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Structure And Method For Providing Line End Extensions For Fin-type Active Regions
App 20220223727 - YU; Shao-Ming ; et al. | 2022-07-14 |
Structure and method for providing line end extensions for fin-type active regions
Grant 11,239,365 - Yu , et al. February 1, 2 | 2022-02-01 |
Layout optimization of a main pattern and a cut pattern
Grant 11,126,774 - Chang , et al. September 21, 2 | 2021-09-21 |
Structure And Method For Providing Line End Extensions For Fin-type Active Regions
App 20200212217 - YU; Shao-Ming ; et al. | 2020-07-02 |
Layout Optimization of a Main Pattern and a Cut Pattern
App 20200125784 - Chang; Shih-Ming ; et al. | 2020-04-23 |
Structure and method for providing line end extensions for fin-type active regions
Grant 10,573,751 - Yu , et al. Feb | 2020-02-25 |
Layout optimization of a main pattern and a cut pattern
Grant 10,528,693 - Chang , et al. J | 2020-01-07 |
Method for patterning a plurality of features for fin-like field-effect transistor (FinFET) devices
Grant 10,049,885 - Ng , et al. August 14, 2 | 2018-08-14 |
Photomask and method for fabricating integrated circuit
Grant 9,983,473 - Lin , et al. May 29, 2 | 2018-05-29 |
Structure and method for transistors with line end extension
Grant 9,917,192 - Yu , et al. March 13, 2 | 2018-03-13 |
Cut-mask patterning process for FIN-like field effect transistor (FINFET) device
Grant 9,904,163 - Ho , et al. February 27, 2 | 2018-02-27 |
Lithography alignment marks
Grant 9,823,574 - Chen , et al. November 21, 2 | 2017-11-21 |
Method of lithography process with inserting scattering bars
Grant 9,805,154 - Ho , et al. October 31, 2 | 2017-10-31 |
Structure And Method For Providing Line End Extensions For Fin-type Active Regions
App 20170271503 - YU; Shao-Ming ; et al. | 2017-09-21 |
Photomask And Method For Fabricating Integrated Circuit
App 20170160633 - LIN; Chun-Yu ; et al. | 2017-06-08 |
Structure and method for providing line end extensions for fin-type active regions
Grant 9,673,328 - Yu , et al. June 6, 2 | 2017-06-06 |
Layout Optimization of a Main Pattern and a Cut Pattern
App 20170124243 - Chang; Shih-Ming ; et al. | 2017-05-04 |
Photomask and method for fabricating integrated circuit
Grant 9,612,526 - Lin , et al. April 4, 2 | 2017-04-04 |
Lithography Alignment Marks
App 20170090299 - Chen; Ching-Huang ; et al. | 2017-03-30 |
Method of using a vaporizing spray system to perform a trimming process
Grant 9,595,440 - Chang , et al. March 14, 2 | 2017-03-14 |
Layout optimization of a main pattern and a cut pattern
Grant 9,501,601 - Chang , et al. November 22, 2 | 2016-11-22 |
Method of Lithography Process with Inserting Scattering Bars
App 20160335385 - Ho; Irene ; et al. | 2016-11-17 |
Layer alignment in FinFET fabrication
Grant 9,437,415 - Shieh , et al. September 6, 2 | 2016-09-06 |
Structure And Method For Transistors With Line End Extension
App 20160240675 - Yu; Shao-Ming ; et al. | 2016-08-18 |
Structure And Method For Providing Line End Extensions For Fin-type Active Regions
App 20160163851 - Yu; Shao-Ming ; et al. | 2016-06-09 |
Method for Patterning a Plurality of Features For Fin-Like Field-Effect Transistor (FINFET) Devices
App 20160148815 - Ng; Hoi-Tou ; et al. | 2016-05-26 |
Cut-Mask Patterning Process for FIN-Like Field Effect Transistor (FINFET) Device
App 20160124300 - Ho; Wei-De ; et al. | 2016-05-05 |
Structure and method for transistor with line end extension
Grant 9,324,866 - Yu , et al. April 26, 2 | 2016-04-26 |
Photomask And Method For Fabricating Integrated Circuit
App 20160062226 - LIN; Chun-Yu ; et al. | 2016-03-03 |
Method for patterning a plurality of features for Fin-like field-effect transistor (FinFET) devices
Grant 9,252,021 - Ng , et al. February 2, 2 | 2016-02-02 |
Cut-mask patterning process for fin-like field effect transistor (FinFET) device
Grant 9,236,267 - De , et al. January 12, 2 | 2016-01-12 |
Polygon-based optical proximity correction
Grant 9,189,588 - Cheng , et al. November 17, 2 | 2015-11-17 |
Layer alignment in FinFET fabrication
Grant 9,190,261 - Shieh , et al. November 17, 2 | 2015-11-17 |
Method Of Using A Vaporizing Spray System To Perform A Trimming Process
App 20150187564 - Chang; Ching-Yu ; et al. | 2015-07-02 |
Polygon-based Optical Proximity Correction
App 20150161321 - Cheng; Wen-Li ; et al. | 2015-06-11 |
Structure And Method For Providing Line End Extensions For Fin-type Active Regions
App 20150115373 - Yu; Shao-Ming ; et al. | 2015-04-30 |
Method For Patterning A Plurality Of Features For Fin-like Field-effect Transistor (finfet) Devices
App 20150072527 - Ng; Hoi-Tou ; et al. | 2015-03-12 |
Layout Optimization of a Main Pattern and a Cut Pattern
App 20140264760 - Chang; Shih-Ming ; et al. | 2014-09-18 |
Method of fabricating a semiconductor device
Grant 8,802,569 - Lu , et al. August 12, 2 | 2014-08-12 |
Layer Alignment in FinFET Fabrication
App 20130273750 - Shieh; Ming-Feng ; et al. | 2013-10-17 |
Method Of Fabricating A Semiconductor Device
App 20130244434 - Lu; Kuei-Liang ; et al. | 2013-09-19 |
Cut-mask Patterning Process For Fin-like Field Effect Transistor (finfet) Device
App 20130210232 - De; Ho Wei ; et al. | 2013-08-15 |
Structure And Method For Transistor With Line End Extension
App 20130187237 - Yu; Shao-Ming ; et al. | 2013-07-25 |
Layer Alignment in FinFET Fabrication
App 20130052793 - Shieh; Ming-Feng ; et al. | 2013-02-28 |
Vaporizing Polymer Spray Deposition System
App 20120108040 - Chang; Ching-Yu ; et al. | 2012-05-03 |
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