| Patent | Date |
|---|
Spin Dispenser Module Substrate Surface Protection System
App 20220288627 - Yang; Ching-Hai ; et al. | 2022-09-15 |
Spin dispenser module substrate surface protection system
Grant 11,344,910 - Yang , et al. May 31, 2 | 2022-05-31 |
Wafer Backside Cleaning Apparatus And Method Of Cleaning Wafer Backside
App 20200171623 - Yang; Ching-Hai ; et al. | 2020-06-04 |
Semiconductor Manufacturing Apparatus and Method Thereof
App 20200033723 - Yang; Ching-Hai ; et al. | 2020-01-30 |
Spin Dispenser Module Substrate Surface Protection System
App 20180117621 - Yang; Ching-Hai ; et al. | 2018-05-03 |
Spin dispenser module substrate surface protection system
Grant 9,855,579 - Yang , et al. January 2, 2 | 2018-01-02 |
Semiconductor processing apparatus and method of operating the same
Grant 9,793,143 - Yang , et al. October 17, 2 | 2017-10-17 |
Semiconductor apparatus and adjustment method
Grant 9,589,820 - Kao , et al. March 7, 2 | 2017-03-07 |
Baking apparatus and method
Grant 9,536,759 - Yang , et al. January 3, 2 | 2017-01-03 |
Baking Apparatus And Method
App 20160351423 - YANG; Ching-Hai ; et al. | 2016-12-01 |
Semiconductor Apparatus And Adjustment Method
App 20160351420 - KAO; Yao-Hwan ; et al. | 2016-12-01 |
System and method for replacing resist filter to reduce resist filter-induced wafer defects
Grant 9,375,665 - Kao , et al. June 28, 2 | 2016-06-28 |
Spin Dispenser Module Substrate Surface Protection System
App 20150224532 - Yang; Ching-Hai ; et al. | 2015-08-13 |
Method of optimizing lithography tools utilization
Grant 9,081,306 - Kao , et al. July 14, 2 | 2015-07-14 |
Semiconductor Processing Apparatus And Method Of Operating The Same
App 20150194325 - YANG; Ching-Hai ; et al. | 2015-07-09 |
Method Of Optimizing Lithography Tools Utilization
App 20140078478 - Kao; Yao-Hwan ; et al. | 2014-03-20 |
System And Method For Replacing Resist Filter To Reduce Resist Filter-induced Wafer Defects
App 20140054212 - Kao; Yao-Hwan ; et al. | 2014-02-27 |
System and method for replacing resist filter to reduce resist filter-induced wafer defects
Grant 8,580,117 - Kao , et al. November 12, 2 | 2013-11-12 |
PEB embedded exposure apparatus
Grant 7,789,576 - Lee , et al. September 7, 2 | 2010-09-07 |
Peb Embedded Exposure Apparatus
App 20080241760 - Lee; Feng-Ning ; et al. | 2008-10-02 |
System and Method for Replacing Resist Filter to Reduce Resist Filter-Induced Wafer Defects
App 20080230492 - Kao; Yao-Hwan ; et al. | 2008-09-25 |
Adjustable exhaust flow for thermal uniformity
Grant 7,026,580 - Kao , et al. April 11, 2 | 2006-04-11 |
Adjustable rinse flow in semiconductor processing
App 20050229976 - Kao, Yao-Hwan ; et al. | 2005-10-20 |
Adjustable exhaust flow for thermal uniformity
App 20050211695 - Kao, Yao-Hwan ; et al. | 2005-09-29 |
Rinse nozzle and method
App 20050211267 - Kao, Yao-Hwan ; et al. | 2005-09-29 |
Distribution manifold for exhausting photoresist vapors
Grant 6,927,363 - Kao , et al. August 9, 2 | 2005-08-09 |
Developer dispensing apparatus with adjustable knife ring
App 20050051196 - Kao, Yao-Hwan ; et al. | 2005-03-10 |
Resist supply apparatus with resist recycling function, coating system having the same and method of resist recycling
App 20050048208 - Kao, Yao-Hwan ; et al. | 2005-03-03 |
Developer dispensing nozzle with movable shutter plates
App 20040188547 - Kao, Yao-Hwan ; et al. | 2004-09-30 |
Spin-coater with self-cleaning cup and method of using
Grant 6,723,168 - Kao , et al. April 20, 2 | 2004-04-20 |
Spin-coater with self-cleaning cup and method of using
App 20020197400 - Kao, Yao-Hwan ; et al. | 2002-12-26 |
Controlled multi-nozzle liquid dispensing system
Grant 5,857,590 - Kao , et al. January 12, 1 | 1999-01-12 |
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