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name:-0.059057950973511
name:-0.04904317855835
name:-0.0047039985656738
KIKUGAWA; Shinya Patent Filings

KIKUGAWA; Shinya

Patent Applications and Registrations

Patent applications and USPTO patent grants for KIKUGAWA; Shinya.The latest application filed is for "method of producing sic-si composite component and sic-si composite component".

Company Profile
2.27.30
  • KIKUGAWA; Shinya - Tokyo JP
  • Kikugawa; Shinya - Chiyoda-ku JP
  • Kikugawa; Shinya - Yokohama N/A JP
  • Kikugawa; Shinya - Yokohama-shi JP
  • Kikugawa; Shinya - Kanagawa JP
  • Kikugawa; Shinya - Sugita Isogo-ku Yokohama-shi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
METHOD OF PRODUCING SiC-Si COMPOSITE COMPONENT AND SiC-Si COMPOSITE COMPONENT
App 20210009473 - YAMADA; Kenji ;   et al.
2021-01-14
Composition for bonding
Grant 10,731,233 - Yamada , et al.
2020-08-04
Composition For Bonding
App 20180230575 - YAMADA; Minoru ;   et al.
2018-08-16
Synthetic silica glass optical component and process for its production
Grant 8,402,786 - Ikuta , et al. March 26, 2
2013-03-26
Glass Substrate For Forming Through-substrate Via Of Semiconductor Device
App 20130034688 - Koike; Akio ;   et al.
2013-02-07
Glass Substrate For Forming Through-substrate Via Of Semiconductor Device
App 20130034687 - KOIKE; Akio ;   et al.
2013-02-07
Mask blanks
Grant 8,323,856 - Kikugawa , et al. December 4, 2
2012-12-04
Process For Producing Article Having Fine Concave And Convex Structure On Surface
App 20120292793 - KOIKE; Akio ;   et al.
2012-11-22
Artificial quartz member, process for producing the same, and optical element comprising the same
Grant 8,257,675 - Agata , et al. September 4, 2
2012-09-04
Tio2-containing Silica Glass, And Optical Member For Euv Lithography
App 20120149543 - KOIKE; Akio ;   et al.
2012-06-14
TiO.sub.2-containing silica glass and optical member for EUV lithography using high energy densities as well as special temperature controlled process for its manufacture
Grant 8,178,450 - Koike , et al. May 15, 2
2012-05-15
TiO.sub.2-containing silica glass and optical member for EUV lithography using the same
Grant 8,093,165 - Koike , et al. January 10, 2
2012-01-10
TIO.sub.2-containing silica glass and optical member for lithography using the same
Grant 8,034,731 - Koike , et al. October 11, 2
2011-10-11
TiO.sub.2-containing silica glass and optical member for lithography using the same
Grant 7,998,892 - Koike , et al. August 16, 2
2011-08-16
TiO.sub.2-containing silica glass
Grant 7,989,378 - Koike , et al. August 2, 2
2011-08-02
Mask Blanks
App 20110053059 - Kikugawa; Shinya ;   et al.
2011-03-03
Tio2-containing Silica Glass And Optical Member For Lithography Using The Same
App 20100323873 - Koike; Akio ;   et al.
2010-12-23
Tio2-containing Silica Glass And Optical Member For Euv Lithography Using High Energy Densities As Well As Special Temperature Controlled Process For Its Manufacture
App 20100323871 - Koike; Akio ;   et al.
2010-12-23
Tio2-containing Silica Glass And Optical Member For Euv Lithography Using The Same
App 20100323872 - KOIKE; Akio ;   et al.
2010-12-23
Tio2-containing Silica Glass And Optical Member For Lithography Using The Same
App 20100317505 - KOIKE; Akio ;   et al.
2010-12-16
Tio2-containing Silica Glass
App 20100261597 - KOIKE; Akio ;   et al.
2010-10-14
Optical member made of synthetic quartz glass, and process for its production
Grant 7,784,307 - Ogawa , et al. August 31, 2
2010-08-31
Process For Producing Silica Glass Containing Tio2, And Optical Material For Euv Lithography Employing Silica Glass Containing Tio2
App 20090242387 - KOIKE; Akio ;   et al.
2009-10-01
Quartz glass substrate and process for its production
Grant 7,592,063 - Ikuta , et al. September 22, 2
2009-09-22
Silica glass and optical material
Grant 7,585,800 - Kawata , et al. September 8, 2
2009-09-08
Artificial Quartz Member, Process For Producing The Same, And Optical Element Comprising The Same
App 20090104103 - AGATA; Noriyuki ;   et al.
2009-04-23
Photomask substrate made of synthetic quartz glass and photomask
Grant 7,491,475 - Kikugawa , et al. February 17, 2
2009-02-17
Silica glass containing TiO.sub.2 and process for its production
Grant 7,419,924 - Koike , et al. September 2, 2
2008-09-02
Silica Glass And Optical Material
App 20080103038 - Kawata; Mitsuhiro ;   et al.
2008-05-01
Quartz glass substrate and process for its production
App 20080057291 - Ikuta; Yoshiaki ;   et al.
2008-03-06
Quartz-type Glass And Process For Its Production
App 20080039310 - HAYASHI; Hideaki ;   et al.
2008-02-14
Mask Blanks
App 20080032213 - KIKUGAWA; Shinya ;   et al.
2008-02-07
Process For Producing Silica Glass Containing Tio2, And Optical Material For Euv Lithography Employing Silica Glass Containing Tio2
App 20070207911 - KOIKE; Akio ;   et al.
2007-09-06
Silica glass containing TiO2 and process for its production
App 20070042893 - Koike; Akio ;   et al.
2007-02-22
Optical member made of synthetic quartz glass, and process for its production
App 20070027018 - Ogawa; Tomonori ;   et al.
2007-02-01
Photomask substrate made of synthetic quartz glass and photomask
App 20060246363 - Kikugawa; Shinya ;   et al.
2006-11-02
Synthetic quartz glass and process for producing it
Grant 7,022,633 - Ikuta , et al. April 4, 2
2006-04-04
Ultraviolet and vacuum ultraviolet antireflection substrate
Grant 6,829,084 - Takaki , et al. December 7, 2
2004-12-07
Structure for attaching a pellicle to a photo-mask
Grant 6,795,170 - Mishiro , et al. September 21, 2
2004-09-21
Pellicle
Grant 6,744,562 - Okada , et al. June 1, 2
2004-06-01
Pellicle and method of using the same
Grant 6,713,200 - Arishima , et al. March 30, 2
2004-03-30
Ultraviolet and vacuum ultraviolet antireflection substrate
App 20030214704 - Takaki, Satoru ;   et al.
2003-11-20
Synthetic quartz glass and process for producing it
App 20030195107 - Ikuta, Yoshiaki ;   et al.
2003-10-16
Ultraviolet and vacuum ultraviolet antireflection substrate
Grant 6,628,456 - Takaki , et al. September 30, 2
2003-09-30
Exposure apparatus, semiconductor device, and photomask
Grant 6,611,317 - Ogawa , et al. August 26, 2
2003-08-26
Synthetic quartz glass and method for preparing the same
Grant 6,576,578 - Ikuta , et al. June 10, 2
2003-06-10
Structure for attaching a pellicle to a photo-mask
App 20030095245 - Mishiro, Hitoshi ;   et al.
2003-05-22
Synthetic quartz glass for optical member, process for producing the same, and method of using the same
Grant 6,544,914 - Kikugawa , et al. April 8, 2
2003-04-08
Synthetic silica glass optical component and process for its production
App 20030051507 - Ikuta, Yoshiaki ;   et al.
2003-03-20
Pellicle
App 20030035222 - Okada, Kaname ;   et al.
2003-02-20
Ultraviolet and vacuum ultraviolet antireflection substrate
App 20030025991 - Takaki, Satoru ;   et al.
2003-02-06
Pellicle and method for manufacture thereof
Grant 6,475,575 - Ikuta , et al. November 5, 2
2002-11-05
Pellicle and method of using the same
App 20020007907 - Arishima, Hiroshi ;   et al.
2002-01-24
Container for an optical article
App 20010035361 - Mishiro, Hitoshi ;   et al.
2001-11-01
Quartz glass substrate for polysilicon thin film transistor liquid crystal display
Grant 5,330,941 - Yaba , et al. July 19, 1
1994-07-19
Solar cell substrate and process for its production
Grant 5,252,140 - Kobayashi , et al. October 12, 1
1993-10-12

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