Komano; Hiroshi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Komano; Hiroshi.The latest application filed is for "air conditioner".

Company Profile

0.22.13

Komano; Hiroshi - Osaka JP
Komano; Hiroshi - Kanagawa JP
Komano; Hiroshi - Kanagawa-ken JP
Komano; Hiroshi - Koza JP
Komano; Hiroshi - Koza-gun JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Air Conditioner App 20130227985 - Komano; Hiroshi	2013-09-05
Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same Grant 7,419,769 - Saito , et al. September 2, 2	2008-09-02
Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same Grant 7,129,018 - Saito , et al. October 31, 2	2006-10-31
Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same Grant 7,063,934 - Saito , et al. June 20, 2	2006-06-20
Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same App 20060035170 - Saito; Koji ; et al.	2006-02-16
Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same App 20060035169 - Saito; Koji ; et al.	2006-02-16
Positive resist composition and base material carrying layer of the positive resist composition App 20050123854 - Ogata, Toshiyuki ; et al.	2005-06-09
Fluorine-containing monomeric ester compound for base resin in photoresist composition Grant 6,846,949 - Ogata , et al. January 25, 2	2005-01-25
Chemically amplified negative photoresist composition for the formation of thick films, photoresist base material and method of forming bumps using the same Grant 6,838,229 - Washio , et al. January 4, 2	2005-01-04
Positive resist composition and base material carrying layer of the positive resist composition Grant 6,787,284 - Ogata , et al. September 7, 2	2004-09-07
Positive resist composition and base material carrying layer of the positive resist composition App 20040152860 - Ogata, Toshiyuki ; et al.	2004-08-05
Novel fluorine-containing monomeric ester compound for base resin in photoresist composition App 20040122255 - Ogata, Toshiyuki ; et al.	2004-06-24
Fluorine-containing monomeric ester compound for base resin in photoresist composition Grant 6,683,202 - Ogata , et al. January 27, 2	2004-01-27
Positive photoresist composition for the formation of thick films, photoresist film and method of forming bumps using the same Grant 6,641,972 - Misumi , et al. November 4, 2	2003-11-04
Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same App 20030064319 - Saito, Koji ; et al.	2003-04-03
Positive photoresist composition for the formation of thick films, photoresist film and method of forming bumps using the same App 20030059706 - Misumi, Kouichi ; et al.	2003-03-27
Chemically amplified negative photoresist composition for the formation of thick films, photoresist base material and method of forming bumps using the same App 20030039921 - Washio, Yasushi ; et al.	2003-02-27
Novel fluorine-containing monomeric ester compound for base resin in photoresist composition App 20020115883 - Ogata, Toshiyuki ; et al.	2002-08-22
Chemical-sensitization photoresist composition Grant 6,388,101 - Hada , et al. May 14, 2	2002-05-14
Positive resist composition and base material carrying layer of the positive resist composition App 20020025495 - Ogata, Toshiyuki ; et al.	2002-02-28
Photopolymerizable composition for color filter and process for producing color filter App 20010036584 - Uchikawa, Kiyoshi ; et al.	2001-11-01
Composition for forming antireflective coating film and method for forming resist pattern using same Grant 6,268,108 - Iguchi , et al. July 31, 2	2001-07-31
Post-ashing treating liquid compositions and a process for treatment therewith Grant 6,261,745 - Tanabe , et al. July 17, 2	2001-07-17
Chemical-sensitization photoresist composition Grant 6,063,953 - Hada , et al. May 16, 2	2000-05-16
Chemical-sensitization photoresist composition Grant 6,022,666 - Hada , et al. February 8, 2	2000-02-08
Photosensitive resin composition containing a triazine compound and a pre-sensitized plate using the same, and photosensitive resin composition containing acridine and triazine compounds and a color filter and a pre-sensitized plate using the same Grant 6,010,824 - Komano , et al. January 4, 2	2000-01-04
Compounds for use in a positive-working resist composition Grant 5,929,271 - Hada , et al. July 27, 1	1999-07-27
Photosensitive resin composition for forming light shielding films, black matrix formed by the same, and method for the production thereof Grant 5,908,720 - Uchikawa , et al. June 1, 1	1999-06-01
Cyano group-containing oxime sulfonate compounds Grant 5,892,095 - Hada , et al. April 6, 1	1999-04-06
Photosensitive resin composition for forming light shielding films, black matrix formed by the same, and method for the production thereof Grant 5,714,286 - Uchikawa , et al. February 3, 1	1998-02-03
Cyanooxime sulfonate compound Grant 5,714,625 - Hada , et al. February 3, 1	1998-02-03
Method of bonding circuit boards Grant 5,545,281 - Matsui , et al. August 13, 1	1996-08-13
Photosensitive resin composition for use as a light-shielding film which can be used as black matrices Grant 5,368,991 - Uchikawa , et al. November 29, 1	1994-11-29
Method of bonding circuit boards Grant 5,318,651 - Matsui , et al. June 7, 1	1994-06-07

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