Lee; Evans Y.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Lee; Evans Y..The latest application filed is for "dielectric etch chamber with expanded process window".

Company Profile

0.11.9

Lee; Evans Y. - Milpitas CA
Lee; Evans Y - Milpitas CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactor Grant 7,374,636 - Horioka , et al. May 20, 2	2008-05-20
Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber Grant 7,316,199 - Horioka , et al. January 8, 2	2008-01-08
Double slit-valve doors for plasma processing Grant 7,147,719 - Welch , et al. December 12, 2	2006-12-12
Temperature controlled window with a fluid supply system Grant 6,916,399 - Rozenzon , et al. July 12, 2	2005-07-12
Magnetic barrier for plasma in chamber exhaust Grant 6,863,835 - Carducci , et al. March 8, 2	2005-03-08
Dielectric etch chamber with expanded process window App 20050003675 - Carducci, James D. ; et al.	2005-01-06
Dielectric etch chamber with expanded process window Grant 6,797,639 - Carducci , et al. September 28, 2	2004-09-28
Magnetic barrier for plasma in chamber exhaust Grant 6,773,544 - Carducci , et al. August 10, 2	2004-08-10
Double slit-valve doors for plasma processing App 20040083978 - Welch, Michael D. ; et al.	2004-05-06
Dielectric etch chamber with expanded process window Grant 6,716,302 - Carducci , et al. April 6, 2	2004-04-06
Double slit-valve doors for plasma processing Grant 6,647,918 - Welch , et al. November 18, 2	2003-11-18
Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber App 20030085000 - Horioka, Keiji ; et al.	2003-05-08
Dielectric etch chamber with expanded process window App 20030037880 - Carducci, James D. ; et al.	2003-02-27
Dielectric etch chamber with expanded process window App 20030038111 - Carducci, James D. ; et al.	2003-02-27
Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactor App 20030006008 - Horioka, Keiji ; et al.	2003-01-09
Magnetic barrier for plasma in chamber exhaust App 20010032591 - Carducci, James D. ; et al.	2001-10-25
Magnetic barrier for plasma in chamber exhaust App 20010032590 - Carducci, James D. ; et al.	2001-10-25
Adjusting DC bias voltage in plasma chamber App 20010014540 - Shan, Hongching ; et al.	2001-08-16
Adjusting DC bias voltage in plasma chamber Grant 6,221,782 - Shan , et al. April 24, 2	2001-04-24
Double slit-valve doors for plasma processing Grant 6,192,827 - Welch , et al. February 27, 2	2001-02-27

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