Luscher; Paul E.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Luscher; Paul E..The latest application filed is for "dielectric etch chamber with expanded process window".

Company Profile

0.18.12

Luscher; Paul E. - Sunnyvale CA
Luscher; Paul E - Sunnyvale CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Double slit-valve doors for plasma processing Grant 7,147,719 - Welch , et al. December 12, 2	2006-12-12
Temperature controlled window with a fluid supply system Grant 6,916,399 - Rozenzon , et al. July 12, 2	2005-07-12
Configurable single substrate wet-dry integrated cluster cleaner Grant 6,899,111 - Luscher , et al. May 31, 2	2005-05-31
Magnetic barrier for plasma in chamber exhaust Grant 6,863,835 - Carducci , et al. March 8, 2	2005-03-08
Dielectric etch chamber with expanded process window App 20050003675 - Carducci, James D. ; et al.	2005-01-06
Temperature controlled dome-coil system for high power inductively coupled plasma systems Grant 6,822,185 - Welch , et al. November 23, 2	2004-11-23
Endpoint detection in substrate fabrication processes Grant 6,813,534 - Sui , et al. November 2, 2	2004-11-02
Dielectric etch chamber with expanded process window Grant 6,797,639 - Carducci , et al. September 28, 2	2004-09-28
Magnetic barrier for plasma in chamber exhaust Grant 6,773,544 - Carducci , et al. August 10, 2	2004-08-10
Double slit-valve doors for plasma processing App 20040083978 - Welch, Michael D. ; et al.	2004-05-06
Temperature controlled dome-coil system for high power inductively coupled plasma systems App 20040065645 - Welch, Michael ; et al.	2004-04-08
Dielectric etch chamber with expanded process window Grant 6,716,302 - Carducci , et al. April 6, 2	2004-04-06
Double slit-valve doors for plasma processing Grant 6,647,918 - Welch , et al. November 18, 2	2003-11-18
Apparatus and method for endpoint control and plasma monitoring Grant 6,535,779 - Birang , et al. March 18, 2	2003-03-18
Dielectric etch chamber with expanded process window App 20030038111 - Carducci, James D. ; et al.	2003-02-27
Dielectric etch chamber with expanded process window App 20030037880 - Carducci, James D. ; et al.	2003-02-27
Configurable single substrate wet-dry integrated cluster cleaner App 20020189638 - Luscher, Paul E. ; et al.	2002-12-19
Endpoint detection in substrate fabrication processes App 20020183977 - Sui, Zhifeng ; et al.	2002-12-05
Configurable single substrate wet-dry integrated cluster cleaner App 20020062848 - Luscher, Paul E. ; et al.	2002-05-30
Correction of wafer temperature drift in a plasma reactor based upon continuous wafer temperature measurements using an in-situ wafer temperature optical probe App 20020048311 - Norrbakhsh, Hamid ; et al.	2002-04-25
Magnetic barrier for plasma in chamber exhaust App 20010032590 - Carducci, James D. ; et al.	2001-10-25
Magnetic barrier for plasma in chamber exhaust App 20010032591 - Carducci, James D. ; et al.	2001-10-25
Adjusting DC bias voltage in plasma chamber App 20010014540 - Shan, Hongching ; et al.	2001-08-16
Adjusting DC bias voltage in plasma chamber Grant 6,221,782 - Shan , et al. April 24, 2	2001-04-24
Double slit-valve doors for plasma processing Grant 6,192,827 - Welch , et al. February 27, 2	2001-02-27
Thin film processing plasma reactor chamber with radially upward sloping ceiling for promoting radially outward diffusion Grant 6,076,482 - Ding , et al. June 20, 2	2000-06-20
Bandpass photon detector Grant 5,995,235 - Sui , et al. November 30, 1	1999-11-30
Apparatus and method for actively controlling the DC potential of a cathode pedestal Grant 5,737,177 - Mett , et al. April 7, 1	1998-04-07
MBE effusion source with asymmetrical heaters Grant 5,253,266 - Knodle, III , et al. October 12, 1	1993-10-12
Transfer and temperature monitoring apparatus Grant 4,201,152 - Luscher May 6, 1	1980-05-06

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