loadpatents
Patent applications and USPTO patent grants for Maynard; Helen L..The latest application filed is for "plasma doping using a solid dopant source".
Patent | Date |
---|---|
Plasma doping using a solid dopant source Grant 10,460,941 - Salimian , et al. Oc | 2019-10-29 |
Plasma Doping Using A Solid Dopant Source App 20180130659 - Salimian; Siamak ;   et al. | 2018-05-10 |
Self-compensating oxide layer Grant 9,437,432 - Maynard , et al. September 6, 2 | 2016-09-06 |
Techniques for plasma processing a substrate Grant 9,123,509 - Papasouliotis , et al. September 1, 2 | 2015-09-01 |
Technique for manufacturing bit patterned media Grant 9,093,104 - Sinclair , et al. July 28, 2 | 2015-07-28 |
Technique for processing a substrate having a non-planar surface Grant 8,679,960 - Papasouliotis , et al. March 25, 2 | 2014-03-25 |
Self-aligned masking for solar cell manufacture Grant 8,465,909 - Bateman , et al. June 18, 2 | 2013-06-18 |
Technique For Manufacturing Bit Patterned Media App 20120175342 - Sinclair; Frank ;   et al. | 2012-07-12 |
Method for enhancing tensile stress and source/drain activation using Si:C Grant 8,124,487 - Maynard , et al. February 28, 2 | 2012-02-28 |
Techniques For Plasma Processing A Substrate App 20110309049 - PAPASOULIOTIS; George D. ;   et al. | 2011-12-22 |
Self-aligned Masking For Solar Cell Manufacture App 20110104618 - Bateman; Nicholas P.T. ;   et al. | 2011-05-05 |
Technique for Processing a Substrate Having a Non-Planar Surface App 20110086501 - Papasouliotis; George D. ;   et al. | 2011-04-14 |
Formation Of Raised Source/Drain On A Strained Thin Film Implanted With Cold And/Or Molecular Carbon App 20100279479 - Hatem; Christopher R. ;   et al. | 2010-11-04 |
METHOD FOR ENHANCING TENSILE STRESS AND SOURCE/DRAIN ACTIVIATION USING Si:C App 20100155898 - Maynard; Helen L. ;   et al. | 2010-06-24 |
Like Integrated Circuit Devices With Different Depth App 20070273004 - Hichri; Habib ;   et al. | 2007-11-29 |
Like integrated circuit devices with different depth Grant 7,279,426 - Hichri , et al. October 9, 2 | 2007-10-09 |
Like Integrated Circuit Devices With Different Depth App 20070066073 - Hichri; Habib ;   et al. | 2007-03-22 |
Detection Of Loss Of Plasma Confinement App 20070007244 - Hichri; Habib ;   et al. | 2007-01-11 |
Methods for running a high density plasma etcher to achieve reduced transistor device damage App 20020029853 - Hudson, Eric A. ;   et al. | 2002-03-14 |
Methods for running a high density plasma etcher to achieve reduced transistor device damage Grant 6,255,221 - Hudson , et al. July 3, 2 | 2001-07-03 |
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