Lin; Yih-Ann

Patent Applications and Registrations

Patent applications and USPTO patent grants for Lin; Yih-Ann.The latest application filed is for "air spacers around contact plugs and method forming same".

Company Profile

16.55.53

Lin; Yih-Ann - Jhudong Township TW
Lin; Yih-Ann - Hsinchu County TW
Lin; Yih-Ann - Jhudong Township, Hsinchu County N/A TW
Lin; Yih-Ann - Taipei TW
Lin, Yih-Ann - Taipei City TW

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Air Spacers Around Contact Plugs and Method Forming Same App 20220310820 - Huang; Chen-Huang ; et al.	2022-09-29
Method Of Forming A Single Metal That Performs N Work Function And P Work Function In A High-k/metal Gate Process App 20220216205 - Lin; Yih-Ann ; et al.	2022-07-07
Air spacers around contact plugs and method forming same Grant 11,355,616 - Huang , et al. June 7, 2	2022-06-07
Single metal that performs N work function and P work function in a high-K/metal gate Grant 11,289,481 - Lin , et al. March 29, 2	2022-03-29
FinFET Device App 20210376141 - Lin; Chia Tai ; et al.	2021-12-02
Residue removal in metal gate cutting process Grant 11,145,752 - Feng , et al. October 12, 2	2021-10-12
V-shape recess profile for embedded source/drain epitaxy Grant 11,121,255 - Li , et al. September 14, 2	2021-09-14
FinFET device with fins of non-uniform width Grant 11,094,825 - Lin , et al. August 17, 2	2021-08-17
Methods for Forming Fin Field-Effect Transistors App 20210242088 - Chen; Ryan Chia-Jen ; et al.	2021-08-05
Self-Aligned Contact Air Gap Formation App 20210183996 - Lee; Kai-Hsuan ; et al.	2021-06-17
Fin Field-Effect Transistor Devices and Methods of Forming the Same App 20210159123 - Hung; Chih-Chang ; et al.	2021-05-27
Air Spacers Around Contact Plugs and Method Forming Same App 20210134973 - Huang; Chen-Huang ; et al.	2021-05-06
Methods for forming fin field-effect transistors Grant 10,991,627 - Chen , et al. April 27, 2	2021-04-27
Methods for forming Fin field-effect transistors Grant 10,957,600 - Chen , et al. March 23, 2	2021-03-23
Residue Removal in Metal Gate Cutting Process App 20210083072 - Feng; Chieh-Ning ; et al.	2021-03-18
Self-aligned contact air gap formation Grant 10,923,565 - Lee , et al. February 16, 2	2021-02-16
Fin field-effect transistor devices and methods of forming the same Grant 10,916,477 - Hung , et al. February 9, 2	2021-02-09
FinFET Device App 20200279945 - Lin; Chia Tai ; et al.	2020-09-03
V-shape recess profile for embedded source/drain epitaxy Grant 10,763,366 - Li , et al. Sep	2020-09-01
V-Shape Recess Profile for Embedded Source/Drain Epitaxy App 20200273993 - Li; Chii-Horng ; et al.	2020-08-27
Method of forming an integrated circuit using a patterned mask layer Grant 10,665,457 - Hsieh , et al.	2020-05-26
FinFET device Grant 10,658,509 - Lin , et al.	2020-05-19
V-shape recess profile for embedded source/drain epitaxy Grant 10,651,309 - Li , et al.	2020-05-12
Self-Aligned Contact Air Gap Formation App 20200105867 - Lee; Kai-Hsuan ; et al.	2020-04-02
Fin Field-Effect Transistor Devices and Methods of Forming the Same App 20200105613 - Hung; Chih-Chang ; et al.	2020-04-02
V-Shape Recess Profile for Embedded Source/Drain Epitaxy App 20200052121 - Li; Chii-Horng ; et al.	2020-02-13
Methods for Forming Fin Field-Effect Transistors App 20200043797 - Chen; Ryan Chia-Jen ; et al.	2020-02-06
V-shape Recess Profile For Embedded Source/drain Epitaxy App 20180337283 - Li; Chii-Horng ; et al.	2018-11-22
Methods for Forming Fin Field-Effect Transistors App 20180323108 - Chen; Ryan Chia-Jen ; et al.	2018-11-08
Methods for forming Fin field-effect transistors Grant 10,083,872 - Chen , et al. September 25, 2	2018-09-25
Method of Forming a Single Metal that Performs N Work Function and P Work Function in a High-K/Metal Gate Process App 20180247937 - Lin; Yih-Ann ; et al.	2018-08-30
Method of Forming an Integrated Circuit App 20180218904 - Hsieh; Tzu-Yen ; et al.	2018-08-02
V-shape recess profile for embedded source/drain epitaxy Grant 10,038,095 - Li , et al. July 31, 2	2018-07-31
Method of forming a single metal that performs N work function and P work function in a high-k/metal gate process Grant 9,960,160 - Lin , et al. May 1, 2	2018-05-01
Method of forming an integrated circuit using a patterned mask layer Grant 9,934,971 - Hsieh , et al. April 3, 2	2018-04-03
FinFET Device App 20180090607 - Lin; Chia Tai ; et al.	2018-03-29
FinFET device Grant 9,825,173 - Lin , et al. November 21, 2	2017-11-21
Method of Forming an Integrated Circuit App 20170236712 - Hsieh; Tzu-Yen ; et al.	2017-08-17
Methods for Forming Fin Field-Effect Transistors App 20170229348 - Chen; Ryan Chia-Jen ; et al.	2017-08-10
V-Shape Recess Profile for Embedded Source/Drain Epitaxy App 20170222053 - Li; Chii-Horng ; et al.	2017-08-03
Method of forming an integrated circuit using a patterned mask layer Grant 9,640,398 - Hsieh , et al. May 2, 2	2017-05-02
Semiconductor fin structures and methods for forming the same Grant 9,633,905 - Chen , et al. April 25, 2	2017-04-25
Etching process Grant 9,601,333 - Yeh , et al. March 21, 2	2017-03-21
Integrated high-K/metal gate in CMOS process flow Grant 9,601,388 - Chen , et al. March 21, 2	2017-03-21
Integrated High-K/Metal Gate in CMOS Process Flow App 20160293490 - Chen; Ryan Chia-Jen ; et al.	2016-10-06
FinFET device structure and methods of making same Grant 9,349,839 - Lin , et al. May 24, 2	2016-05-24
Etching Process App 20160099151 - Yeh; Ming-Hsi ; et al.	2016-04-07
Integrated high-k/metal gate in CMOS process flow Grant 9,257,426 - Chen , et al. February 9, 2	2016-02-09
Finfet Device App 20160035874 - Lin; Chia Tai ; et al.	2016-02-04
Method of making a FinFET device Grant 9,190,496 - Lin , et al. November 17, 2	2015-11-17
Method of forming a semiconductor device Grant 9,153,440 - Lin , et al. October 6, 2	2015-10-06
Method Of Forming An Integrated Circuit App 20150243504 - HSIEH; Tzu-Yen ; et al.	2015-08-27
Method of forming an integrated circuit using a patterned mask layer Grant 9,059,085 - Hsieh , et al. June 16, 2	2015-06-16
FinFET Device Structure and Methods of Making Same App 20150118815 - Lin; Yu-Chao ; et al.	2015-04-30
Integrated High-K/Metal Gate In CMOS Process Flow App 20150061031 - Chen; Ray Chia-Jen ; et al.	2015-03-05
FinFET device structure and methods of making same Grant 8,946,014 - Lin , et al. February 3, 2	2015-02-03
Method to pre-heat and stabilize etching chamber condition and improve mean time between cleaning Grant 8,911,559 - Lin , et al. December 16, 2	2014-12-16
Method Of Forming An Integrated Circuit App 20140295654 - HSIEH; Tzu-Yen ; et al.	2014-10-02
Integrated high-k/metal gate in CMOS process flow Grant 8,841,731 - Chen , et al. September 23, 2	2014-09-23
N2 based plasma treatment and ash for HK metal gate protection Grant 8,791,001 - Lin , et al. July 29, 2	2014-07-29
Method of forming an integrated circuit Grant 8,772,183 - Hsieh , et al. July 8, 2	2014-07-08
FinFET Device Structure and Methods of Making Same App 20140183661 - Lin; Yu-Chao ; et al.	2014-07-03
Method Of Forming A Single Metal That Performs N Work Function And P Work Function In A High-K/Metal Gate Process App 20140001566 - Lin; Yih-Ann ; et al.	2014-01-02
Semiconductor Fin Structures and Methods for Forming the Same App 20130277759 - Chen; Ryan Chia-Jen ; et al.	2013-10-24
Methods of fabricating high-K metal gate devices Grant 8,551,837 - Lin , et al. October 8, 2	2013-10-08
Method Of Forming A Semiconductor Device App 20130252425 - LIN; Chih-Han ; et al.	2013-09-26
Method of forming a single metal that performs N work function and P work function in a high-k/metal gate process Grant 8,524,588 - Lin , et al. September 3, 2	2013-09-03
Integrated High-k/metal Gate In Cmos Process Flow App 20130140643 - Chen; Ryan Chia-Jen ; et al.	2013-06-06
Method Of Forming An Integrated Circuit App 20130102136 - HSIEH; Tzu-Yen ; et al.	2013-04-25
Integrated high-K/metal gate in CMOS process flow Grant 8,383,502 - Chen , et al. February 26, 2	2013-02-26
Method to integrate gate etching as all-in-one process for high K metal gate Grant 8,304,349 - Lin , et al. November 6, 2	2012-11-06
Patterning methodology for uniformity control Grant 8,273,632 - Lin , et al. September 25, 2	2012-09-25
Sealing layer of a field effect transistor Grant 8,258,588 - Lin , et al. September 4, 2	2012-09-04
Methods Of Fabricating High-k Metal Gate Devices App 20120164822 - Lin; Yih-Ann ; et al.	2012-06-28
Patterning Methodology for Uniformity Control App 20120108046 - Lin; Yu Chao ; et al.	2012-05-03
Method for fabricating an isolation structure Grant 8,163,625 - Lin , et al. April 24, 2	2012-04-24
Methods of fabricating high-k metal gate devices Grant 8,148,249 - Lin , et al. April 3, 2	2012-04-03
Integrated High-K/Metal Gate in CMOS Process Flow App 20110275212 - Chen; Ryan Chia-Jen ; et al.	2011-11-10
Patterning methodology for uniformity control Grant 8,053,323 - Lin , et al. November 8, 2	2011-11-08
Method of integrating high-K/metal gate in CMOS process flow Grant 8,003,507 - Chen , et al. August 23, 2	2011-08-23
Sealing Layer Of A Field Effect Transistor App 20110031562 - LIN; Yu Chao ; et al.	2011-02-10
Method of defining gate structure height for semiconductor devices Grant 7,833,853 - Chen , et al. November 16, 2	2010-11-16
Method For Fabricating An Isolation Structure App 20100255654 - Lin; Yih-Ann ; et al.	2010-10-07
Solution for polymer and capping layer removing with wet dipping in HK metal gate etching process Grant 7,776,755 - Lin , et al. August 17, 2	2010-08-17
Method of reducing a critical dimension of a semiconductor device Grant 7,759,239 - Lin , et al. July 20, 2	2010-07-20
Method To Pre-heat And Stabilize Etching Chamber Condition And Improve Mean Time Between Cleaning App 20100071719 - Lin; Yu Chao ; et al.	2010-03-25
Methods Of Fabricating High-k Metal Gate Devices App 20100068876 - Lin; Yih-Ann ; et al.	2010-03-18
Method Of Defining Gate Structure Height For Semiconductor Devices App 20100068861 - Chen; Ryan Chia-Jen ; et al.	2010-03-18
N2 Based Plasma Treatment And Ash For Hk Metal Gate Protection App 20100062591 - Lin; Yu Chao ; et al.	2010-03-11
Novel Solution For Polymer And Capping Layer Removing With Wet Dipping In Hk Metal Gate Etching Process App 20100062590 - Lin; Jr Jung ; et al.	2010-03-11
Method Of Forming A Single Metal That Performs N Work Function And P Work Function In A High-k/metal Gate Process App 20100038721 - Lin; Yih-Ann ; et al.	2010-02-18
Novel Method To Integrate Gate Etching As All-in-one Process For High K Metal Gate App 20100041236 - Lin; Jr Jung ; et al.	2010-02-18
Method Of Integrating High-k/metal Gate In Cmos Process Flow App 20100041223 - Chen; Ryan Chia-Jen ; et al.	2010-02-18
Wet cleaning method to eliminate copper corrosion Grant 7,022,610 - Chou , et al. April 4, 2	2006-04-04
Method to enhance the adhesion between dry film and seed metal Grant 6,926,818 - Lin , et al. August 9, 2	2005-08-09
Wet cleaning method to eliminate copper corrosion App 20050136678 - Chou, Chun-Li ; et al.	2005-06-23
Plasma ashing/etching using solid sapphire disk App 20030234079 - Jiang, Yue-Ying ; et al.	2003-12-25