Patent | Date |
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Split gate memory cell fabrication and system Grant 11,239,346 - MacPeak , et al. February 1, 2 | 2022-02-01 |
Cleaning System With In-line Spm Processing App 20210407825 - Brown; Brian J. ;   et al. | 2021-12-30 |
Method for stripping one or more layers from a semiconductor wafer Grant 11,205,575 - Palla , et al. December 21, 2 | 2021-12-21 |
Dopant anneal with stabilization step for IC with matched devices Grant 11,205,578 - Kirkpatrick , et al. December 21, 2 | 2021-12-21 |
Split Gate Memory Cell Fabrication And System App 20200381541 - MacPeak; John Howard ;   et al. | 2020-12-03 |
Integrated circuit having chemically modified spacer surface Grant 10,483,261 - Kirkpatrick , et al. Nov | 2019-11-19 |
Dopant Anneal With Stabilization Step For Ic With Matched Devices App 20190115226 - KIRKPATRICK; BRIAN K. ;   et al. | 2019-04-18 |
Method of fabricating semiconductors Grant 9,881,795 - Farber , et al. January 30, 2 | 2018-01-30 |
Inner L-spacer for replacement gate flow Grant 9,768,078 - Lenox , et al. September 19, 2 | 2017-09-19 |
High-k / metal gate CMOS transistors with TiN gates Grant 9,721,847 - Niimi , et al. August 1, 2 | 2017-08-01 |
Integrated Circuit Having Chemically Modified Spacer Surface App 20170179126 - KIRKPATRICK; BRIAN K. ;   et al. | 2017-06-22 |
Method Of Fabricating Semiconductors App 20170148634 - Farber; David Gerald ;   et al. | 2017-05-25 |
Integrated circuit having chemically modified spacer surface Grant 9,620,423 - Kirkpatrick , et al. April 11, 2 | 2017-04-11 |
Integrated circuit having chemically modified spacer surface Grant 9,496,359 - Kirkpatrick , et al. November 15, 2 | 2016-11-15 |
Method of fabricating semiconductors Grant 9,490,143 - Farber , et al. November 8, 2 | 2016-11-08 |
Inner L-spacer For Replacement Gate Flow App 20160254197 - LENOX; Chet Vernon ;   et al. | 2016-09-01 |
Integrated Circuit Having Chemically Modified Spacer Surface App 20160233132 - KIRKPATRICK; BRIAN K. ;   et al. | 2016-08-11 |
Inner L-spacer for replacement gate flow Grant 9,362,375 - Lenox , et al. June 7, 2 | 2016-06-07 |
Gate Slot Overetch Control App 20160118269 - ESHUN; EBENEZER ;   et al. | 2016-04-28 |
Integrated Circuit Having Chemically Modified Spacer Surface App 20160027884 - KIRKPATRICK; BRIAN K. ;   et al. | 2016-01-28 |
Hard mask for source/drain epitaxy control Grant 9,224,657 - Farber , et al. December 29, 2 | 2015-12-29 |
Inner L-spacer for replacement gate flow Grant 9,178,037 - Lenox , et al. November 3, 2 | 2015-11-03 |
Inner L-spacer For Replacement Gate Flow App 20150311304 - LENOX; Chet Vernon ;   et al. | 2015-10-29 |
HIGH-K / METAL GATE CMOS TRANSISTORS WITH TiN GATES App 20150287643 - Niimi; Hiroaki ;   et al. | 2015-10-08 |
Inner L-spacer For Replacement Gate Flow App 20150279966 - LENOX; Chet Vernon ;   et al. | 2015-10-01 |
Inner L-spacer for replacement gate flow Grant 9,087,917 - Lenox , et al. July 21, 2 | 2015-07-21 |
HIGH-K / METAL GATE CMOS TRANSISTORS WITH TiN GATES App 20150187653 - Niimi; Hiroaki ;   et al. | 2015-07-02 |
High-k / metal gate CMOS transistors with TiN gates Grant 9,070,785 - Niimi , et al. June 30, 2 | 2015-06-30 |
Inner L-spacer For Replacement Gate Flow App 20150069516 - LENOX; Chet Vernon ;   et al. | 2015-03-12 |
Hard Mask For Source/drain Epitaxy Control App 20150044830 - Farber; David Gerald ;   et al. | 2015-02-12 |
MOS transistors including SiON gate dielectric with enhanced nitrogen concentration at its sidewalls Grant 8,748,992 - Kirkpatrick , et al. June 10, 2 | 2014-06-10 |
Fabricating A Semiconductor Die Having Coefficient Of Thermal Expansion Graded Layer App 20140080301 - Kirkpatrick; Brian K. ;   et al. | 2014-03-20 |
Die having coefficient of thermal expansion graded layer Grant 8,618,661 - Kirkpatrick , et al. December 31, 2 | 2013-12-31 |
Die having coefficient of thermal expansion graded layer Grant 08618661 - | 2013-12-31 |
Integrated Circuit Having Chemically Modified Spacer Surface App 20130248949 - KIRKPATRICK; BRIAN K. ;   et al. | 2013-09-26 |
MOS TRANSISTORS INCLUDING SiON GATE DIELECTRIC WITH ENHANCED NITROGEN CONCENTRATION AT ITS SIDEWALLS App 20130221451 - KIRKPATRICK; Brian K. ;   et al. | 2013-08-29 |
Method of forming MOS transistors including SiON gate dielectric with enhanced nitrogen concentration at its sidewalls Grant 8,450,221 - Kirkpatrick , et al. May 28, 2 | 2013-05-28 |
Die Having Coefficient Of Thermal Expansion Graded Layer App 20130082385 - KIRKPATRICK; BRIAN K. ;   et al. | 2013-04-04 |
Gate dielectric first replacement gate processes and integrated circuits therefrom Grant 8,372,703 - Kirkpatrick , et al. February 12, 2 | 2013-02-12 |
Curvature reduction for semiconductor wafers Grant 8,252,609 - Kirkpatrick , et al. August 28, 2 | 2012-08-28 |
Wafer planarity control between pattern levels Grant 8,216,945 - Prins , et al. July 10, 2 | 2012-07-10 |
MOS TRANSISTORS INCLUDING SiON GATE DIELECTRIC WITH ENHANCED NITROGEN CONCENTRATION AT ITS SIDEWALLS App 20120032280 - Kirkpatrick; Brian K. ;   et al. | 2012-02-09 |
Recessed STI for wide transistors Grant 8,058,161 - Barna , et al. November 15, 2 | 2011-11-15 |
Nitride removal while protecting semiconductor surfaces for forming shallow junctions Grant 8,043,921 - Kirkpatrick , et al. October 25, 2 | 2011-10-25 |
Systems and methods for removing wafer edge residue and debris using a residue remover mechanism Grant 7,998,865 - Tran , et al. August 16, 2 | 2011-08-16 |
Cross-contamination control for processing of circuits comprising MOS devices that include metal comprising high-K dielectrics Grant 7,968,443 - Kirkpatrick , et al. June 28, 2 | 2011-06-28 |
Selective wet etch process for CMOS ICs having embedded strain inducing regions and integrated circuits therefrom Grant 7,943,456 - Yu , et al. May 17, 2 | 2011-05-17 |
Cross-contamination control for semiconductor process flows having metal comprising gate electrodes Grant 7,927,993 - Kirkpatrick April 19, 2 | 2011-04-19 |
Gate Dielectric First Replacement Gate Processes And Integrated Circuits Therefrom App 20110031557 - Kirkpatrick; Brian K. ;   et al. | 2011-02-10 |
Gate dielectric first replacement gate processes and integrated circuits therefrom Grant 7,838,356 - Kirkpatrick , et al. November 23, 2 | 2010-11-23 |
Wafer Planarity Control Between Pattern Levels App 20100261353 - Prins; Steven L. ;   et al. | 2010-10-14 |
Curvature Reduction For Semiconductor Wafers App 20100261298 - Kirkpatrick; Brian K. ;   et al. | 2010-10-14 |
Nitride Removal While Protecting Semiconductor Surfaces For Forming Shallow Junctions App 20100248440 - Kirkpatrick; Brian K. ;   et al. | 2010-09-30 |
Post metal gate VT adjust etch clean Grant 7,785,957 - Kirkpatrick , et al. August 31, 2 | 2010-08-31 |
Cross-contamination Control For Semiconductor Process Flows Having Metal Comprising Gate Electrodes App 20100167518 - KIRKPATRICK; BRIAN K. | 2010-07-01 |
Selective Wet Etch Process For Cmos Ics Having Embedded Strain Inducing Regions And Integrated Circuits Therefrom App 20100164005 - YU; SHAOFENG ;   et al. | 2010-07-01 |
Gate Dielectric First Replacement Gate Processes And Integrated Circuits Therefrom App 20100164006 - KIRKPATRICK; BRIAN K. ;   et al. | 2010-07-01 |
Post Metal Gate Vt Adjust Etch Clean App 20100167514 - KIRKPATRICK; BRIAN K. ;   et al. | 2010-07-01 |
Cross-contamination Control For Processing Of Circuits Comprising Mos Devices That Include Metal Comprising High-k Dielectrics App 20100167517 - KIRKPATRICK; BRIAN K. ;   et al. | 2010-07-01 |
Post High-k Dielectric/metal Gate Clean App 20100167519 - KIRKPATRICK; BRIAN K. ;   et al. | 2010-07-01 |
Post high-k dielectric/metal gate clean Grant 7,732,284 - Kirkpatrick , et al. June 8, 2 | 2010-06-08 |
Method to Form CMOS Circuits Using Optimized Sidewalls App 20090098702 - Kirkpatrick; Brian K. ;   et al. | 2009-04-16 |
Method To Form Cmos Circuits With Sub 50nm Sti Structures Using Selective Epitaxial Silicon Post Sti Etch App 20090096055 - Montgomery; Clint L. ;   et al. | 2009-04-16 |
Method to form shallow trench isolation with rounded upper corner for advanced semiconductor circuits Grant 7,504,339 - Chen , et al. March 17, 2 | 2009-03-17 |
Shallow Trench Divot Control Post App 20080268589 - Farber; David Gerald ;   et al. | 2008-10-30 |
Post high voltage gate oxide pattern high-vacuum outgas surface treatment Grant 7,402,524 - Kirkpatrick , et al. July 22, 2 | 2008-07-22 |
Protection of silicon from phosphoric acid using thick chemical oxide Grant 7,384,869 - Riley , et al. June 10, 2 | 2008-06-10 |
Recessed STI for wide transistors App 20080081404 - Barna; Gabriel George ;   et al. | 2008-04-03 |
Dual-gate integrated circuit semiconductor device Grant 7,339,240 - Kirkpatrick , et al. March 4, 2 | 2008-03-04 |
Chemical mechanical polishing method and apparatus Grant 7,186,651 - Tran , et al. March 6, 2 | 2007-03-06 |
Chemical Mechanical Polishing Method and Apparatus App 20070050077 - Tran; Joe G. ;   et al. | 2007-03-01 |
Systems and methods for removing wafer edge residue and debris using a wafer clean solution App 20060266383 - Tran; Joe G. ;   et al. | 2006-11-30 |
Systems and methods for removing wafer edge residue and debris using a residue remover mechanism App 20060270231 - Tran; Joe G. ;   et al. | 2006-11-30 |
Protection of silicon from phosphoric acid using thick chemical oxide App 20060228904 - Riley; Deborah J. ;   et al. | 2006-10-12 |
Post high voltage gate dielectric pattern plasma surface treatment App 20060183337 - Kirkpatrick; Brian K. ;   et al. | 2006-08-17 |
Chemical mechanical polishing method and apparatus App 20060175294 - Tran; Joe G. ;   et al. | 2006-08-10 |
Post high voltage gate dielectric pattern plasma surface treatment Grant 7,049,242 - Kirkpatrick , et al. May 23, 2 | 2006-05-23 |
Post high voltage gate oxide pattern high-vacuum outgas surface treatment App 20060084229 - Kirkpatrick; Brian K. ;   et al. | 2006-04-20 |
Post high voltage gate oxide pattern high-vacuum outgas surface treatment Grant 7,018,925 - Kirkpatrick , et al. March 28, 2 | 2006-03-28 |
Method to form shallow trench isolation with rounded upper corner for advanced semiconductor circuits App 20050208732 - Chen, Zhihao ;   et al. | 2005-09-22 |
Post plasma clean process for a hardmask Grant 6,921,721 - Kirkpatrick , et al. July 26, 2 | 2005-07-26 |
Method for improving a physical property defect value of a gate dielectric App 20050156286 - Kirkpatrick, Brian K. ;   et al. | 2005-07-21 |
Method to form shallow trench isolation with rounded upper corner for advanced semiconductor circuits Grant 6,917,093 - Chen , et al. July 12, 2 | 2005-07-12 |
Chemical mechanical polishing method and apparatus App 20050095863 - Tran, Joe G. ;   et al. | 2005-05-05 |
Nickel silicide - silicon nitride adhesion through surface passivation App 20050090087 - Lu, Jiong-Ping ;   et al. | 2005-04-28 |
Post plasma clean process for a hardmask App 20050090115 - Kirkpatrick, Brian K. ;   et al. | 2005-04-28 |
Method to form shallow trench isolation with rounded upper corner for advanced semiconductor circuits App 20050062127 - Chen, Zhihao ;   et al. | 2005-03-24 |
Method for improving a physical property defect value of a gate dielectric Grant 6,869,862 - Kirkpatrick , et al. March 22, 2 | 2005-03-22 |
Pre-pattern surface modification of low-k dielectrics Grant 6,861,348 - Kirkpatrick , et al. March 1, 2 | 2005-03-01 |
Post high voltage gate oxide pattern high-vacuum outgas surface treatment App 20040266113 - Kirkpatrick, Brian K. ;   et al. | 2004-12-30 |
Nickel silicide--silicon nitride adhesion through surface passivation Grant 6,831,008 - Lu , et al. December 14, 2 | 2004-12-14 |
Method to reduce charge interface traps and channel hot carrier degradation Grant 6,797,644 - Watt , et al. September 28, 2 | 2004-09-28 |
Process control, monitoring and end point detection for semiconductor wafers processed with supercritical fluids App 20040168709 - Drumm, James M. ;   et al. | 2004-09-02 |
Post high voltage gate dielectric pattern plasma surface treatment App 20040142570 - Kirkpatrick, Brian K. ;   et al. | 2004-07-22 |
Pre-pattern surface modification for low-k dielectrics using A H2 plasma Grant 6,720,247 - Kirkpatrick , et al. April 13, 2 | 2004-04-13 |
Nickel silicide - silicon nitride adhesion through surface passivation App 20040061184 - Lu, Jiong-Ping ;   et al. | 2004-04-01 |
Method for improving a physical property defect value of a gate dielectric App 20040029391 - Kirkpatrick, Brian K. ;   et al. | 2004-02-12 |
Method to reduce charge interface traps and channel hot carrier degradation App 20020132493 - Watt, Victor ;   et al. | 2002-09-19 |
Pre-pattern surface modification for low-k dielectrics using A H2 plasma App 20020111017 - Kirkpatrick, Brian K. ;   et al. | 2002-08-15 |
Pre-pattern surface modification for low-k dielectrics App 20020111037 - Kirkpatrick, Brian K. ;   et al. | 2002-08-15 |
Selective Nitride Etching With Silicate Ion Pre-loading App 20010001728 - JAN, DER?apos;E ;   et al. | 2001-05-24 |