| Patent | Date |
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Integrated Electronic Waste Recycling And Recovery System And Process Of Using Same
App 20210040581 - Song; Yuxin ; et al. | 2021-02-11 |
Method And Apparatus For Separation And Size Reduction Of Noble Metal Containing Sources
App 20180318842 - KORZENSKI; Michael B. | 2018-11-08 |
Method for recycling of obsolete printed circuit boards
Grant 10,034,387 - Brosseau , et al. July 24, 2 | 2018-07-24 |
Method for the recovery of lithium cobalt oxide from lithium ion batteries
Grant 9,972,830 - Poe , et al. May 15, 2 | 2018-05-15 |
Apparatus and method for stripping solder metals during the recycling of waste electrical and electronic equipment
Grant 9,731,368 - Chen , et al. August 15, 2 | 2017-08-15 |
Compositions and methods for the selective removal of silicon nitride
Grant 9,691,629 - Cooper , et al. June 27, 2 | 2017-06-27 |
Apparatus and method for stripping solder metals during the recycling of waste electrical and electronic equipment
Grant 9,649,712 - Chen , et al. May 16, 2 | 2017-05-16 |
Method For Recycling Of Obsolete Printed Circuit Boards
App 20170079146 - BROSSEAU; Andre ; et al. | 2017-03-16 |
Wet Based Formulations For The Selective Removal Of Noble Metals
App 20160362804 - CHEN; Tianniu ; et al. | 2016-12-15 |
Oxidizing aqueous cleaner for the removal of post-etch residues
Grant 9,443,713 - Minsek , et al. September 13, 2 | 2016-09-13 |
Sustainable Process For Reclaiming Precious Metals And Base Metals From E-waste
App 20160122846 - KORZENSKI; Michael B. ; et al. | 2016-05-05 |
Method For Recycling Of Obsolete Printed Circuit Boards
App 20160095230 - BROSSEAU; Andre ; et al. | 2016-03-31 |
Compositions And Methods For The Selective Removal Of Silicon Nitride
App 20160035580 - COOPER; Emanuel I. ; et al. | 2016-02-04 |
Sustainable process for reclaiming precious metals and base metals from e-waste
Grant 9,238,850 - Korzenski , et al. January 19, 2 | 2016-01-19 |
Apparatus and method for stripping solder metals during the recycling of waste electrical and electronic equipment
Grant 9,221,114 - Chen , et al. December 29, 2 | 2015-12-29 |
Method for recycling of obsolete printed circuit boards
Grant 9,215,813 - Brosseau , et al. December 15, 2 | 2015-12-15 |
Apparatus And Method For Stripping Solder Metals During The Recycling Of Waste Electrical And Electronic Equipment
App 20150322540 - CHEN; Tianniu ; et al. | 2015-11-12 |
Apparatus And Method For Stripping Solder Metals During The Recycling Of Waste Electrical And Electronic Equipment
App 20150322545 - CHEN; Tianniu ; et al. | 2015-11-12 |
Apparatus And Method For Stripping Solder Metals During The Recycling Of Waste Electrical And Electronic Equipment
App 20150321279 - CHEN; Tianniu ; et al. | 2015-11-12 |
Compositions and methods for the selective removal of silicon nitride
Grant 9,158,203 - Cooper , et al. October 13, 2 | 2015-10-13 |
Lithographic tool in situ clean formulations
Grant 9,074,169 - Chen , et al. July 7, 2 | 2015-07-07 |
Removal Of Lead From Solid Materials
App 20150050199 - Korzenski; Michael B. ; et al. | 2015-02-19 |
Oxidizing Aqueous Cleaner For The Removal Of Post-etch Residues
App 20150000697 - Minsek; David W. ; et al. | 2015-01-01 |
Compositions And Methods For The Selective Removal Of Silicon Nitride
App 20140326633 - COOPER; Emanuel I. ; et al. | 2014-11-06 |
Method For The Recovery Of Lithium Cobalt Oxide From Lithium Ion Batteries
App 20140306162 - Poe; Sarah L. ; et al. | 2014-10-16 |
Compositions and methods for the selective removal of silicon nitride
Grant 8,778,210 - Cooper , et al. July 15, 2 | 2014-07-15 |
Apparatus And Method For Stripping Solder Metals During The Recycling Of Waste Electrical And Electronic Equipment
App 20140191019 - Chen; Tianniu ; et al. | 2014-07-10 |
Oxidizing aqueous cleaner for the removal of post-etch residues
Grant 8,765,654 - Minsek , et al. July 1, 2 | 2014-07-01 |
Composition and method for recycling semiconductor wafers having low-k dielectric materials thereon
Grant 8,642,526 - Visintin , et al. February 4, 2 | 2014-02-04 |
Sustainable Process For Reclaiming Precious Metals And Base Metals From E-waste
App 20130336857 - Korzenski; Michael B. ; et al. | 2013-12-19 |
Methods Of Texturing Surfaces For Controlled Reflection
App 20130295712 - CHEN; Tianniu ; et al. | 2013-11-07 |
Method For Preventing The Collapse Of High Aspect Ratio Structures During Drying
App 20130280123 - Chen; Tianniu ; et al. | 2013-10-24 |
Composition And Process For Post-etch Removal Of Photoresist And/or Sacrificial Anti-reflective Material Deposited On A Substrate
App 20130109605 - Rath; Melissa K. ; et al. | 2013-05-02 |
Composition and process for post-etch removal of photoresist and/or sacrificial anti-reflective material deposited on a substrate
Grant 8,338,087 - Rath , et al. December 25, 2 | 2012-12-25 |
Compositions And Method For The Removal Of Photoresist For A Wafer Rework Application
App 20120042898 - Visintin; Pamela M. ; et al. | 2012-02-23 |
Formulations for cleaning ion-implanted photoresist layers from microelectronic devices
Grant 8,114,220 - Visintin , et al. February 14, 2 | 2012-02-14 |
Lithographic Tool In Situ Clean Formulations
App 20120015857 - Chen; Tianniu ; et al. | 2012-01-19 |
Metals compatible post-etch photoresist remover and/or sacrificial antireflective coating etchant
Grant 8,058,219 - Rath , et al. November 15, 2 | 2011-11-15 |
Composition And Method For Recycling Semiconductor Wafers Having Low-k Dielectric Materials Thereon
App 20110275164 - Visintin; Pamela M. ; et al. | 2011-11-10 |
Low pH mixtures for the removal of high density implanted resist
Grant 8,026,200 - Cooper , et al. September 27, 2 | 2011-09-27 |
Oxidizing Aqueous Cleaner For The Removal Of Post-etch Residues
App 20110186086 - Minsek; David W. ; et al. | 2011-08-04 |
Composition and method for recycling semiconductor wafers having low-k dielectric materials thereon
Grant 7,960,328 - Visintin , et al. June 14, 2 | 2011-06-14 |
Oxidizing aqueous cleaner for the removal of post-etch residues
Grant 7,922,824 - Minsek , et al. April 12, 2 | 2011-04-12 |
Composition And Method For Removing Ion-implanted Photoresist
App 20110039747 - Zhou; Renjie ; et al. | 2011-02-17 |
Compositions And Methods For The Selective Removal Of Silicon Nitride
App 20100176082 - Cooper; Emanuel I. ; et al. | 2010-07-15 |
Liquid Cleaner For The Removal Of Post-etch Residues
App 20100163788 - Visintin; Pamela ; et al. | 2010-07-01 |
Methods For Stripping Material For Wafer Reclamation
App 20100112728 - Korzenski; Michael B. ; et al. | 2010-05-06 |
Compositions And Methods For The Removal Of Photoresist For A Wafer Rework Application
App 20100056410 - Visintin; Pamela M. ; et al. | 2010-03-04 |
Formulations For Removing Cooper-containing Post-etch Residue From Microelectronic Devices
App 20090301996 - Visintin; Pamela M. ; et al. | 2009-12-10 |
LOW pH MIXTURES FOR THE REMOVAL OF HIGH DENSITY IMPLANTED RESIST
App 20090281016 - Cooper; Emanuel ; et al. | 2009-11-12 |
Removal Of Particle Contamination On Patterned Silicon/silicon Dioxide Using Dense Fluid/chemical Formulations
App 20090217940 - Korzenski; Michael B. ; et al. | 2009-09-03 |
Oxidizing Aqueous Cleaner For The Removal Of Post-etch Residues
App 20090215658 - Minsek; David W. ; et al. | 2009-08-27 |
Dense Fluid Compositions For Removal Of Hardened Photoresist, Post-etch Residue And/or Bottom Anti-reflective Coating
App 20090192065 - Korzenski; Michael B. ; et al. | 2009-07-30 |
Non-fluoride containing supercritical fluid composition for removal of ion-implant photoresist
Grant 7,557,073 - Korzenski , et al. July 7, 2 | 2009-07-07 |
Enhancement of silicon-containing particulate material removal using supercritical fluid-based compositions
Grant 7,553,803 - Korzenski , et al. June 30, 2 | 2009-06-30 |
Metals Compatible Post-etch Photoresist Remover And/or Sacrificial Antireflective Coating Etchant
App 20090118153 - Rath; Melissa K. ; et al. | 2009-05-07 |
Removal of MEMS sacrificial layers using supercritical fluid/chemical formulations
Grant 7,517,809 - Korzenski , et al. April 14, 2 | 2009-04-14 |
Apparatus and Method for Supercritical Fluid Removal or Deposition Processes
App 20080271991 - Korzenski; Michael B. ; et al. | 2008-11-06 |
Formulations for Cleaning Ion-Implanted Photoresist Layers from Microelectronic Devices
App 20080269096 - Visintin; Pamela M. ; et al. | 2008-10-30 |
Composition and Method for Recycling Semiconductor Wafers Having Low-K Dielectric Materials Thereon
App 20080261847 - Visintin; Pamela M. ; et al. | 2008-10-23 |
Formulations For Cleaning Memory Device Structures
App 20080125342 - Visintin; Pamela M. ; et al. | 2008-05-29 |
Supercritical Fluid Cleaning Of Semiconductor Substrates
App 20080058238 - Xu; Chongying ; et al. | 2008-03-06 |
Removal Of High-dose Ion-implanted Photoresist Using Self-assembled Monolayers In Solvent Systems
App 20070251551 - Korzenski; Michael B. ; et al. | 2007-11-01 |
Supercritical carbon dioxide/chemical formulation for ashed and unashed aluminum post-etch residue removal
Grant 7,223,352 - Korzenski , et al. May 29, 2 | 2007-05-29 |
Removal Of Mems Sacrificial Layers Using Supercritical Fluid/chemical Formulations
App 20070111533 - Korzenski; Michael B. ; et al. | 2007-05-17 |
Removal of MEMS sacrificial layers using supercritical fluid/chemical formulations
Grant 7,160,815 - Korzenski , et al. January 9, 2 | 2007-01-09 |
Compositions and methods for high-efficiency cleaning/polishing of semiconductor wafers
Grant 7,119,052 - Korzenski , et al. October 10, 2 | 2006-10-10 |
Supercritical fluid-assisted deposition of materials on semiconductor substrates
Grant 7,119,418 - Xu , et al. October 10, 2 | 2006-10-10 |
Supercritical Fluid-assisted Deposition Of Materials On Semiconductor Substrates
App 20060178006 - Xu; Chongying ; et al. | 2006-08-10 |
Compositions and methods for high-efficiency cleaning of semiconductor wafers
App 20060122085 - Korzenski; Michael B. ; et al. | 2006-06-08 |
Supercritical carbon dioxide/chemical formulation for ashed and unashed aluminum post-etch residue removal
App 20060073998 - Korzenski; Michael B. ; et al. | 2006-04-06 |
Supercritical carbon dioxide/chemical formulation for removal of photoresists
App 20060040840 - Korzenski; Michael B. ; et al. | 2006-02-23 |
Removal of particle contamination on a patterned silicon/silicon dioxide using dense fluid/chemical formulations
App 20060019850 - Korzenski; Michael B. ; et al. | 2006-01-26 |
Supercritical carbon dioxide/chemical formulation for removal of photoresists
Grant 6,989,358 - Korzenski , et al. January 24, 2 | 2006-01-24 |
Composition useful for removal of bottom anti-reflection coatings from patterned ion-implanted photoresist wafers
App 20050227482 - Korzenski, Michael B. ; et al. | 2005-10-13 |
Removal of particle contamination on patterned silicon/silicon dioxide using supercritical carbon dioxide/chemical formulations
Grant 6,943,139 - Korzenski , et al. September 13, 2 | 2005-09-13 |
Composition and process for post-etch removal of photoresist and/or sacrificial anti-reflective material deposited on a substrate
App 20050197265 - Rath, Melissa K. ; et al. | 2005-09-08 |
Enhancement of silicon-containing particulate material removal using supercritical fluid-based compositions
App 20050192193 - Korzenski, Michael B. ; et al. | 2005-09-01 |
Removal of MEMS sacrificial layers using supercritical fluid/chemical formulations
App 20050118813 - Korzenski, Michael B. ; et al. | 2005-06-02 |
Removal of MEMS sacrificial layers using supercritical fluid/chemical formulations
App 20050118832 - Korzenski, Michael B. ; et al. | 2005-06-02 |
Compositions and methods for high-efficiency cleaning/polishing of semiconductor wafers
App 20040266635 - Korzenski, Michael B. ; et al. | 2004-12-30 |
Non-fluoride containing supercritical fluid composition for removal of ion-implant photoresist
App 20040198622 - Korzenski, Michael B. ; et al. | 2004-10-07 |
Treatment of supercritical fluid utilized in semiconductor manufacturing applications
Grant 6,735,978 - Tom , et al. May 18, 2 | 2004-05-18 |
Supercritical carbon dioxide/chemical formulation for removal of photoresists
App 20040087457 - Korzenski, Michael B. ; et al. | 2004-05-06 |
Removal of particle contamination on patterned silicon/silicon dioxide using supercritical carbon dioxide/chemical formulations
App 20040087456 - Korzenski, Michael B. ; et al. | 2004-05-06 |
Supercritical carbon dioxide/chemical formulation for ashed and unashed aluminum post-etch residue removal
App 20040087174 - Korzenski, Michael B. ; et al. | 2004-05-06 |
Supercritical fluid-assisted deposition of materials on semiconductor substrates
App 20040023453 - Xu, Chongying ; et al. | 2004-02-05 |
Supercritical fluid cleaning of semiconductor substrates
App 20030125225 - Xu, Chongying ; et al. | 2003-07-03 |
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