Kong; Keun Kyu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kong; Keun Kyu.The latest application filed is for "composition for coating photoresist pattern and method for forming fine pattern using the same".

Company Profile

0.26.26

Kong; Keun Kyu - Seoul KR
Kong; Keun Kyu - Icheon-si KR
KONG; Keun Kyu - Icheon-si Gyeonggi-do KR
Kong; Keun-Kyu - Kyoungki-do KR
Kong; Keun Kyu - Kyongki-do KR
Kong; Keun Kyu - Kwangju KR
KONG; Keun Kyu - Jeheon-si KR
Kong; Keun Kyu - Ichon-shi KR
Kong; Keun Kyu - Gyunggi-Do KR
Kong, Keun Kyu - Gyeonggi-do KR
Kong; Keun-kyu - Kwangju-shi KR
Kong; Keun Kyu - Ichon KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Composition For Coating Photoresist Pattern And Method For Forming Fine Pattern Using The Same App 20180120707 - LEE; Sung Jae ; et al.	2018-05-03
Semiconductor integrated circuit device with a surface and method of manufacturing the same Grant 9,947,546 - Sim , et al. April 17, 2	2018-04-17
Semiconductor Integrated Circuit Device With A Surface And Method Of Manufacturing The Same App 20170207098 - SIM; Jae Hee ; et al.	2017-07-20
Composition For Coating Photoresist Pattern And Method For Forming Fine Pattern Using The Same App 20170102619 - LEE; Sung Jae ; et al.	2017-04-13
Composition For Coating Photoresist Pattern And Method For Forming Fine Pattern Using The Same App 20170032960 - Lee; Sung Jae ; et al.	2017-02-02
Capacitor of semiconductor device and method for fabricating the same Grant 7,749,895 - Kong July 6, 2	2010-07-06
Method for forming fine patterns of a semiconductor device Grant 7,674,708 - Kong March 9, 2	2010-03-09
Method for fabricating capacitor of semiconductor memory device using amorphous carbon Grant 7,582,525 - Kong , et al. September 1, 2	2009-09-01
Cleaning solution for removing photoresist Grant 7,563,753 - Lee , et al. July 21, 2	2009-07-21
Method for forming fine pattern in semiconductor device Grant 7,510,973 - Kong March 31, 2	2009-03-31
Method for forming a pattern on a semiconductor device and semiconductor device resulting from the same Grant 7,510,979 - Jung , et al. March 31, 2	2009-03-31
Semiconductor device and method for fabricating the same App 20080200024 - Kong; Keun Kyu	2008-08-21
Liquid Composition for Immersion Lithography and Lithography Method Using the Same App 20080176047 - Kong; Keun Kyu ; et al.	2008-07-24
Method for forming fine pattern in semiconductor device App 20080160772 - Kong; Keun Kyu	2008-07-03
Process for forming a fine pattern using a top-coating composition for a photoresist and product formed by same Grant 7,329,477 - Jung , et al. February 12, 2	2008-02-12
Method For Forming A Pattern On A Semiconductor Device And Semiconductor Device Resulting From The Same App 20080020592 - JUNG; Jae-chang ; et al.	2008-01-24
Method For Forming Fine Patterns Of A Semiconductor Device App 20080009137 - KONG; Keun Kyu	2008-01-10
Light Absorbent Agent Polymer Useful For Organic Anti-reflective Coating, And Preparation Method For The Same App 20070265406 - JUNG; Jae-chang ; et al.	2007-11-15
Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same Grant 7,285,370 - Jung , et al. October 23, 2	2007-10-23
Cross-linking monomers for photoresist, and process for preparing photoresist polymers using the same Grant 7,208,260 - Jung , et al. April 24, 2	2007-04-24
Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same Grant 7,186,496 - Jung , et al. March 6, 2	2007-03-06
Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same Grant 7,160,668 - Jung , et al. January 9, 2	2007-01-09
Method for fabricating capacitor of semiconductor memory device using amorphous carbon App 20060141736 - Kong; Keun-Kyu ; et al.	2006-06-29
Light absorbent agent polymer for organic anti-reflective coating and preparation method and organic anti-reflective coating composition comprising the same Grant 7,033,729 - Jung , et al. April 25, 2	2006-04-25
Top-coating composition for photoresist and process for forming fine pattern using the same Grant 6,984,482 - Jung , et al. January 10, 2	2006-01-10
Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same App 20060004161 - Jung; Jae-chang ; et al.	2006-01-05
Liquid composition for immersion lithography and lithography method using the same App 20050260528 - Kong, Keun Kyu ; et al.	2005-11-24
Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same App 20050130061 - Jung, Jae-Chang ; et al.	2005-06-16
Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same App 20050084798 - Jung, Jae-chang ; et al.	2005-04-21
Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same App 20050085078 - Jung, Jae Chang ; et al.	2005-04-21
Process for forming a fine pattern using a top-coating composition for a photoresist and product formed by same App 20050069816 - Jung, Jae Chang ; et al.	2005-03-31
Pattern width slimming-inhibiting method of photoresist pattern using photoresist composition containing thermal acid generator Grant 6,787,285 - Kong , et al. September 7, 2	2004-09-07
Organic polymer for organic anti-reflective coating layer and preparation thereof Grant 6,770,720 - Jung , et al. August 3, 2	2004-08-03
Over-coating composition for photoresist, and processes for forming photoresist patterns using the same Grant 6,764,806 - Jung , et al. July 20, 2	2004-07-20
Method of inhibiting pattern collapse using a relacs material Grant 6,703,323 - Kong , et al. March 9, 2	2004-03-09
Process for forming photoresist pattern by using gas phase amine treatment Grant 6,664,031 - Jung , et al. December 16, 2	2003-12-16
Method of inhibiting pattern collapse using a relacs material App 20030143489 - Kong, Keun Kyu ; et al.	2003-07-31
Cleaning solution for removing photoresist App 20030130148 - Lee, Geun Su ; et al.	2003-07-10
Top-coating composition for photoresist and process for forming fine pattern using the same App 20030108815 - Jung, Jae Chang ; et al.	2003-06-12
Organic polymer for organic anti-reflective coating layer and preparation thereof App 20030100695 - Jung, Jae-chang ; et al.	2003-05-29
Cross-linking monomers for photoresist, and process for preparing photoresist polymers using the same App 20020177069 - Jung, Jae Chang ; et al.	2002-11-28
Photoresist monomers having stability to post exposure delay, polymers thereof and photoresist compositions containing the same Grant 6,455,225 - Kong , et al. September 24, 2	2002-09-24
Pattern width slimming-inhibiting method of photoresist pattern using photoresist composition containing thermal acid generator App 20020081504 - Kong, Keun Kyu ; et al.	2002-06-27
Photoresist composition containing photo base generator with photo acid generator Grant 6,395,451 - Jung , et al. May 28, 2	2002-05-28
Photoresist cross-linker and photoresist composition comprising the same Grant 6,368,773 - Jung , et al. April 9, 2	2002-04-09
Novel photoresist cross-linker and photoresist composition comprising the same App 20020019560 - Kong, Keun Kyu ; et al.	2002-02-14
Process for forming photoresist pattern by using gas phase amine treatment App 20010053590 - Jung, Jae Chang ; et al.	2001-12-20
Photoresist cross-linker and photoresist composition comprising the same Grant 6,322,948 - Jung , et al. November 27, 2	2001-11-27
Photoresist cross-linker and photoresist composition comprising the same Grant 6,312,868 - Kong , et al. November 6, 2	2001-11-06
Monomers for photoresist, polymers thereof, and photoresist compositions using the same Grant 6,291,131 - Jung , et al. September 18, 2	2001-09-18
Over-coating composition for photoresist, and processes for forming photoresist patterns using the same App 20010003030 - Jung, Jae Chang ; et al.	2001-06-07
Maleimide or alicyclic olefin-based monomers, copolymer resin of these monomers and photoresist using the resin Grant 6,165,672 - Jung , et al. December 26, 2	2000-12-26

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