loadpatents
name:-0.058007955551147
name:-0.037909984588623
name:-0.0033738613128662
Kraehmer; Daniel Patent Filings

Kraehmer; Daniel

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kraehmer; Daniel.The latest application filed is for "lithography projection objective, and a method for correcting image defects of the same".

Company Profile
3.47.58
  • Kraehmer; Daniel - Essingen DE
  • - Essingen DE
  • Kraehmer; Daniel - Aalen N/A DE
  • Kraehmer, Daniel - Oberkochen DE
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Microlithography projection objective
Grant 10,281,824 - Feldmann , et al.
2019-05-07
Lithography Projection Objective, And A Method For Correcting Image Defects Of The Same
App 20190072861 - Loering; Ulrich ;   et al.
2019-03-07
Projection Objective For Microlithography
App 20180164474 - Kraehmer; Daniel ;   et al.
2018-06-14
Lithography projection objective, and a method for correcting image defects of the same
Grant 9,964,859 - Loering , et al. May 8, 2
2018-05-08
EUV light source for generating a usable output beam for a projection exposure apparatus
Grant 9,955,563 - Saenger , et al. April 24, 2
2018-04-24
Microlithographic Projection Exposure Apparatus
App 20170322343 - Kamenov; Vladimir ;   et al.
2017-11-09
Microlithographic projection exposure apparatus
Grant 9,733,395 - Kamenov , et al. August 15, 2
2017-08-15
Microlithography Projection Objective
App 20170192362 - Feldmann; Heiko ;   et al.
2017-07-06
Collector
Grant 9,645,503 - Saenger , et al. May 9, 2
2017-05-09
Illumination system for an EUV lithography device and facet mirror therefor
Grant 9,551,941 - Ruoff , et al. January 24, 2
2017-01-24
Mask for EUV lithography, EUV lithography system and method for optimising the imaging of a mask
Grant 9,535,332 - Ruoff , et al. January 3, 2
2017-01-03
Lithography Projection Objective, And A Method For Correcting Image Defects Of The Same
App 20160370709 - Loering; Ulrich ;   et al.
2016-12-22
Lithography projection objective, and a method for correcting image defects of the same
Grant 9,316,922 - Loering , et al. April 19, 2
2016-04-19
Illumination System For An Euv Lithography Device And Facet Mirror Therefor
App 20160004164 - Ruoff; Johannes ;   et al.
2016-01-07
Microlithography projection objective
Grant 9,097,984 - Feldmann , et al. August 4, 2
2015-08-04
Projection objective for microlithography with stray light compensation and related methods
Grant 9,063,439 - Goehnermeier , et al. June 23, 2
2015-06-23
Euv Light Source For Generating A Usable Output Beam For A Projection Exposure Apparatus
App 20150173163 - Saenger; Ingo ;   et al.
2015-06-18
Optical system for a microlithographic projection exposure apparatus
Grant 08922753 -
2014-12-30
Optical system for a microlithographic projection exposure apparatus
Grant 8,922,753 - Kraehmer , et al. December 30, 2
2014-12-30
Microlithography Projection Objective
App 20140333913 - Feldmann; Heiko ;   et al.
2014-11-13
Lithography Projection Objective, And A Method For Correcting Image Defects Of The Same
App 20140327891 - Loering; Ulrich ;   et al.
2014-11-06
Lithography projection objective, and a method for correcting image defects of the same
Grant 8,879,159 - Loering , et al. November 4, 2
2014-11-04
Microlithographic Projection Exposure Apparatus
App 20140320955 - Kamenov; Vladimir ;   et al.
2014-10-30
Microlithography Projection Objective
App 20140293256 - Feldmann; Heiko ;   et al.
2014-10-02
Optical System For A Microlithographic Projection Exposure Apparatus
App 20140268085 - Kraehmer; Daniel ;   et al.
2014-09-18
Collector
App 20140192339 - Saenger; Ingo ;   et al.
2014-07-10
Microlithographic exposure method as well as a projection exposure system for carrying out the method
Grant 8,767,181 - Gruner , et al. July 1, 2
2014-07-01
Optical system for microlithography
Grant 8,456,616 - Kraehmer , et al. June 4, 2
2013-06-04
Combination stop for catoptric projection arrangement
Grant 8,436,985 - Mann , et al. May 7, 2
2013-05-07
Mask For Euv Lithography, Euv Lithography System And Method For Optimising The Imaging Of A Mask
App 20130100428 - RUOFF; Johannes ;   et al.
2013-04-25
High transmission, high aperture catadioptric projection objective and projection exposure apparatus
Grant 8,345,222 - Kraehmer , et al. January 1, 2
2013-01-01
Projection objective of a microlithographic projection exposure apparatus
Grant 8,325,426 - Schuster , et al. December 4, 2
2012-12-04
Combination Stop For Catoptric Projection Arrangement
App 20120236272 - Mann; Hans-Juergen ;   et al.
2012-09-20
Polarization-modulating optical element and method for manufacturing thereof
Grant 8,213,079 - Kraehmer , et al. July 3, 2
2012-07-03
Combination stop for catoptric projection arrangement
Grant 8,208,127 - Mann , et al. June 26, 2
2012-06-26
Optimization and matching of optical systems by use of orientation Zernike polynomials
Grant 8,126,669 - Totzeck , et al. February 28, 2
2012-02-28
Lithography Projection Objective, And A Method For Correcting Image Defects Of The Same
App 20120019800 - Loering; Ulrich ;   et al.
2012-01-26
Lithography projection objective, and a method for correcting image defects of the same
Grant 8,054,557 - Loering , et al. November 8, 2
2011-11-08
Illumination system or projection lens of a microlithographic exposure system
Grant 8,031,326 - Totzeck , et al. October 4, 2
2011-10-04
Projection Objective Of A Microlithographic Projection Exposure Apparatus
App 20110235013 - Schuster; Karl-Heinz ;   et al.
2011-09-29
Microlithographic Projection Exposure Apparatus
App 20110222043 - Kamenov; Vladimir ;   et al.
2011-09-15
Projection objective of a microlithographic projection exposure apparatus
Grant 7,982,969 - Schuster , et al. July 19, 2
2011-07-19
Method for determining intensity distribution in the image plane of a projection exposure arrangement
Grant 7,961,297 - Greif-Wuestenbecker , et al. June 14, 2
2011-06-14
Polarization-modulating Optical Element And Method For Manufacturing Thereof
App 20110109894 - Kraehmer; Daniel ;   et al.
2011-05-12
Optical System For Microlithography
App 20110069295 - Kraehmer; Daniel ;   et al.
2011-03-24
Microlithographic Exposure Method As Well As A Projection Exposure System For Carrying Out The Method
App 20110069296 - GRUNER; Toralf ;   et al.
2011-03-24
Polarization-modulating optical element and method for manufacturing thereof
Grant 7,903,333 - Kraehmer , et al. March 8, 2
2011-03-08
Microlithographic exposure method as well as a projection exposure system for carrying out the method
Grant 7,847,921 - Gruner , et al. December 7, 2
2010-12-07
Projection exposure apparatus and method for operating the same
Grant 7,808,615 - Gruner , et al. October 5, 2
2010-10-05
Projection Objective For Micrlolithography Having An Obscurated Pupil
App 20100208225 - Kraehmer; Daniel ;   et al.
2010-08-19
Lithography Projection Objective, And A Method For Correcting Image Defects Of The Same
App 20100157435 - Loering; Ulrich ;   et al.
2010-06-24
Methods For Producing An Antireflection Surface On An Optical Element, Optical Element And Associated Optical Arrangement
App 20100149510 - ZACZEK; Christoph ;   et al.
2010-06-17
Method for describing, evaluating and improving optical polarization properties of a microlithographic projection exposure apparatus
Grant 7,728,975 - Totzeck , et al. June 1, 2
2010-06-01
Projection objective of a microlithographic projection exposure apparatus
Grant 7,710,640 - Beder , et al. May 4, 2
2010-05-04
High Transmission, High Aperture Catadioptric Projection Objective And Projection Exposure Apparatus
App 20100097592 - Kraehmer; Daniel ;   et al.
2010-04-22
Symmetrical objective having four lens groups for microlithography
Grant 7,697,211 - Shafer , et al. April 13, 2
2010-04-13
Lithography projection objective, and a method for correcting image defects of the same
Grant 7,692,868 - Loering , et al. April 6, 2
2010-04-06
Projection Objective For Microlithography
App 20100079739 - Goehnermeier; Aksel ;   et al.
2010-04-01
Projection Objective For Microlithography
App 20100079741 - Kraehmer; Daniel ;   et al.
2010-04-01
Projection objective of a microlithographic projection exposure apparatus
Grant 7,679,831 - Kraehmer , et al. March 16, 2
2010-03-16
Specification, Optimization And Matching Of Optical Systems By Use Of Orientational Zernike Polynomials
App 20090306921 - Totzeck; Michael ;   et al.
2009-12-10
Projection Objective Of A Microlithographic Projection Exposure Apparatus
App 20090284831 - Schuster; Karl-Heinz ;   et al.
2009-11-19
Method For Describing A Retardation Distribution In A Microlithographic Projection Exposure Apparatus
App 20090195876 - Kraehmer; Daniel
2009-08-06
Microlithography projection objective
App 20090115986 - Feldmann; Heiko ;   et al.
2009-05-07
Lithography Projection Objective, And A Method For Correcting Image Defects Of The Same
App 20090103184 - Loering; Ulrich ;   et al.
2009-04-23
Symmetrical Objective Having Four Lens Groups For Microlithography
App 20090080086 - Shafer; David R. ;   et al.
2009-03-26
Microlithographic Exposure Method As Well As A Projection Exposure System For Carrying Out The Method
App 20090040496 - GRUNER; Toralf ;   et al.
2009-02-12
Microlithograph system
Grant 7,483,121 - Kraehmer , et al. January 27, 2
2009-01-27
Combination Stop For Catoptric Projection Arrangement
App 20090021714 - Mann; Hans-Juergen ;   et al.
2009-01-22
Projection Lens Of A Microlithographic Exposure System
App 20090021830 - Totzeck; Michael ;   et al.
2009-01-22
Lithography projection objective, and a method for correcting image defects of the same
Grant 7,463,423 - Loering , et al. December 9, 2
2008-12-09
Projection exposure apparatus
Grant 7,463,422 - Kamenow , et al. December 9, 2
2008-12-09
Microlithographic projection exposure apparatus
App 20080297754 - Kamenov; Vladimir ;   et al.
2008-12-04
Projection Objective Of A Microlithographic Projection Exposure Apparatus
App 20080278799 - Beder; Susanne ;   et al.
2008-11-13
Method for Determining Intensity Distribution in the Image Plane of a Projection Exposure Arrangement
App 20080212060 - Greif-Wuestenbecker; Joern ;   et al.
2008-09-04
Illumination System Or Projection Lens Of A Microlithographic Exposure System
App 20080204877 - Totzeck; Michael ;   et al.
2008-08-28
Optical System, In Particular Objective Or Illumination System For A Microlithographic Projection Exposure Apparatus
App 20080198455 - Totzeck; Michael ;   et al.
2008-08-21
Microlithographic exposure method as well as a projection exposure system for carrying out the method
Grant 7,408,616 - Gruner , et al. August 5, 2
2008-08-05
Lithography Projection Objective, And A Method For Correcting Image Defects Of The Same
App 20080144184 - Loering; Ulrich ;   et al.
2008-06-19
Microlithograph System
App 20080088816 - Kraehmer; Daniel ;   et al.
2008-04-17
Projection Exposure Apparatus For Semiconductor Lithography
App 20080049202 - Kraehmer; Daniel
2008-02-28
Projection Objective Of A Microlithographic Projection Exposure Apparatus
App 20080043331 - Kraehmer; Daniel ;   et al.
2008-02-21
Optical system and method for the production of micro-structured components by microlithography
Grant 7,317,508 - Kraehmer , et al. January 8, 2
2008-01-08
Projection Exposure Apparatus And Method For Operating The Same
App 20080002167 - Gruner; Toralf ;   et al.
2008-01-03
Objective with crystal lenses
App 20070242250 - Goehnermeier; Aksel ;   et al.
2007-10-18
Polarization-modulating Optical Element And Method For Manufacturing Thereof
App 20070211246 - Kraehmer; Daniel ;   et al.
2007-09-13
Method of determining lens materials for a projection exposure apparatus
App 20070195423 - Kamenov; Vladimir ;   et al.
2007-08-23
Objective with crystal lenses
Grant 7,239,447 - Goehnermeier , et al. July 3, 2
2007-07-03
Method of determining lens materials for a projection exposure apparatus
Grant 7,239,450 - Kamenov , et al. July 3, 2
2007-07-03
Optical element, in particular for an objective or an illumination system of a microlithographic projection exposure apparatus
App 20070007491 - Mueller; Ralf ;   et al.
2007-01-11
Optical system of a projection exposure apparatus
App 20060238735 - Kamenov; Vladimir ;   et al.
2006-10-26
Method of determining lens materials for a projection exposure apparatus
App 20060109560 - Kamenov; Vladimir ;   et al.
2006-05-25
Objective with birefringent lenses
Grant 6,992,834 - Totzeck , et al. January 31, 2
2006-01-31
Objective with birefringent lenses
App 20050200966 - Totzeck, Michael ;   et al.
2005-09-15
Objective with crystal lenses
App 20050157401 - Goehnermeier, Aksel ;   et al.
2005-07-21
Optical system and method for the production of microstructured components by microlithography
App 20050146798 - Kraehmer, Daniel ;   et al.
2005-07-07
Microlithographic exposure method as well as a projection exposure system for carrying out the method
App 20050146704 - Gruner, Toralf ;   et al.
2005-07-07
Optical system with birefringent optical elements
App 20050094268 - Fiolka, Damian ;   et al.
2005-05-05
Projection exposure system
Grant 6,806,942 - Schuster , et al. October 19, 2
2004-10-19
Projection exposure system
App 20040017554 - Schuster, Karl-Heinz ;   et al.
2004-01-29

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