometer Scale App 20120328796 - Gates; Stephen M. ;   et al. | 2012-12-27 |
Method To Evaluate Effectiveness Of Substrate Cleanness And Quantity Of Pin Holes In An Antireflective Coating Of A Solar Cell App 20120325316 - Cotte; John M. ;   et al. | 2012-12-27 |
Patternable Low-k Dielectric Interconnect Structure With A Graded Cap Layer And Method Of Fabrication App 20120252204 - Lin; Qinghuang ;   et al. | 2012-10-04 |
Materials containing voids with void size controlled on the nanometer scale Grant 8,268,411 - Gates , et al. September 18, 2 | 2012-09-18 |
Patternable low-k dielectric interconnect structure with a graded cap layer and method of fabrication Grant 8,202,783 - Lin , et al. June 19, 2 | 2012-06-19 |
Method of fabricating a SiCOH dielectric material with improved toughness and improved Si-C bonding Grant 8,101,236 - Edelstein , et al. January 24, 2 | 2012-01-24 |
Ultra low .kappa. plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality Grant 8,097,932 - Nguyen , et al. January 17, 2 | 2012-01-17 |
Method To Evaluate Effectiveness Of Substrate Cleanness And Quantity Of Pin Holes In An Antireflective Coating Of A Solar Cell App 20120006396 - Cotte; John M. ;   et al. | 2012-01-12 |
Patternable Dielectric Film Structure With Improved Lithography And Method Of Fabricating Same App 20110312177 - Lin; Qinghuang ;   et al. | 2011-12-22 |
INTERCONNECT STRUCTURE WITH AN OXYGEN-DOPED SiC ANTIREFLECTIVE COATING AND METHOD OF FABRICATION App 20110291284 - Goldfarb; Dario L. ;   et al. | 2011-12-01 |
Low-temperature Absorber Film And Method Of Fabrication App 20110254138 - Babich; Katherina E. ;   et al. | 2011-10-20 |
Enhanced Bonding Interfaces On Carbon-based Materials For Nanoelectronic Devices App 20110233513 - Dimitrakopoulos; Christos D. ;   et al. | 2011-09-29 |
SiCOH DIELECTRIC MATERIAL WITH IMPROVED TOUGHNESS AND IMPROVED Si-C BONDING, SEMICONDUCTOR DEVICE CONTAINING THE SAME, AND METHOD TO MAKE THE SAME App 20110101489 - Edelstein; Daniel C. ;   et al. | 2011-05-05 |
Patternable Low-k Dielectric Interconnect Structure With A Graded Cap Layer And Method Of Fabrication App 20110074044 - Lin; Qinghuang ;   et al. | 2011-03-31 |
SiCOH film preparation using precursors with built-in porogen functionality Grant 7,915,180 - Gates , et al. March 29, 2 | 2011-03-29 |
SiCOH dielectric material with improved toughness and improved Si-C bonding Grant 7,892,648 - Edelstein , et al. February 22, 2 | 2011-02-22 |
Materials containing voids with void size controlled on the nanometer scale Grant 7,674,521 - Gates , et al. March 9, 2 | 2010-03-09 |
Materials Containing Voids With Void Size Controlled On The Nanometer Scale App 20090297729 - Gates; Stephen M. ;   et al. | 2009-12-03 |
Electrode Formed In Aperture Defined By A Copolymer Mask App 20090239334 - Breitwisch; Matthew J. ;   et al. | 2009-09-24 |
SiCOH FILM PREPARATION USING PRECURSORS WITH BUILT-IN POROGEN FUNCTIONALITY App 20090203225 - Gates; Stephen M. ;   et al. | 2009-08-13 |
Deposition of hafnium oxide and/or zirconium oxide and fabrication of passivated electronic structures Grant 7,566,938 - Cabral, Jr. , et al. July 28, 2 | 2009-07-28 |
SiCOH DIELECTRIC MATERIAL WITH IMPROVED TOUGHNESS AND IMPROVED Si-C BONDING, SEMICONDUCTOR DEVICE CONTAINING THE SAME, AND METHOD TO MAKE THE SAME App 20090181178 - Edelstein; Daniel C. ;   et al. | 2009-07-16 |
ULTRA LOW k PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION PROCESSES USING A SINGLE BIFUNCTIONAL PRECURSOR CONTAINING BOTH A SiCOH MATRIX FUNCTIONALITY AND ORGANIC POROGEN FUNCTIONALITY App 20090146265 - Nguyen; Son Van ;   et al. | 2009-06-11 |
SiCOH film preparation using precursors with built-in porogen functionality Grant 7,521,377 - Gates , et al. April 21, 2 | 2009-04-21 |
Patternable Dielectric Film Structure With Improved Lithography And Method Of Fabricating Same App 20090079076 - Lin; Qinghuang ;   et al. | 2009-03-26 |
Ultra low k plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality Grant 7,491,658 - Nguyen , et al. February 17, 2 | 2009-02-17 |
SiCOH dielectric material with improved toughness and improved Si-C bonding, semiconductor device containing the same, and method to make the same Grant 7,479,306 - Edelstein , et al. January 20, 2 | 2009-01-20 |
SiCOH DIELECTRIC App 20080265381 - Afzali-Ardakani; Ali ;   et al. | 2008-10-30 |
Materials containing voids with void size controlled on the nanometer scale App 20070196639 - Gates; Stephen M. ;   et al. | 2007-08-23 |
SiCOH dielectric App 20070173071 - Afzali-Ardakani; Ali ;   et al. | 2007-07-26 |
SiCOH film preparation using precursors with built-in porogen functionality App 20070161256 - Gates; Stephen M. ;   et al. | 2007-07-12 |
SiCOH dielectric material with improved toughness and improved Si-C bonding, semiconductor device containing the same, and method to make the same App 20060165891 - Edelstein; Daniel C. ;   et al. | 2006-07-27 |
Deposition of hafnium oxide and/or zirconium oxide and fabrication of passivated electronic structures App 20060138603 - Cabral; Cyril JR. ;   et al. | 2006-06-29 |
Ultra low k plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality App 20060079099 - Nguyen; Son Van ;   et al. | 2006-04-13 |
Delivery systems for gases for gases via the sublimation of solid precursors Grant 6,984,415 - McFeely , et al. January 10, 2 | 2006-01-10 |
Deposition of hafnium oxide and/or zirconium oxide and fabrication of passivated electronic structures Grant 6,982,230 - Cabral, Jr. , et al. January 3, 2 | 2006-01-03 |
SiCOH dielectric material with improved toughness and improved Si-C bonding, semiconductor device containing the same, and method to make the same App 20050194619 - Edelstein, Daniel C. ;   et al. | 2005-09-08 |
Tuneable ferroelectric decoupling capacitor Grant 6,888,714 - Shaw , et al. May 3, 2 | 2005-05-03 |
Deposition of hafnium oxide and/or zirconium oxide and fabrication of passivated electronic structures App 20040092073 - Cabral, Cyril JR. ;   et al. | 2004-05-13 |
High dielectric constant materials Grant 6,653,246 - Chudzik , et al. November 25, 2 | 2003-11-25 |
High dielectric constant materials App 20030132509 - Chudzik, Michael P. ;   et al. | 2003-07-17 |
Tuneable ferroelectric decoupling capacitor App 20030112578 - Shaw, Thomas M. ;   et al. | 2003-06-19 |
Method of manufacturing high dielectric constant material Grant 6,541,331 - Chudzik , et al. April 1, 2 | 2003-04-01 |
Method Of Manufacturing High Dielectric Constant Material App 20030032235 - Chudzik, Michael P. ;   et al. | 2003-02-13 |
Delivery Systems For Gases For Gases Via The Sublimation Of Solid Precursors App 20020009544 - MCFEELY, F. READ ;   et al. | 2002-01-24 |