| Patent | Date |
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Inductive plasma source with metallic shower head using b-field concentrator
Grant 11,450,509 - Lai , et al. September 20, 2 | 2022-09-20 |
Magnetic-material Shield Around Plasma Chambers Near Pedestal
App 20220139679 - KONNOTH JOSEPH; Job George ; et al. | 2022-05-05 |
Magnetic Holding Structures For Plasma Processing Applications
App 20220122866 - NGUYEN; Andrew ; et al. | 2022-04-21 |
Radio frequency conduit
Grant D946,534 - Fischbach , et al. March 22, 2 | 2022-03-22 |
Single Chamber Flowable Film Formation And Treatments
App 20220076922 - Paul; Khokan Chandra ; et al. | 2022-03-10 |
Semiconductor Processing Chambers For Deposition And Etch
App 20220076920 - Paul; Khokan Chandra ; et al. | 2022-03-10 |
Showerhead Design To Control Stray Deposition
App 20220064797 - DHANAKSHIRUR; Akshay ; et al. | 2022-03-03 |
Method And Apparatus For Selective Nitridation Process
App 20210202702 - ROGERS; Matthew Scott ; et al. | 2021-07-01 |
Method and apparatus for selective nitridation process
Grant 10,950,698 - Rogers , et al. March 16, 2 | 2021-03-16 |
Chamber member of a plasma source and pedestal with radially outward positioned lift pins for translation of a substrate c-ring
Grant 10,699,878 - Caron , et al. | 2020-06-30 |
Inductive Plasma Source With Metallic Shower Head Using B-field Concentrator
App 20200144027 - LAI; Canfeng ; et al. | 2020-05-07 |
Inductive plasma source with metallic shower head using B-field concentrator
Grant 10,529,541 - Lai , et al. J | 2020-01-07 |
Methods And Apparatuses For Controlling Transitions Between Continuous Wave And Pulsing Plasmas
App 20170330764 - Lai; Canfeng ; et al. | 2017-11-16 |
Chamber Memeber Of A Plasma Source And Pedestal With Radially Outward Positioned Lift Pins For Translation Of A Substrate C-ring
App 20170236688 - Caron; James Eugene ; et al. | 2017-08-17 |
Inductive Plasma Source With Metallic Shower Head Using B-field Concentrator
App 20170194128 - LAI; Canfeng ; et al. | 2017-07-06 |
Systems And Methods For Producing Energetic Neutrals
App 20160013020 - Ashtiani; Kaihan ; et al. | 2016-01-14 |
Methods And Apparatus For Processing Substrates Using An Ion Shield
App 20150332941 - TOBIN; JEFFREY ; et al. | 2015-11-19 |
Methods and apparatus for processing substrates using an ion shield
Grant 9,048,190 - Tobin , et al. June 2, 2 | 2015-06-02 |
Methods And Apparatus For Processing Substrates Using An Ion Shield
App 20140099795 - TOBIN; JEFFREY ; et al. | 2014-04-10 |
Methods And Apparatus For Controlling Power Distribution In Substrate Processing Systems
App 20130014894 - LAI; CANFENG ; et al. | 2013-01-17 |
Methods And Apparatus For Controlling Power Distribution In Substrate Processing Systems
App 20130017315 - LAI; CANFENG ; et al. | 2013-01-17 |
Ceiling electrode with process gas dispersers housing plural inductive RF power applicators extending into the plasma
Grant 8,317,970 - Lai , et al. November 27, 2 | 2012-11-27 |
Dual Plasma Source, Lamp Heated Plasma Chamber
App 20120222618 - Olsen; Christopher ; et al. | 2012-09-06 |
Inductive Plasma Source With Metallic Shower Head Using B-field Concentrator
App 20110278260 - Lai; Canfeng ; et al. | 2011-11-17 |
Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechucking
Grant 8,003,500 - Vellaikal , et al. August 23, 2 | 2011-08-23 |
Internal balanced coil for inductively coupled high density plasma processing chamber
Grant 7,789,993 - Chen , et al. September 7, 2 | 2010-09-07 |
Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechucking
Grant 7,659,184 - Vellaikal , et al. February 9, 2 | 2010-02-09 |
Two-piece dome with separate RF coils for inductively coupled plasma reactors
Grant 7,651,587 - Lu , et al. January 26, 2 | 2010-01-26 |
Ceiling Electrode With Process Gas Dispersers Housing Plural Inductive Rf Power Applicators Extending Into The Plasma
App 20090294065 - LAI; CANFENG ; et al. | 2009-12-03 |
Plasma Immersion Ion Implantation Process With Chamber Seasoning And Seasoning Layer Plasma Discharging For Wafer Dechucking
App 20090280628 - Vellaikal; Manoj ; et al. | 2009-11-12 |
Low-frequency Bias Power In Hdp-cvd Processes
App 20090263594 - Wang; Rongping ; et al. | 2009-10-22 |
Chamber clean method using remote and in situ plasma cleaning systems
Grant 7,588,036 - Cui , et al. September 15, 2 | 2009-09-15 |
Plasma Immersion Ion Implantation Process With Chamber Seasoning And Seasoning Layer Plasma Discharging For Wafer Dechucking
App 20090215251 - Vellaikal; Manoj ; et al. | 2009-08-27 |
Internal balanced coil for inductively coupled high density plasma processing chamber
Grant 7,572,647 - Chen , et al. August 11, 2 | 2009-08-11 |
Low-frequency bias power in HDP-CVD processes
Grant 7,571,698 - Wang , et al. August 11, 2 | 2009-08-11 |
Internal Balanced Coil For Inductively Coupled High Density Plasma Processing Chamber
App 20080188087 - CHEN; ROBERT ; et al. | 2008-08-07 |
Internal Balanced Coil For Inductively Coupled High Density Plasma Processing Chamber
App 20080188090 - Chen; Robert ; et al. | 2008-08-07 |
Internal Balanced Coil For Inductively Coupled High Density Plasma Processing Chamber
App 20080185284 - Chen; Robert ; et al. | 2008-08-07 |
In situ application of etch back for improved deposition into high-aspect-ratio features
Grant 7,399,707 - Krishnaraj , et al. July 15, 2 | 2008-07-15 |
Multi-core transformer plasma source
Grant 7,363,876 - Lai , et al. April 29, 2 | 2008-04-29 |
Two-piece dome with separate RF coils for inductively coupled plasma reactors
App 20070037397 - Lu; Siqing ; et al. | 2007-02-15 |
Inductive plasma system with sidewall magnet
App 20060177600 - Lu; Siqing ; et al. | 2006-08-10 |
Low-frequency bias power in HDP-CVD processes
App 20060150913 - Wang; Rongping ; et al. | 2006-07-13 |
Magnetic-field concentration in inductively coupled plasma reactors
App 20060075967 - Lu; Siqing ; et al. | 2006-04-13 |
In situ application of etch back for improved deposition into high-aspect-ratio features
App 20050124166 - Krishnaraj, Padmanabhan ; et al. | 2005-06-09 |
Non-intrusive plasma probe
Grant 6,894,474 - Cox , et al. May 17, 2 | 2005-05-17 |
Atmospheric substrate processing apparatus for depositing multiple layers on a substrate
App 20050098115 - Barnes, Michael ; et al. | 2005-05-12 |
In situ application of etch back for improved deposition into high-aspect-ratio features
Grant 6,869,880 - Krishnaraj , et al. March 22, 2 | 2005-03-22 |
Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas
Grant 6,863,019 - Shamouilian , et al. March 8, 2 | 2005-03-08 |
Atmospheric substrate processing apparatus for depositing multiple layers on a substrate
Grant 6,841,006 - Barnes , et al. January 11, 2 | 2005-01-11 |
Multi-core transformer plasma source
App 20040226658 - Lai, Canfeng ; et al. | 2004-11-18 |
Multi-core transformer plasma source
App 20040226511 - Lai, Canfeng ; et al. | 2004-11-18 |
Multi-core transformer plasma source
App 20040226512 - Lai, Canfeng ; et al. | 2004-11-18 |
Multi-core transformer plasma source
App 20040185610 - Lai, Canfeng ; et al. | 2004-09-23 |
Multi-core transformer plasma source
App 20040182517 - Lai, Canfeng ; et al. | 2004-09-23 |
Multi-core transformer plasma source
Grant 6,755,150 - Lai , et al. June 29, 2 | 2004-06-29 |
Toroidal plasma source for plasma processing
Grant 6,712,020 - Cox , et al. March 30, 2 | 2004-03-30 |
Substrate support with extended radio frequency electrode upper surface
Grant 6,682,603 - Gondhalekar , et al. January 27, 2 | 2004-01-27 |
Chamber clean method using remote and in situ plasma cleaning systems
App 20040000321 - Cui, Zhenjiang ; et al. | 2004-01-01 |
Non-intrusive plasma probe
App 20030227283 - Cox, Michael S. ; et al. | 2003-12-11 |
Substrate Support With Extended Radio Frequency Electrode Upper Surface
App 20030211757 - Gondhalekar, Sudhir ; et al. | 2003-11-13 |
In situ application of etch back for improved deposition into high-aspect-ratio features
App 20030136332 - Krishnaraj, Padmanabhan ; et al. | 2003-07-24 |
Multi-core transformer plasma source
App 20030085205 - Lai, Canfeng ; et al. | 2003-05-08 |
Atmospheric substrate processing apparatus for depositing multiple layers on a substrate
App 20030039766 - Barnes, Michael ; et al. | 2003-02-27 |
Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas
App 20030036272 - Shamouilian, Shamouil ; et al. | 2003-02-20 |
Toroidal plasma source for plasma processing
App 20020157793 - Cox, Michael S. ; et al. | 2002-10-31 |
Directing a flow of gas in a substrate processing chamber
Grant 6,450,117 - Murugesh , et al. September 17, 2 | 2002-09-17 |
High-permeability Magnetic Shield For Improved Process Uniformity In Nonmagnetized Plasma Process Chambers
App 20020127350 - Ishikawa, Tetsuya ; et al. | 2002-09-12 |
High-permeability magnetic shield for improved process uniformity in nonmagnetized plasma process chambers
Grant 6,447,651 - Ishikawa , et al. September 10, 2 | 2002-09-10 |
Toroidal plasma source for plasma processing
Grant 6,418,874 - Cox , et al. July 16, 2 | 2002-07-16 |
Plasma assisted semiconductor substrate processing chamber having a plurality of ground path bridges
Grant 6,364,958 - Lai , et al. April 2, 2 | 2002-04-02 |
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