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name:-0.01630711555481
name:-0.0025019645690918
Nakashima; Seiyo Patent Filings

Nakashima; Seiyo

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nakashima; Seiyo.The latest application filed is for "substrate processing apparatus, method of manufacturing semiconductor device, and recording medium".

Company Profile
2.14.13
  • Nakashima; Seiyo - Toyama JP
  • Nakashima; Seiyo - Toyama-shi JP
  • Nakashima; Seiyo - Tokyo JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium
Grant 10,825,697 - Yamada , et al. November 3, 2
2020-11-03
Substrate Processing Apparatus, Method Of Manufacturing Semiconductor Device, And Recording Medium
App 20200303219 - YAMADA; Tomoyuki ;   et al.
2020-09-24
Substrate Processing Apparatus
App 20200291516 - Nakashima; Seiyo
2020-09-17
Substrate processing apparatus, exhaust system and method of manufacturing semiconductor device
Grant 10,163,663 - Yonejima , et al. Dec
2018-12-25
Substrate Processing Apparatus, Exhaust System And Method Of Manufacturing Semiconductor Device
App 20180144953 - YONEJIMA; Toshihiko ;   et al.
2018-05-24
Substrate processing apparatus
Grant 9,698,037 - Nakashima , et al. July 4, 2
2017-07-04
Substrate processing apparatus
Grant 9,394,607 - Nishida , et al. July 19, 2
2016-07-19
Substrate Processing Apparatus, Method Of Manufacturing Semiconductor Device And Non-transitory Computer-readable Recording Medium
App 20150267296 - NISHIDA; Masaya ;   et al.
2015-09-24
Method of manufacturing a semiconductor device
Grant 8,420,167 - Nakashima , et al. April 16, 2
2013-04-16
Substrate processing apparatus, method for manufacturing semiconductor device, and process tube
Grant 8,303,712 - Nakashima , et al. November 6, 2
2012-11-06
Substrate processing apparatus and manufacturing method of a semiconductor device
Grant 8,277,161 - Aburatani , et al. October 2, 2
2012-10-02
Semiconductor manufacturing equipment
Grant D652,395 - Shimada , et al. January 17, 2
2012-01-17
Semiconductor manufacturing equipment
Grant D651,990 - Shimada , et al. January 10, 2
2012-01-10
Substrate Processing Apparatus
App 20110305543 - NAKASHIMA; Seiyo ;   et al.
2011-12-15
Substrate Processing Apparatus
App 20100229416 - ABURATANI; Yukinori ;   et al.
2010-09-16
Reaction tube
Grant D618,638 - Nakashima June 29, 2
2010-06-29
Substrate treating apparatus and semiconductor device manufacturing method
Grant 7,731,797 - Nakashima , et al. June 8, 2
2010-06-08
Substrate processing apparatus having gas side flow via gas inlet
Grant 7,700,054 - Hayashida , et al. April 20, 2
2010-04-20
Substrate Processing Apparatus, Method For Manufacturing Semiconductor Device, And Process Tube
App 20090197402 - NAKASHIMA; Seiyo ;   et al.
2009-08-06
Substrate processing apparatus, method of manufacturing semiconductor device, and reaction vessel
App 20090191718 - Nakashima; Seiyo ;   et al.
2009-07-30
Substrate processing apparatus and manufacturing method of a semiconductor device
App 20090003977 - Aburatani; Yukinori ;   et al.
2009-01-01
Substrate processing apparatus, method of manufacturing semiconductor device, and reaction vessel
App 20080173238 - Nakashima; Seiyo ;   et al.
2008-07-24
Substrate Treating Apparatus and Semiconductor Device Manufacturing Method
App 20080134977 - Nakashima; Seiyo ;   et al.
2008-06-12
Substrate processing apparatus and substrate processing method
App 20060075972 - Nakashima; Seiyo ;   et al.
2006-04-13
Substrate processing apparatus and substrate processing method
App 20020017363 - Nakashima, Seiyo ;   et al.
2002-02-14

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