Lam Research Corporation, a Delaware Corporation

Patent Applications and Registrations

Patent applications and USPTO patent grants for Lam Research Corporation, a Delaware Corporation.The latest application filed is for "etch rate uniformity using the independent movement of electrode pieces".

Company Profile

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Lam Research Corporation, a Delaware Corporation -

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Etch rate uniformity using the independent movement of electrode pieces App 20060278339 - Kim; Jisoo ; et al.	2006-12-14
Confined plasma with adjustable electrode area ratio App 20060278340 - Fischer; Andreas	2006-12-14
Method and apparatus for controlling spatial temperature distribution App 20050211385 - Benjamin, Neil ; et al.	2005-09-29
Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support App 20050173403 - Benjamin, Neil ; et al.	2005-08-11
Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support App 20050173404 - Benjamin, Neil ; et al.	2005-08-11
Method for toolmatching and troubleshooting a plasma processing system App 20050151479 - Avoyan, Armen ; et al.	2005-07-14
Method for toolmatching and troubleshooting a plasma processing system App 20040061448 - Avoyan, Armen ; et al.	2004-04-01
Apparatus and method for controlling the voltage applied to an electrostatic shield used in a plasma generator App 20030205557 - Benjamin, Neil ; et al.	2003-11-06
Variable temperature processes for tunable electrostatic chuck App 20030186545 - Kamp, Tom A. ; et al.	2003-10-02
Etch rate uniformity App 20030148611 - Dhindsa, Rajinder ; et al.	2003-08-07

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