| Patent | Date |
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Method Of Forming A Thin Film Using A Surface Protection Material
App 20210130954 - LEE; Geun Su ; et al. | 2021-05-06 |
Precursor composition containing group IV organic compound and method for forming thin film using same
Grant 10,597,777 - Lee , et al. | 2020-03-24 |
Precursor Composition Containing Group Iv Organic Compound And Method For Forming Thin Film Using Same
App 20180347042 - LEE; Geun-Su ; et al. | 2018-12-06 |
Gap-fill polymer for filling fine pattern gaps and method for fabricating semiconductor device using the same
Grant 9,892,964 - Moon , et al. February 13, 2 | 2018-02-13 |
Gap-fill Polymer For Filling Fine Pattern Gaps And Method For Fabricating Semiconductor Device Using The Same
App 20180033688 - MOON; Ji Won ; et al. | 2018-02-01 |
Organic Germanium Amine Compound and Method for Depositing Thin Film Using the Same
App 20170117142 - Lee; Geun Su ; et al. | 2017-04-27 |
Precursor Composition for Forming Zirconium-Containing Film and Method for Forming Zirconium-Containing Film Using Same
App 20160362786 - Lee; Geun Su ; et al. | 2016-12-15 |
Method for forming silicon oxide film of semiconductor device
Grant 9,029,273 - Park , et al. May 12, 2 | 2015-05-12 |
Method For Forming Silicon Oxide Film Of Semiconductor Device
App 20140057458 - PARK; Hyung Soon ; et al. | 2014-02-27 |
Method of manufacturing a capacitor
Grant 8,202,443 - Lee June 19, 2 | 2012-06-19 |
Method of Manufacturing a Capacitor
App 20100317171 - Lee; Geun Su | 2010-12-16 |
Method for forming a photoresist pattern
Grant 7,781,145 - Lee , et al. August 24, 2 | 2010-08-24 |
Photoresist coating composition and method for forming fine pattern using the same
Grant 7,615,338 - Lee , et al. November 10, 2 | 2009-11-10 |
Cleaning solution for removing photoresist
Grant 7,563,753 - Lee , et al. July 21, 2 | 2009-07-21 |
Method for forming a photoresist pattern
Grant 7,467,632 - Lee , et al. December 23, 2 | 2008-12-23 |
Hard mask composition and method for manufacturing semiconductor device
Grant 7,449,538 - Lee November 11, 2 | 2008-11-11 |
Water-soluble negative photoresist polymer and composition containing the same
Grant 7,399,570 - Lee July 15, 2 | 2008-07-15 |
Etching composition and method for manufacturing a capacitor using the same
App 20080166842 - Lee; Geun Su | 2008-07-10 |
Photoresist coating composition and method for forming fine pattern using the same
Grant 7,390,611 - Lee June 24, 2 | 2008-06-24 |
Method for Forming a Photoresist Pattern
App 20080138747 - Lee; Geun Su ; et al. | 2008-06-12 |
Method for pattern formation using photoresist cleaning solution
Grant 7,364,837 - Lee , et al. April 29, 2 | 2008-04-29 |
Composition For Preventing Leaning In Formation Of Capacitor, And Method For Manufacturing Capacitor Using The Same
App 20080083920 - Lee; Geun Su | 2008-04-10 |
Photoresist polymer and photoresist composition containing the same
Grant 7,338,742 - Lee March 4, 2 | 2008-03-04 |
Process for forming a fine pattern using a top-coating composition for a photoresist and product formed by same
Grant 7,329,477 - Jung , et al. February 12, 2 | 2008-02-12 |
Cleaning solution for photoresist and method for forming pattern using the same
Grant 7,314,853 - Lee , et al. January 1, 2 | 2008-01-01 |
Method for Pattern Formation Using Photoresist Cleaning Solution
App 20070269752 - Lee; Won Wook ; et al. | 2007-11-22 |
Water-soluble negative photoresist polymer, composition containing the same, and method of forming a photoresist pattern
Grant 7,270,934 - Lee September 18, 2 | 2007-09-18 |
Method for forming a photoresist pattern
App 20070163625 - Lee; Geun Su ; et al. | 2007-07-19 |
Hard Mask Composition and Method for Manufacturing Semiconductor Device
App 20070154838 - Lee; Geun Su | 2007-07-05 |
Composition for hard mask and method for manufacturing semiconductor device
App 20070154837 - Lee; Ki Lyoung ; et al. | 2007-07-05 |
Cleaning solution for photoresist and method for forming pattern using the same
Grant 7,238,653 - Lee , et al. July 3, 2 | 2007-07-03 |
Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator
Grant 7,235,349 - Lee , et al. June 26, 2 | 2007-06-26 |
Cross-linking monomers for photoresist, and process for preparing photoresist polymers using the same
Grant 7,208,260 - Jung , et al. April 24, 2 | 2007-04-24 |
Thinner composition for inhibiting photoresist from drying
App 20070087951 - Lee; Geun Su ; et al. | 2007-04-19 |
Additive for photoresist composition for resist flow process
Grant 7,150,961 - Jung , et al. December 19, 2 | 2006-12-19 |
Photoresist coating composition and method for forming fine pattern using the same
App 20060263716 - Lee; Geun Su | 2006-11-23 |
Photoresist coating composition and method for forming fine pattern using the same
App 20060263717 - Lee; Geun Su ; et al. | 2006-11-23 |
Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator
Grant 7,138,218 - Lee , et al. November 21, 2 | 2006-11-21 |
Organic anti-reflective coating composition and pattern forming method using the same
Grant 7,132,217 - Lee , et al. November 7, 2 | 2006-11-07 |
Method for preparing semiconductor device
App 20060246382 - Lee; Geun Su ; et al. | 2006-11-02 |
Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator
App 20060183050 - Lee; Sung Koo ; et al. | 2006-08-17 |
Photoresist polymer and photoresist composition containing the same
Grant 7,083,893 - Lee August 1, 2 | 2006-08-01 |
Water-soluble composition for coating photoresist pattern and method for forming fine patterns using the same
App 20060147834 - Lee; Geun Su ; et al. | 2006-07-06 |
Composition for coating a photoresist pattern
App 20060141390 - Lee; Geun Su ; et al. | 2006-06-29 |
Solution composition for removing a remaining photoresist resin
Grant 7,056,872 - Lee , et al. June 6, 2 | 2006-06-06 |
Method of preparing anti-reflective coating polymer and anti-reflecting coating composition comprising an anti-reflecting coating polymer
Grant 7,033,732 - Lee April 25, 2 | 2006-04-25 |
Photoresist polymer and photoresist composition containing the same
Grant 7,022,458 - Lee , et al. April 4, 2 | 2006-04-04 |
Photoresist polymers and photoresist compositions comprising the same
Grant 7,011,924 - Lee March 14, 2 | 2006-03-14 |
Organic anti-reflective coating polymers, anti-reflective coating composition comprising the same and preparation methods thereof
Grant 6,998,442 - Jung , et al. February 14, 2 | 2006-02-14 |
Top-coating composition for photoresist and process for forming fine pattern using the same
Grant 6,984,482 - Jung , et al. January 10, 2 | 2006-01-10 |
Water-soluble negative photoresist polymer and composition containing the same
App 20050282080 - Lee, Geun Su | 2005-12-22 |
Water-soluble negative photoresist polymer, composition containing the same, and method of forming a photoresist pattern
App 20050282079 - Lee, Geun Su | 2005-12-22 |
Cleaning solution for photoresist, method for forming a photoresist pattern using the same, and semiconductor device
App 20050233921 - Lee, Geun Su ; et al. | 2005-10-20 |
Photoresist monomers, polymers and photoresist compositions for preventing acid diffusion
Grant 6,924,078 - Lee , et al. August 2, 2 | 2005-08-02 |
Photoresist monomers, polymers thereof and photoresist compositions containing the same
Grant 6,921,622 - Lee , et al. July 26, 2 | 2005-07-26 |
Photoresist cleaning solutions and methods for pattern formation using the same
App 20050153855 - Lee, Geun Su ; et al. | 2005-07-14 |
Photoresist cleaning solutions and methods for pattern formation using the same
App 20050109992 - Lee, Won Wook ; et al. | 2005-05-26 |
Photoresist polymer and photoresist composition containing the same
App 20050089800 - Lee, Geun Su | 2005-04-28 |
Cleaning solution for photoresist and method for forming pattern using the same
App 20050074709 - Lee, Geun Su ; et al. | 2005-04-07 |
Process for forming a fine pattern using a top-coating composition for a photoresist and product formed by same
App 20050069816 - Jung, Jae Chang ; et al. | 2005-03-31 |
Photoresist composition
Grant 6,861,199 - Lee March 1, 2 | 2005-03-01 |
Maleimide-photoresist monomers containing halogen, polymers thereof and photoresist compositions comprising the same
Grant 6,858,371 - Lee , et al. February 22, 2 | 2005-02-22 |
Top anti-reflective coating polymer, its preparation method and anti-reflective coating composition comprising the same
App 20050026076 - Lee, Geun Su | 2005-02-03 |
Photoresist polymer and photoresist composition containing the same
App 20050026070 - Lee, Geun Su ; et al. | 2005-02-03 |
Photoresist polymers and photoresist compositions comprising the same
App 20050026071 - Lee, Geun Su | 2005-02-03 |
Photoresist monomers, polymers thereof and photoresist compositions containing the same
Grant 6,849,375 - Lee , et al. February 1, 2 | 2005-02-01 |
Organic anti-reflective coating composition and pattern forming method using the same
App 20050014094 - Lee, Geun Su ; et al. | 2005-01-20 |
Cleaning solution for removing photoresist
Grant 6,841,526 - Lee , et al. January 11, 2 | 2005-01-11 |
Photoresist polymer and photoresist composition containing the same
App 20040265735 - Lee, Geun Su | 2004-12-30 |
Photoresist composition for resist flow process
Grant 6,824,951 - Lee , et al. November 30, 2 | 2004-11-30 |
Cross-linker monomer comprising double bond and photoresist copolymer containing the same
Grant 6,818,376 - Lee , et al. November 16, 2 | 2004-11-16 |
Partially crosslinked polymer for bilayer photoresist
Grant 6,811,960 - Lee , et al. November 2, 2 | 2004-11-02 |
Photoresist monomers, polymers thereof and photoresist compositons containing the same
Grant 6,806,025 - Lee , et al. October 19, 2 | 2004-10-19 |
Cleaning solution for photoresist and method for forming pattern using the same
App 20040180293 - Lee, Geun Su ; et al. | 2004-09-16 |
Additive for photoresist composition for resist flow process
App 20040166437 - Jung, Min Ho ; et al. | 2004-08-26 |
Photoresist polymer for top-surface imaging process by silylation and photoresist composition containing the same
Grant 6,770,415 - Lee , et al. August 3, 2 | 2004-08-03 |
Additive for photoresist composition for resist flow process
Grant 6,770,414 - Jung , et al. August 3, 2 | 2004-08-03 |
Photoresist composition
App 20040131965 - Lee, Geun Su | 2004-07-08 |
Photoresist monomers, polymers thereof and photoresist compositions using the same
Grant 6,753,448 - Lee , et al. June 22, 2 | 2004-06-22 |
Photoresist additive for preventing acid migration and photoresist composition comprising the same
Grant 6,753,128 - Lee , et al. June 22, 2 | 2004-06-22 |
Chemical amplification photoresist monomers, polymers therefrom and photoresist compositions containing the same
Grant 6,749,990 - Jung , et al. June 15, 2 | 2004-06-15 |
Photoresist monomers containing fluorine-substituted benzylcarboxylate and photoresist polymers comprising the same
Grant 6,737,217 - Lee , et al. May 18, 2 | 2004-05-18 |
Organic anti-reflective coating polymers, anti-reflective coating composition comprising the same and preparation methods thereof
App 20040091623 - Jung, Min-Ho ; et al. | 2004-05-13 |
Maleimide-photoresist polymers containing fluorine and photoresist compositions comprising the same
Grant 6,720,129 - Lee , et al. April 13, 2 | 2004-04-13 |
Process for forming a photoresist pattern comprising alkaline treatment
Grant 6,699,644 - Lee , et al. March 2, 2 | 2004-03-02 |
Photoresist composition containing photo radical generator with photoacid generator
Grant 6,692,891 - Jung , et al. February 17, 2 | 2004-02-17 |
Photoresist monomer, polymer thereof and photoresist composition containing the same
Grant 6,686,123 - Lee , et al. February 3, 2 | 2004-02-03 |
Photoresist monomers containing fluorine-substituted benzylcarboxylate and photoresist polymers comprising the same
Grant 6,653,047 - Lee , et al. November 25, 2 | 2003-11-25 |
Partially crosslinked polymer for bilayer photoresist
App 20030207205 - Lee, Geun Su ; et al. | 2003-11-06 |
Photoresist composition for top-surface imaging processes by silylation
Grant 6,630,281 - Koh , et al. October 7, 2 | 2003-10-07 |
Photoresist monomer comprising bisphenol derivatives and polymers thereof
Grant 6,627,383 - Lee , et al. September 30, 2 | 2003-09-30 |
Photoresist composition for resist flow process, and process for forming contact hole using the same
Grant 6,627,379 - Kim , et al. September 30, 2 | 2003-09-30 |
Photoresist polymer and composition having nitro groups
Grant 6,613,493 - Lee , et al. September 2, 2 | 2003-09-02 |
Method for forming micro-pattern of semiconductor device
Grant 6,610,616 - Koh , et al. August 26, 2 | 2003-08-26 |
Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator
App 20030148212 - Lee, Sung Koo ; et al. | 2003-08-07 |
Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and methods of preparation thereof
Grant 6,602,650 - Hong , et al. August 5, 2 | 2003-08-05 |
Novel photoresist monomers, polymers thereof and photoresist compositions using the same
App 20030144567 - Lee, Geun Su ; et al. | 2003-07-31 |
Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and method of preparation thereof
Grant 6,599,678 - Hong , et al. July 29, 2 | 2003-07-29 |
Cleaning solution for removing photoresist
App 20030130148 - Lee, Geun Su ; et al. | 2003-07-10 |
Partially crosslinked polymer for bilayer photoresist
Grant 6,589,707 - Lee , et al. July 8, 2 | 2003-07-08 |
Top-coating composition for photoresist and process for forming fine pattern using the same
App 20030108815 - Jung, Jae Chang ; et al. | 2003-06-12 |
Photoresist monomers, polymers and photoresist compositions for preventing acid diffusion
App 20030091927 - Lee, Geun Su ; et al. | 2003-05-15 |
Cleaning solution for removing photoresist
App 20030083215 - Lee, Geun-Su ; et al. | 2003-05-01 |
Photoresist additive for preventing acid migration and photoresist composition comprising the same
App 20030082481 - Lee, Geun Su ; et al. | 2003-05-01 |
Solution composition for removing a remaining photoresist resin
App 20030060382 - Lee, Geun Su ; et al. | 2003-03-27 |
Photoresist monomers, polymers thereof and photoresist compositions containing the same
App 20030022101 - Lee, Geun Su ; et al. | 2003-01-30 |
Photoresist monomers containing fluorine-substituted benzylcarboxylate and photoresist polymers comprising the same
App 20030022103 - Lee, Geun Su ; et al. | 2003-01-30 |
Photoresist monomers, polymers thereof and photoresist compositions containing the same
App 20030022100 - Lee, Geun Su ; et al. | 2003-01-30 |
Photoresist monomers containing fluorine-substituted benzylcarboxylate and photoresist polymers comprising the same
App 20030017412 - Lee, Geun Su ; et al. | 2003-01-23 |
Chemical amplification photoresist monomers, polymers therefrom and photoresist compositions containing the same
App 20030017404 - Jung, Jae Chang ; et al. | 2003-01-23 |
Maleimide-photoresist monomers containing halogen, polymers thereof and photoresist compositions comprising the same
App 20030013037 - Lee, Geun Su ; et al. | 2003-01-16 |
Photoresist polymer and composition having nitro groups
App 20030013036 - Lee, Geun Su ; et al. | 2003-01-16 |
Photoresist monomers, polymers thereof and photoresist compositons containing the same
App 20030003379 - Lee, Geun Su ; et al. | 2003-01-02 |
Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and methods of preparation thereof
App 20030003397 - Hong, Sung-eun ; et al. | 2003-01-02 |
Organic anti-reflective coating polymer and preparation thereof
Grant 6,489,432 - Jung , et al. December 3, 2 | 2002-12-03 |
Cross-linking monomers for photoresist, and process for preparing photoresist polymers using the same
App 20020177069 - Jung, Jae Chang ; et al. | 2002-11-28 |
Organic anti-reflective coating polymer, anti-reflective coating composition methods of preparation thereof
Grant 6,486,283 - Hong , et al. November 26, 2 | 2002-11-26 |
Maleimide-photoresist polymers containing fluorine and photoresist compositions comprising the same
App 20020164541 - Lee, Geun Su ; et al. | 2002-11-07 |
Cross-linker monomer comprising double bond and photoresist copolymer containing the same
App 20020160301 - Lee, Geun Su ; et al. | 2002-10-31 |
Novel photoresist monomer, polymer thereof and photoresist composition containing it
App 20020151666 - Jung, Min Ho ; et al. | 2002-10-17 |
Photoresist monomers having stability to post exposure delay, polymers thereof and photoresist compositions containing the same
Grant 6,455,225 - Kong , et al. September 24, 2 | 2002-09-24 |
Organic anti-reflective coating polymers, anti-reflective coating composition comprising the same and preparation methods thereof
App 20020128410 - Jung, Min-Ho ; et al. | 2002-09-12 |
Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and method of preparation thereof
App 20020127789 - Hong, Sung-Eun ; et al. | 2002-09-12 |
Photoresist monomer, polymer thereof and photoresist composition containing it
Grant 6,448,352 - Jung , et al. September 10, 2 | 2002-09-10 |
Organic anti-reflective coating polymer, anti-reflective coating composition methods of preparation thereof
App 20020123586 - Hong, Sung-Eun ; et al. | 2002-09-05 |
Photoresist monomer, polymer thereof and photoresist composition containing it
Grant 6,426,171 - Jung , et al. July 30, 2 | 2002-07-30 |
Organic anti-reflective coating polymer, anti-reflective coating composition and methods of preparation thereof
App 20020093069 - Hong, Sung-Eun ; et al. | 2002-07-18 |
Organic anti-reflective coating polymer, anti-reflective coating composition and methods of preparation thereof
App 20020090452 - Hong, Sung-Eun ; et al. | 2002-07-11 |
Novel photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same
App 20020091216 - Lee, Geun Su ; et al. | 2002-07-11 |
Method for forming micro-pattern of semiconductor device
App 20020090832 - Koh, Cha-Won ; et al. | 2002-07-11 |
Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same
Grant 6,410,670 - Lee , et al. June 25, 2 | 2002-06-25 |
Photoresist monomer, polymer thereof and photoresist composition containing the same
App 20020061466 - Lee, Geun Su ; et al. | 2002-05-23 |
Photoresist polymer for top-surface imaging process by silylation and photoresist composition containing the same
App 20020061461 - Lee, Geun Su ; et al. | 2002-05-23 |
Polymers and photoresist compositions using the same
Grant 6,391,518 - Jung , et al. May 21, 2 | 2002-05-21 |
Photoresist monomer comprising bisphenol derivatives and polymers thereof
App 20020051940 - Lee, Geun Su ; et al. | 2002-05-02 |
Photoresist composition for resist flow process
App 20020048723 - Lee, Geun Su ; et al. | 2002-04-25 |
Photoresist composition for top-surface imaging processes by silylation
App 20020031721 - Koh, Cha Won ; et al. | 2002-03-14 |
Photoresist composition for resist flow process, and process for forming contact hole using the same
App 20020028405 - Kim, Jin Soo ; et al. | 2002-03-07 |
Partially crosslinked polymer for bilayer photoresist
App 20020028406 - Lee, Geun Su ; et al. | 2002-03-07 |
Additive for photoresist composition for resist flow process
App 20020022197 - Jung, Min Ho ; et al. | 2002-02-21 |
Novel photoresist polymers, and photoresist compositions containing the same
App 20020018960 - Lee, Geun Su ; et al. | 2002-02-14 |
Multi-oxygen containing compound for preventing acid diffusion, and photoresist composition containing the same
App 20020015917 - Lee, Geun Su ; et al. | 2002-02-07 |
Photoresist composition containing photo radical generator with photoacid generator
App 20020012873 - Jung, Jae Chang ; et al. | 2002-01-31 |
Organic anti-reflective coating polymer and preparation thereof
App 20010049429 - Jung, Min-ho ; et al. | 2001-12-06 |
Polymer and a forming method of a micro pattern using the same
Grant 6,316,162 - Jung , et al. November 13, 2 | 2001-11-13 |
Organic anti-reflective coating polymer and preparation thereof
App 20010034427 - Jung, Min-Ho ; et al. | 2001-10-25 |
Partially crosslinked polymer for bilayer photoresist
App 20010031420 - Lee, Geun Su ; et al. | 2001-10-18 |
Monomers for photoresist, polymers thereof, and photoresist compositions using the same
Grant 6,291,131 - Jung , et al. September 18, 2 | 2001-09-18 |
Photoresist polymers of carboxyl-containing alicyclic compounds
Grant 6,265,130 - Lee , et al. July 24, 2 | 2001-07-24 |
Photoresist monomers, polymers thereof, and photoresist compositions containing the same
Grant 6,235,448 - Lee , et al. May 22, 2 | 2001-05-22 |
Photoresist monomers, polymers thereof, and photoresist compositions containing the same
Grant 6,235,447 - Lee , et al. May 22, 2 | 2001-05-22 |
Polymer and a forming method of a micro pattern using the same
Grant 6,225,020 - Jung , et al. May 1, 2 | 2001-05-01 |
Oxabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same
Grant 6,150,069 - Jung , et al. November 21, 2 | 2000-11-21 |
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