loadpatents
name:-0.016500234603882
name:-0.020150899887085
name:-0.0004429817199707
Misra; Sudhanshu Patent Filings

Misra; Sudhanshu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Misra; Sudhanshu.The latest application filed is for "chemical planarization".

Company Profile
0.36.24
  • Misra; Sudhanshu - Camas WA
  • Misra; Sudhanshu - San Jose CA
  • Misra; Sudhanshu - Sunnyvale CA
  • Misra; Sudhanshu - Orlando FL
  • Misra, Sudhanshu - City of Orlando FL
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Chemical Planarization
App 20200365412 - Misra; Sudhanshu ;   et al.
2020-11-19
Customized polishing pads for CMP and methods of fabrication and use thereof
Grant 10,220,487 - Roy , et al.
2019-03-05
Customized Polishing Pads For Cmp And Methods Of Fabrication And Use Thereof
App 20160229025 - ROY; Pradip K. ;   et al.
2016-08-11
Grooved CMP pads
Grant 9,375,823 - Kerprich , et al. June 28, 2
2016-06-28
Customized polishing pads for CMP and methods of fabrication and use thereof
Grant 9,278,424 - Roy , et al. March 8, 2
2016-03-08
Polishing systems
Grant 9,272,388 - Misra March 1, 2
2016-03-01
Grooved Cmp Pads
App 20160023321 - Kerprich; Robert ;   et al.
2016-01-28
Grooved CMP pad
Grant 9,180,570 - Kerprich , et al. November 10, 2
2015-11-10
Customized Polishing Pads For Cmp And Methods Of Fabrication And Use Thereof
App 20150065020 - Roy; Pradip K. ;   et al.
2015-03-05
Customized polishing pads for CMP and methods of fabrication and use thereof
Grant 8,864,859 - Roy , et al. October 21, 2
2014-10-21
Customized polishing pads for CMP and methods of fabrication and use thereof
Grant 8,715,035 - Roy , et al. May 6, 2
2014-05-06
Polishing Systems
App 20130149945 - Misra; Sudhanshu
2013-06-13
Polishing systems
Grant 8,383,003 - Misra February 26, 2
2013-02-26
Customized polish pads for chemical mechanical planarization
Grant 8,380,339 - Misra , et al. February 19, 2
2013-02-19
Customized Polish Pads For Chemical Mechanical Planarization
App 20100273398 - Misra; Sudhanshu ;   et al.
2010-10-28
Customized polish pads for chemical mechanical planarization
Grant 7,704,122 - Misra , et al. April 27, 2
2010-04-27
Customized polishing pads for CMP and methods of fabrication and use thereof
Grant 7,704,125 - Roy , et al. April 27, 2
2010-04-27
Polishing systems
App 20090318063 - Misra; Sudhanshu
2009-12-24
Grooved CMP pad
App 20090311955 - Kerprich; Robert ;   et al.
2009-12-17
Customized Polishing Pads for CMP and Methods of Fabrication and Use Thereof
App 20090053976 - Roy; Pradip K. ;   et al.
2009-02-26
Customized polish pads for chemical mechanical planarization
Grant 7,425,172 - Misra , et al. September 16, 2
2008-09-16
Customized polishing pads for CMP and methods of fabrication and use thereof
App 20080207100 - Roy; Pradip K. ;   et al.
2008-08-28
Customized polish pads for chemical mechanical planarization
App 20080090498 - Misra; Sudhanshu ;   et al.
2008-04-17
Customized polishing pads for CMP and methods of fabrication and use thereof
App 20060276109 - Roy; Pradip K. ;   et al.
2006-12-07
Customized polishing pads for CMP and methods of fabrication and use thereof
App 20060189269 - Roy; Pradip K. ;   et al.
2006-08-24
Customized polish pads for chemical mechanical planarization
App 20050009448 - Misra, Sudhanshu ;   et al.
2005-01-13
Semiconductor device having an interconnect layer with a plurality of layout regions having substantially uniform densities of active interconnects and dummy fills
Grant 6,683,382 - Cwynar , et al. January 27, 2
2004-01-27
Pad for chemical mechanical polishing
Grant 6,659,846 - Misra , et al. December 9, 2
2003-12-09
Non-hydrolytic-sol-gel process for high K dielectric
Grant 6,616,965 - Misra , et al. September 9, 2
2003-09-09
Chemical mechanical polishing composition and method of polishing metal layers using same
Grant 6,599,837 - Merchant , et al. July 29, 2
2003-07-29
Method for chemical/mechanical planarization of a semiconductor wafer having dissimilar metal pattern densities
Grant 6,596,639 - Easter , et al. July 22, 2
2003-07-22
Composite polishing pads for chemical-mechanical polishing
Grant 6,544,107 - Misra , et al. April 8, 2
2003-04-08
Process for making mixed metal oxides
Grant 6,540,974 - Misra , et al. April 1, 2
2003-04-01
Pad for chemical mechanical polishing
App 20030054735 - Misra, Sudhanshu ;   et al.
2003-03-20
Method for making an interconnect layer and a semiconductor device including the same
App 20020162082 - Cwynar, Donald Thomas ;   et al.
2002-10-31
Local area alloying for preventing dishing of copper during chemical-mechanical polishing (CMP)
Grant 6,461,225 - Misra , et al. October 8, 2
2002-10-08
Polishing fluid, polishing method, semiconductor device and semiconductor device fabrication method
Grant 6,458,016 - Merchant , et al. October 1, 2
2002-10-01
Polishing fluid, polishing method, semiconductor device and semiconductor device fabrication method
Grant 6,439,972 - Misra , et al. August 27, 2
2002-08-27
Composite polishing pads for chemical-mechanical polishing
App 20020115385 - Misra, Sudhanshu ;   et al.
2002-08-22
Method for making an interconnect layer and a semiconductor device including the same
Grant 6,436,807 - Cwynar , et al. August 20, 2
2002-08-20
Silicon carbide barrier layers for porous low dielectric constant materials
Grant 6,410,419 - Merchant , et al. June 25, 2
2002-06-25
Polishing pads from closed-cell elastomer foam
Grant 6,368,200 - Merchant , et al. April 9, 2
2002-04-09
CMP system and slurry for polishing semiconductor wafers and related method
Grant 6,364,744 - Merchant , et al. April 2, 2
2002-04-02
In-situ electroplated oxide passivating film for corrosion inhibition
App 20020030282 - Merchant, Sailesh Mansinh ;   et al.
2002-03-14
Colloidal suspension of abrasive particles containing magnesium as CMP slurry
Grant 6,319,095 - Merchant , et al. November 20, 2
2001-11-20
Thin film deposition of mixed metal oxides
App 20010040785 - Misra, Sudhanshu ;   et al.
2001-11-15
Polishing fluid, polishing method, semiconductor device and semiconductor device fabrication method
App 20010036795 - Merchant, Sailesh Mansinh ;   et al.
2001-11-01
Polishing fluid, polishing method, semiconductor device and semiconductor device fabrication method
App 20010036796 - Misra, Sudhanshu ;   et al.
2001-11-01
Method of making a semiconductor with copper passivating film
Grant 6,114,234 - Merchant , et al. September 5, 2
2000-09-05
Silicon carbide barrier layers for porous low dielectric constant materials
Grant 6,100,587 - Merchant , et al. August 8, 2
2000-08-08
Method of passivating copper interconnects in a semiconductor
Grant 6,071,808 - Merchant , et al. June 6, 2
2000-06-06

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