| Patent | Date |
|---|
Fin Field-Effect Transistor Device and Method
App 20220293471 - Tsai; Meng Jhe ; et al. | 2022-09-15 |
Gap Patterning For Metal-to-source/drain Plugs In A Semiconductor Device
App 20220270931 - HUANG; Yu-Lien ; et al. | 2022-08-25 |
Memory Device And Method For Forming Thereof
App 20220271087 - LIN; HAN-TING ; et al. | 2022-08-25 |
Transistor Source/Drain Contacts and Methods of Forming the Same
App 20220262792 - Wu; Yang-Cheng ; et al. | 2022-08-18 |
Gap patterning for metal-to-source/drain plugs in a semiconductor device
Grant 11,355,399 - Huang , et al. June 7, 2 | 2022-06-07 |
Tuning Threshold Voltage Through Meta Stable Plasma Treatment
App 20220139712 - Wu; Shao-Jyun ; et al. | 2022-05-05 |
Semiconductor Structure And Method For Forming The Same
App 20220131070 - LIN; JIANN-HORNG ; et al. | 2022-04-28 |
Etch Profile Control Of Via Opening
App 20220102219 - HSIUNG; Te-Chih ; et al. | 2022-03-31 |
Integrated Circuit Structure And Manufacturing Method Thereof
App 20220102204 - HSIUNG; Te-Chih ; et al. | 2022-03-31 |
Etch Profile Control Of Gate Contact Opening
App 20220102199 - HSIUNG; Te-Chih ; et al. | 2022-03-31 |
Integrated Circuit Structure And Manufacturing Method Thereof
App 20220102211 - HSIUNG; Te-Chih ; et al. | 2022-03-31 |
Etch Profile Control Of Gate Contact Opening
App 20220102202 - HSIUNG; Te-Chih ; et al. | 2022-03-31 |
Interconnect Structure for Semiconductor Devices
App 20220102138 - Wang; Po-Chuan ; et al. | 2022-03-31 |
Etch Profile Control Of Gate Contact Opening
App 20220102507 - HSIUNG; Te-Chih ; et al. | 2022-03-31 |
Etch Profile Control Of Via Opening
App 20220102511 - HSIUNG; Te-Chih ; et al. | 2022-03-31 |
Middle-of-line Interconnect Structure And Manufacturing Method
App 20220093757 - Huang; Yu-Lien ; et al. | 2022-03-24 |
Tuning threshold voltage through meta stable plasma treatment
Grant 11,239,083 - Wu , et al. February 1, 2 | 2022-02-01 |
Memory Device Structure And Method For Forming The Same
App 20220029091 - WANG; Hsing-Hsiang ; et al. | 2022-01-27 |
Method of forming isolation layer
Grant 11,227,788 - Tsai , et al. January 18, 2 | 2022-01-18 |
Memory Cell With Low Resistance Top Electrode Contact And Methods For Forming The Same
App 20210399207 - WANG; Hsing-Hsiang ; et al. | 2021-12-23 |
Gap Patterning For Metal-to-source/drain Plugs In A Semiconductor Device
App 20210366780 - HUANG; Yu-Lien ; et al. | 2021-11-25 |
Semiconductor Device and Method
App 20210358811 - Wu; Shao-Jyun ; et al. | 2021-11-18 |
Fin Field-effect Transistor And Method Of Forming The Same
App 20210359104 - Pan; Sheng-Liang ; et al. | 2021-11-18 |
Interconnect Structures For Semiconductor Devices And Methods Of Manufacturing The Same
App 20210335673 - Huang; Yu-Lien ; et al. | 2021-10-28 |
Selective NFET/PFET recess of source/drain regions
Grant 11,139,211 - Chang , et al. October 5, 2 | 2021-10-05 |
Method of forming MOSFET structure
Grant 11,127,837 - Fu , et al. September 21, 2 | 2021-09-21 |
Layer for side wall passivation
Grant 11,121,025 - Hsu , et al. September 14, 2 | 2021-09-14 |
Self-aligned insulated film for high-K metal gate device
Grant 11,094,545 - Ng , et al. August 17, 2 | 2021-08-17 |
Semiconductor device and method
Grant 11,081,396 - Wu , et al. August 3, 2 | 2021-08-03 |
Semiconductor Device and Method
App 20210082768 - Wu; Shao-Jyun ; et al. | 2021-03-18 |
Method Of Forming A Vertical Device
App 20210050430 - CHEN; DE-FANG ; et al. | 2021-02-18 |
Self-aligned nanowire formation using double patterning
Grant 10,879,129 - Fu , et al. December 29, 2 | 2020-12-29 |
Vertical device having a protrusion structure
Grant 10,854,728 - Chen , et al. December 1, 2 | 2020-12-01 |
Method Of Forming Isolation Layer
App 20200335388 - TSAI; Teng-Chun ; et al. | 2020-10-22 |
Tuning Threshold Voltage Through Meta Stable Plasma Treatment
App 20200294805 - Wu; Shao-Jyun ; et al. | 2020-09-17 |
Method of forming isolation layer
Grant 10,707,114 - Tsai , et al. | 2020-07-07 |
Methods for controlling an end-to-end distance in semiconductor device
Grant 10,692,720 - Huang , et al. | 2020-06-23 |
Selective NFET/PFET Recess of Source/Drain Regions
App 20200185278 - Chang; Yun-Min ; et al. | 2020-06-11 |
Method Of Forming A Vertical Device
App 20200111887 - CHEN; DE-FANG ; et al. | 2020-04-09 |
Layer for Side Wall Passivation
App 20200105586 - Hsu; Yun-Chang ; et al. | 2020-04-02 |
Self-Aligned Nanowire Formation Using Double Patterning
App 20200083110 - Fu; Ching-Feng ; et al. | 2020-03-12 |
Methods for Controlling an End-to-End Distance in Semiconductor Device
App 20200083046 - Huang; Yu-Lien ; et al. | 2020-03-12 |
Method of Forming MOSFET Structure
App 20200058765 - Fu; Ching-Feng ; et al. | 2020-02-20 |
Selective NFET/PFET recess of source/drain regions
Grant 10,553,492 - Chang , et al. Fe | 2020-02-04 |
Tuning threshold voltage through meta stable plasma treatment
Grant 10,535,524 - Wu , et al. Ja | 2020-01-14 |
Semiconductor methods and devices
Grant 10,515,818 - Liu , et al. Dec | 2019-12-24 |
Methods for controlling an end-to-end distance in semiconductor device
Grant 10,504,729 - Huang , et al. Dec | 2019-12-10 |
Self-aligned nanowire formation using double patterning
Grant 10,504,792 - Fu , et al. Dec | 2019-12-10 |
Vertical device having a protrusion source
Grant 10,505,014 - Chen , et al. Dec | 2019-12-10 |
Self-Aligned Insulated Film for High-K Metal Gate Device
App 20190341263 - Ng; Jin-Aun ; et al. | 2019-11-07 |
Selective Nfet/pfet Recess Of Source/drain Regions
App 20190333820 - Chang; Yun-Min ; et al. | 2019-10-31 |
Method of forming MOSFET structure
Grant 10,461,170 - Fu , et al. Oc | 2019-10-29 |
Method of forming isolation layer
Grant 10,418,271 - Tsai , et al. Sept | 2019-09-17 |
Methods for Controlling an End-to-End Distance in Semiconductor Device
App 20190259613 - Huang; Yu-Lien ; et al. | 2019-08-22 |
Self-aligned insulated film for high-k metal gate device
Grant 10,388,531 - Ng , et al. A | 2019-08-20 |
Semiconductor device and method of forming vertical structure
Grant 10,325,994 - Peng , et al. | 2019-06-18 |
Methods for controlling an end-to-end distance in semiconductor device
Grant 10,312,089 - Huang , et al. | 2019-06-04 |
Methods For Controlling An End-to-end Distance In Semiconductor Device
App 20190164759 - HUANG; Yu-Lien ; et al. | 2019-05-30 |
Gate structure
Grant 10,276,725 - Fu , et al. | 2019-04-30 |
Self-Aligned Nanowire Formation Using Double Patterning
App 20190122936 - Fu; Ching-Feng ; et al. | 2019-04-25 |
Self-aligned nanowire formation using double patterning
Grant 10,163,723 - Fu , et al. Dec | 2018-12-25 |
Method Of Forming Isolation Layer
App 20180350655 - TSAI; Teng-Chun ; et al. | 2018-12-06 |
Semiconductor Device And Method Of Forming Vertical Structure
App 20180240882 - PENG; Chih-Tang ; et al. | 2018-08-23 |
Methods for fabricating vertical-gate-all-around transistor structures
Grant 10,026,658 - Tsai , et al. July 17, 2 | 2018-07-17 |
Semiconductor Methods and Devices
App 20180151382 - Liu; Chi-Kang ; et al. | 2018-05-31 |
Contact for high-k metal gate device
Grant 9,978,850 - Chuang , et al. May 22, 2 | 2018-05-22 |
Method of making a silicide beneath a vertical structure
Grant 9,966,448 - Lin , et al. May 8, 2 | 2018-05-08 |
Semiconductor device and method of forming vertical structure
Grant 9,954,069 - Peng , et al. April 24, 2 | 2018-04-24 |
Nano wire structure and method for fabricating the same
Grant 9,911,661 - Fu , et al. March 6, 2 | 2018-03-06 |
Self-Aligned Insulated Film For High-K Metal Gate Device
App 20180019133 - Ng; Jin-Aun ; et al. | 2018-01-18 |
Nano Wire Structure and Method for Fabricating the Same
App 20170365524 - Fu; Ching-Feng ; et al. | 2017-12-21 |
Contact for High-K Metal Gate Device
App 20170317180 - Chuang; Harry-Hak-Lay ; et al. | 2017-11-02 |
Vertical structure having an etch stop over portion of the source
Grant 9,805,968 - Lin , et al. October 31, 2 | 2017-10-31 |
Self-aligned insulated film for high-k metal gate device
Grant 9,779,947 - Ng , et al. October 3, 2 | 2017-10-03 |
Nano wire structure and method for fabricating the same
Grant 9,741,621 - Fu , et al. August 22, 2 | 2017-08-22 |
Self-Aligned Nanowire Formation Using Double Patterning
App 20170229349 - Fu; Ching-Feng ; et al. | 2017-08-10 |
Contact for high-k metal gate device
Grant 9,711,605 - Chuang , et al. July 18, 2 | 2017-07-18 |
Method Of Forming A Vertical Device
App 20170200804 - CHEN; DE-FANG ; et al. | 2017-07-13 |
Iterative self-aligned patterning
Grant 9,685,332 - Chen , et al. June 20, 2 | 2017-06-20 |
Gate Structure
App 20170162720 - Fu; Ching-Feng ; et al. | 2017-06-08 |
Nano Wire Structure and Method for Fabricating the Same
App 20170154824 - Fu; Ching-Feng ; et al. | 2017-06-01 |
Vertical Structure and Method of Forming Semiconductor Device
App 20170154807 - Lin; Cheng-Tung ; et al. | 2017-06-01 |
Self-aligned nanowire formation using double patterning
Grant 9,633,907 - Fu , et al. April 25, 2 | 2017-04-25 |
Method of forming a vertical device
Grant 9,614,054 - Chen , et al. April 4, 2 | 2017-04-04 |
Method of forming channel of gate structure
Grant 9,590,090 - Fu , et al. March 7, 2 | 2017-03-07 |
Vertical structure and method of forming semiconductor device
Grant 9,577,093 - Lin , et al. February 21, 2 | 2017-02-21 |
Nano wire structure and method for fabricating the same
Grant 9,570,358 - Fu , et al. February 14, 2 | 2017-02-14 |
Semiconductor device and manufacturing method thereof
Grant 9,508,817 - Yen , et al. November 29, 2 | 2016-11-29 |
Nano Wire Structure and Method for Fabricating the Same
App 20160343620 - Fu; Ching-Feng ; et al. | 2016-11-24 |
Contact For High-k Metal Gate Device
App 20160293721 - Chuang; Harry-Hak-Lay ; et al. | 2016-10-06 |
Fin patterning methods for increased process margin
Grant 9,449,880 - Tseng , et al. September 20, 2 | 2016-09-20 |
Fin Patterning Methods For Increased Process Margin
App 20160254191 - Tseng; Chin-Yuan ; et al. | 2016-09-01 |
Method Of Forming Mosfet Structure
App 20160247896 - FU; CHING-FENG ; et al. | 2016-08-25 |
Nano wire structure and method for fabricating the same
Grant 9,412,614 - Fu , et al. August 9, 2 | 2016-08-09 |
Semiconductor Device And Method Of Forming Vertical Structure
App 20160211370 - PENG; CHIH-TANG ; et al. | 2016-07-21 |
Self-aligned Insulated Film For High-k Metal Gate Device
App 20160196979 - Ng; Jin-Aun ; et al. | 2016-07-07 |
Contact for high-k metal gate device
Grant 9,368,603 - Chuang , et al. June 14, 2 | 2016-06-14 |
Method of forming MOSFET structure
Grant 9,343,412 - Fu , et al. May 17, 2 | 2016-05-17 |
Method Of Forming A Vertical Device
App 20160111523 - CHEN; DE-FANG ; et al. | 2016-04-21 |
Iterative Self-aligned Patterning
App 20160111297 - CHEN; DE-FANG ; et al. | 2016-04-21 |
Semiconductor device and method of forming vertical structure
Grant 9,318,447 - Peng , et al. April 19, 2 | 2016-04-19 |
Semiconductor Device And Manufacturing Method Thereof
App 20160043173 - YEN; Yung-Sung ; et al. | 2016-02-11 |
Vertical Structure And Method Of Forming Semiconductor Device
App 20160027917 - LIN; CHENG-TUNG ; et al. | 2016-01-28 |
Semiconductor Device And Method Of Forming Vertical Structure
App 20160020180 - PENG; CHIH-TANG ; et al. | 2016-01-21 |
Method of forming a vertical device
Grant 9,224,833 - Chen , et al. December 29, 2 | 2015-12-29 |
Method Of Forming Isolation Layer
App 20150364358 - TSAI; TENG-CHUN ; et al. | 2015-12-17 |
Self-aligned Nanowire Formation Using Double Patterning
App 20150348848 - Fu; Ching-Feng ; et al. | 2015-12-03 |
Nano Wire Structure and Method for Fabricating the Same
App 20150348796 - Fu; Ching-Feng ; et al. | 2015-12-03 |
Vertical Structure And Method Of Forming The Same
App 20150333152 - LIN; CHENG-TUNG ; et al. | 2015-11-19 |
Vertical structure and method of forming semiconductor device
Grant 9,166,001 - Lin , et al. October 20, 2 | 2015-10-20 |
Systems And Methods For Fabricating Vertical-gate-all-around Transistor Structures
App 20150295040 - TSAI; TENG-CHUN ; et al. | 2015-10-15 |
Chemical mechanical polish process control for improvement in within-wafer thickness uniformity
Grant 9,132,523 - Lee , et al. September 15, 2 | 2015-09-15 |
Vertical Structure And Method Of Forming Semiconductor Device
App 20150228718 - LIN; CHENG-TUNG ; et al. | 2015-08-13 |
Method Of Forming Mosfet Structure
App 20150228483 - FU; CHING-FENG ; et al. | 2015-08-13 |
Vertical Device And Method Of Forming The Same
App 20150228759 - CHEN; DE-FANG ; et al. | 2015-08-13 |
Method Of Forming Channel Of Gate Structure
App 20150194497 - FU; CHING-FENG ; et al. | 2015-07-09 |
Field effect transistors and method of forming the same
Grant 8,969,922 - Liu , et al. March 3, 2 | 2015-03-03 |
Contact For High-k Metal Gate Device
App 20150021672 - Chuang; Harry-Hak-Lay ; et al. | 2015-01-22 |
Self-aligned Insulated Film For High-k Metal Gate Device
App 20140367802 - Ng; Jin-Aun ; et al. | 2014-12-18 |
Contact for high-k metal gate device
Grant 8,853,753 - Chuang , et al. October 7, 2 | 2014-10-07 |
Self-aligned insulated film for high-k metal gate device
Grant 8,822,283 - Ng , et al. September 2, 2 | 2014-09-02 |
Method of forming SOI-like structure in a bulk semiconductor substrate by annealing a lower portion of a trench while protecting an upper portion of the trench
Grant 8,673,736 - Yang , et al. March 18, 2 | 2014-03-18 |
Contact for High-K Metal Gate Device
App 20130328115 - Chuang; Harry-Hak-Lay ; et al. | 2013-12-12 |
Contact for high-K metal gate device
Grant 8,546,227 - Chuang , et al. October 1, 2 | 2013-10-01 |
Semiconductor Device and Method of Forming the Same
App 20130200461 - Liu; Chia-Chu ; et al. | 2013-08-08 |
Contact For High-k Metal Gate Device
App 20130069174 - Chuang; Hak-Lay ; et al. | 2013-03-21 |
Self-aligned Insulated Film For High-k Metal Gate Device
App 20130056837 - Ng; Jin-Aun ; et al. | 2013-03-07 |
Method of forming contacts for a semiconductor device
Grant 8,222,136 - Tu , et al. July 17, 2 | 2012-07-17 |
Chemical Mechanical Polish Process Control for Improvement in Within-Wafer Thickness Uniformity
App 20120164918 - Lee; Shen-Nan ; et al. | 2012-06-28 |
Method Of Forming Contacts For A Semiconductor Device
App 20120094485 - Tu; Yuan-Tien ; et al. | 2012-04-19 |
High planarizing method for use in a gate last process
Grant 8,153,526 - Lee , et al. April 10, 2 | 2012-04-10 |
Chemical mechanical polish process control for improvement in within-wafer thickness uniformity
Grant 8,129,279 - Lee , et al. March 6, 2 | 2012-03-06 |
Semiconductor devices with dual-metal gate structures and fabrication methods thereof
Grant 7,947,591 - Hsu , et al. May 24, 2 | 2011-05-24 |
MOS devices with continuous contact etch stop layer
Grant 7,732,878 - Yao , et al. June 8, 2 | 2010-06-08 |
Chemical Mechanical Polish Process Control for Improvement in Within-Wafer Thickness Uniformity
App 20100093259 - Lee; Shen-Nan ; et al. | 2010-04-15 |
High Planarizing Method For Use In A Gate Last Process
App 20100048007 - Lee; Shen-Nan ; et al. | 2010-02-25 |
Novel Seal Isolation Liner For Use In Contact Hole Formation
App 20090137119 - Liu; Hsin-Lun ; et al. | 2009-05-28 |
Semiconductor Devices With Dual-metal Gate Structures And Fabrication Methods Thereof
App 20080188044 - Hsu; Peng-Fu ; et al. | 2008-08-07 |
In-situ plasma treatment of advanced resists in fine pattern definition
Grant 7,390,753 - Lin , et al. June 24, 2 | 2008-06-24 |
Semiconductor devices with dual-metal gate structures and fabrication methods thereof
Grant 7,378,713 - Hsu , et al. May 27, 2 | 2008-05-27 |
Semiconductor Devices With Dual-metal Gate Structures And Fabrication Methods Thereof
App 20080099851 - Hsu; Peng-Fu ; et al. | 2008-05-01 |
MOS devices with continuous contact etch stop layer
App 20080093675 - Yao; Liang-Gi ; et al. | 2008-04-24 |
Method to control gate CD
Grant RE39,913 - Tao , et al. November 6, 2 | 2007-11-06 |
In-situ plasma treatment of advanced resists in fine pattern definition
App 20070111110 - Lin; Li-Te ; et al. | 2007-05-17 |
SOI-like structures in a bulk semiconductor substrate
App 20070063282 - Yang; Ji-Yi ; et al. | 2007-03-22 |
Method of forming SOI-like structure in a bulk semiconductor substrate using self-organized atomic migration
App 20070032037 - Yang; Ji-Yi ; et al. | 2007-02-08 |
Method of forming SOI-like structure in a bulk semiconductor substrate using self-organized atomic migration
Grant 7,157,350 - Yang , et al. January 2, 2 | 2007-01-02 |
Large-scale trimming for ultra-narrow gates
App 20060205224 - Huang; Ming-Jie ; et al. | 2006-09-14 |
Method of forming a stacked capacitor structure with increased surface area for a DRAM device
Grant 7,023,042 - Chan , et al. April 4, 2 | 2006-04-04 |
Large-scale trimming for ultra-narrow gates
Grant 7,008,866 - Huang , et al. March 7, 2 | 2006-03-07 |
SOI-like structure in a bulk semiconductor substrate and method of forming same
App 20050253194 - Yang, Ji-Yi ; et al. | 2005-11-17 |
Large-scale trimming for ultra-narrow gates
App 20050133827 - Huang, Ming-Jie ; et al. | 2005-06-23 |
Method for cleaning an integrated circuit device using an aqueous cleaning composition
App 20050092348 - Chiang, Ju-Chien ; et al. | 2005-05-05 |
Fully dry, Si recess free process for removing high k dielectric layer
App 20050081781 - Lin, Huan-Just ; et al. | 2005-04-21 |
Method using wet etching to trim a critical dimension
Grant 6,828,205 - Tsai , et al. December 7, 2 | 2004-12-07 |
Method of pull back for forming shallow trench isolation
Grant 6,828,248 - Tao , et al. December 7, 2 | 2004-12-07 |
Dynamic Feed Forward Temperature Control To Achieve Cd Etching Uniformity
App 20040182822 - Chen, Li-Shiun ; et al. | 2004-09-23 |
Dynamic feed forward temperature control to achieve CD etching uniformity
Grant 6,794,302 - Chen , et al. September 21, 2 | 2004-09-21 |
Method of forming a stacked capacitor structure with increased surface area for a DRAM device
App 20040142531 - Chan, Bor-Wen ; et al. | 2004-07-22 |
Method of forming a stacked capacitor structure with increased surface area for a DRAM device
Grant 6,706,591 - Chan , et al. March 16, 2 | 2004-03-16 |
Method for etching silicon nitride selective to titanium silicide
Grant 6,656,847 - Lin , et al. December 2, 2 | 2003-12-02 |
Method using wet etching to trim a critical dimension
App 20030148619 - Tsai, Ming-Huan ; et al. | 2003-08-07 |
Selectively controllable gas feed zones for a plasma reactor
Grant 6,590,344 - Tao , et al. July 8, 2 | 2003-07-08 |
Selectively Controllable Gas Feed Zones For A Plasma Reactor
App 20030094903 - Tao, Jhun-jan ; et al. | 2003-05-22 |
Method of patterning narrow gate electrode
Grant 6,174,818 - Tao , et al. January 16, 2 | 2001-01-16 |
Method for fabricating a T-shaped hard mask/conductor profile to improve self-aligned contact isolation
Grant 6,140,218 - Liu , et al. October 31, 2 | 2000-10-31 |
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