Kotsugi; Tadashi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kotsugi; Tadashi.The latest application filed is for "semiconductor device manufacturing method".

Company Profile

0.7.9

Kotsugi; Tadashi - Miyagi JP
Kotsugi; Tadashi - Beaverton OR
Kotsugi; Tadashi - Tokyo JP
Kotsugi; Tadashi - Minato-ku JP
KOTSUGI; Tadashi - Kanagawa JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Etching apparatus Grant 9,691,643 - Nishimura , et al. June 27, 2	2017-06-27
Semiconductor device manufacturing method Grant 9,245,764 - Nishimura , et al. January 26, 2	2016-01-26
Plasma processing method and plasma processing apparatus Grant 8,993,352 - Nishimura , et al. March 31, 2	2015-03-31
Semiconductor Device Manufacturing Method App 20150079790 - Nishimura; Eiichi ; et al.	2015-03-19
Etching Apparatus App 20150013908 - NISHIMURA; Eiichi ; et al.	2015-01-15
Etching method and etching apparatus Grant 8,877,081 - Nishimura , et al. November 4, 2	2014-11-04
Plasma Processing Method And Plasma Processing Apparatus App 20140141532 - Nishimura; Eiichi ; et al.	2014-05-22
Etching Method And Etching Apparatus App 20130196511 - NISHIMURA; Eiichi ; et al.	2013-08-01
Static electricity deflecting device, electron beam irradiating apparatus, substrate processing apparatus, substrate processing method, and method of manufacturing substrate Grant 7,554,095 - Fuse , et al. June 30, 2	2009-06-30
Static electricity deflecting device, electron beam irradiating apparatus, substrate processing apparatus, substrate processing method and method of manufacturing substrate Grant 7,550,739 - Fuse , et al. June 23, 2	2009-06-23
Static electricity deflecting device, electron beam irradiating apparatus, substrate processing apparatus, substrate processing method and method of manufacturing substrate Grant 7,521,687 - Fuse , et al. April 21, 2	2009-04-21
Electron Beam Lithography Apparatus And Design Method Of Patterned Beam-defining Aperture App 20090008579 - TAKEYA; Koji ; et al.	2009-01-08
Static Electricity Deflecting Device, Electron Beam Irradiating Apparatus, Substrate Processing Apparatus, Substrate Processing Method And Method Of Manufacturing Substrate App 20080067429 - Fuse; Takashi ; et al.	2008-03-20
Static Electricity Deflecting Device, Electron Beam Irradiating Apparatus, Substrate Processing Apparatus, Substrate Processing Method, And Method Of Manufacturing Substrate App 20080062608 - FUSE; Takashi ; et al.	2008-03-13
Static Electricity Deflecting Device, Electron Beam Irradiating Apparatus, Substrate Processing Apparatus, Substrate Processing Method And Method Of Manufacturing Substrate App 20070228275 - FUSE; Takashi ; et al.	2007-10-04
Static Electricity Deflecting Device, Electron Beam Irradiating Apparatus, Substrate Processing Apparatus, Substrate Processing Method And Method Of Manufacturing Substrate App 20070228285 - Fuse; Takashi ; et al.	2007-10-04

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