| Patent | Date |
|---|
Method and system for calculating printed area metric indicative of stochastic variations of the lithographic process
Grant 11,270,054 - Jin , et al. March 8, 2 | 2022-03-08 |
Method and System for Calculating Printed Area Metric Indicative of Stochastic Variations of the Lithographic Process
App 20220067260 - Jin; Hyejin ; et al. | 2022-03-03 |
Method and system for calculating probability of success or failure for a lithographic process due to stochastic variations of the lithographic process
Grant 11,061,373 - Khaira , et al. July 13, 2 | 2021-07-13 |
Shrink process aware assist features
Grant 10,153,162 - Kim , et al. Dec | 2018-12-11 |
Shrink Process Aware Assist Features
App 20180096839 - KIM; Ryan Ryoung-Han ; et al. | 2018-04-05 |
Methods for fabricating integrated circuits using directed self-assembly including a substantially periodic array of topographical features that includes etch resistant topographical features for transferability control
Grant 9,530,662 - Latypov , et al. December 27, 2 | 2016-12-27 |
Methods For Fabricating Integrated Circuits Using Directed Self-assembly Including A Substantially Periodic Array Of Topographical Features That Includes Etch Resistant Topographical Features For Transferability Control
App 20160247686 - Latypov; Azat ; et al. | 2016-08-25 |
Methods for fabricating integrated circuits using designs of integrated circuits adapted to directed self-assembly fabrication to form via and contact structures
Grant 9,305,834 - Latypov , et al. April 5, 2 | 2016-04-05 |
Methods for fabricating integrated circuits using directed self-assembly including lithographically-printable assist features
Grant 9,305,800 - Coskun , et al. April 5, 2 | 2016-04-05 |
Methods for fabricating integrated circuits including generating photomasks for directed self-assembly (DSA) using DSA target patterns
Grant 9,286,434 - Zou , et al. March 15, 2 | 2016-03-15 |
Methods for fabricating integrated circuits including generating photomasks for directed self-assembly
Grant 9,208,275 - Wang , et al. December 8, 2 | 2015-12-08 |
Methods For Fabricating Integrated Circuits Including Generating Photomasks For Directed Self-assembly (dsa) Using Dsa Target Patterns
App 20150339429 - Zou; Yi ; et al. | 2015-11-26 |
Methods for fabricating integrated circuits including generating photomasks for directed self-assembly
Grant 9,170,501 - Latypov , et al. October 27, 2 | 2015-10-27 |
Methods For Fabricating Integrated Circuits Including Generating Photomasks For Directed Self-assembly
App 20150242555 - Wang; Wei-Long ; et al. | 2015-08-27 |
Methods For Fabricating Integrated Circuits Using Directed Self-assembly Including Lithographically-printable Assist Features
App 20150235839 - Coskun; Tamer ; et al. | 2015-08-20 |
Methods for fabricating integrated circuits including topographical features for directed self-assembly
Grant 9,053,923 - Latypov , et al. June 9, 2 | 2015-06-09 |
Methods For Fabricating Integrated Circuits Including Topographical Features For Directed Self-assembly
App 20150126034 - Latypov; Azat ; et al. | 2015-05-07 |
Methods For Fabricating Integrated Circuits Including Generating E-beam Patterns For Directed Self-assembly
App 20150126032 - Latypov; Azat ; et al. | 2015-05-07 |
Methods for fabricating integrated circuits including generating e-beam patterns for directed self-assembly
Grant 9,023,730 - Latypov , et al. May 5, 2 | 2015-05-05 |
Methods for fabricating integrated circuits including generating photomasks for directed self-assembly
Grant 9,009,634 - Latypov , et al. April 14, 2 | 2015-04-14 |
Methods For Fabricating Integrated Circuits Including Generating Photomasks For Directed Self-assembly
App 20150012897 - Latypov; Azat ; et al. | 2015-01-08 |
Methods For Fabricating Integrated Circuits Including Generating Photomasks For Directed Self-assembly
App 20150012896 - Latypov; Azat ; et al. | 2015-01-08 |
Method and apparatus for providing metric relating two or more process parameters to yield
Grant 8,856,698 - Latypov October 7, 2 | 2014-10-07 |
Method And Apparatus For Providing Metric Relating Two Or More Process Parameters To Yield
App 20140282307 - LATYPOV; Azat | 2014-09-18 |
Methods for directed self-assembly process/proximity correction
Grant 8,667,430 - Latypov March 4, 2 | 2014-03-04 |
Methods for directed self-assembly process/proximity correction
Grant 8,667,428 - Latypov March 4, 2 | 2014-03-04 |
Methods, systems, and computer program products for printing patterns on photosensitive surfaces
Grant 7,777,861 - Latypov , et al. August 17, 2 | 2010-08-17 |
Methods and systems to compensate for a stitching disturbance of a printed pattern
Grant 7,773,199 - Bleeker , et al. August 10, 2 | 2010-08-10 |
Method and system for wavefront measurements of an optical system
Grant 7,768,653 - Latypov , et al. August 3, 2 | 2010-08-03 |
Methods and systems to compensate for a stitching disturbance of a printed pattern
Grant 7,630,054 - Bleeker , et al. December 8, 2 | 2009-12-08 |
Methods and Systems to Compensate for a Stitching Disturbance of a Printed Pattern in a Maskless Lithography System Not Utilizing Overlap of the Exposure Zones
App 20090033893 - Bleeker; Arno ; et al. | 2009-02-05 |
Method and system for a maskless lithography rasterization technique based on global optimization
Grant 7,469,058 - Latypov , et al. December 23, 2 | 2008-12-23 |
Using time and/or power modulation to achieve dose gray-scale in optical maskless lithography
Grant 7,463,402 - Cebuhar , et al. December 9, 2 | 2008-12-09 |
Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones
Grant 7,410,736 - Bleeker , et al. August 12, 2 | 2008-08-12 |
Methods and systems to compensate for a stitching disturbance of a printed pattern
App 20080094595 - Bleeker; Arno ; et al. | 2008-04-24 |
Methods and systems to compensate for a stitching disturbance of a printed pattern
App 20080094596 - Bleeker; Arno ; et al. | 2008-04-24 |
Methods, Systems, and Computer Program Products for Printing Patterns on Photosensitive Surfaces
App 20080079923 - Latypov; Azat ; et al. | 2008-04-03 |
Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuation
Grant 7,259,831 - Latypov , et al. August 21, 2 | 2007-08-21 |
Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region
App 20070146672 - Bleeker; Arno ; et al. | 2007-06-28 |
Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuation
App 20060256312 - Latypov; Azat ; et al. | 2006-11-16 |
Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region
Grant 7,133,121 - Bleeker , et al. November 7, 2 | 2006-11-07 |
Method and system for a maskless lithography rasterization technique based on global optimization
App 20060209314 - Latypov; Azat ; et al. | 2006-09-21 |
Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography
App 20060114546 - Cebuhar; Wenceslao A. ; et al. | 2006-06-01 |
Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuation
Grant 7,023,526 - Latypov , et al. April 4, 2 | 2006-04-04 |
Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography
Grant 6,985,280 - Cebuhar , et al. January 10, 2 | 2006-01-10 |
Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region
App 20050170267 - Bleeker, Arno ; et al. | 2005-08-04 |
Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography
App 20050094245 - Cebuhar, Wenceslao A. ; et al. | 2005-05-05 |
Methods And Systems To Compensate For A Stitching Disturbance Of A Printed Pattern In A Maskless Lithography System Utilizing Overlap Of Exposure Zones With Attenuation Of The Aerial Image In The Overlap Region
Grant 6,876,440 - Bleeker , et al. April 5, 2 | 2005-04-05 |
Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuation
App 20050068509 - Latypov, Azat ; et al. | 2005-03-31 |
Methods And Systems To Compensate For A Stitching Disturbance Of A Printed Pattern In A Maskless Lithography System Utilizing Overlap Of Exposure Zones With Attenuation Of The Aerial Image In The Overlap Region
App 20050068514 - Bleeker, Arno ; et al. | 2005-03-31 |
Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones
App 20050068467 - Bleeker, Arno ; et al. | 2005-03-31 |
Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography
Grant 6,831,768 - Cebuhar , et al. December 14, 2 | 2004-12-14 |
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