loadpatents
name:-0.073065996170044
name:-0.050796031951904
name:-0.004925012588501
Kirkpatrick; Brian K. Patent Filings

Kirkpatrick; Brian K.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Kirkpatrick; Brian K..The latest application filed is for "cleaning system with in-line spm processing".

Company Profile
5.48.59
  • Kirkpatrick; Brian K. - Allen TX
  • - Allen TX US
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Split gate memory cell fabrication and system
Grant 11,239,346 - MacPeak , et al. February 1, 2
2022-02-01
Cleaning System With In-line Spm Processing
App 20210407825 - Brown; Brian J. ;   et al.
2021-12-30
Method for stripping one or more layers from a semiconductor wafer
Grant 11,205,575 - Palla , et al. December 21, 2
2021-12-21
Dopant anneal with stabilization step for IC with matched devices
Grant 11,205,578 - Kirkpatrick , et al. December 21, 2
2021-12-21
Split Gate Memory Cell Fabrication And System
App 20200381541 - MacPeak; John Howard ;   et al.
2020-12-03
Integrated circuit having chemically modified spacer surface
Grant 10,483,261 - Kirkpatrick , et al. Nov
2019-11-19
Dopant Anneal With Stabilization Step For Ic With Matched Devices
App 20190115226 - KIRKPATRICK; BRIAN K. ;   et al.
2019-04-18
Method of fabricating semiconductors
Grant 9,881,795 - Farber , et al. January 30, 2
2018-01-30
Inner L-spacer for replacement gate flow
Grant 9,768,078 - Lenox , et al. September 19, 2
2017-09-19
High-k / metal gate CMOS transistors with TiN gates
Grant 9,721,847 - Niimi , et al. August 1, 2
2017-08-01
Integrated Circuit Having Chemically Modified Spacer Surface
App 20170179126 - KIRKPATRICK; BRIAN K. ;   et al.
2017-06-22
Method Of Fabricating Semiconductors
App 20170148634 - Farber; David Gerald ;   et al.
2017-05-25
Integrated circuit having chemically modified spacer surface
Grant 9,620,423 - Kirkpatrick , et al. April 11, 2
2017-04-11
Integrated circuit having chemically modified spacer surface
Grant 9,496,359 - Kirkpatrick , et al. November 15, 2
2016-11-15
Method of fabricating semiconductors
Grant 9,490,143 - Farber , et al. November 8, 2
2016-11-08
Inner L-spacer For Replacement Gate Flow
App 20160254197 - LENOX; Chet Vernon ;   et al.
2016-09-01
Integrated Circuit Having Chemically Modified Spacer Surface
App 20160233132 - KIRKPATRICK; BRIAN K. ;   et al.
2016-08-11
Inner L-spacer for replacement gate flow
Grant 9,362,375 - Lenox , et al. June 7, 2
2016-06-07
Gate Slot Overetch Control
App 20160118269 - ESHUN; EBENEZER ;   et al.
2016-04-28
Integrated Circuit Having Chemically Modified Spacer Surface
App 20160027884 - KIRKPATRICK; BRIAN K. ;   et al.
2016-01-28
Hard mask for source/drain epitaxy control
Grant 9,224,657 - Farber , et al. December 29, 2
2015-12-29
Inner L-spacer for replacement gate flow
Grant 9,178,037 - Lenox , et al. November 3, 2
2015-11-03
Inner L-spacer For Replacement Gate Flow
App 20150311304 - LENOX; Chet Vernon ;   et al.
2015-10-29
HIGH-K / METAL GATE CMOS TRANSISTORS WITH TiN GATES
App 20150287643 - Niimi; Hiroaki ;   et al.
2015-10-08
Inner L-spacer For Replacement Gate Flow
App 20150279966 - LENOX; Chet Vernon ;   et al.
2015-10-01
Inner L-spacer for replacement gate flow
Grant 9,087,917 - Lenox , et al. July 21, 2
2015-07-21
HIGH-K / METAL GATE CMOS TRANSISTORS WITH TiN GATES
App 20150187653 - Niimi; Hiroaki ;   et al.
2015-07-02
High-k / metal gate CMOS transistors with TiN gates
Grant 9,070,785 - Niimi , et al. June 30, 2
2015-06-30
Inner L-spacer For Replacement Gate Flow
App 20150069516 - LENOX; Chet Vernon ;   et al.
2015-03-12
Hard Mask For Source/drain Epitaxy Control
App 20150044830 - Farber; David Gerald ;   et al.
2015-02-12
MOS transistors including SiON gate dielectric with enhanced nitrogen concentration at its sidewalls
Grant 8,748,992 - Kirkpatrick , et al. June 10, 2
2014-06-10
Fabricating A Semiconductor Die Having Coefficient Of Thermal Expansion Graded Layer
App 20140080301 - Kirkpatrick; Brian K. ;   et al.
2014-03-20
Die having coefficient of thermal expansion graded layer
Grant 8,618,661 - Kirkpatrick , et al. December 31, 2
2013-12-31
Die having coefficient of thermal expansion graded layer
Grant 08618661 -
2013-12-31
Integrated Circuit Having Chemically Modified Spacer Surface
App 20130248949 - KIRKPATRICK; BRIAN K. ;   et al.
2013-09-26
MOS TRANSISTORS INCLUDING SiON GATE DIELECTRIC WITH ENHANCED NITROGEN CONCENTRATION AT ITS SIDEWALLS
App 20130221451 - KIRKPATRICK; Brian K. ;   et al.
2013-08-29
Method of forming MOS transistors including SiON gate dielectric with enhanced nitrogen concentration at its sidewalls
Grant 8,450,221 - Kirkpatrick , et al. May 28, 2
2013-05-28
Die Having Coefficient Of Thermal Expansion Graded Layer
App 20130082385 - KIRKPATRICK; BRIAN K. ;   et al.
2013-04-04
Gate dielectric first replacement gate processes and integrated circuits therefrom
Grant 8,372,703 - Kirkpatrick , et al. February 12, 2
2013-02-12
Curvature reduction for semiconductor wafers
Grant 8,252,609 - Kirkpatrick , et al. August 28, 2
2012-08-28
Wafer planarity control between pattern levels
Grant 8,216,945 - Prins , et al. July 10, 2
2012-07-10
MOS TRANSISTORS INCLUDING SiON GATE DIELECTRIC WITH ENHANCED NITROGEN CONCENTRATION AT ITS SIDEWALLS
App 20120032280 - Kirkpatrick; Brian K. ;   et al.
2012-02-09
Recessed STI for wide transistors
Grant 8,058,161 - Barna , et al. November 15, 2
2011-11-15
Nitride removal while protecting semiconductor surfaces for forming shallow junctions
Grant 8,043,921 - Kirkpatrick , et al. October 25, 2
2011-10-25
Systems and methods for removing wafer edge residue and debris using a residue remover mechanism
Grant 7,998,865 - Tran , et al. August 16, 2
2011-08-16
Cross-contamination control for processing of circuits comprising MOS devices that include metal comprising high-K dielectrics
Grant 7,968,443 - Kirkpatrick , et al. June 28, 2
2011-06-28
Selective wet etch process for CMOS ICs having embedded strain inducing regions and integrated circuits therefrom
Grant 7,943,456 - Yu , et al. May 17, 2
2011-05-17
Cross-contamination control for semiconductor process flows having metal comprising gate electrodes
Grant 7,927,993 - Kirkpatrick April 19, 2
2011-04-19
Gate Dielectric First Replacement Gate Processes And Integrated Circuits Therefrom
App 20110031557 - Kirkpatrick; Brian K. ;   et al.
2011-02-10
Gate dielectric first replacement gate processes and integrated circuits therefrom
Grant 7,838,356 - Kirkpatrick , et al. November 23, 2
2010-11-23
Wafer Planarity Control Between Pattern Levels
App 20100261353 - Prins; Steven L. ;   et al.
2010-10-14
Curvature Reduction For Semiconductor Wafers
App 20100261298 - Kirkpatrick; Brian K. ;   et al.
2010-10-14
Nitride Removal While Protecting Semiconductor Surfaces For Forming Shallow Junctions
App 20100248440 - Kirkpatrick; Brian K. ;   et al.
2010-09-30
Post metal gate VT adjust etch clean
Grant 7,785,957 - Kirkpatrick , et al. August 31, 2
2010-08-31
Cross-contamination Control For Semiconductor Process Flows Having Metal Comprising Gate Electrodes
App 20100167518 - KIRKPATRICK; BRIAN K.
2010-07-01
Selective Wet Etch Process For Cmos Ics Having Embedded Strain Inducing Regions And Integrated Circuits Therefrom
App 20100164005 - YU; SHAOFENG ;   et al.
2010-07-01
Gate Dielectric First Replacement Gate Processes And Integrated Circuits Therefrom
App 20100164006 - KIRKPATRICK; BRIAN K. ;   et al.
2010-07-01
Post Metal Gate Vt Adjust Etch Clean
App 20100167514 - KIRKPATRICK; BRIAN K. ;   et al.
2010-07-01
Cross-contamination Control For Processing Of Circuits Comprising Mos Devices That Include Metal Comprising High-k Dielectrics
App 20100167517 - KIRKPATRICK; BRIAN K. ;   et al.
2010-07-01
Post High-k Dielectric/metal Gate Clean
App 20100167519 - KIRKPATRICK; BRIAN K. ;   et al.
2010-07-01
Post high-k dielectric/metal gate clean
Grant 7,732,284 - Kirkpatrick , et al. June 8, 2
2010-06-08
Method to Form CMOS Circuits Using Optimized Sidewalls
App 20090098702 - Kirkpatrick; Brian K. ;   et al.
2009-04-16
Method To Form Cmos Circuits With Sub 50nm Sti Structures Using Selective Epitaxial Silicon Post Sti Etch
App 20090096055 - Montgomery; Clint L. ;   et al.
2009-04-16
Method to form shallow trench isolation with rounded upper corner for advanced semiconductor circuits
Grant 7,504,339 - Chen , et al. March 17, 2
2009-03-17
Shallow Trench Divot Control Post
App 20080268589 - Farber; David Gerald ;   et al.
2008-10-30
Post high voltage gate oxide pattern high-vacuum outgas surface treatment
Grant 7,402,524 - Kirkpatrick , et al. July 22, 2
2008-07-22
Protection of silicon from phosphoric acid using thick chemical oxide
Grant 7,384,869 - Riley , et al. June 10, 2
2008-06-10
Recessed STI for wide transistors
App 20080081404 - Barna; Gabriel George ;   et al.
2008-04-03
Dual-gate integrated circuit semiconductor device
Grant 7,339,240 - Kirkpatrick , et al. March 4, 2
2008-03-04
Chemical mechanical polishing method and apparatus
Grant 7,186,651 - Tran , et al. March 6, 2
2007-03-06
Chemical Mechanical Polishing Method and Apparatus
App 20070050077 - Tran; Joe G. ;   et al.
2007-03-01
Systems and methods for removing wafer edge residue and debris using a wafer clean solution
App 20060266383 - Tran; Joe G. ;   et al.
2006-11-30
Systems and methods for removing wafer edge residue and debris using a residue remover mechanism
App 20060270231 - Tran; Joe G. ;   et al.
2006-11-30
Protection of silicon from phosphoric acid using thick chemical oxide
App 20060228904 - Riley; Deborah J. ;   et al.
2006-10-12
Post high voltage gate dielectric pattern plasma surface treatment
App 20060183337 - Kirkpatrick; Brian K. ;   et al.
2006-08-17
Chemical mechanical polishing method and apparatus
App 20060175294 - Tran; Joe G. ;   et al.
2006-08-10
Post high voltage gate dielectric pattern plasma surface treatment
Grant 7,049,242 - Kirkpatrick , et al. May 23, 2
2006-05-23
Post high voltage gate oxide pattern high-vacuum outgas surface treatment
App 20060084229 - Kirkpatrick; Brian K. ;   et al.
2006-04-20
Post high voltage gate oxide pattern high-vacuum outgas surface treatment
Grant 7,018,925 - Kirkpatrick , et al. March 28, 2
2006-03-28
Method to form shallow trench isolation with rounded upper corner for advanced semiconductor circuits
App 20050208732 - Chen, Zhihao ;   et al.
2005-09-22
Post plasma clean process for a hardmask
Grant 6,921,721 - Kirkpatrick , et al. July 26, 2
2005-07-26
Method for improving a physical property defect value of a gate dielectric
App 20050156286 - Kirkpatrick, Brian K. ;   et al.
2005-07-21
Method to form shallow trench isolation with rounded upper corner for advanced semiconductor circuits
Grant 6,917,093 - Chen , et al. July 12, 2
2005-07-12
Chemical mechanical polishing method and apparatus
App 20050095863 - Tran, Joe G. ;   et al.
2005-05-05
Nickel silicide - silicon nitride adhesion through surface passivation
App 20050090087 - Lu, Jiong-Ping ;   et al.
2005-04-28
Post plasma clean process for a hardmask
App 20050090115 - Kirkpatrick, Brian K. ;   et al.
2005-04-28
Method to form shallow trench isolation with rounded upper corner for advanced semiconductor circuits
App 20050062127 - Chen, Zhihao ;   et al.
2005-03-24
Method for improving a physical property defect value of a gate dielectric
Grant 6,869,862 - Kirkpatrick , et al. March 22, 2
2005-03-22
Pre-pattern surface modification of low-k dielectrics
Grant 6,861,348 - Kirkpatrick , et al. March 1, 2
2005-03-01
Post high voltage gate oxide pattern high-vacuum outgas surface treatment
App 20040266113 - Kirkpatrick, Brian K. ;   et al.
2004-12-30
Nickel silicide--silicon nitride adhesion through surface passivation
Grant 6,831,008 - Lu , et al. December 14, 2
2004-12-14
Method to reduce charge interface traps and channel hot carrier degradation
Grant 6,797,644 - Watt , et al. September 28, 2
2004-09-28
Process control, monitoring and end point detection for semiconductor wafers processed with supercritical fluids
App 20040168709 - Drumm, James M. ;   et al.
2004-09-02
Post high voltage gate dielectric pattern plasma surface treatment
App 20040142570 - Kirkpatrick, Brian K. ;   et al.
2004-07-22
Pre-pattern surface modification for low-k dielectrics using A H2 plasma
Grant 6,720,247 - Kirkpatrick , et al. April 13, 2
2004-04-13
Nickel silicide - silicon nitride adhesion through surface passivation
App 20040061184 - Lu, Jiong-Ping ;   et al.
2004-04-01
Method for improving a physical property defect value of a gate dielectric
App 20040029391 - Kirkpatrick, Brian K. ;   et al.
2004-02-12
Method to reduce charge interface traps and channel hot carrier degradation
App 20020132493 - Watt, Victor ;   et al.
2002-09-19
Pre-pattern surface modification for low-k dielectrics using A H2 plasma
App 20020111017 - Kirkpatrick, Brian K. ;   et al.
2002-08-15
Pre-pattern surface modification for low-k dielectrics
App 20020111037 - Kirkpatrick, Brian K. ;   et al.
2002-08-15
Selective Nitride Etching With Silicate Ion Pre-loading
App 20010001728 - JAN, DER?apos;E ;   et al.
2001-05-24

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