loadpatents
Patent applications and USPTO patent grants for Kamenov; Vladimir.The latest application filed is for "catadioptric projection objective".
Patent | Date |
---|---|
Microlithography projection objective Grant 10,281,824 - Feldmann , et al. | 2019-05-07 |
Catadioptric Projection Objective App 20180373006 - Epple; Alexander ;   et al. | 2018-12-27 |
Catadioptric projection objective Grant 10,042,146 - Epple , et al. August 7, 2 | 2018-08-07 |
Catadioptric Projection Objective App 20180095258 - Epple; Alexander ;   et al. | 2018-04-05 |
Surface correction of mirrors with decoupling coating Grant 9,921,483 - Dier , et al. March 20, 2 | 2018-03-20 |
Microlithographic Projection Exposure Apparatus App 20170322343 - Kamenov; Vladimir ;   et al. | 2017-11-09 |
Microlithographic projection exposure apparatus Grant 9,733,395 - Kamenov , et al. August 15, 2 | 2017-08-15 |
Catadioptric projection objective Grant 9,726,870 - Epple , et al. August 8, 2 | 2017-08-08 |
Microlithography Projection Objective App 20170192362 - Feldmann; Heiko ;   et al. | 2017-07-06 |
Catadioptric Projection Objective App 20160231546 - Epple; Alexander ;   et al. | 2016-08-11 |
Surface Correction Of Mirrors With Decoupling Coating App 20160209750 - DIER; Oliver ;   et al. | 2016-07-21 |
Catadioptric projection objective Grant 9,279,969 - Epple , et al. March 8, 2 | 2016-03-08 |
Microlithography projection objective Grant 9,097,984 - Feldmann , et al. August 4, 2 | 2015-08-04 |
Projection objective for microlithography with stray light compensation and related methods Grant 9,063,439 - Goehnermeier , et al. June 23, 2 | 2015-06-23 |
Catadioptric Projection Objective App 20150055212 - Epple; Alexander ;   et al. | 2015-02-26 |
Microlithography Projection Objective App 20140333913 - Feldmann; Heiko ;   et al. | 2014-11-13 |
Microlithographic Projection Exposure Apparatus App 20140320955 - Kamenov; Vladimir ;   et al. | 2014-10-30 |
Catadioptric projection objective Grant 8,873,137 - Epple , et al. October 28, 2 | 2014-10-28 |
Microlithography Projection Objective App 20140293256 - Feldmann; Heiko ;   et al. | 2014-10-02 |
Catadioptric Projection Objective App 20130242279 - EPPLE; Alexander ;   et al. | 2013-09-19 |
Reflective mask for EUV lithography Grant 8,486,590 - Kamenov , et al. July 16, 2 | 2013-07-16 |
Catadioptric projection objective Grant 8,446,665 - Epple , et al. May 21, 2 | 2013-05-21 |
Projection objective of a microlithographic projection exposure apparatus Grant 8,339,576 - Loering , et al. December 25, 2 | 2012-12-25 |
Reflective Mask For Euv Lithography App 20120320348 - KAMENOV; Vladimir ;   et al. | 2012-12-20 |
Projection Objective Of A Microlithographic Projection Exposure Apparatus App 20120281196 - Loering; Ulrich ;   et al. | 2012-11-08 |
Microlithographic Projection Exposure Apparatus App 20110222043 - Kamenov; Vladimir ;   et al. | 2011-09-15 |
Method for determining intensity distribution in the image plane of a projection exposure arrangement Grant 7,961,297 - Greif-Wuestenbecker , et al. June 14, 2 | 2011-06-14 |
Catadioptric Projection Objective App 20110038061 - EPPLE; Alexander ;   et al. | 2011-02-17 |
Projection exposure apparatus and method for operating the same Grant 7,808,615 - Gruner , et al. October 5, 2 | 2010-10-05 |
Projection Objective For Microlithography App 20100079739 - Goehnermeier; Aksel ;   et al. | 2010-04-01 |
Microlithography projection objective App 20090115986 - Feldmann; Heiko ;   et al. | 2009-05-07 |
Microlithographic projection exposure apparatus App 20080297754 - Kamenov; Vladimir ;   et al. | 2008-12-04 |
Method for improving the imaging properties of a projection objective for a microlithographic projection exposure apparatus Grant 7,456,933 - Wegmann , et al. November 25, 2 | 2008-11-25 |
Method for Determining Intensity Distribution in the Image Plane of a Projection Exposure Arrangement App 20080212060 - Greif-Wuestenbecker; Joern ;   et al. | 2008-09-04 |
Optical system and photolithography tool comprising same Grant 7,355,791 - Kamenov , et al. April 8, 2 | 2008-04-08 |
Method of optimizing an objective with fluoride crystal lenses, and objective with fluoride crystal lenses Grant 7,321,465 - Totzeck , et al. January 22, 2 | 2008-01-22 |
Projection Exposure Apparatus And Method For Operating The Same App 20080002167 - Gruner; Toralf ;   et al. | 2008-01-03 |
Method of determining lens materials for a projection exposure apparatus App 20070195423 - Kamenov; Vladimir ;   et al. | 2007-08-23 |
Method of determining lens materials for a projection exposure apparatus Grant 7,239,450 - Kamenov , et al. July 3, 2 | 2007-07-03 |
Optical system of a projection exposure apparatus App 20060238735 - Kamenov; Vladimir ;   et al. | 2006-10-26 |
Method of determining lens materials for a projection exposure apparatus App 20060109560 - Kamenov; Vladimir ;   et al. | 2006-05-25 |
Method for improving the imaging properties of a projection objective for a microlithographic projection exposure apparatus App 20060077371 - Wegmann; Ulrich ;   et al. | 2006-04-13 |
Optical system and photolithography tool comprising same App 20060066764 - Kamenov; Vladimir ;   et al. | 2006-03-30 |
Catadioptric projection lens and method for compensating the intrinsic birefringence in such a lens App 20050270659 - Albert, Michael ;   et al. | 2005-12-08 |
Catadioptric reduction objective App 20050190446 - Kuerz, Birgit ;   et al. | 2005-09-01 |
Method of optimizing an objective with fluoride crystal lenses, and objective with fluoride crystal lenses App 20050180023 - Totzeck, Michael ;   et al. | 2005-08-18 |
Catadioptric projection lens and method for compensating the intrinsic birefringence in such a lens App 20040227988 - Albert, Michael ;   et al. | 2004-11-18 |
Retardation element made from cubic crystal and an optical system therewith App 20040218271 - Hartmaier, Juergen ;   et al. | 2004-11-04 |
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