Patent | Date |
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Phase Change Memory Cell Resistive Liner App 20220310913 - Cheng; Kangguo ;   et al. | 2022-09-29 |
Punch through stopper in bulk finFET device Grant 11,404,560 - Basker , et al. August 2, 2 | 2022-08-02 |
Layout Design for Threshold Voltage Tuning App 20210384139 - ZHOU; Huimei ;   et al. | 2021-12-09 |
Two-stage top source drain epitaxy formation for vertical field effect transistors enabling gate last formation Grant 11,164,787 - Reznicek , et al. November 2, 2 | 2021-11-02 |
Germanium-based Laser Diode App 20210249845 - Liu; Zuoguang ;   et al. | 2021-08-12 |
Self-aligned gate and junction for VTFET Grant 11,075,280 - Liu , et al. July 27, 2 | 2021-07-27 |
Shared contact trench comprising dual silicide layers and dual epitaxial layers for source/drain layers of NFET and PFET devices Grant 11,062,960 - Wu , et al. July 13, 2 | 2021-07-13 |
Two-stage Top Source Drain Epitaxy Formation For Vertical Field Effect Transistors Enabling Gate Last Formation App 20210193527 - Reznicek; Alexander ;   et al. | 2021-06-24 |
Composite spacer enabling uniform doping in recessed fin devices Grant 11,038,041 - Basker , et al. June 15, 2 | 2021-06-15 |
Measurement of top contact resistance in vertical field-effect transistor devices Grant 11,024,738 - Liu , et al. June 1, 2 | 2021-06-01 |
Vertical field effect transistor replacement metal gate fabrication Grant 10,985,073 - Xie , et al. April 20, 2 | 2021-04-20 |
VFET device design for top contact resistance measurement Grant 10,957,605 - Zhang , et al. March 23, 2 | 2021-03-23 |
Fabrication of vertical transport fin field effect transistors with a self-aligned separator and an isolation region with an air gap Grant 10,950,492 - Cheng , et al. March 16, 2 | 2021-03-16 |
Dual silicide liner flow for enabling low contact resistance Grant 10,916,471 - Adusumilli , et al. February 9, 2 | 2021-02-09 |
Vertical Field Effect Transistor Replacement Metal Gate Fabrication App 20210013106 - Xie; Ruilong ;   et al. | 2021-01-14 |
Composite spacer enabling uniform doping in recessed fin devices Grant 10,854,733 - Basker , et al. December 1, 2 | 2020-12-01 |
Self-Aligned Gate and Junction for VTFET App 20200335601 - Liu; Zuoguang ;   et al. | 2020-10-22 |
Fin field effect transistor fabrication and devices having inverted T-shaped gate Grant 10,784,365 - Basker , et al. Sept | 2020-09-22 |
Measurement Of Top Contact Resistance In Vertical Field-effect Transistor Devices App 20200295175 - Liu; Zuoguang ;   et al. | 2020-09-17 |
Punch Through Stopper In Bulk Finfet Device App 20200259002 - A1 | 2020-08-13 |
Wrapped contacts with enhanced area Grant 10,693,007 - Cheng , et al. | 2020-06-23 |
Contact formation in semiconductor devices Grant 10,685,961 - Gluschenkov , et al. | 2020-06-16 |
Extremely thin silicon-on-insulator silicon germanium device without edge strain relaxation Grant 10,658,387 - Cheng , et al. | 2020-05-19 |
Punch through stopper in bulk finFET device Grant 10,629,709 - Basker , et al. | 2020-04-21 |
VFET device design for top contact resistance measurement Grant 10,622,257 - Zhang , et al. | 2020-04-14 |
Contact formation in semiconductor devices Grant 10,586,769 - Gluschenkov , et al. | 2020-03-10 |
Dual Silicide Liner Flow For Enabling Low Contact Resistance App 20200066583 - Adusumilli; Praneet ;   et al. | 2020-02-27 |
Sacrificial cap for forming semiconductor contact Grant 10,573,567 - Adusumilli , et al. Feb | 2020-02-25 |
Shared Contact Trench Comprising Dual Silicide Layers And Dual Epitaxial Layers For Source/drain Layers Of Nfet And Pfet Devices App 20200058562 - Wu; Heng ;   et al. | 2020-02-20 |
Shared Contact Trench Comprising Dual Silicide Layers And Dual Epitaxial Layers For Source/drain Layers Of Nfet And Pfet Devices App 20200058563 - Wu; Heng ;   et al. | 2020-02-20 |
Shared contact trench comprising dual silicide layers and dual epitaxial layers for source/drain layers of NFET and PFET devices Grant 10,566,246 - Wu , et al. Feb | 2020-02-18 |
Fabrication of vertical transport fin field effect transistors with a self-aligned separator and an isolation region with an air gap Grant 10,559,491 - Cheng , et al. Feb | 2020-02-11 |
VFET Device Design for Top Contact Resistance Measurement App 20200035565 - Zhang; Chen ;   et al. | 2020-01-30 |
Dual silicide liner flow for enabling low contact resistance Grant 10,546,776 - Adusumilli , et al. Ja | 2020-01-28 |
CMOS VFET contacts with trench solid and liquid phase epitaxy Grant 10,510,617 - Gluschenkov , et al. Dec | 2019-12-17 |
Embedded bottom metal contact formed by a self-aligned contact process for vertical transistors Grant 10,490,653 - Fan , et al. Nov | 2019-11-26 |
Sacrificial Cap For Forming Semiconductor Contact App 20190341318 - Adusumilli; Praneet ;   et al. | 2019-11-07 |
Formation of a semiconductor device with selective nitride grown on conductor Grant 10,468,412 - Bao , et al. No | 2019-11-05 |
Fabrication Of Vertical Transport Fin Field Effect Transistors With A Self-aligned Separator And An Isolation Region With An Air App 20190311942 - Cheng; Kangguo ;   et al. | 2019-10-10 |
Sacrificial cap for forming semiconductor contact Grant 10,431,503 - Adusumilli , et al. O | 2019-10-01 |
Cmos Vfet Contacts With Trench Solid And Liquid Phase Epitaxy App 20190279913 - GLUSCHENKOV; Oleg ;   et al. | 2019-09-12 |
Low resistance source drain contact formation Grant 10,381,442 - Gluschenkov , et al. A | 2019-08-13 |
Fabrication of vertical transport fin field effect transistors with a self-aligned separator and an isolation region with an air gap Grant 10,381,262 - Cheng , et al. A | 2019-08-13 |
Low-drive current FinFET structure for improving circuit density of ratioed logic in SRAM devices Grant 10,361,210 - Basker , et al. | 2019-07-23 |
Contact Formation In Semiconductor Devices App 20190221565 - Gluschenkov; Oleg ;   et al. | 2019-07-18 |
S/D contact resistance measurement on FinFETs Grant 10,354,930 - Liu , et al. July 16, 2 | 2019-07-16 |
Split fin field effect transistor enabling back bias on fin type field effect transistors Grant 10,347,765 - Basker , et al. July 9, 2 | 2019-07-09 |
Contact formation in semiconductor devices Grant 10,347,581 - Gluschenkov , et al. July 9, 2 | 2019-07-09 |
Extremely thin silicon-on-insulator silicon germanium device without edge strain relaxation Grant 10,340,292 - Cheng , et al. | 2019-07-02 |
VFET Device Design for Top Contact Resistance Measurement App 20190189520 - Zhang; Chen ;   et al. | 2019-06-20 |
Low Resistance Source Drain Contact Formation with Trench Metastable Alloys and Laser Annealing App 20190181012 - Gluschenkov; Oleg ;   et al. | 2019-06-13 |
Contact formation in semiconductor devices Grant 10,319,722 - Gluschenkov , et al. | 2019-06-11 |
Embedded bottom metal contact formed by a self-aligned contact process for vertical transistors Grant 10,319,835 - Fan , et al. | 2019-06-11 |
Fin field effect transistor fabrication and devices having inverted T-shaped gate Grant 10,319,840 - Basker , et al. | 2019-06-11 |
Laser spike annealing for solid phase epitaxy and low contact resistance in an SRAM with a shared pFET and nFET trench Grant 10,312,245 - Liu , et al. | 2019-06-04 |
Fin Field Effect Transistor Fabrication And Devices Having Inverted T-shaped Gate App 20190165142 - Basker; Veeraraghavan S. ;   et al. | 2019-05-30 |
Contact Formation In Semiconductor Devices App 20190148299 - Gluschenkov; Oleg ;   et al. | 2019-05-16 |
Semiconductor device including enhanced low-k spacer Grant 10,256,321 - Cheng , et al. | 2019-04-09 |
Self-aligned doping in source/drain regions for low contact resistance Grant 10,249,542 - Guo , et al. | 2019-04-02 |
Low resistance source drain contact formation with trench metastable alloys and laser annealing Grant 10,249,502 - Gluschenkov , et al. | 2019-04-02 |
Pure boron for silicide contact Grant 10,229,982 - Chen , et al. | 2019-03-12 |
Epitaxial and silicide layer formation at top and bottom surfaces of semiconductor fins Grant 10,229,987 - Cheng , et al. | 2019-03-12 |
Wrapped source/drain contacts with enhanced area Grant 10,224,431 - Cheng , et al. | 2019-03-05 |
Fin field effect transistor fabrication and devices having inverted T-shaped gate Grant 10,224,417 - Basker , et al. | 2019-03-05 |
Punch through stopper in bulk finFET device Grant 10,224,420 - Basker , et al. | 2019-03-05 |
Airgap spacers Grant 10,217,868 - Cheng , et al. Feb | 2019-02-26 |
Low resistance source/drain contacts for complementary metal oxide semiconductor (CMOS) devices Grant 10,211,207 - Adusumilli , et al. Feb | 2019-02-19 |
Extremely Thin Silicon-on-insulator Silicon Germanium Device Without Edge Strain Relaxation App 20190019811 - CHENG; Kangguo ;   et al. | 2019-01-17 |
Laser Spike Annealing For Solid Phase Epitaxy And Low Contact Resistance In An Sram With A Shared Pfet And Nfet Trench App 20190019796 - LIU; ZUOGUANG ;   et al. | 2019-01-17 |
Punch through stopper in bulk finFET device Grant 10,170,594 - Basker , et al. J | 2019-01-01 |
Fabrication of vertical doped fins for complementary metal oxide semiconductor field effect transistors Grant 10,170,479 - Cheng , et al. J | 2019-01-01 |
Finfet including improved epitaxial topology Grant 10,164,110 - Basker , et al. Dec | 2018-12-25 |
Epitaxial and silicide layer formation at top and bottom surfaces of semiconductor fins Grant 10,158,003 - Cheng , et al. Dec | 2018-12-18 |
Punch Through Stopper In Bulk Finfet Device App 20180350959 - Basker; Veeraraghavan S. ;   et al. | 2018-12-06 |
Wrapped Source/drain Contacts With Enhanced Area App 20180350991 - Cheng; Kangguo ;   et al. | 2018-12-06 |
Low resistance source/drain contacts for complementary metal oxide semiconductor (CMOS) devices Grant 10,141,308 - Adusumilli , et al. Nov | 2018-11-27 |
Embedded Bottom Metal Contact Formed By A Self-aligned Contact Process For Vertical Transistors App 20180337260 - Fan; Su Chen ;   et al. | 2018-11-22 |
Embedded Bottom Metal Contact Formed By A Self-aligned Contact Process For Vertical Transistors App 20180337257 - Fan; Su Chen ;   et al. | 2018-11-22 |
Nanowire semiconductor device including lateral-etch barrier region Grant 10,134,864 - Basker , et al. November 20, 2 | 2018-11-20 |
Nanowire semiconductor device including lateral-etch barrier region Grant 10,128,335 - Basker , et al. November 13, 2 | 2018-11-13 |
Self-aligned Spacer For Cut-last Transistor Fabrication App 20180323280 - Bao; Ruqiang ;   et al. | 2018-11-08 |
Laser Spike Annealing For Solid Phase Epitaxy And Low Contact Resistance In An Sram With A Shared Pfet And Nfet Trench App 20180315761 - Liu; Zuoguang ;   et al. | 2018-11-01 |
Extremely thin silicon-on-insulator silicon germanium device without edge strain relaxation Grant 10,115,805 - Cheng , et al. October 30, 2 | 2018-10-30 |
Laser spike annealing for solid phase epitaxy and low contact resistance in an SRAM with a shared PFET and NFET trench Grant 10,115,728 - Liu , et al. October 30, 2 | 2018-10-30 |
Forming a contact for a semiconductor device Grant 10,115,824 - Gluschenkov , et al. October 30, 2 | 2018-10-30 |
Fabrication Of Vertical Transport Fin Field Effect Transistors With A Self-aligned Separator And An Isolation Region With An Air Gap App 20180308743 - Cheng; Kangguo ;   et al. | 2018-10-25 |
Fabrication Of Vertical Transport Fin Field Effect Transistors With A Self-aligned Separator And An Isolation Region With An Air Gap App 20180308742 - Cheng; Kangguo ;   et al. | 2018-10-25 |
Punch through stopper in bulk FinFET device Grant 10,109,723 - Basker , et al. October 23, 2 | 2018-10-23 |
Punch through stopper in bulk finFET device Grant 10,103,251 - Basker , et al. October 16, 2 | 2018-10-16 |
Contact Formation In Semiconductor Devices App 20180277483 - Gluschenkov; Oleg ;   et al. | 2018-09-27 |
Contact Formation In Semiconductor Devices App 20180277541 - Gluschenkov; Oleg ;   et al. | 2018-09-27 |
Wrapped source/drain contacts with enhanced area Grant 10,084,094 - Cheng , et al. September 25, 2 | 2018-09-25 |
Punch through stopper in bulk finFET device Grant 10,084,070 - Basker , et al. September 25, 2 | 2018-09-25 |
Wrapped Source/drain Contacts With Enhanced Area App 20180269324 - Cheng; Kangguo ;   et al. | 2018-09-20 |
Wrapped Source/drain Contacts With Enhanced Area App 20180269325 - Cheng; Kangguo ;   et al. | 2018-09-20 |
Low Resistance Source/drain Contacts For Complementary Metal Oxide Semiconductor (cmos) Devices App 20180261598 - Adusumilli; Praneet ;   et al. | 2018-09-13 |
Low Resistance Source/drain Contacts For Complementary Metal Oxide Semiconductor (cmos) Devices App 20180261597 - Adusumilli; Praneet ;   et al. | 2018-09-13 |
Self-aligned spacer for cut-last transistor fabrication Grant 10,068,805 - Bao , et al. September 4, 2 | 2018-09-04 |
Composite Spacer Enabling Uniform Doping In Recessed Fin Devices App 20180248017 - Basker; Veeraraghavan S. ;   et al. | 2018-08-30 |
Low Resistance Source Drain Contact Formation App 20180240875 - Gluschenkov; Oleg ;   et al. | 2018-08-23 |
Fabrication of vertical transport fin field effect transistors with a self-aligned separator and an isolation region with an air gap Grant 10,056,289 - Cheng , et al. August 21, 2 | 2018-08-21 |
Silicon nitride fill for PC gap regions to increase cell density Grant 10,056,378 - Guo , et al. August 21, 2 | 2018-08-21 |
Method and structure to fabricate closely packed hybrid nanowires at scaled pitch Grant 10,032,677 - Basker , et al. July 24, 2 | 2018-07-24 |
Self-aligned doping in source/drain regions for low contact resistance Grant 10,032,679 - Guo , et al. July 24, 2 | 2018-07-24 |
Self-aligned Doping In Source/drain Regions For Low Contact Resistance App 20180197792 - Guo; Dechao ;   et al. | 2018-07-12 |
Self-aligned Doping In Source/drain Regions For Low Contact Resistance App 20180197793 - Guo; Dechao ;   et al. | 2018-07-12 |
Embedded bottom metal contact formed by a self-aligned contact process for vertical transistors Grant 10,020,381 - Fan , et al. July 10, 2 | 2018-07-10 |
Airgap spacers Grant 10,020,400 - Cheng , et al. July 10, 2 | 2018-07-10 |
Self-aligned spacer for cut-last transistor fabrication Grant 10,020,378 - Bao , et al. July 10, 2 | 2018-07-10 |
Top contact resistance measurement in vertical FETs Grant 10,002,809 - Cheng , et al. June 19, 2 | 2018-06-19 |
Composite spacer enabling uniform doping in recessed fin devices Grant 10,002,945 - Basker , et al. June 19, 2 | 2018-06-19 |
Nanowire semiconductor device including lateral-etch barrier region Grant 10,002,921 - Basker , et al. June 19, 2 | 2018-06-19 |
Low resistance dual liner contacts for fin field-effect transistors (FinFETs) Grant 9,997,416 - Adusumilli , et al. June 12, 2 | 2018-06-12 |
Top contact resistance measurement in vertical FETS Grant 9,997,421 - Cheng , et al. June 12, 2 | 2018-06-12 |
Implantation formed metal-insulator-semiconductor (MIS) contacts Grant 9,997,609 - Chen , et al. June 12, 2 | 2018-06-12 |
Implantation formed metal-insulator-semiconductor (MIS) contacts Grant 9,991,355 - Chen , et al. June 5, 2 | 2018-06-05 |
Low resistance source/drain contacts for complementary metal oxide semiconductor (CMOS) devices Grant 9,978,750 - Adusumilli , et al. May 22, 2 | 2018-05-22 |
Low resistance source drain contact formation Grant 9,972,682 - Gluschenkov , et al. May 15, 2 | 2018-05-15 |
Fin Field Effect Transistor Fabrication And Devices Having Inverted T-shaped Gate App 20180122923 - Basker; Veeraraghavan S. ;   et al. | 2018-05-03 |
Forming A Contact For A Semiconductor Device App 20180114861 - Gluschenkov; Oleg ;   et al. | 2018-04-26 |
Split Fin Field Effect Transistor Enabling Back Bias On Fin Type Field Effect Transistors App 20180108772 - Basker; Veeraraghavan S. ;   et al. | 2018-04-19 |
Nanowire semiconductor device including lateral-etch barrier region Grant 9,947,744 - Basker , et al. April 17, 2 | 2018-04-17 |
Tunneling fin type field effect transistor with epitaxial source and drain regions Grant 9,947,586 - Basker , et al. April 17, 2 | 2018-04-17 |
Self-aligned Spacer For Cut-last Transistor Fabrication App 20180083120 - Bao; Ruqiang ;   et al. | 2018-03-22 |
Sacrificial Cap For Forming Semiconductor Contact App 20180082909 - Adusumilli; Praneet ;   et al. | 2018-03-22 |
Self-aligned Spacer For Cut-last Transistor Fabrication App 20180082905 - Bao; Ruqiang ;   et al. | 2018-03-22 |
Pure boron for silicide contact Grant 9,923,074 - Chen , et al. March 20, 2 | 2018-03-20 |
Epitaxial And Silicide Layer Formation At Top And Bottom Surfaces Of Semiconductor Fins App 20180076299 - Cheng; Kangguo ;   et al. | 2018-03-15 |
Forming a contact for a semiconductor device Grant 9,917,060 - Gluschenkov , et al. March 13, 2 | 2018-03-13 |
Silicon Nitride Fill For Pc Gap Regions To Increase Cell Density App 20180069002 - Guo; Dechao ;   et al. | 2018-03-08 |
Extremely Thin Silicon-on-insulator Silicon Germanium Device Without Edge Strain Relaxation App 20180069024 - CHENG; Kangguo ;   et al. | 2018-03-08 |
Composite Spacer Enabling Uniform Doping In Recessed Fin Devices App 20180061966 - Basker; Veeraraghavan S. ;   et al. | 2018-03-01 |
Semiconductor Device Including Enhanced Low-k Spacer App 20180053830 - Cheng; Kangguo ;   et al. | 2018-02-22 |
Split fin field effect transistor enabling back bias on fin type field effect transistors Grant 9,899,524 - Basker , et al. February 20, 2 | 2018-02-20 |
Increased contact area for finFETs Grant 9,899,525 - Basker , et al. February 20, 2 | 2018-02-20 |
Fin field effect transistor fabrication and devices having inverted T-shaped gate Grant 9,893,171 - Basker , et al. February 13, 2 | 2018-02-13 |
Epitaxial and silicide layer formation at top and bottom surfaces of semiconductor fins Grant 9,882,024 - Cheng , et al. January 30, 2 | 2018-01-30 |
Top Contact Resistance Measurement In Vertical Fets App 20180025950 - Cheng; Kangguo ;   et al. | 2018-01-25 |
Top Contact Resistance Measurement In Vertical Fets App 20180025954 - Cheng; Kangguo ;   et al. | 2018-01-25 |
Punch Through Stopper In Bulk Finfet Device App 20180026120 - Basker; Veeraraghavan S. ;   et al. | 2018-01-25 |
Fabrication of vertical doped fins for complementary metal oxide semiconductor field effect transistors Grant 9,871,041 - Cheng , et al. January 16, 2 | 2018-01-16 |
Forming CMOSFET structures with different contact liners Grant 9,870,958 - Cheng , et al. January 16, 2 | 2018-01-16 |
Method and structure to fabricate closely packed hybrid nanowires at scaled pitch Grant 9,865,508 - Basker , et al. January 9, 2 | 2018-01-09 |
Fabrication Of Vertical Doped Fins For Complementary Metal Oxide Semiconductor Field Effect Transistors App 20180006036 - Cheng; Kangguo ;   et al. | 2018-01-04 |
Fabrication Of Vertical Doped Fins For Complementary Metal Oxide Semiconductor Field Effect Transistors App 20180006037 - Cheng; Kangguo ;   et al. | 2018-01-04 |
Silicon nitride fill for PC gap regions to increase cell density Grant 9,859,275 - Guo , et al. January 2, 2 | 2018-01-02 |
Low-drive current FinFET structure for improving circuit density of ratioed logic in SRAM devices Grant 9,859,286 - Basker , et al. January 2, 2 | 2018-01-02 |
Dual FIN integration for electron and hole mobility enhancement Grant 9,859,281 - Chen , et al. January 2, 2 | 2018-01-02 |
Formation Of A Semiconductor Device With Selective Nitride Grown On Conductor App 20170373063 - Bao; Ruqiang ;   et al. | 2017-12-28 |
Extremely thin silicon-on-insulator silicon germanium device without edge strain relaxation Grant 9,853,054 - Cheng , et al. December 26, 2 | 2017-12-26 |
Self aligned epitaxial based punch through control Grant 9,853,159 - Basker , et al. December 26, 2 | 2017-12-26 |
Method and structure for multigate FinFet device epi-extension junction control by hydrogen treatment Grant 9,853,158 - Basker , et al. December 26, 2 | 2017-12-26 |
Airgap Spacers App 20170358673 - Cheng; Kangguo ;   et al. | 2017-12-14 |
Fin Field Effect Transistor Fabrication And Devices Having Inverted T-shaped Gate App 20170352659 - Basker; Veeraraghavan S. ;   et al. | 2017-12-07 |
Fin Field Effect Transistor Fabrication And Devices Having Inverted T-shaped Gate App 20170352744 - Basker; Veeraraghavan S. ;   et al. | 2017-12-07 |
LOW RESISTANCE DUAL LINER CONTACTS FOR FIN FIELD-EFFECT TRANSISTORS (FinFETs) App 20170352597 - Adusumilli; Praneet ;   et al. | 2017-12-07 |
Split Fin Field Effect Transistor Enabling Back Bias On Fin Type Field Effect Transistors App 20170323944 - Basker; Veeraraghavan S. ;   et al. | 2017-11-09 |
Punch Through Stopper In Bulk Finfet Device App 20170323956 - Basker; Veeraraghavan S. ;   et al. | 2017-11-09 |
Split Fin Field Effect Transistor Enabling Back Bias On Fin Type Field Effect Transistors App 20170323964 - Basker; Veeraraghavan S. ;   et al. | 2017-11-09 |
Vehicle body and manufacturing method Grant 9,809,233 - Kendall , et al. November 7, 2 | 2017-11-07 |
Dual silicide liner flow for enabling low contact resistance Grant 9,805,973 - Adusumilli , et al. October 31, 2 | 2017-10-31 |
Split fin field effect transistor enabling back bias on fin type field effect transistors Grant 9,806,155 - Basker , et al. October 31, 2 | 2017-10-31 |
Sacrificial cap for forming semiconductor contact Grant 9,805,989 - Adusumilli , et al. October 31, 2 | 2017-10-31 |
S/d Contact Resistance Measurement On Finfets App 20170307667 - Liu; Zuoguang ;   et al. | 2017-10-26 |
Self Aligned Epitaxial Based Punch Through Control App 20170301786 - Basker; Veeraraghavan S. ;   et al. | 2017-10-19 |
Pure Boron For Silicide Contact App 20170288036 - Chen; Chia-Yu ;   et al. | 2017-10-05 |
Pure Boron For Silicide Contact App 20170288035 - Chen; Chia-Yu ;   et al. | 2017-10-05 |
Forming CMOSFET structures with different contact liners Grant 9,773,709 - Cheng , et al. September 26, 2 | 2017-09-26 |
Low resistance dual liner contacts for Fin Field-Effect Transistors (FinFETs) Grant 9,768,077 - Adusumilli , et al. September 19, 2 | 2017-09-19 |
FinFET having controlled dielectric region height Grant 9,768,027 - Guo , et al. September 19, 2 | 2017-09-19 |
Top contact resistance measurement in vertical FETs Grant 9,768,085 - Cheng , et al. September 19, 2 | 2017-09-19 |
Increased Contact Area For Finfets App 20170250285 - Basker; Veeraraghavan S. ;   et al. | 2017-08-31 |
Airgap Spacers App 20170243968 - Cheng; Kangguo ;   et al. | 2017-08-24 |
Pure boron for silicide contact Grant 9,741,813 - Chen , et al. August 22, 2 | 2017-08-22 |
Tunneling Fin Type Field Effect Transistor With Epitaxial Source And Drain Regions App 20170236755 - Basker; Veeraraghavan S. ;   et al. | 2017-08-17 |
Pure boron for silicide contact Grant 9,735,248 - Chen , et al. August 15, 2 | 2017-08-15 |
Nanowire Semiconductor Device Including Lateral-etch Barrier Region App 20170229553 - Basker; Veeraraghavan S. ;   et al. | 2017-08-10 |
Dual fin integration for electron and hole mobility enhancement Grant 9,728,537 - Chen , et al. August 8, 2 | 2017-08-08 |
Nanowire Semiconductor Device Including Lateral-etch Barrier Region App 20170221991 - Basker; Veeraraghavan S. ;   et al. | 2017-08-03 |
Low Resistance Source Drain Contact Formation App 20170213889 - Gluschenkov; Oleg ;   et al. | 2017-07-27 |
Low Resistance Source Drain Contact Formation with Trench Metastable Alloys and Laser Annealing App 20170213739 - Gluschenkov; Oleg ;   et al. | 2017-07-27 |
Method and structure for multigate FinFET device epi-extension junction control by hydrogen treatment Grant 9,711,645 - Basker , et al. July 18, 2 | 2017-07-18 |
Dual fin integration for electron and hole mobility enhancement Grant 9,704,867 - Chen , et al. July 11, 2 | 2017-07-11 |
Self-aligned spacer for cut-last transistor fabrication Grant 9,704,754 - Bao , et al. July 11, 2 | 2017-07-11 |
Extremely Thin Silicon-on-insulator Silicon Germanium Device Without Edge Strain Relaxation App 20170186854 - CHENG; Kangguo ;   et al. | 2017-06-29 |
Extremely Thin Silicon-on-insulator Silicon Germanium Device Without Edge Strain Relaxation App 20170170195 - CHENG; Kangguo ;   et al. | 2017-06-15 |
Method and Structure to Fabricate Closely Packed Hybrid Nanowires at Scaled Pitch App 20170170073 - Basker; Veeraraghavan S. ;   et al. | 2017-06-15 |
Extremely Thin Silicon-on-insulator Silicon Germanium Device Without Edge Strain Relaxation App 20170170197 - CHENG; Kangguo ;   et al. | 2017-06-15 |
Increased contact area for FinFETs Grant 9,680,020 - Basker , et al. June 13, 2 | 2017-06-13 |
Airgap spacers Grant 9,673,293 - Cheng , et al. June 6, 2 | 2017-06-06 |
Extremely thin silicon-on-insulator silicon germanium device without edge strain relaxation Grant 9,659,960 - Cheng , et al. May 23, 2 | 2017-05-23 |
Silicon nanowire formation in replacement metal gate process Grant 9,647,062 - Chen , et al. May 9, 2 | 2017-05-09 |
Dual Silicide Liner Flow For Enabling Low Contact Resistance App 20170125306 - Adusumilli; Praneet ;   et al. | 2017-05-04 |
Dual Silicide Liner Flow For Enabling Low Contact Resistance App 20170125289 - Adusumilli; Praneet ;   et al. | 2017-05-04 |
Dual Silicide Liner Flow For Enabling Low Contact Resistance App 20170125338 - Adusumilli; Praneet ;   et al. | 2017-05-04 |
Composite spacer enabling uniform doping in recessed fin devices Grant 9,620,644 - Basker , et al. April 11, 2 | 2017-04-11 |
Self aligned epitaxial based punch through control Grant 9,608,069 - Basker , et al. March 28, 2 | 2017-03-28 |
Method and structure to fabricate closely packed hybrid nanowires at scaled pitch Grant 9,607,900 - Basker , et al. March 28, 2 | 2017-03-28 |
Semiconductor device including dual spacer and uniform epitaxial buffer interface of embedded SiGe source/drain Grant 9,601,621 - Basker , et al. March 21, 2 | 2017-03-21 |
Punch Through Stopper In Bulk Finfet Device App 20170077268 - Basker; Veeraraghavan S. ;   et al. | 2017-03-16 |
Epitaxial And Silicide Layer Formation At Top And Bottom Surfaces Of Semiconductor Fins App 20170077266 - Cheng; Kangguo ;   et al. | 2017-03-16 |
Method and Structure to Fabricate Closely Packed Hybrid Nanowires at Scaled Pitch App 20170077264 - Basker; Veeraraghavan S. ;   et al. | 2017-03-16 |
Method And Structure To Fabricate Closely Packed Hybrid Nanowires At Scaled Pitch App 20170076990 - Basker; Veeraraghavan S. ;   et al. | 2017-03-16 |
Semiconductor device including dual spacer and uniform epitaxial buffer interface of embedded SiGe source/drain Grant 9,595,597 - Basker , et al. March 14, 2 | 2017-03-14 |
Composite Spacer Enabling Uniform Doping In Recessed Fin Devices App 20170062584 - Basker; Veeraraghavan S. ;   et al. | 2017-03-02 |
Semiconductor Device Including Dual Spacer And Uniform Epitaxial Buffer Interface Of Embedded Sige Source/drain App 20170062588 - Basker; Veeraraghavan S. ;   et al. | 2017-03-02 |
Semiconductor Device Including Dual Spacer And Uniform Epitaxial Buffer Interface Of Embedded Sige Source/drain App 20170062614 - Basker; Veeraraghavan S. ;   et al. | 2017-03-02 |
Composite Spacer Enabling Uniform Doping In Recessed Fin Devices App 20170062601 - Basker; Veeraraghavan S. ;   et al. | 2017-03-02 |
Forming Cmosfet Structures With Different Contact Liners App 20170053837 - Cheng; Kangguo ;   et al. | 2017-02-23 |
Forming Cmosfet Structures With Different Contact Liners App 20170053918 - Cheng; Kangguo ;   et al. | 2017-02-23 |
Epitaxial And Silicide Layer Formation At Top And Bottom Surfaces Of Semiconductor Fins App 20170047411 - Cheng; Kangguo ;   et al. | 2017-02-16 |
Recessed metal liner contact with copper fill Grant 9,570,574 - Adusumilli , et al. February 14, 2 | 2017-02-14 |
Pure Boron For Silicide Contact App 20170033188 - Chen; Chia-Yu ;   et al. | 2017-02-02 |
Pure Boron For Silicide Contact App 20170033193 - Chen; Chia-Yu ;   et al. | 2017-02-02 |
Punch through stopper in bulk finFET device Grant 9,559,191 - Basker , et al. January 31, 2 | 2017-01-31 |
Increased Contact Area For Finfets App 20170012129 - Basker; Veeraraghavan S. ;   et al. | 2017-01-12 |
Nanowire Semiconductor Device Including Lateral-etch Barrier Region App 20160380054 - Basker; Veeraraghavan S. ;   et al. | 2016-12-29 |
Nanowire Semiconductor Device Including Lateral-etch Barrier Region App 20160380083 - Basker; Veeraraghavan S. ;   et al. | 2016-12-29 |
Punch Through Stopper In Bulk Finfet Device App 20160372589 - Basker; Veeraraghavan S. ;   et al. | 2016-12-22 |
Symmetrical extension junction formation with low-k spacer and dual epitaxial process in finFET device Grant 9,525,048 - Basker , et al. December 20, 2 | 2016-12-20 |
Punch Through Stopper In Bulk Finfet Device App 20160365432 - Basker; Veeraraghavan S. ;   et al. | 2016-12-15 |
Forming CMOSFET structures with different contact liners Grant 9,520,363 - Cheng , et al. December 13, 2 | 2016-12-13 |
3D fin tunneling field effect transistor Grant 9,508,597 - Liu , et al. November 29, 2 | 2016-11-29 |
Nanowire semiconductor device including lateral-etch barrier region Grant 9,502,523 - Basker , et al. November 22, 2 | 2016-11-22 |
Forming CMOSFET structures with different contact liners Grant 9,502,309 - Cheng , et al. November 22, 2 | 2016-11-22 |
Dual Fin Integration For Electron And Hole Mobility Enhancement App 20160336322 - Chen; Chia-Yu ;   et al. | 2016-11-17 |
Dual Fin Integration For Electron And Hole Mobility Enhancement App 20160336236 - Chen; Chia-Yu ;   et al. | 2016-11-17 |
Dual Fin Integration For Electron And Hole Mobility Enhancement App 20160336321 - Chen; Chia-Yu ;   et al. | 2016-11-17 |
Recessed metal liner contact with copper fill Grant 9,496,225 - Adusumilli , et al. November 15, 2 | 2016-11-15 |
Pure boron for silicide contact Grant 9,484,431 - Chen , et al. November 1, 2 | 2016-11-01 |
Pure boron for silicide contact Grant 9,484,256 - Chen , et al. November 1, 2 | 2016-11-01 |
Method And Structure For Multigate Finfet Device Epi-extension Junction Control By Hydrogen Treatment App 20160315183 - Basker; Veeraraghavan S. ;   et al. | 2016-10-27 |
Finfet Having Controlled Dielectric Region Height App 20160314976 - Guo; Dechao ;   et al. | 2016-10-27 |
Symmetrical Extension Junction Formation With Low-k Spacer And Dual Epitaxial Process In Finfet Device App 20160284820 - Basker; Veeraraghavan S. ;   et al. | 2016-09-29 |
Nanowire semiconductor device including lateral-etch barrier region Grant 9,455,317 - Basker , et al. September 27, 2 | 2016-09-27 |
Semiconductor device including merged-unmerged work function metal and variable fin pitch Grant 9,437,499 - Basker , et al. September 6, 2 | 2016-09-06 |
Dual fin integration for electron and hole mobility enhancement Grant 9,437,445 - Chen , et al. September 6, 2 | 2016-09-06 |
Finfet Having Controlled Dielectric Region Height App 20160254178 - Guo; Dechao ;   et al. | 2016-09-01 |
Dual Fin Integration For Electron And Hole Mobility Enhancement App 20160247685 - Chen; Chia-Yu ;   et al. | 2016-08-25 |
Shallow trench isolation for end fin variation control Grant 9,412,643 - Basker , et al. August 9, 2 | 2016-08-09 |
Silicon Nitride Fill For Pc Gap Regions To Increase Cell Density App 20160218102 - Guo; Dechao ;   et al. | 2016-07-28 |
Implantation Formed Metal-insulator-semiconductor (mis) Contacts App 20160211343 - Chen; Chia-Yu ;   et al. | 2016-07-21 |
Implantation Formed Metal-insulator-semiconductor (mis) Contacts App 20160211340 - Chen; Chia-Yu ;   et al. | 2016-07-21 |
Implantation Formed Metal-insulator-semiconductor (mis) Contacts App 20160211342 - Chen; Chia-Yu ;   et al. | 2016-07-21 |
Forming wrap-around silicide contact on finFET Grant 9,397,197 - Guo , et al. July 19, 2 | 2016-07-19 |
Implantation formed metal-insulator-semiconductor (MIS) contacts Grant 9,391,152 - Chen , et al. July 12, 2 | 2016-07-12 |
Low-drive Current Finfet Structure For Improving Circuit Density Of Ratioed Logic In Sram Devices App 20160181254 - Basker; Veeraraghavan S. ;   et al. | 2016-06-23 |
Low-drive Current Finfet Structure For Improving Circuit Density Of Ratioed Logic In Sram Devices App 20160181256 - Basker; Veeraraghavan S. ;   et al. | 2016-06-23 |
Symmetrical extension junction formation with low-K spacer and dual epitaxial process in FinFET device Grant 9,362,407 - Basker , et al. June 7, 2 | 2016-06-07 |
Silicon nanowire formation in replacement metal gate process Grant 9,331,146 - Chen , et al. May 3, 2 | 2016-05-03 |
Forming wrap-around silicide contact on finFET Grant 9,318,581 - Guo , et al. April 19, 2 | 2016-04-19 |
Finfet Including Improved Epitaxial Topology App 20160049515 - Basker; Veeraraghavan S. ;   et al. | 2016-02-18 |
Finfet including improved epitaxial topology Grant 9,257,537 - Basker , et al. February 9, 2 | 2016-02-09 |
Shallow trench isolation for end fin variation control Grant 9,252,044 - Basker , et al. February 2, 2 | 2016-02-02 |
Independent gate vertical FinFET structure Grant 9,252,145 - Basker , et al. February 2, 2 | 2016-02-02 |
Silicon Nanowire Formation In Replacement Metal Gate Process App 20150364543 - Chen; Chia-Yu ;   et al. | 2015-12-17 |
Silicon Nanowire Formation In Replacement Metal Gate Process App 20150364544 - Chen; Chia-Yu ;   et al. | 2015-12-17 |
Semiconductor Device Including Merged-unmerged Work Function Metal And Variable Fin Pitch App 20150357246 - Basker; Veeraraghavan S. ;   et al. | 2015-12-10 |
Semiconductor device including merged-unmerged work function metal and variable fin pitch Grant 9,196,612 - Basker , et al. November 24, 2 | 2015-11-24 |
Independent gate vertical FinFET structure Grant 9,190,466 - Basker , et al. November 17, 2 | 2015-11-17 |
Independent Gate Vertical Finfet Structure App 20150325576 - Basker; Veeraraghavan S. ;   et al. | 2015-11-12 |
Dual silicide regions and method for forming the same Grant 9,177,810 - Basker , et al. November 3, 2 | 2015-11-03 |
Punch Through Stopper In Bulk Finfet Device App 20150303284 - Basker; Veeraraghavan S. ;   et al. | 2015-10-22 |
Semiconductor Device Including Merged-unmerged Work Function Metal And Variable Fin Pitch App 20150279839 - Basker; Veeraraghavan S. ;   et al. | 2015-10-01 |
Shallow Trench Isolation For End Fin Variation Control App 20150270158 - Basker; Veeraraghavan S. ;   et al. | 2015-09-24 |
Shallow Trench Isolation For End Fin Variation Control App 20150270264 - Basker; Veeraraghavan S. ;   et al. | 2015-09-24 |
Dual Silicide Regions And Method For Forming The Same App 20150214058 - Basker; Veeraraghavan S. ;   et al. | 2015-07-30 |
Finfet Including Improved Epitaxial Topology App 20150187914 - Basker; Veeraraghavan S. ;   et al. | 2015-07-02 |
Independent Gate Vertical Finfet Structure App 20150187867 - Basker; Veeraraghavan S. ;   et al. | 2015-07-02 |
Method And Structure For Multigate Finfet Device Epi-extension Junction Control By Hydrogen Treatment App 20150187577 - Basker; Veeraraghavan S. ;   et al. | 2015-07-02 |
Vehicle Body And Manufacturing Method App 20150000556 - Kendall; Harold ;   et al. | 2015-01-01 |