Lin; Li-Te S.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Lin; Li-Te S..The latest application filed is for "end-cut first approach for critical dimension control".

Company Profile

0.22.15

Lin; Li-Te S. - Hsinchu TW
Lin; Li-Te S. - Hsinchu City TW
Lin; Li-Te S. - Hsinchu County N/A TW
Lin; Li-Te S. - Hsin-Chu TW
Lin; Li-Te S. - Hsin-Chu County TW

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
End-cut first approach for critical dimension control Grant 9,196,491 - Lin , et al. November 24, 2	2015-11-24
End-Cut First Approach For Critical Dimension Control App 20140106479 - Lin; Li-Te S. ; et al.	2014-04-17
End-cut first approach for critical dimension control Grant 8,563,410 - Lin , et al. October 22, 2	2013-10-22
Source/drain carbon implant and RTA anneal, pre-SiGe deposition Grant 8,404,546 - Woon , et al. March 26, 2	2013-03-26
Shallow junction formation and high dopant activation rate of MOS devices Grant 8,212,253 - Nieh , et al. July 3, 2	2012-07-03
Shallow Junction Formation and High Dopant Activation Rate of MOS Devices App 20110316079 - Nieh; Chun-Feng ; et al.	2011-12-29
Shallow junction formation and high dopant activation rate of MOS devices Grant 8,039,375 - Nieh , et al. October 18, 2	2011-10-18
End-cut First Approach For Critical Dimension Control App 20110124134 - Lin; Li-Te S. ; et al.	2011-05-26
Double Patterning Strategy For Forming Fine Patterns In Photolithography App 20110059407 - LIN; Li-Te S. ; et al.	2011-03-10
Source/Drain Carbon Implant and RTA Anneal, Pre-SiGe Deposition App 20110027955 - Woon; Wei-Yen ; et al.	2011-02-03
Source/drain carbon implant and RTA anneal, pre-SiGe deposition Grant 7,838,887 - Woon , et al. November 23, 2	2010-11-23
Multi-step epitaxial process for depositing Si/SiGe Grant 7,816,217 - Lin , et al. October 19, 2	2010-10-19
Source/Drain Carbon Implant and RTA Anneal, Pre-SiGe Deposition App 20090273034 - Woon; Wei-Yen ; et al.	2009-11-05
Embedded SiGe stressor with tensile strain for NMOS current enhancement Grant 7,612,389 - Lin , et al. November 3, 2	2009-11-03
SiGe selective growth without a hard mask Grant 7,494,884 - Lin , et al. February 24, 2	2009-02-24
Shallow junction formation and high dopant activation rate of MOS devices App 20080293204 - Nieh; Chun-Feng ; et al.	2008-11-27
SiGe selective growth without a hard mask App 20080083948 - Lin; Hsien-Hsin ; et al.	2008-04-10
Phosphoric acid free process for polysilicon gate definition Grant 7,307,009 - Lin , et al. December 11, 2	2007-12-11
Multi-step epitaxial process for depositing Si/SiGe App 20070148919 - Lin; Li-Te S. ; et al.	2007-06-28
Embedded SiGe stressor with tensile strain for NMOS current enhancement App 20070057287 - Lin; Li-Te S. ; et al.	2007-03-15
Method for controlling spacer oxide loss Grant 7,179,715 - Chiang , et al. February 20, 2	2007-02-20
Method for controlling spacer oxide loss App 20060216918 - Chiang; Ju-Chien ; et al.	2006-09-28
Phosphoric acid free process for polysilicon gate definition App 20050118755 - Lin, Li-Te S. ; et al.	2005-06-02
Fully dry, Si recess free process for removing high k dielectric layer App 20050081781 - Lin, Huan-Just ; et al.	2005-04-21
Iteratively selective gas flow control and dynamic database to achieve CD uniformity Grant 6,864,174 - Lin , et al. March 8, 2	2005-03-08
Phosphoric acid free process for polysilicon gate definition Grant 6,849,531 - Lin , et al. February 1, 2	2005-02-01
Test structure for differentiating the line and via contribution in stress migration Grant 6,835,578 - Lin , et al. December 28, 2	2004-12-28
Dry-wet-dry solvent-free process after stop layer etch in dual damascene process Grant 6,797,627 - Shih , et al. September 28, 2	2004-09-28
Partial via hard mask open on low-k dual damascene etch with dual hard mask (DHM) approach Grant 6,797,630 - Wu , et al. September 28, 2	2004-09-28
Dynamic Feed Forward Temperature Control To Achieve Cd Etching Uniformity App 20040182822 - Chen, Li-Shiun ; et al.	2004-09-23
Iteratively selective gas flow control and dynamic database to achieve CD uniformity App 20040185584 - Lin, Li-Te S. ; et al.	2004-09-23
Dynamic feed forward temperature control to achieve CD etching uniformity Grant 6,794,302 - Chen , et al. September 21, 2	2004-09-21
Method of dual damascene patterning Grant 6,720,256 - Wu , et al. April 13, 2	2004-04-13
N2/H2 chemistry for dry development in top surface imaging technology Grant 6,551,938 - Wu , et al. April 22, 2	2003-04-22
Partial hard mask open process for hard mask dual damascene etch Grant 6,376,366 - Lin , et al. April 23, 2	2002-04-23

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