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name:-0.025116920471191
name:-0.017976999282837
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Nagumo; Toshiharu Patent Filings

Nagumo; Toshiharu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nagumo; Toshiharu.The latest application filed is for "semiconductor memory device and manufacturing method thereof".

Company Profile
0.13.21
  • Nagumo; Toshiharu - Kuwana JP
  • NAGUMO; Toshiharu - Tokyo JP
  • Nagumo; Toshiharu - Kanagawa JP
  • Nagumo; Toshiharu - Yokkaichi JP
  • Nagumo; Toshiharu - Sagamihara JP
  • NAGUMO; Toshiharu - Kawasaki-shi JP
  • Nagumo; Toshiharu - Kawasaki JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Semiconductor memory device including memory pillars and transistor and manufacturing method thereof
Grant 10,896,913 - Fukushima , et al. January 19, 2
2021-01-19
Semiconductor Memory Device And Manufacturing Method Thereof
App 20200083243 - FUKUSHIMA; Takashi ;   et al.
2020-03-12
Semiconductor Device Having Compressively Strained Channel Region And Method Of Making Same
App 20180301552 - NAGUMO; Toshiharu
2018-10-18
Semiconductor device having compressively strained channel region and method of making same
Grant 10,069,010 - Nagumo September 4, 2
2018-09-04
Semiconductor memory device and method for manufacturing same
Grant 9,929,177 - Nagumo March 27, 2
2018-03-27
Semiconductor Memory Device And Method For Manufacturing Same
App 20170309638 - NAGUMO; Toshiharu
2017-10-26
High-electron-mobility transistor with protective diode
Grant 9,589,951 - Nagumo , et al. March 7, 2
2017-03-07
Self-aligned dual-height isolation for bulk FinFET
Grant 9,564,486 - Akarvardar , et al. February 7, 2
2017-02-07
Semiconductor device and forming method
Grant 9,553,131 - Nagumo , et al. January 24, 2
2017-01-24
Semiconductor device having finFET structures and method of making same
Grant 9,362,308 - Nagumo June 7, 2
2016-06-07
Self-aligned dual-height isolation for bulk FinFET
Grant 9,324,790 - Akarvardar , et al. April 26, 2
2016-04-26
Device isolation in FinFET CMOS
Grant 9,305,846 - Jacob , et al. April 5, 2
2016-04-05
Semiconductor Device
App 20160079426 - KUME; Ippei ;   et al.
2016-03-17
Semiconductor Device
App 20160056145 - Nagumo; Toshiharu ;   et al.
2016-02-25
Semiconductor Device And Forming Method
App 20160056207 - NAGUMO; Toshiharu ;   et al.
2016-02-25
Retrograde Doped Layer For Device Isolation
App 20160035728 - Jacob; Ajey Poovannummoottil ;   et al.
2016-02-04
Field Effect Transistor With Channel Core Modified For A Backgate Bias And Method Of Fabrication
App 20160027872 - HIRAI; Tomohiro ;   et al.
2016-01-28
Field Effect Transistor With Channel Core Modified To Reduce Leakage Current And Method Of Fabrication
App 20160020312 - HIRAI; Tomohiro ;   et al.
2016-01-21
Semiconductor device with group-III nitride compound semiconductor layer on substrate for transistor
Grant 9,231,105 - Kume , et al. January 5, 2
2016-01-05
Self-aligned Dual-height Isolation For Bulk Finfet
App 20150372080 - Akarvardar; Murat Kerem ;   et al.
2015-12-24
Field effect transistor with channel core modified to reduce leakage current and method of fabrication
Grant 9,196,715 - Hirai , et al. November 24, 2
2015-11-24
Field effect transistor with channel core modified for a backgate bias and method of fabrication
Grant 9,190,505 - Hirai , et al. November 17, 2
2015-11-17
Self-aligned Dual-height Isolation For Bulk Finfet
App 20150137308 - Akarvardar; Murat Kerem ;   et al.
2015-05-21
Device Isolation In Finfet Cmos
App 20150140761 - Jacob; Ajey Poovannummoottil ;   et al.
2015-05-21
Semiconductor Device
App 20150060875 - Kume; Ippei ;   et al.
2015-03-05
Device isolation in finFET CMOS
Grant 8,963,259 - Jacob , et al. February 24, 2
2015-02-24
Retrograde Doped Layer For Device Isolation
App 20140361377 - Jacob; Ajey Poovannummoottil ;   et al.
2014-12-11
Device Isolation In Finfet Cmos
App 20140353801 - Jacob; Ajey P. ;   et al.
2014-12-04
Semiconductor Device Having Finfet Structures And Method Of Making Same
App 20140252483 - NAGUMO; Toshiharu
2014-09-11
Semiconductor Device Having Compressively Strained Channel Region And Method Of Making Same
App 20140239399 - NAGUMO; Toshiharu
2014-08-28
Field Effect Transistor With Channel Core Modified To Reduce Leakage Current And Method Of Fabrication
App 20140183451 - HIRAI; Tomohiro ;   et al.
2014-07-03
Field Effect Transistor With Channel Core Modified For A Backgate Bias And Method Of Fabrication
App 20140183452 - HIRAI; Tomohiro ;   et al.
2014-07-03
Semiconductor Device, Semiconductor Wafer, And Methods Of Manufacturing The Same
App 20120313172 - MATSUDAIRA; Masaharu ;   et al.
2012-12-13
Evaluation Method, Evaluation Apparatus, And Simulation Method Of Semiconductor Device
App 20120065920 - NAGUMO; Toshiharu ;   et al.
2012-03-15

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