| Patent | Date |
|---|
7-methyl-3-methylene-7-octenal Acetal Compound And Methods For Producing Aldehyde Compound And Ester Compound Using The Same
App 20220306565 - Kinsho; Takeshi ; et al. | 2022-09-29 |
Process for preparing a formylalkenyl alkoxymethyl ether compound and processes for preparing conjugated diene compounds from the same
Grant 11,420,919 - Miyake , et al. August 23, 2 | 2022-08-23 |
Diester Compound Having A Dimethylcyclobutane Ring, A Process For Preparing The Same, And A Process For Preparing Dimethylcyclobutane Compound Derived From The Diester Compound
App 20220259136 - Ishibashi; Naoki ; et al. | 2022-08-18 |
Dialkoxyalkenyl alkoxymethyl ether compound and a process for preparing a terminal conjugated alkadienal compound from the same
Grant 11,414,368 - Miyake , et al. August 16, 2 | 2022-08-16 |
KINETIC RESOLUTION REACTION OF A (1RS,2SR)-(2-HYDROXY-3,5,5-TRIMETHYL-3-CYCLOPENTENYL)METHYL CARBOXYLATE COMPOUND, A PROCESS FOR PREPARING OPTICALLY ACTIVE TRANS-alpha-NECRODYL ISOBUTYRATE, AND A PROCESS FOR PREPARING OPTICALLY ACTIVE gamma-NECRODYL ISOBUTYRATE
App 20220234983 - Watanabe; Tomohiro ; et al. | 2022-07-28 |
Process for preparing an alkoxymethyl alkynyl ether compound having a terminal triple bond
Grant 11,384,041 - Miyake , et al. July 12, 2 | 2022-07-12 |
Dimethylcyclobutanone compounds, dimethylcyclobutane compounds, and processes for preparing the same
Grant 11,384,043 - Ishibashi , et al. July 12, 2 | 2022-07-12 |
7-methyl-3-methylene-7-octenal acetal compound and methods for producing aldehyde compound and ester compound using the same
Grant 11,384,046 - Kinsho , et al. July 12, 2 | 2022-07-12 |
Processes for preparing alpha-necrodyl compounds and processes for preparing gamma-necrodyl compounds
Grant 11,370,741 - Watanabe , et al. June 28, 2 | 2022-06-28 |
Processes For Preparing A 3-isopropenyl-6-heptenal Compound And A 6-isopropenyl-3-methyl-3,9-decadienyl Carboxylate Compound, And An Intermediate Therefor
App 20220185763 - Baba; Akihiro ; et al. | 2022-06-16 |
Diester compound having a dimethylcyclobutane ring, a process for preparing the same, and a process for preparing dimethylcyclobutane compound derived from the diester compound
Grant 11,352,312 - Ishibashi , et al. June 7, 2 | 2022-06-07 |
Process for preparing (9Z,11E)-9,11-hexadecadienal
Grant 11,319,271 - Miyake , et al. May 3, 2 | 2022-05-03 |
Dialkoxyalkenyl Alkoxymethyl Ether Compound And A Process For Preparing A Terminal Conjugated Alkadienal Compound From The Same
App 20220106247 - Miyake; Yuki ; et al. | 2022-04-07 |
Haloalkenyl Alkoxymethyl Ether Compound And A Process For Preparing A Terminal Conjugated Alkadien-1-yl Acetate Compound And A Terminal Conjugated Alkadien-1-ol Compound Therefrom
App 20220106253 - Miyake; Yuki ; et al. | 2022-04-07 |
6-hydroxy-3-hexenyl Alkoxymethyl Ether Compound And A Process For Preparing A 3,13-octadecadien-1-ol Compound From The Same
App 20220106252 - Miyake; Yuki ; et al. | 2022-04-07 |
Processes for preparing 2-isopropenyl-5-methyl-4-hexenoic acid, 2-isopropenyl-5-methyl-4-hexen-1-ol, and a carboxylate ester thereof
Grant 11,286,227 - Yamashita , et al. March 29, 2 | 2022-03-29 |
Processes For Preparing Alpha-necrodyl Compounds And Processes For Preparing Gamma-necrodyl Compounds
App 20220024847 - Watanabe; Tomohiro ; et al. | 2022-01-27 |
Processes For Preparing 5,5-dimethyl-2-oxo-3-cyclopentene-1-carboxylate Compounds And 3,5,5-trimethyl-2-oxo-3-cyclopentene-1-carboxylate Compounds From 3,3-dimethyl-1-butene-1,4-dicarboxylate Compounds And 1,3,3-trimethyl-1-butene-1,4-dicarboxylate Compounds, And 1,3,3-trimethyl-1-butene-1,4-dicarbo
App 20220024846 - Watanabe; Tomohiro ; et al. | 2022-01-27 |
Process For Preparing 6-isopropenyl-3-methyl-9-decenyl Acetate, And Intermediates Therefor
App 20220017447 - Baba; Akihiro ; et al. | 2022-01-20 |
Process For Preparing (9z,11e)-9,11-hexadecadienal
App 20210403403 - Miyake; Yuki ; et al. | 2021-12-30 |
Aerosol Sprayer For Insect Pest Mating Disruption
App 20210329911 - ISHIBASHI; Naoki ; et al. | 2021-10-28 |
Processes For Preparing 2-isopropenyl-5-methyl-4-hexenoic Acid, 2-isopropenyl-5-methyl-4-hexen-1-ol, And A Carboxylate Ester Thereof
App 20210323902 - Yamashita; Miyoshi ; et al. | 2021-10-21 |
Process For Preparing 6-isopropenyl-3-methyl-9-decenyl Acetate And Intermediates Thereof
App 20210323903 - Baba; Akihiro ; et al. | 2021-10-21 |
Dialkoxyalkadienyne compound and a process for preparing the same and a process for preparing a dienynal compound
Grant 11,148,989 - Miyake , et al. October 19, 2 | 2021-10-19 |
Process For Preparing A Formylalkenyl Alkoxymethyl Ether Compound And Processes For Preparing Conjugated Diene Compounds From The Same
App 20210300854 - Miyake; Yuki ; et al. | 2021-09-30 |
Process for preparing 4-penten-2-ynal
Grant 11,097,999 - Miyake , et al. August 24, 2 | 2021-08-24 |
Process For Preparing An Alkoxymethyl Alkynyl Ether Compound Having A Terminal Triple Bond
App 20210198172 - Miyake; Yuki ; et al. | 2021-07-01 |
Processes For Preparing A 2-(1,2,2-trimethyl-3-cyclopentenyl)-2-oxoethyl Carboxylate Compound And Hydroxymethyl 1,2,2-trimethyl-3-cyclopentenyl Ketone, And A Halomethyl (1,2,2-trimethyl-3-cyclopentenyl) Ketone Compound
App 20210114960 - Kinsho; Takeshi ; et al. | 2021-04-22 |
Process for preparing (7Z)-7-tricosene
Grant 10,954,174 - Miyake , et al. March 23, 2 | 2021-03-23 |
Process For Preparing 4-penten-2-ynal
App 20210061745 - Miyake; Yuki ; et al. | 2021-03-04 |
Dialkoxyalkadienyne Compound And A Process For Preparing The Same And A Process For Preparing A Dienynal Compound
App 20210061744 - Miyake; Yuki ; et al. | 2021-03-04 |
Diester Compound Having A Dimethylcyclobutane Ring, A Process For Preparing The Same, And A Process For Preparing Dimethylcyclobutane Compound Derived From The Diester Compound
App 20210017115 - Ishibashi; Naoki ; et al. | 2021-01-21 |
Dimethylcyclobutanone Compounds, Dimethylcyclobutane Compounds, And Processes For Preparing The Same
App 20210017112 - Ishibashi; Naoki ; et al. | 2021-01-21 |
11-halo-3-undecene Compound And A Process For Preparing The Same And A Process For Preparing 9-dodecenal Compound
App 20210009489 - Miyake; Yuki ; et al. | 2021-01-14 |
Processes for preparing 4-methyl-5-nonanone and 4-methyl-5-nonanol
Grant 10,882,805 - Miyake , et al. January 5, 2 | 2021-01-05 |
Processes for preparing 4-methyl-5-nonanone and 4-methyl-5-nonanol
Grant 10,882,806 - Miyake , et al. January 5, 2 | 2021-01-05 |
Process For Preparing (7z)-7-tricosene
App 20200361836 - Miyake; Yuki ; et al. | 2020-11-19 |
Method for producing (Z)-2-benzoyloxy-12-heptadecene and (2S,12Z)-2-hydroxy-12-heptadecene and method for producing (2S,12Z)-2-acetoxy-12-heptadecene
Grant 10,815,504 - Yamashita , et al. October 27, 2 | 2020-10-27 |
Process for preparing a 5-alken-1-yne compound, (6Z)-1,1-dialkoxy-6-nonen-2-yne compound, (2E,6Z)-2,6-nonadienal and (2E)-cis-6,7-epoxy-2-nonenal, and 1,1-dialkoxy-6-nonen-2-yne compound
Grant 10,781,146 - Watanabe , et al. Sept | 2020-09-22 |
Process for preparing (E2)-cis-6,7-epoxy-2-nonenal
Grant 10,781,194 - Yamashita , et al. Sept | 2020-09-22 |
Composition having sex pheromone activity on San Jose scale, and attractant, mating disruptant, attraction method and mating disruption method for San Jose scale
Grant 10,736,317 - Kinsho , et al. A | 2020-08-11 |
1-haloalkadiene and a process for preparing the same and a process for preparing (9e, 11z)-9,11-hexadecadienyl acetate
Grant 10,737,999 - Watanabe , et al. A | 2020-08-11 |
Process for preparing (E2,Z6)-2,6-nonadienal
Grant 10,730,817 - Yamashita , et al. | 2020-08-04 |
Processes For Preparing 4-methyl-5-nonanone And 4-methyl-5-nonanol
App 20200199052 - Miyake; Yuki ; et al. | 2020-06-25 |
Processes For Preparing 4-methyl-5-nonanone And 4-methyl-5-nonanol
App 20200199053 - Miyake; Yuki ; et al. | 2020-06-25 |
Method for producing reduced halide compound having undergone reduction of carbon-carbon unsaturated bond
Grant 10,676,417 - Miyake , et al. | 2020-06-09 |
Process for preparing (2E,6Z)-2,6-nonadienal and a process for preparing (2E)-cis 6,7-epoxy-2-nonenal
Grant 10,662,166 - Miyake , et al. | 2020-05-26 |
Process for preparing (9e, 11z)-9,11-hexadecadienal
Grant 10,618,862 - Watanabe , et al. | 2020-04-14 |
7-methyl-3-methylene-7-octenal acetal compound and methods for producing aldehyde compound and ester compound using the same
Grant 10,611,718 - Kinsho , et al. | 2020-04-07 |
Process For Preparing (e2)-cis-6,7-epoxy-2-nonenal
App 20200062725 - Yamashita; Miyoshi ; et al. | 2020-02-27 |
Process For Preparing (e2,z6)-2,6-nonadienal
App 20200062682 - Yamashita; Miyoshi ; et al. | 2020-02-27 |
Process For Preparing A 5-alken-1-yne Compound, (6z)-1,1-dialkoxy-6-nonen-2-yne Compound, (2e,6z)-2,6-nonadienal And (2e)-cis-6,
App 20200048161 - Watanabe; Tomohiro ; et al. | 2020-02-13 |
Method For Controlling San Jose Scale
App 20200000089 - HOJO; Tatsuya ; et al. | 2020-01-02 |
Process For Preparing (2e,6z)-2,6-nonadienal And A Process For Preparing (2e)-cis-6,7-epoxy-2-nonenal
App 20190367468 - MIYAKE; Yuki ; et al. | 2019-12-05 |
Method for producing 3,7-dimethyl-7-octenol and method for producing 3,7-dimethyl-7-octenyl carboxylate compound
Grant 10,494,322 - Kinsho , et al. De | 2019-12-03 |
Method For Producing Reduced Halide Compound Having Undergone Reduction Of Carbon-carbon Unsaturated Bond
App 20190322607 - Miyake; Yuki ; et al. | 2019-10-24 |
1-HALOALKADIENE AND A PROCESS FOR PREPARING THE SAME AND A PROCESS FOR PREPARING (9e, 11z)-9,11-HEXADECADIENYL ACETATE
App 20190322614 - WATANABE; Tomohiro ; et al. | 2019-10-24 |
PROCESS FOR PREPARING (9e, 11z)-9,11-HEXADECADIENAL
App 20190322605 - WATANABE; Tomohiro ; et al. | 2019-10-24 |
Method for preparing (7E)-7, 9-decadienoate ester
Grant 10,442,752 - Miyake , et al. Oc | 2019-10-15 |
Composition Having Sex Pheromone Activity On San Jose Scale, And Attractant, Mating Disruptant, Attraction Method And Mating Dis
App 20190191698 - KINSHO; Takeshi ; et al. | 2019-06-27 |
Method For Producing 3,7-dimethyl-7-octenol And Method For Producing 3,7-dimethyl-7-octenyl Carboxylate Compound
App 20190194099 - KINSHO; Takeshi ; et al. | 2019-06-27 |
Method For Preparing (7e)-7, 9-decadienoate Ester
App 20190106374 - MIYAKE; Yuki ; et al. | 2019-04-11 |
Process For Preparing (4z,7z)-4,7-decadien-1-yl Acetate
App 20190071385 - MIYAKE; Yuki ; et al. | 2019-03-07 |
Process for preparing (4Z,7Z)-4,7-decadien-1-yl acetate
Grant 10,221,123 - Miyake , et al. | 2019-03-05 |
Sustained release pheromone preparation of vine mealybug and control method using the preparation
Grant 10,182,566 - Hojo , et al. Ja | 2019-01-22 |
Method For Producing (z)-2-benzoyloxy-12-heptadecene And (2s,12z)-2-hydroxy-12-heptadecene And Method For Producing (2s,12z)-2-acetoxy-12-heptadecene
App 20180355386 - Yamashita; Miyoshi ; et al. | 2018-12-13 |
1-halo-6,9-pentadecadiene and method for producing (7Z,10Z)-7,10-hexadecadienal
Grant 10,138,191 - Miyake , et al. Nov | 2018-11-27 |
Methods for producing 2,6-dimethyl-1,5-heptadien-3-ol and 2,6-dimethyl-1,5-heptadien-3-yl acetate
Grant 10,138,189 - Yamashita , et al. Nov | 2018-11-27 |
Method for producing 2,4-dienal acetal compound and 2,4-dienal compound
Grant 10,138,179 - Ishibashi , et al. Nov | 2018-11-27 |
1-halo-6,9-pentadecadiene And Method For Producing (7z,10z)-7,10-hexadecadienal
App 20180305284 - MIYAKE; Yuki ; et al. | 2018-10-25 |
Method For Producing 2,4-dienal Acetal Compound And 2,4-dienal Compound
App 20180305276 - ISHIBASHI; Naoki ; et al. | 2018-10-25 |
Sustained Release Pheromone Preparation
App 20180271088 - SAGUCHI; Ryuichi ; et al. | 2018-09-27 |
Method for producing (Z)-2-benzoyloxy-12-heptadecene and (2S,12Z)-2-hydroxy-12-heptadecene and method for producing (2S,12Z)-2-acetoxy-12-heptadecene
Grant 10,081,820 - Yamashita , et al. September 25, 2 | 2018-09-25 |
Method of producing aliphatic aldehyde compound having terminal conjugated diene structure and intermediate therefor
Grant 10,040,742 - Baba , et al. August 7, 2 | 2018-08-07 |
7-methyl-3-methylene-7-octenal Acetal Compound And Methods For Producing Aldehyde Compound And Ester Compound Using The Same
App 20180155267 - Kinsho; Takeshi ; et al. | 2018-06-07 |
Method for producing ethyl 4-methyloctanoate
Grant 9,969,671 - Miyake , et al. May 15, 2 | 2018-05-15 |
Alpha-halotetramethycyclohexanone, a method for the preparation thereof, and a method for the preparation of a (2,3,4,4-tetramethylcyclopentyl)methy carboxylate compound
Grant 9,919,994 - Wakamori , et al. March 20, 2 | 2018-03-20 |
Methods For Producing 2,6-dimethyl-1,5-heptadien-3-ol And 2,6-dimethyl-1,5-heptadien-3-yl Acetate
App 20180029964 - YAMASHITA; Miyoshi ; et al. | 2018-02-01 |
Method for producing asymmetric conjugated diyne compound and method for producing Z,Z-conjugated diene compound using the same
Grant 9,845,304 - Miyake , et al. December 19, 2 | 2017-12-19 |
Method for producing chlorohydrocarbon having conjugated double bonds
Grant 9,845,273 - Miyake , et al. December 19, 2 | 2017-12-19 |
Alpha-halotetramethycyclohexanone, A Method For The Preparation Thereof, And A Method For The Preparation Of A (2,3,4,4-tetramethylcyclopentyl)methy Carboxylate Compound
App 20170342013 - WAKAMORI; Shinnosuke ; et al. | 2017-11-30 |
Terminal conjugated trienal acetal compound and method for producing terminal conjugated trienal compound using the same
Grant 9,822,050 - Ishibashi , et al. November 21, 2 | 2017-11-21 |
Method Of Producing Aliphatic Aldehyde Compound Having Terminal Conjugated Diene Structure And Intermediate Therefor
App 20170297987 - Baba; Akihiro ; et al. | 2017-10-19 |
Method For Producing Ethyl 4-methyloctanoate
App 20170267625 - MIYAKE; Yuki ; et al. | 2017-09-21 |
Terminal Conjugated Trienal Acetal Compound and Method for Producing Terminal Conjugated Trienal Compound Using the Same
App 20170253548 - ISHIBASHI; Naoki ; et al. | 2017-09-07 |
Sustained Release Pheromone Preparation of Vine Mealybug and Control Method Using the Preparation
App 20170251667 - HOJO; Tatsuya ; et al. | 2017-09-07 |
Method for producing 2-isopropenyl-5-methyl-4-hexen-1-yl 3-methyl-2-butenoate
Grant 9,738,587 - Yamashita , et al. August 22, 2 | 2017-08-22 |
(E)-2-isopropyl-5-methyl-3,5-hexadienoate compound, method for producing the same, and methods for producing (E)-2-isopropyl-5-methyl-3,5-hexadienol and (E)-2-isopropyl-5-methyl-3,5-hexadienyl carboxylate by using the same
Grant 9,725,400 - Kinsho , et al. August 8, 2 | 2017-08-08 |
Sustained Release Pheromone Preparation
App 20170215413 - OHNO; Erina ; et al. | 2017-08-03 |
Methods for producing .beta.-cyclolavandulal and derivative of same
Grant 9,708,241 - Kinsho , et al. July 18, 2 | 2017-07-18 |
1-(2-acyloxyethyl)cyclopropyl sulfonate compound, 3-halomethyl-3-butenyl carboxylate compound, and method for producing 4-alkyl-3-methylenebutyl carboxylate
Grant 9,688,622 - Kinsho , et al. June 27, 2 | 2017-06-27 |
1-(2-acyloxyethyl)cyclopropyl Sulfonate Compound, 3-halomethyl-3-butenyl Carboxylate Compound, And Method For Producing 4-alkyl-3-methylenebutyl Carboxylate
App 20170158626 - Kinsho; Takeshi ; et al. | 2017-06-08 |
1-(2-acyloxyethyl)cyclopropyl sulfonate compound, 3-halomethyl-3-butenyl carboxylate compound, and method for producing 4-alkyl-3-methylenebutyl carboxylate
Grant 9,611,211 - Kinsho , et al. April 4, 2 | 2017-04-04 |
(e)-2-isopropyl-5-methyl-3,5-hexadienoate Compound, Method For Producing The Same, And Methods For Producing (e)-2-isopropyl-5-methyl-3,5-hexadienol And (e)-2-isopropyl-5-methyl-3,5-hexadienyl Carboxylate By Using The Same
App 20170050913 - Kinsho; Takeshi ; et al. | 2017-02-23 |
Method for producing an .omega.-halo-2-alkynal
Grant 9,550,720 - Yamashita , et al. January 24, 2 | 2017-01-24 |
3-acyloxymethyl-3-butenyl carboxylate compound and method for producing 4-alkyl-3-methylenebutyl carboxylate
Grant 9,499,468 - Kinsho , et al. November 22, 2 | 2016-11-22 |
7-methyl-3-methylene-7-octenyl halide, method for producing the same, and method for producing 7-methyl-3-methylene-7-octenyl propionate
Grant 9,481,619 - Kinsho , et al. November 1, 2 | 2016-11-01 |
Wet strip process for an antireflective coating layer
Grant 9,460,934 - Glodde , et al. October 4, 2 | 2016-10-04 |
Method for Producing Asymmetric Conjugated Diyne Compound and Method for Producing Z,Z-Conjugated Diene Compound Using the Same
App 20160229829 - Miyake; Yuki ; et al. | 2016-08-11 |
Method for producing substrate for making microarray
Grant 9,410,951 - Kusaki , et al. August 9, 2 | 2016-08-09 |
Method For Producing Cyclolavandulol And Derivative Thereof
App 20160221923 - Kinsho; Takeshi ; et al. | 2016-08-04 |
Methods For Producing Beta-cyclolavandulal And Derivative Of Same
App 20160221924 - Kinsho; Takeshi ; et al. | 2016-08-04 |
3-acyloxymethyl-3-butenyl Carboxylate Compound And Method For Producing 4-alkyl-3-methylenebutyl Carboxylate
App 20160185707 - Kinsho; Takeshi ; et al. | 2016-06-30 |
1-(2-acyloxyethyl)cyclopropyl Sulfonate Compound, 3-halomethyl-3-butenyl Carboxylate Compound, And Method For Producing 4-alkyl-3-methylenebutyl Carboxylate
App 20160185708 - Kinsho; Takeshi ; et al. | 2016-06-30 |
7-methyl-3-methylene-7-octenyl Halide, Method For Producing The Same, And Method For Producing 7-methyl-3-methylene-7-octenyl Propionate
App 20160185690 - Kinsho; Takeshi ; et al. | 2016-06-30 |
Method for producing a conjugated Z-alken-yn-yl acetate
Grant 9,376,368 - Yamashita , et al. June 28, 2 | 2016-06-28 |
Organic film composition, method for forming organic film and patterning process using this, and heat-decomposable polymer
Grant 9,372,404 - Watanabe , et al. June 21, 2 | 2016-06-21 |
Method For Producing 2-isopropenyl-5-methyl-4-hexen-1-yl 3-methyl-2-butenoate
App 20160152544 - Yamashita; Miyoshi ; et al. | 2016-06-02 |
Method For Producing An Omega-halo-2-alkynal
App 20160107969 - Yamashita; Miyoshi ; et al. | 2016-04-21 |
Method For Producing A Conjugated Z-alken-yn-yl Acetate
App 20160107978 - Yamashita; Miyoshi ; et al. | 2016-04-21 |
Method for Producing (Z)-2-Benzoyloxy-12-Heptadecene and (2S,12Z)-2-Hydroxy-12-Heptadecene and Method for Producing (2S,12Z)-2-Acetoxy-12-Heptadecene
App 20160076063 - Yamashita; Miyoshi ; et al. | 2016-03-17 |
Method for producing 3,5-dimethyldodecanoic acid
Grant 9,278,900 - Ishibashi , et al. March 8, 2 | 2016-03-08 |
Method for producing 3,5-dimethyldodecanoic acid; and 4-carboxy-3,5-Dimethyl-3,5-dodecadienoic acid
Grant 9,278,899 - Baba , et al. March 8, 2 | 2016-03-08 |
Fluorinated ester monomer, making method, fluorinated ester polymer, and difluorohydroxycarboxylic acid
Grant 9,261,783 - Kinsho , et al. February 16, 2 | 2016-02-16 |
Omega-halo-2-alkynal
Grant 9,255,056 - Yamashita , et al. February 9, 2 | 2016-02-09 |
Method For Producing 3,5-dimethyldodecanoic Acid
App 20150344396 - Ishibashi; Naoki ; et al. | 2015-12-03 |
Method For Producing 3,5-dimethyldodecanoic Acid; And 4-carboxy-3,5-dimethyl-3,5-dodecadienoic Acid
App 20150344395 - Baba; Akihiro ; et al. | 2015-12-03 |
Method for producing 2-isopropylidene-5-methyl-4-hexenyl butyrate
Grant 9,126,920 - Kinsho , et al. September 8, 2 | 2015-09-08 |
Method for producing (E)-2-isopropyl-5-methyl-2,4-hexadienyl acetate
Grant 9,126,923 - Kinsho , et al. September 8, 2 | 2015-09-08 |
Composition for resist underlayer film, process for forming resist underlayer film, patterning process, and fullerene derivative
Grant 9,076,738 - Watanabe , et al. July 7, 2 | 2015-07-07 |
Patterning process, resist composition, polymer, and polymerizable ester compound
Grant 9,057,949 - Watanabe , et al. June 16, 2 | 2015-06-16 |
Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition
Grant 9,046,764 - Tachibana , et al. June 2, 2 | 2015-06-02 |
Naphthalene derivative, resist bottom layer material, and patterning process
Grant 9,045,587 - Kinsho , et al. June 2, 2 | 2015-06-02 |
Method for producing molecule immobilizing substrate, and molecule immobilizing substrate
Grant 9,034,661 - Kusaki , et al. May 19, 2 | 2015-05-19 |
Method For Producing (e)-2-isopropyl-5-methyl-2,4-hexadienyl Acetate
App 20150119598 - KINSHO; Takeshi ; et al. | 2015-04-30 |
Method For Producing 2-isopropylidene-5-methyl-4-hexenyl Butyrate
App 20150119597 - KINSHO; Takeshi ; et al. | 2015-04-30 |
Silicon-containing antireflective coatings including non-polymeric silsesquioxanes
Grant 8,999,625 - Glodde , et al. April 7, 2 | 2015-04-07 |
Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process
Grant 8,933,251 - Watanabe , et al. January 13, 2 | 2015-01-13 |
Naphthalene Derivative, Resist Bottom Layer Material, And Patterning Process
App 20140363768 - Kinsho; Takeshi ; et al. | 2014-12-11 |
Resist underlayer film composition and patterning process using the same
Grant 8,877,422 - Ogihara , et al. November 4, 2 | 2014-11-04 |
Omega-halo-2-alkynal, Method For Producing Same, And Method For Producing Conjugated Z-alken-yn-yl Acetate Using Same
App 20140309452 - Yamashita; Miyoshi ; et al. | 2014-10-16 |
Resist underlayer film composition and patterning process using the same
Grant 8,853,031 - Ogihara , et al. October 7, 2 | 2014-10-07 |
Naphthalene derivative, resist bottom layer material, and patterning process
Grant 8,846,846 - Kinsho , et al. September 30, 2 | 2014-09-30 |
Method For Producing Chlorohydrocarbon Having Conjugated Double Bonds
App 20140275657 - Miyake; Yuki ; et al. | 2014-09-18 |
Wet Strip Process For An Antireflective Coating Layer
App 20140273501 - Glodde; Martin ; et al. | 2014-09-18 |
Biphenyl derivative, resist bottom layer material, bottom layer forming method, and patterning process
Grant 8,835,697 - Kori , et al. September 16, 2 | 2014-09-16 |
Resist underlayer film composition, process for forming resist underlayer film, patterning process and fullerene derivative
Grant 8,835,092 - Watanabe , et al. September 16, 2 | 2014-09-16 |
Fluoroalcohol, fluorinated monomer, polymer, resist composition and patterning process
Grant 8,835,094 - Hasegawa , et al. September 16, 2 | 2014-09-16 |
Silicon-containing Antireflective Coatings Including Non-polymeric Silsesquioxanes
App 20140227641 - Glodde; Martin ; et al. | 2014-08-14 |
Naphthalene derivative, resist bottom layer material, resist bottom layer forming method, and patterning process
Grant 8,795,955 - Kinsho , et al. August 5, 2 | 2014-08-05 |
Acid-labile ester monomer having spirocyclic structure, polymer, resist composition, and patterning process
Grant 8,791,288 - Kinsho , et al. July 29, 2 | 2014-07-29 |
Acetal compound, polymer, resist composition, and patterning process
Grant 8,791,290 - Hasegawa , et al. July 29, 2 | 2014-07-29 |
Patterning process
Grant 8,722,321 - Kobayashi , et al. May 13, 2 | 2014-05-13 |
Near-infrared absorptive layer-forming composition and multilayer film comprising near-infrared absorptive layer
Grant 8,722,307 - Tachibana , et al. May 13, 2 | 2014-05-13 |
Fluorinated ester monomer, making method, fluorinated ester polymer, and difluorohydroxycarboxylic acid
Grant 8,697,903 - Kinsho , et al. April 15, 2 | 2014-04-15 |
Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process
Grant 8,691,490 - Ohashi , et al. April 8, 2 | 2014-04-08 |
Resist underlayer film composition and patterning process using the same
Grant 8,663,898 - Ogihara , et al. March 4, 2 | 2014-03-04 |
Fluorinated Ester Monomer, Making Method, Fluorinated Ester Polymer, And Difluorohydroxycarboxylic Acid
App 20140051024 - KINSHO; Takeshi ; et al. | 2014-02-20 |
Photoacid generator, resist composition, and patterning process
Grant 8,609,889 - Ohashi , et al. December 17, 2 | 2013-12-17 |
Resist underlayer film-forming composition, process for forming resist underlayer film and patterning process
Grant 8,603,732 - Ogihara , et al. December 10, 2 | 2013-12-10 |
Sulfonium salt, resist composition, and patterning process
Grant 8,597,869 - Sagehashi , et al. December 3, 2 | 2013-12-03 |
Resist underlayer film composition and patterning process using the same
Grant 8,592,956 - Ogihara , et al. November 26, 2 | 2013-11-26 |
Resist composition and patterning process
Grant 8,592,133 - Watanabe , et al. November 26, 2 | 2013-11-26 |
Resist composition and patterning process
Grant 8,586,282 - Watanabe , et al. November 19, 2 | 2013-11-19 |
Organic Film Composition, Method For Forming Organic Film And Patterning Process Using This, And Heat-decomposable Polymer
App 20130302990 - WATANABE; Takeru ; et al. | 2013-11-14 |
Positive resist compositions and patterning process
Grant 8,541,158 - Kusaki , et al. September 24, 2 | 2013-09-24 |
Fluorinated Monomer Of Cyclic Acetal Structure, Polymer, Resist Protective Coating Composition, Resist Composition, And Patterning Process
App 20130231491 - WATANABE; Takeru ; et al. | 2013-09-05 |
Resist Underlayer Film Composition, Method For Producing Polymer For Resist Underlayer Film, And Patterning Process Using The Resist Underlayer Film Composition
App 20130171569 - TACHIBANA; Seiichiro ; et al. | 2013-07-04 |
Patterning Process, Resist Composition, Polymer, And Polymerizable Ester Compound
App 20130157194 - Watanabe; Takeru ; et al. | 2013-06-20 |
Near-infrared Absorbing Film Composition For Lithographic Application
App 20130157463 - Goldfarb; Dario L. ; et al. | 2013-06-20 |
Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process
Grant 8,431,323 - Watanabe , et al. April 30, 2 | 2013-04-30 |
Resist-modifying composition and pattern forming process
Grant 8,426,105 - Watanabe , et al. April 23, 2 | 2013-04-23 |
Acetal compounds and their preparation, polymers, resist compositions and patterning process
Grant 8,420,290 - Hasegawa , et al. April 16, 2 | 2013-04-16 |
Sulfonium salt, acid generator, resist composition, photomask blank, and patterning process
Grant 8,394,570 - Ohashi , et al. March 12, 2 | 2013-03-12 |
Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process
Grant 8,349,533 - Ohsawa , et al. January 8, 2 | 2013-01-08 |
Resist-modifying composition and pattern forming process
Grant 8,329,384 - Watanabe , et al. December 11, 2 | 2012-12-11 |
Near-infrared absorbing dye, near-infrared absorptive film-forming composition, and near-infrared absorptive film
Grant 8,323,536 - Ohashi , et al. December 4, 2 | 2012-12-04 |
Near-infrared Absorptive Layer-forming Composition And Multilayer Film Comprising Near-infrared Absorptive Layer
App 20120301828 - TACHIBANA; Seiichiro ; et al. | 2012-11-29 |
Antireflective coating composition, antireflective coating, and patterning process
Grant 8,313,890 - Tachibana , et al. November 20, 2 | 2012-11-20 |
Patterning Process
App 20120270159 - Kobayashi; Tomohiro ; et al. | 2012-10-25 |
Resist lower layer film-formed substrate
Grant 8,288,072 - Hatakeyama , et al. October 16, 2 | 2012-10-16 |
Sulfonate and its derivative, photosensitive acid generator, and resist composition and patterning process using the same
Grant 8,283,104 - Ohashi , et al. October 9, 2 | 2012-10-09 |
Biphenyl Derivative, Resist Bottom Layer Material, Bottom Layer Forming Method, And Patterning Process
App 20120252218 - Kori; Daisuke ; et al. | 2012-10-04 |
Double patterning process
Grant 8,247,166 - Takemura , et al. August 21, 2 | 2012-08-21 |
Resist Underlayer Film Composition And Patterning Process Using The Same
App 20120184103 - OGIHARA; Tsutomu ; et al. | 2012-07-19 |
Resist Composition And Patterning Process
App 20120183892 - WATANABE; Satoshi ; et al. | 2012-07-19 |
Resist Composition And Patterning Process
App 20120183893 - WATANABE; Satoshi ; et al. | 2012-07-19 |
Polymer, polymer preparation method, resist composition and patterning process
Grant 8,216,766 - Watanabe , et al. July 10, 2 | 2012-07-10 |
Resist Underlayer Film Composition And Patterning Process Using The Same
App 20120171868 - OGIHARA; Tsutomu ; et al. | 2012-07-05 |
Chemically-amplified positive resist composition and patterning process thereof
Grant 8,202,677 - Takeda , et al. June 19, 2 | 2012-06-19 |
Resist Underlayer Film Composition And Patterning Process Using The Same
App 20120142193 - OGIHARA; Tsutomu ; et al. | 2012-06-07 |
Near-infrared Absorbing Dye, Near-infrared Absorptive Film-forming Composition, And Near-infrared Absorptive Film
App 20120119171 - OHASHI; Masaki ; et al. | 2012-05-17 |
Resist Underlayer Film Composition And Patterning Process Using The Same
App 20120108071 - OGIHARA; Tsutomu ; et al. | 2012-05-03 |
Resist composition and patterning process
Grant 8,168,367 - Watanabe , et al. May 1, 2 | 2012-05-01 |
Sulfonium Salt, Resist Composition, And Patterning Process
App 20120100486 - Sagehashi; Masayoshi ; et al. | 2012-04-26 |
Fluorinated Ester Monomer, Making Method, Fluorinated Ester Polymer, And Difluorohydroxycarboxylic Acid
App 20120083580 - KINSHO; Takeshi ; et al. | 2012-04-05 |
Method for manufacturing substrate for making microarray
Grant 8,148,053 - Kusaki , et al. April 3, 2 | 2012-04-03 |
Fluoroalcohol, Fluorinated Monomer, Polymer, Resist Composition And Patterning Process
App 20120077121 - HASEGAWA; Koji ; et al. | 2012-03-29 |
Naphthalene Derivative, Resist Bottom Layer Material, And Patterning Process
App 20120064725 - Kinsho; Takeshi ; et al. | 2012-03-15 |
Composition For Resist Underlayer Film, Process For Forming Resist Underlayer Film, Patterning Process, And Fullerene Derivative
App 20120045900 - WATANABE; Takeru ; et al. | 2012-02-23 |
Photoacid generator, resist composition, and patterning process
Grant 8,114,570 - Ohsawa , et al. February 14, 2 | 2012-02-14 |
Photoacid generator, resist composition, and patterning process
Grant 8,114,571 - Ohashi , et al. February 14, 2 | 2012-02-14 |
Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process
Grant 8,105,748 - Ohashi , et al. January 31, 2 | 2012-01-31 |
Naphthalene Derivative, Resist Bottom Layer Material, Resist Bottom Layer Forming Method, And Patterning Process
App 20110311920 - Kinsho; Takeshi ; et al. | 2011-12-22 |
Carboxyl-containing lactone compound, polymer, resist composition, and patterning process
Grant 8,062,831 - Shinachi , et al. November 22, 2 | 2011-11-22 |
Positive resist composition and patterning process
Grant 8,062,828 - Ohsawa , et al. November 22, 2 | 2011-11-22 |
Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process
Grant 8,057,985 - Ohashi , et al. November 15, 2 | 2011-11-15 |
Monomer, resist composition, and patterning process
Grant 8,057,982 - Hatakeyama , et al. November 15, 2 | 2011-11-15 |
Method for manufacturing substrate for making microarray
Grant 8,053,179 - Kusaki , et al. November 8, 2 | 2011-11-08 |
Hydroxyl-containing monomer, polymer, resist composition, and patterning process
Grant 8,053,165 - Kinsho , et al. November 8, 2 | 2011-11-08 |
Sulfonium salt-containing polymer, resist composition, and patterning process
Grant 8,048,610 - Ohsawa , et al. November 1, 2 | 2011-11-01 |
Near-infrared Absorptive Layer-forming Composition And Multilayer Film
App 20110262863 - TACHIBANA; Seiichiro ; et al. | 2011-10-27 |
Near-infrared Absorptive Layer-forming Composition And Multilayer Film
App 20110262862 - OHASHI; Masaki ; et al. | 2011-10-27 |
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
Grant 8,030,515 - Kobayashi , et al. October 4, 2 | 2011-10-04 |
Acetal Compound, Polymer, Resist Composition, And Patterning Process
App 20110236831 - HASEGAWA; Koji ; et al. | 2011-09-29 |
Positive resist compositions and patterning process
Grant 8,021,822 - Ohsawa , et al. September 20, 2 | 2011-09-20 |
Positive resist compositions and patterning process
Grant 8,017,302 - Ohsawa , et al. September 13, 2 | 2011-09-13 |
Ester compounds and their preparation, polymers, resist compositions and patterning process
Grant 7,998,657 - Ohashi , et al. August 16, 2 | 2011-08-16 |
Resist Underlayer Film Composition, Process For Forming Resist Underlayer Film, Patterning Process And Fullerene Derivative
App 20110195362 - Watanabe; Takeru ; et al. | 2011-08-11 |
Positive resist compositions and patterning process
Grant 7,993,811 - Ohsawa , et al. August 9, 2 | 2011-08-09 |
Novel Sulfonium Salt, Polymer, Method For Producing The Polymer, Resist Composition And Patterning Process
App 20110189607 - OHASHI; Masaki ; et al. | 2011-08-04 |
Positive Resist Compositions And Patterning Process
App 20110183262 - Kusaki; Wataru ; et al. | 2011-07-28 |
Positive resist composition and patterning process
Grant 7,985,528 - Nishi , et al. July 26, 2 | 2011-07-26 |
Resist Underlayer Film-forming Composition, Process For Forming Resist Underlayer Film And Patterning Process
App 20110177459 - OGIHARA; Tsutomu ; et al. | 2011-07-21 |
Fluorinated monomer, fluorinated polymer, resist composition and patterning process
Grant 7,981,589 - Hasegawa , et al. July 19, 2 | 2011-07-19 |
Novel Sulfonate Salts And Derivatives, Photoacid Generators, Resist Compositions, And Patterning Process
App 20110160481 - KOBAYASHI; Katsuhiro ; et al. | 2011-06-30 |
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
Grant 7,928,262 - Kobayashi , et al. April 19, 2 | 2011-04-19 |
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
Grant 7,919,226 - Ohsawa , et al. April 5, 2 | 2011-04-05 |
Ester compounds and their preparation, polymers, resist compositions and patterning process
Grant 7,902,385 - Ohashi , et al. March 8, 2 | 2011-03-08 |
Resist Polymer, Preparing Method, Resist Composition And Patterning Process
App 20110054133 - Tachibana; Seiichiro ; et al. | 2011-03-03 |
Ester Compounds And Their Preparation, Polymers, Resist Compositions And Patterning Process
App 20110039204 - OHASHI; Masaki ; et al. | 2011-02-17 |
Antireflective coating composition, antireflective coating, and patterning process
Grant 7,879,530 - Tachibana , et al. February 1, 2 | 2011-02-01 |
Lactone-containing compound, polymer, resist composition, and patterning process
Grant 7,871,752 - Hasegawa , et al. January 18, 2 | 2011-01-18 |
Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process
Grant 7,868,199 - Hasegawa , et al. January 11, 2 | 2011-01-11 |
Photoacid Generator, Resist Composition, And Patterning Process
App 20110003247 - Ohashi; Masaki ; et al. | 2011-01-06 |
Acid-labile Ester Monomer Having Spirocyclic Structure, Polymer, Resist Composition, And Patterning Process
App 20100304295 - Kinsho; Takeshi ; et al. | 2010-12-02 |
Resist-modifying Composition And Pattern Forming Process
App 20100297563 - Watanabe; Takeru ; et al. | 2010-11-25 |
Resist-modifying Composition And Pattern Forming Process
App 20100297554 - Watanabe; Takeru ; et al. | 2010-11-25 |
Lactone-containing compound, polymer, resist composition, and patterning process
Grant 7,833,694 - Hasegawa , et al. November 16, 2 | 2010-11-16 |
Hydrogenated ring-opening metathesis polymer, resist composition and patterning process
Grant 7,807,331 - Kobayashi , et al. October 5, 2 | 2010-10-05 |
Method For Producing Molecule Immobilizing Substrate, And Molecule Immobilizing Substrate
App 20100233827 - KUSAKI; Wataru ; et al. | 2010-09-16 |
Hydrogenated ring-opening metathesis polymer, resist composition comprising the same and patterning method
Grant 7,794,915 - Sunaga , et al. September 14, 2 | 2010-09-14 |
Lactone-containing compounds, polymers, resist compositions, and patterning method
Grant RE41,580 - Hasegawa , et al. August 24, 2 | 2010-08-24 |
Novel Sulfonate And Its Derivative, Photosensitive Acid Generator, And Resist Composition And Patterning Process Using The Same
App 20100209827 - OHASHI; Masaki ; et al. | 2010-08-19 |
Patterning process and resist composition
Grant 7,741,015 - Hatakeyama , et al. June 22, 2 | 2010-06-22 |
Antireflective Coating Composition, Antireflective Coating , And Patterning Process
App 20100151381 - TACHIBANA; Seiichiro ; et al. | 2010-06-17 |
Sulfonium Salt, Acid Generator, Resist Composition, Photomask Blank, And Patterning Process
App 20100143830 - OHASHI; Masaki ; et al. | 2010-06-10 |
Acetal Compounds And Their Preparation, Polymers, Resist Compositions And Patterning Process
App 20100136485 - HASEGAWA; Koji ; et al. | 2010-06-03 |
Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process
App 20100119970 - Ohsawa; Youichi ; et al. | 2010-05-13 |
Fluorinated Monomer Of Cyclic Acetal Structure, Polymer, Resist Protective Coating Composition, Resist Composition, And Patterning Process
App 20100112482 - WATANABE; Takeru ; et al. | 2010-05-06 |
Polymerizable Anion-containing Sulfonium Salt And Polymer, Resist Composition, And Patterning Process
App 20100099042 - OHASHI; Masaki ; et al. | 2010-04-22 |
Patterning Process
App 20100086878 - Hatakeyama; Jun ; et al. | 2010-04-08 |
Polymerizable ester compounds, polymers, resist compositions and patterning process
Grant 7,687,222 - Watanabe , et al. March 30, 2 | 2010-03-30 |
Antireflection film composition and patterning process using the same
Grant 7,687,228 - Hatakeyama , et al. March 30, 2 | 2010-03-30 |
Lactone-containing compound, polymer, resist composition, and patterning process
Grant 7,678,530 - Hasegawa , et al. March 16, 2 | 2010-03-16 |
Double Patterning Process
App 20100062380 - Takemura; Katsuya ; et al. | 2010-03-11 |
Positive Resist Composition And Patterning Process
App 20100062366 - Nishi; Tsunehiro ; et al. | 2010-03-11 |
Polymerizable Anion-containing Sulfonium Salt And Polymer, Resist Composition, And Patterning Process
App 20100055608 - Ohashi; Masaki ; et al. | 2010-03-04 |
Method for producing substrate for making microarray
App 20100055337 - Kusaki; Wataru ; et al. | 2010-03-04 |
Photoacid generator, resist composition, and patterning process
Grant 7,670,751 - Ohashi , et al. March 2, 2 | 2010-03-02 |
Chemically-amplified positive resist composition and patterning process thereof
App 20100009286 - Takeda; Takanobu ; et al. | 2010-01-14 |
Resist composition and patterning process
App 20100009299 - Watanabe; Satoshi ; et al. | 2010-01-14 |
Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process
Grant 7,638,256 - Kinsho , et al. December 29, 2 | 2009-12-29 |
Novel Photoacid Generator, Resist Composition, And Patterning Process
App 20090274978 - OHASHI; Masaki ; et al. | 2009-11-05 |
Carboxyl-containing Lactone Compound, Polymer, Resist Composition, And Patterning Process
App 20090274984 - SHINACHI; Satoshi ; et al. | 2009-11-05 |
Positive resist compositions and patterning process
Grant 7,611,821 - Nishi , et al. November 3, 2 | 2009-11-03 |
Sulfonium Salt-containing Polymer, Resist Composition, And Patterning Process
App 20090269696 - OHSAWA; Youichi ; et al. | 2009-10-29 |
Polymer, Polymer Preparation Method, Resist Composition And Patterning Process
App 20090246686 - WATANABE; Takeru ; et al. | 2009-10-01 |
Novel Photoacid Generator, Resist Composition, And Patterning Process
App 20090246694 - Ohsawa; Youichi ; et al. | 2009-10-01 |
Hydroxyl-containing Monomer, Polymer, Resist Composition, And Patterning Process
App 20090239179 - Kinsho; Takeshi ; et al. | 2009-09-24 |
Polymerizable fluorinated compound, making method, polymer, resist composition and patterning process
Grant 7,592,407 - Harada , et al. September 22, 2 | 2009-09-22 |
Lactone-containing Compound, Polymer, Resist Composition, And Patterning Process
App 20090233242 - HASEGAWA; Koji ; et al. | 2009-09-17 |
Monomer, Resist Composition, And Patterning Process
App 20090226843 - HATAKEYAMA; Jun ; et al. | 2009-09-10 |
Positive Resist Composition And Patterning Process
App 20090202943 - Ohsawa; Youichi ; et al. | 2009-08-13 |
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
Grant 7,569,324 - Kobayashi , et al. August 4, 2 | 2009-08-04 |
Positive Resist Compositions And Patterning Process
App 20090186298 - OHSAWA; Youichi ; et al. | 2009-07-23 |
Positive Resist Compositions And Patterning Process
App 20090186297 - Ohsawa; Youichi ; et al. | 2009-07-23 |
Positive Resist Compositions And Patterning Process
App 20090186296 - OHSAWA; Youichi ; et al. | 2009-07-23 |
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
Grant 7,556,909 - Kobayashi , et al. July 7, 2 | 2009-07-07 |
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
Grant 7,531,290 - Kobayashi , et al. May 12, 2 | 2009-05-12 |
Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process
Grant 7,531,289 - Kinsho , et al. May 12, 2 | 2009-05-12 |
Antireflective Coating Composition, Antireflective Coating, And Patterning Process
App 20090087799 - Tachibana; Seiichiro ; et al. | 2009-04-02 |
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
Grant 7,511,169 - Ohsawa , et al. March 31, 2 | 2009-03-31 |
Novel Photoacid Generator, Resist Composition, And Patterning Process
App 20090061358 - OHASHI; Masaki ; et al. | 2009-03-05 |
Polymers, positive resist compositions and patterning process
Grant 7,491,483 - Hatakeyama , et al. February 17, 2 | 2009-02-17 |
Fluorinated Monomer, Fluorinated Polymer, Resist Composition And Patterning Process
App 20090035699 - HASEGAWA; Koji ; et al. | 2009-02-05 |
Fluorine-containing silicon compounds, silicone resins, resist compositions, and patterning process
Grant 7,485,408 - Kinsho , et al. February 3, 2 | 2009-02-03 |
Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
App 20080318160 - Ohsawa; Youichi ; et al. | 2008-12-25 |
Method for manufacturing substrate for making microarray
App 20080233409 - Kusaki; Wataru ; et al. | 2008-09-25 |
Method for manufacturing substrate for making microarray
App 20080233521 - Kusaki; Wataru ; et al. | 2008-09-25 |
Method for manufacturing substrate for making microarray
App 20080233309 - Kusaki; Wataru ; et al. | 2008-09-25 |
Method for manufacturing substrate for microarray
App 20080233292 - Kusaki; Wataru ; et al. | 2008-09-25 |
Resist lower layer film composition and patterning process using the same
App 20080227037 - Hatakeyama; Jun ; et al. | 2008-09-18 |
Antireflection film composition and patterning process using the same
App 20080220381 - Hatakeyama; Jun ; et al. | 2008-09-11 |
Patterning Process And Resist Composition
App 20080199806 - HATAKEYAMA; Jun ; et al. | 2008-08-21 |
Novel Sulfonate Salts And Derivatives, Photoacid Generators, Resist Compositions, And Patterning Process
App 20080124656 - KOBAYASHI; Katsuhiro ; et al. | 2008-05-29 |
Tertiary amine compounds having an ester structure and processes for preparing the same
Grant 7,378,548 - Watanabe , et al. May 27, 2 | 2008-05-27 |
Hydrogenated ring-opening metathesis polymer, resist composition comprising the same and patterning method
App 20080085470 - Sunaga; Tadahiro ; et al. | 2008-04-10 |
Lactone-containing compound, polymer, resist composition, and patterning process
App 20080026331 - HASEGAWA; Koji ; et al. | 2008-01-31 |
Polymerizable ester compounds, polymers, resist compositions and patterning process
App 20080008962 - Watanabe; Takeru ; et al. | 2008-01-10 |
Positive Resist Compositions And Patterning Process
App 20080008961 - NISHI; Tsunehiro ; et al. | 2008-01-10 |
Ester compounds and their preparation, polymers, resist compositions and patterning process
App 20080008965 - Ohashi; Masaki ; et al. | 2008-01-10 |
Novel Sulfonate Salts And Derivatives, Photoacid Generators, Resist Compositions, And Patterning Process
App 20070298352 - KOBAYASHI; Katsuhiro ; et al. | 2007-12-27 |
Polymerizable fluorinated ester compounds and their preparing processes
Grant 7,312,288 - Kinsho , et al. December 25, 2 | 2007-12-25 |
Resist polymer, preparing method, resist composition and patterning process
App 20070264592 - Tachibana; Seiichiro ; et al. | 2007-11-15 |
Polymerizable Fluorinated Ester Compounds And Their Preparing Processes
App 20070249858 - Kinsho; Takeshi ; et al. | 2007-10-25 |
Polymerizable ester having sulfonamide structure, polymer, resist composition and patterning process
Grant 7,285,368 - Watanabe , et al. October 23, 2 | 2007-10-23 |
Sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning using the same
Grant 7,282,316 - Kobayashi , et al. October 16, 2 | 2007-10-16 |
Nitrogen-containing organic compound, resist composition and patterning process
Grant 7,276,324 - Watanabe , et al. October 2, 2 | 2007-10-02 |
Fluorine-containing silicon compounds, silicone resins, resist compositions, and patterning process
App 20070218402 - Kinsho; Takeshi ; et al. | 2007-09-20 |
Polymers, positive resist compositions and patterning process
App 20070207408 - Hatakeyama; Jun ; et al. | 2007-09-06 |
Nitrogen-containing organic compound, resist composition and patterning process
Grant 7,252,925 - Watanabe , et al. August 7, 2 | 2007-08-07 |
Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process
App 20070179309 - Hasegawa; Koji ; et al. | 2007-08-02 |
Lactone-containing compound, polymer, resist composition, and patterning process
App 20070160929 - Hasegawa; Koji ; et al. | 2007-07-12 |
Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
App 20070099113 - Kobayashi; Katsuhiro ; et al. | 2007-05-03 |
Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
App 20070099112 - Kobayashi; Katsuhiro ; et al. | 2007-05-03 |
Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process
Grant 7,202,318 - Kinsho , et al. April 10, 2 | 2007-04-10 |
Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process
Grant 7,192,684 - Kinsho , et al. March 20, 2 | 2007-03-20 |
Compound, polymer, resist composition, and patterning process
Grant 7,169,541 - Hasegawa , et al. January 30, 2 | 2007-01-30 |
Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process
App 20070009832 - Kinsho; Takeshi ; et al. | 2007-01-11 |
Basic compound, resist composition and patterning process
Grant 7,141,352 - Watanabe , et al. November 28, 2 | 2006-11-28 |
Basic compound, resist composition and patterning process
Grant 7,141,351 - Watanabe , et al. November 28, 2 | 2006-11-28 |
Ester compounds, polymers, resist compositions and patterning process
Grant 7,132,215 - Hasegawa , et al. November 7, 2 | 2006-11-07 |
Novel ester compounds, polymers, resist compositions and patterning process
App 20060234160 - Hasegawa; Koji ; et al. | 2006-10-19 |
Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
App 20060228648 - Ohsawa; Youichi ; et al. | 2006-10-12 |
Novel Tertiary Amine Compounds Having An Ester Structure And Processes For Preparing The Same
App 20060217570 - Watanabe; Takeru ; et al. | 2006-09-28 |
Tertiary amine compounds having an ester structure and processes for preparing same
Grant 7,084,303 - Watanabe , et al. August 1, 2 | 2006-08-01 |
Alicyclic methacrylate having oxygen substituent group on .alpha.-methyl
Grant 7,041,846 - Watanabe , et al. May 9, 2 | 2006-05-09 |
Polymerizable fluorinated compound, making method, polymer, resist composition and patterning process
App 20060094817 - Harada; Yuji ; et al. | 2006-05-04 |
Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process
App 20060093960 - Kinsho; Takeshi ; et al. | 2006-05-04 |
Tertiary (meth)acrylates having lactone structure, polymers, resist compositions and patterning process
Grant 7,037,995 - Watanabe , et al. May 2, 2 | 2006-05-02 |
Tertiary alcohol compounds having alicyclic structure
Grant 7,029,822 - Hasegawa , et al. April 18, 2 | 2006-04-18 |
Compound, fluorine-containing polymerizable cyclic olefin compound
Grant 7,012,161 - Watanabe , et al. March 14, 2 | 2006-03-14 |
Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process
App 20060009602 - Kinsho; Takeshi ; et al. | 2006-01-12 |
Novel tertiary (meth)acrylates having lactone structure, polymers, resist compositions and patterning process
App 20050250924 - Watanabe, Takeru ; et al. | 2005-11-10 |
Acetal compound, polymer, resist composition and patterning process
Grant 6,962,767 - Watanabe , et al. November 8, 2 | 2005-11-08 |
Polymer, resist material and patterning method
Grant 6,946,233 - Nishi , et al. September 20, 2 | 2005-09-20 |
Novel epoxy compounds having an alicyclic structure, polymer compounds, resist materials, and patterning methods
App 20050142491 - Hasegawa, Koji ; et al. | 2005-06-30 |
Epoxy compound having alicyclic structure, polymer, resist composition and patterning process
Grant 6,899,990 - Hasegawa , et al. May 31, 2 | 2005-05-31 |
Nitrogen-containing organic compound, resist composition and patterning process
App 20050106500 - Watanabe, Takeru ; et al. | 2005-05-19 |
Nitrogen-containing organic compound, resist composition and patterning process
App 20050095533 - Watanabe, Takeru ; et al. | 2005-05-05 |
Novel compound, fluorine-containing polymerizable cyclic olefin compound
App 20050054883 - Watanabe, Takeru ; et al. | 2005-03-10 |
Novel sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning process using the same
App 20050048395 - Kobayashi, Katsuhiro ; et al. | 2005-03-03 |
Novel compound, polymer, resist composition, and patterning process
App 20050014092 - Hasegawa, Koji ; et al. | 2005-01-20 |
Polymer, resist composition and patterning process
Grant 6,844,133 - Nishi , et al. January 18, 2 | 2005-01-18 |
Basic compound, resist composition and patterning process
App 20050008968 - Watanabe, Takeru ; et al. | 2005-01-13 |
Polymerizable ester having sulfonamide structure, polymer, resist composition and patterning process
App 20050003303 - Watanabe, Takeru ; et al. | 2005-01-06 |
Novel tertiary alcohol compounds having alicyclic structure
App 20040254394 - Hasegawa, Koji ; et al. | 2004-12-16 |
Resist composition and patterning process
Grant 6,830,866 - Kobayashi , et al. December 14, 2 | 2004-12-14 |
Basic compound, resist composition and patterning process
App 20040234884 - Watanabe, Takeru ; et al. | 2004-11-25 |
Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparation
Grant 6,794,111 - Nishi , et al. September 21, 2 | 2004-09-21 |
Alicyclic methacrylate having oxygen substituent group on alpha-methyl
App 20040176630 - Watanabe, Takeru ; et al. | 2004-09-09 |
Polymer, resist composition and patterning process
Grant 6,780,563 - Hasegawa , et al. August 24, 2 | 2004-08-24 |
Tertiary alcohol compounds having alicyclic structure
Grant 6,774,258 - Hasegawa , et al. August 10, 2 | 2004-08-10 |
(Meth)acrylates having lactone structure, polymers, photoresist compositions and patterning process
Grant 6,746,818 - Kinsho , et al. June 8, 2 | 2004-06-08 |
Cyclic acetal compound, polymer, resist composition and patterning process
Grant 6,743,566 - Nakashima , et al. June 1, 2 | 2004-06-01 |
Novel ester compounds, polymers, resist compositions and patterning process
App 20040068124 - Hasegawa, Koji ; et al. | 2004-04-08 |
Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process
App 20040067436 - Kinsho, Takeshi ; et al. | 2004-04-08 |
Polymer, resist composition and patterning process
Grant 6,703,183 - Nishi , et al. March 9, 2 | 2004-03-09 |
Polymer, resist composition and patterning process
Grant 6,673,515 - Nishi , et al. January 6, 2 | 2004-01-06 |
Polymer, resist composition and patterning process
Grant 6,673,517 - Nishi , et al. January 6, 2 | 2004-01-06 |
Polymer, resist composition and patterning process
Grant 6,673,518 - Nishi , et al. January 6, 2 | 2004-01-06 |
Novel ester compounds polymers, resist compositions and patterning process
App 20030198891 - Hasegawa, Koji ; et al. | 2003-10-23 |
Acetal compound, polymer, resist composition and patterning response
App 20030153706 - Watanabe, Takeru ; et al. | 2003-08-14 |
Polymer, resist composition and patterning process
App 20030091929 - Nishi, Tsunehiro ; et al. | 2003-05-15 |
Polymer, resist composition and patterning process
App 20030087183 - Nishi, Tsunehiro ; et al. | 2003-05-08 |
Novel ester compounds, polymers, resist compositions and patterning process
App 20030088115 - Nishi, Tsunehiro ; et al. | 2003-05-08 |
Polymer, resist composition and patterning process
App 20030054289 - Nishi, Tsunehiro ; et al. | 2003-03-20 |
Polymer, resist material and patterning method
App 20030054290 - Nishi, Tsunehiro ; et al. | 2003-03-20 |
Novel epoxy compounds having an alicyclic structure, polymer compounds, resist materials, and patterning methods
App 20030050398 - Hasegawa, Koji ; et al. | 2003-03-13 |
Cyclic acetal compound, polymer, resist composition and patterning process
App 20030045731 - Nakashima, Mutsuo ; et al. | 2003-03-06 |
Novel epoxy compound having alicyclic structure, polymer, resist composition and patterning process
App 20030036603 - Hasegawa, Koji ; et al. | 2003-02-20 |
Resist composition and patterning process
App 20030013039 - Kobayashi, Tomohiro ; et al. | 2003-01-16 |
Novel (meth) acrylates having lactone structure, polymers, photoresist compositions and patterning process
App 20030008232 - Kinsho, Takeshi ; et al. | 2003-01-09 |
Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparation
App 20020197559 - Nishi, Tsunehiro ; et al. | 2002-12-26 |
Novel tertiary amine compounds having an ester structure and processes for preparing same
App 20020193622 - Watanabe, Takeru ; et al. | 2002-12-19 |
Novel tetrahydrofuran compounds having alicyclic structure
App 20020183529 - Kinsho, Takeshi ; et al. | 2002-12-05 |
Cyclic acetal compound, polymer, resist composition and patterning process
App 20020147290 - Nakashima, Mutsuo ; et al. | 2002-10-10 |
Acetal compound, polymer, resist composition and patterning response
App 20020132970 - Watanabe, Takeru ; et al. | 2002-09-19 |
Polymer, resist composition and patterning process
App 20020115821 - Nishi, Tsunehiro ; et al. | 2002-08-22 |
Acid-decomposable Ester Compound Suitable For Use In Resist Material
App 20020115874 - Kinsho, Takeshi ; et al. | 2002-08-22 |
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