loadpatents
name:-0.014072895050049
name:-0.01078200340271
name:-0.00043797492980957
Maynard; Helen L. Patent Filings

Maynard; Helen L.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Maynard; Helen L..The latest application filed is for "plasma doping using a solid dopant source".

Company Profile
0.13.11
  • Maynard; Helen L. - North Reading MA
  • Maynard; Helen L. - Reading MA
  • Maynard; Helen L. - Hopewell Junction NY
  • Maynard, Helen L. - New York NY
  • Maynard; Helen L. - Somerset NJ
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Plasma doping using a solid dopant source
Grant 10,460,941 - Salimian , et al. Oc
2019-10-29
Plasma Doping Using A Solid Dopant Source
App 20180130659 - Salimian; Siamak ;   et al.
2018-05-10
Self-compensating oxide layer
Grant 9,437,432 - Maynard , et al. September 6, 2
2016-09-06
Techniques for plasma processing a substrate
Grant 9,123,509 - Papasouliotis , et al. September 1, 2
2015-09-01
Technique for manufacturing bit patterned media
Grant 9,093,104 - Sinclair , et al. July 28, 2
2015-07-28
Technique for processing a substrate having a non-planar surface
Grant 8,679,960 - Papasouliotis , et al. March 25, 2
2014-03-25
Self-aligned masking for solar cell manufacture
Grant 8,465,909 - Bateman , et al. June 18, 2
2013-06-18
Technique For Manufacturing Bit Patterned Media
App 20120175342 - Sinclair; Frank ;   et al.
2012-07-12
Method for enhancing tensile stress and source/drain activation using Si:C
Grant 8,124,487 - Maynard , et al. February 28, 2
2012-02-28
Techniques For Plasma Processing A Substrate
App 20110309049 - PAPASOULIOTIS; George D. ;   et al.
2011-12-22
Self-aligned Masking For Solar Cell Manufacture
App 20110104618 - Bateman; Nicholas P.T. ;   et al.
2011-05-05
Technique for Processing a Substrate Having a Non-Planar Surface
App 20110086501 - Papasouliotis; George D. ;   et al.
2011-04-14
Formation Of Raised Source/Drain On A Strained Thin Film Implanted With Cold And/Or Molecular Carbon
App 20100279479 - Hatem; Christopher R. ;   et al.
2010-11-04
METHOD FOR ENHANCING TENSILE STRESS AND SOURCE/DRAIN ACTIVIATION USING Si:C
App 20100155898 - Maynard; Helen L. ;   et al.
2010-06-24
Like Integrated Circuit Devices With Different Depth
App 20070273004 - Hichri; Habib ;   et al.
2007-11-29
Like integrated circuit devices with different depth
Grant 7,279,426 - Hichri , et al. October 9, 2
2007-10-09
Like Integrated Circuit Devices With Different Depth
App 20070066073 - Hichri; Habib ;   et al.
2007-03-22
Detection Of Loss Of Plasma Confinement
App 20070007244 - Hichri; Habib ;   et al.
2007-01-11
Methods for running a high density plasma etcher to achieve reduced transistor device damage
App 20020029853 - Hudson, Eric A. ;   et al.
2002-03-14
Methods for running a high density plasma etcher to achieve reduced transistor device damage
Grant 6,255,221 - Hudson , et al. July 3, 2
2001-07-03

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