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name:-0.046561002731323
name:-0.04645299911499
name:-0.063146114349365
Lee; Kai-Hsuan Patent Filings

Lee; Kai-Hsuan

Patent Applications and Registrations

Patent applications and USPTO patent grants for Lee; Kai-Hsuan.The latest application filed is for "transistor gate contacts and methods of forming the same".

Company Profile
40.36.44
  • Lee; Kai-Hsuan - Hsinchu TW
  • Lee; Kai-Hsuan - Hsinchu City TW
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Transistor Gate Contacts and Methods of Forming the Same
App 20220310445 - Lee; Kai-Hsuan ;   et al.
2022-09-29
Air gap formation between gate spacer and epitaxy structure
Grant 11,456,295 - Lai , et al. September 27, 2
2022-09-27
Semiconductor device having a contact plug with an air gap spacer
Grant 11,456,383 - Liu , et al. September 27, 2
2022-09-27
High Aspect Ratio Gate Structure Formation
App 20220216326 - Yeong; Sai-Hooi ;   et al.
2022-07-07
High aspect ratio gate structure formation
Grant 11,289,583 - Yeong , et al. March 29, 2
2022-03-29
FinFET Structure with Airgap and Method of Forming the Same
App 20220085185 - Yao; Chien Ning ;   et al.
2022-03-17
Air Gaps In Memory Array Structures
App 20210407845 - Wang; Sheng-Chen ;   et al.
2021-12-30
Self-aligned gate hard mask and method forming same
Grant 11,205,724 - Lee , et al. December 21, 2
2021-12-21
FinFET structure with airgap and method of forming the same
Grant 11,189,706 - Yao , et al. November 30, 2
2021-11-30
Fin Field Effect Transistor Having Airgap And Method For Manufacturing The Same
App 20210358810 - Yeong; Sai-Hooi ;   et al.
2021-11-18
FINFET Device with Wrapped-Around Epitaxial Structure and Manufacturing Method Thereof
App 20210343599 - Yang; Cheng-Yu ;   et al.
2021-11-04
FinFET semiconductor device having source/drain contact(s) separated by airgap spacer(s) from the gate stack(s) to reduce parasitic capacitance
Grant 11,152,486 - Yang , et al. October 19, 2
2021-10-19
Methods of Reducing Parasitic Capacitance in Semiconductor Devices
App 20210313233 - Lee; Kai-Hsuan ;   et al.
2021-10-07
Forming transistor by selectively growing gate spacer
Grant 11,133,229 - Lee , et al. September 28, 2
2021-09-28
Finfet Structure With Airgap And Method Of Forming The Same
App 20210249519 - Yao; Chien Ning ;   et al.
2021-08-12
Flexible Merge Scheme for Source/Drain Epitaxy Regions
App 20210242217 - Lee; Kai-Hsuan ;   et al.
2021-08-05
Fin field effect transistor having air gap and method for manufacturing the same
Grant 11,081,395 - Yeong , et al. August 3, 2
2021-08-03
Contact Air Gap Formation And Structures Thereof
App 20210225713 - YEONG; Sai-Hooi ;   et al.
2021-07-22
FinFET device with wrapped-around epitaxial structure and manufacturing method thereof
Grant 11,062,957 - Yang , et al. July 13, 2
2021-07-13
Methods of reducing parasitic capacitance in semiconductor devices
Grant 11,043,425 - Lee , et al. June 22, 2
2021-06-22
Self-Aligned Contact Air Gap Formation
App 20210183996 - Lee; Kai-Hsuan ;   et al.
2021-06-17
Air Gap Formation Between Gate Spacer And Epitaxy Structure
App 20210118749 - LAI; Bo-Yu ;   et al.
2021-04-22
Flexible merge scheme for source/drain epitaxy regions
Grant 10,985,167 - Lee , et al. April 20, 2
2021-04-20
Contact air gap formation and structures thereof
Grant 10,971,408 - Yeong , et al. April 6, 2
2021-04-06
Finfet Device And Method
App 20210066500 - Liu; Su-Hao ;   et al.
2021-03-04
Low-K Gate Spacer and Methods for Forming the Same
App 20210057546 - Lin; Wen-Kai ;   et al.
2021-02-25
Self-aligned contact air gap formation
Grant 10,923,565 - Lee , et al. February 16, 2
2021-02-16
Semiconductor Device Having A Uniform And Thin Silicide Layer On An Epitaxial Source/ Drain Structure And Manufacturing Method Thereof
App 20210035806 - LEE; Kai-Hsuan ;   et al.
2021-02-04
Semiconductor Devices with Reduced Parasitic Capacitance
App 20210020757 - Yang; Cheng-Yu ;   et al.
2021-01-21
Air gap formation between gate spacer and epitaxy structure
Grant 10,861,753 - Lai , et al. December 8, 2
2020-12-08
Field effect transistor and method of forming the same
Grant 10,847,634 - Cheng , et al. November 24, 2
2020-11-24
Low-k gate spacer and methods for forming the same
Grant 10,833,170 - Lin , et al. November 10, 2
2020-11-10
Semiconductor device having a uniform and thin silicide layer on an epitaxial source/ drain structure and manufacturing method thereof
Grant 10,811,262 - Lee , et al. October 20, 2
2020-10-20
Interconnect structure for semiconductor device and methods of fabrication thereof
Grant 10,777,504 - Yu , et al. Sept
2020-09-15
Self-Aligned Gate Hard Mask and Method Forming Same
App 20200287042 - Lee; Kai-Hsuan ;   et al.
2020-09-10
Self-aligned gate hard mask and method forming same
Grant 10,686,075 - Lee , et al.
2020-06-16
Interconnect Structure For Semiconductor Device And Methods Of Fabrication Thereof
App 20200161240 - YU; Chia-Ta ;   et al.
2020-05-21
Forming Transistor by Selectively Growing Gate Spacer
App 20200152522 - Lee; Kai-Hsuan ;   et al.
2020-05-14
Air Gap Formation Between Gate Spacer And Epitaxy Structure
App 20200135590 - LAI; Bo-Yu ;   et al.
2020-04-30
Contact Air Gap Formation And Structures Thereof
App 20200135591 - YEONG; Sai-Hooi ;   et al.
2020-04-30
High Aspect Ratio Gate Structure Formation
App 20200105910 - Yeong; Sai-Hooi ;   et al.
2020-04-02
Self-Aligned Contact Air Gap Formation
App 20200105867 - Lee; Kai-Hsuan ;   et al.
2020-04-02
Methods of Reducing Parasitic Capacitance in Semiconductor Devices
App 20200075417 - Lee; Kai-Hsuan ;   et al.
2020-03-05
Flexible Merge Scheme for Source/Drain Epitaxy Regions
App 20200066734 - Lee; Kai-Hsuan ;   et al.
2020-02-27
Fin Field Effect Transistor Having Airgap And Method For Manufacturing The Same
App 20200043796 - Yeong; Sai-Hooi ;   et al.
2020-02-06
Low-K Gate Spacer and Methods for Forming the Same
App 20200035809 - Lin; Wen-Kai ;   et al.
2020-01-30
Method for forming semiconductor device structure
Grant 10,535,525 - Lin , et al. Ja
2020-01-14
Forming transistor by selectively growing gate spacer
Grant 10,535,569 - Lee , et al. Ja
2020-01-14
Flexible merge scheme for source/drain epitaxy regions
Grant 10,529,725 - Lee , et al. J
2020-01-07
Interconnect structure for semiconductor device and methods of fabrication thereof
Grant 10,515,896 - Yu , et al. Dec
2019-12-24
Low-k gate spacer and methods for forming the same
Grant 10,490,650 - Lin , et al. Nov
2019-11-26
Flexible merge scheme for source/drain epitaxy regions
Grant 10,483,266 - Lee , et al. Nov
2019-11-19
Semiconductor Structure And Method For Forming The Same
App 20190148519 - LEE; Kai-Hsuan ;   et al.
2019-05-16
Low-k Gate Spacer And Methods For Forming The Same
App 20190148514 - Lin; Wen-Kai ;   et al.
2019-05-16
Semiconductor structure and method for forming the same
Grant 10,283,624 - Lee , et al.
2019-05-07
Field Effect Transistor And Method Of Forming The Same
App 20190131436 - Cheng; Te-En ;   et al.
2019-05-02
Flexible Merge Scheme for Source/Drain Epitaxy Regions
App 20190109141 - Lee; Kai-Hsuan ;   et al.
2019-04-11
Wrapped-Around Epitaxial Structure and Method
App 20190074225 - Yang; Cheng-Yu ;   et al.
2019-03-07
Interconnect Structure For Semiconductor Device And Methods Of Fabrication Thereof
App 20190067194 - YU; Chia-Ta ;   et al.
2019-02-28
Interconnect Structure For Semiconductor Device And Methods Of Fabrication Thereof
App 20190067197 - YU; Chia-Ta ;   et al.
2019-02-28
Method For Forming Semiconductor Device Structure
App 20190067012 - LIN; Chun-An ;   et al.
2019-02-28
Self-Aligned Gate Hard Mask and Method Forming Same
App 20190013400 - Lee; Kai-Hsuan ;   et al.
2019-01-10
Semiconductor device having a stacked fin structure and manufacturing method thereof
Grant 10,163,728 - Wang , et al. Dec
2018-12-25
FinFET device with wrapped-around epitaxial structure and manufacturing method thereof
Grant 10,141,231 - Yang , et al. Nov
2018-11-27
Forming Transistor by Selectively Growing Gate Spacer
App 20180337100 - Lee; Kai-Hsuan ;   et al.
2018-11-22
Flexible Merge Scheme for Source/Drain Epitaxy Regions
App 20180308852 - Lee; Kai-Hsuan ;   et al.
2018-10-25
FinFET device with epitaxial structures that wrap around the fins and the method of fabricating the same
Grant 10,103,146 - Yu , et al. October 16, 2
2018-10-16
Self-aligned gate hard mask and method forming same
Grant 10,062,784 - Lee , et al. August 28, 2
2018-08-28
Forming transistor by selectively growing gate spacer
Grant 10,037,923 - Lee , et al. July 31, 2
2018-07-31
Finfet Device With Epitaxial Structures That Wrap Around The Fins And The Method Of Fabricating The Same
App 20180166442 - Yu; Chia-Ta ;   et al.
2018-06-14
Methods for reducing contact resistance in semiconductors manufacturing process
Grant 9,997,631 - Yang , et al. June 12, 2
2018-06-12
FinFET device with epitaxial structures that wrap around the fins and the method of fabricating the same
Grant 9,865,595 - Yu , et al. January 9, 2
2018-01-09
Methods For Reducing Contact Resistance In Semiconductor Manufacturing Process
App 20170352762 - YANG; Cheng-Yu ;   et al.
2017-12-07
Semiconductor Device And Manufacturing Method Thereof
App 20170207095 - LEE; Kai-Hsuan ;   et al.
2017-07-20
Semiconductor Device And Manufacturing Method Thereof
App 20170125304 - WANG; Sheng-Chen ;   et al.
2017-05-04
Structure and formation method of FinFET device
Grant 9,570,613 - Lee , et al. February 14, 2
2017-02-14
Structure and formation method of FinFET device
Grant 9,496,264 - Lee , et al. November 15, 2
2016-11-15
Semiconductor device and manufacturing method thereof
Grant 9,449,882 - Wang , et al. September 20, 2
2016-09-20
Structure And Formation Method Of Finfet Device
App 20160240536 - LEE; Kai-Hsuan ;   et al.
2016-08-18
Structure And Formation Method Of Finfet Device
App 20160240651 - LEE; Kai-Hsuan ;   et al.
2016-08-18

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