| Patent | Date |
|---|
Photoresist coating composition and method for forming fine contact of semiconductor device
Grant 8,133,547 - Jung March 13, 2 | 2012-03-13 |
Method for forming a fine pattern in a semicondutor device
Grant 8,067,146 - Jung November 29, 2 | 2011-11-29 |
Pattern Hardening Coating Agent
App 20110275746 - Jung; Jae Chang | 2011-11-10 |
Method for forming fine pattern of semiconductor device
Grant 7,977,035 - Jung July 12, 2 | 2011-07-12 |
Method for forming a fine pattern of a semiconductor device
Grant 7,959,818 - Jung June 14, 2 | 2011-06-14 |
Method for manufacturing a semiconductor device
Grant 7,838,201 - Jung , et al. November 23, 2 | 2010-11-23 |
Method for forming a fine pattern of a semiconductor device
Grant 7,824,841 - Jung November 2, 2 | 2010-11-02 |
Method for manufacturing semiconductor device
Grant 7,807,336 - Lee , et al. October 5, 2 | 2010-10-05 |
Method for manufacturing a semiconductor device
Grant 7,803,519 - Jung September 28, 2 | 2010-09-28 |
Method of forming fine pattern of semiconductor device
Grant 7,790,357 - Jung September 7, 2 | 2010-09-07 |
Method for forming a pattern on a semiconductor device using an organic hard mask
Grant 7,776,515 - Jung August 17, 2 | 2010-08-17 |
Anti-reflective polymer, anti-reflective composition containing the same, and method for forming pattern using the same
Grant 7,771,920 - Jung August 10, 2 | 2010-08-10 |
Anti-reflective polymer, anti-reflective composition containing the same, and method for forming pattern using the same
Grant 7,759,052 - Jung , et al. July 20, 2 | 2010-07-20 |
Method for Forming a Pattern on a Semiconductor Using an Organic Hard Mask
App 20100176492 - Jung; Jae Chang | 2010-07-15 |
Method for forming fine pattern of semiconductor device
Grant 7,754,591 - Jung July 13, 2 | 2010-07-13 |
Method for Manufacturing a Semiconductor Device
App 20100173249 - Jung; Jae Chang ; et al. | 2010-07-08 |
Photoresist composition and method for forming pattern of a semiconductor device
Grant 7,749,680 - Jung , et al. July 6, 2 | 2010-07-06 |
Method for forming fine pattern of semiconductor device
Grant 7,745,339 - Jung June 29, 2 | 2010-06-29 |
Composition for an organic hard mask and method for forming a pattern on a semiconductor device using the same
Grant 7,737,227 - Jung June 15, 2 | 2010-06-15 |
Method for manufacturing underlying pattern of semiconductor device
Grant 7,655,568 - Lee , et al. February 2, 2 | 2010-02-02 |
Method for fabricating semiconductor device
Grant 7,629,595 - Jung , et al. December 8, 2 | 2009-12-08 |
Method For Forming A Pattern Of A Semiconductor Device
App 20090298291 - LEE; Sung Koo ; et al. | 2009-12-03 |
Method for Manufacturing a Semiconductor Device
App 20090258498 - Jung; Jae Chang | 2009-10-15 |
Method for fabricating capacitor of semiconductor memory device using amorphous carbon
Grant 7,582,525 - Kong , et al. September 1, 2 | 2009-09-01 |
Method for Manufacturing a Semiconductor Device
App 20090191709 - Jung; Jae Chang ; et al. | 2009-07-30 |
Cleaning solution for removing photoresist
Grant 7,563,753 - Lee , et al. July 21, 2 | 2009-07-21 |
Polymer for immersion lithography and photoresist composition
Grant 7,534,548 - Jung , et al. May 19, 2 | 2009-05-19 |
Photoresist polymer, and photoresist composition
Grant 7,534,549 - Jung May 19, 2 | 2009-05-19 |
Organic anti-reflective coating polymer, organic anti-reflective coating composition and method for forming photoresist pattern
Grant 7,531,297 - Jung May 12, 2 | 2009-05-12 |
Hard mask composition for lithography process
Grant 7,514,200 - Jung April 7, 2 | 2009-04-07 |
Method for forming a pattern on a semiconductor device and semiconductor device resulting from the same
Grant 7,510,979 - Jung , et al. March 31, 2 | 2009-03-31 |
Method for forming fine pattern of semiconductor device
Grant 7,494,935 - Jung , et al. February 24, 2 | 2009-02-24 |
Anti-reflective Polymer, Anti-reflective Composition Containing The Same, And Method For Forming Pattern Using The Same
App 20090042141 - JUNG; JAE CHANG ; et al. | 2009-02-12 |
Anti-reflective Polymer, Anti-reflective Composition Containing The Same, And Method For Forming Pattern Using The Same
App 20090042140 - Jung; Jae Chang | 2009-02-12 |
Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same
Grant 7,462,439 - Jung , et al. December 9, 2 | 2008-12-09 |
Top anti-reflective coating composition, method for forming the pattern of a semiconductor device using the same, and semiconductor device comprising the pattern
Grant 7,419,760 - Jung , et al. September 2, 2 | 2008-09-02 |
Liquid Composition for Immersion Lithography and Lithography Method Using the Same
App 20080176047 - Kong; Keun Kyu ; et al. | 2008-07-24 |
Photoresist Composition And Method For Forming Pattern Of A Semiconductor Device
App 20080166638 - Jung; Jae Chang ; et al. | 2008-07-10 |
Method for Forming a Fine Pattern in a Semicondutor Device
App 20080166665 - Jung; Jae Chang | 2008-07-10 |
Method for forming a fine pattern in a semiconductor
App 20080166661 - Jung; Jae Chang | 2008-07-10 |
Polymer For Hard Mask Of Semiconductor Device And Composition Containing The Same
App 20080138745 - Jung; Jae Chang | 2008-06-12 |
Method For Forming A Fine Pattern Of A Semiconductor Device
App 20080131814 - JUNG; Jae Chang | 2008-06-05 |
Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same
Grant 7,381,519 - Jung , et al. June 3, 2 | 2008-06-03 |
Composition for an organic bottom anti-reflective coating and method for forming pattern using the same
Grant 7,374,868 - Jung May 20, 2 | 2008-05-20 |
Photoresist polymer and photoresist composition containing the same
Grant 7,361,447 - Jung April 22, 2 | 2008-04-22 |
Method For Forming Fine Pattern Of Semiconductor Device
App 20080076072 - Jung; Jae Chang | 2008-03-27 |
Method For Forming A Fine Pattern Of A Semiconductor Device
App 20080064213 - JUNG; Jae Chang | 2008-03-13 |
Method Of Forming Fine Pattern Of Semiconductor Device
App 20080063986 - Jung; Jae Chang | 2008-03-13 |
Method For Forming Fine Pattern Of Semiconductor Device
App 20080063985 - JUNG; Jae Chang ; et al. | 2008-03-13 |
Process for forming a fine pattern using a top-coating composition for a photoresist and product formed by same
Grant 7,329,477 - Jung , et al. February 12, 2 | 2008-02-12 |
Photoresist Coating Composition and Method for Forming Fine Contact of Semiconductor Device
App 20080032243 - Jung; Jae Chang | 2008-02-07 |
Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same
Grant 7,326,525 - Jung February 5, 2 | 2008-02-05 |
Method For Forming A Pattern On A Semiconductor Device And Semiconductor Device Resulting From The Same
App 20080020592 - JUNG; Jae-chang ; et al. | 2008-01-24 |
Method for forming fine pattern of semiconductor device
Grant 7,314,810 - Jung January 1, 2 | 2008-01-01 |
Photoacid generating polymer, its preparation method, top anti-reflective coating composition comprising the same, method of forming a pattern in a semiconductor device, and semiconductor device
Grant 7,303,858 - Jung , et al. December 4, 2 | 2007-12-04 |
Methods for forming fine photoresist patterns
Grant 7,300,880 - Hwang , et al. November 27, 2 | 2007-11-27 |
Light Absorbent Agent Polymer Useful For Organic Anti-reflective Coating, And Preparation Method For The Same
App 20070265406 - JUNG; Jae-chang ; et al. | 2007-11-15 |
Method for manufacturing semiconductor device using immersion lithography process with filtered air
App 20070264599 - Lee; Sung Koo ; et al. | 2007-11-15 |
Method For Forming Fine Pattern Of Semiconductor Device
App 20070264828 - Jung; Jae Chang | 2007-11-15 |
Top anti-reflective coating composition and method for pattern formation of semiconductor device using the same
Grant 7,288,364 - Jung , et al. October 30, 2 | 2007-10-30 |
Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same
Grant 7,285,370 - Jung , et al. October 23, 2 | 2007-10-23 |
Photoresist composition for EUV and method for forming photoresist pattern using the same
Grant 7,282,318 - Jung October 16, 2 | 2007-10-16 |
Organic anti-reflective coating polymer, organic anti-reflective coating composition comprising the coating polymer and method for forming photoresist pattern using the coating composition
App 20070228365 - Jung; Jae Chang | 2007-10-04 |
Organic anti-reflective coating composition and method for forming photoresist pattern using the same
Grant 7,270,933 - Jung September 18, 2 | 2007-09-18 |
Over-coating composition for photoresist and process for forming photoresist pattern using the same
Grant 7,270,937 - Jung September 18, 2 | 2007-09-18 |
Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same
Grant 7,267,924 - Jung September 11, 2 | 2007-09-11 |
Method For Forming Fine Pattern Of Semiconductor Device
App 20070202697 - Jung; Jae Chang | 2007-08-30 |
Method For Forming Fine Pattern Of Semiconductor Device
App 20070202671 - Jung; Jae Chang | 2007-08-30 |
Method For Forming Fine Pattern Of Semiconductor Device
App 20070196772 - Jung; Jae Chang | 2007-08-23 |
Method For Fabricating Semiconductor Device
App 20070164235 - Jung; Jae Chang ; et al. | 2007-07-19 |
Hard mask composition for lithography process
App 20070154839 - Jung; Jae Chang | 2007-07-05 |
Method for Manufacturing Semiconductor Device
App 20070148602 - Lee; Sung Koo ; et al. | 2007-06-28 |
Method for Manufacturing Semiconductor Device
App 20070148983 - Lee; Sung Koo ; et al. | 2007-06-28 |
Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator
Grant 7,235,349 - Lee , et al. June 26, 2 | 2007-06-26 |
Polymer for hard mask of semiconductor device and composition containing the same
App 20070142617 - Jung; Jae Chang | 2007-06-21 |
Method for manufacturing semiconductor device using immersion lithography process
App 20070117410 - Jung; Jae Chang ; et al. | 2007-05-24 |
Method for forming patterns in a semiconductor device
Grant 7,220,679 - Lee , et al. May 22, 2 | 2007-05-22 |
Composition for Removing Immersion Lithography Solution and Method for Manufacturing Semiconductor Device Including Immersion Lithography Process Using the Same
App 20070099124 - Jung; Jae Chang ; et al. | 2007-05-03 |
Organic anti-reflective coating polymer, organic anti-reflective coating composition and method for forming photoresist pattern
App 20070099110 - Jung; Jae Chang | 2007-05-03 |
Cross-linking monomers for photoresist, and process for preparing photoresist polymers using the same
Grant 7,208,260 - Jung , et al. April 24, 2 | 2007-04-24 |
Cross-linking polymer for organic anti-reflective coating, organic anti-reflective coating composition comprising the same and method for forming photoresist pattern using the same
Grant 7,205,089 - Jung , et al. April 17, 2 | 2007-04-17 |
Method for fabricating semiconductor device including resist flow process and film coating process
App 20070059926 - Jung; Jae Chang | 2007-03-15 |
Method of fabricating semiconductor device including resist flow process and film coating process
App 20070059927 - Jung; Jae Chang | 2007-03-15 |
Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same
Grant 7,186,496 - Jung , et al. March 6, 2 | 2007-03-06 |
Method for manufacturing semiconductor device using immersion lithography process
App 20070042298 - Jung; Jae Chang ; et al. | 2007-02-22 |
Organic anti-reflective coating composition and method for forming photoresist patterns using the same
Grant 7,175,974 - Jung , et al. February 13, 2 | 2007-02-13 |
Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same
Grant 7,160,668 - Jung , et al. January 9, 2 | 2007-01-09 |
Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same
App 20070003861 - Jung; Jae Chang ; et al. | 2007-01-04 |
Additive for photoresist composition for resist flow process
Grant 7,150,961 - Jung , et al. December 19, 2 | 2006-12-19 |
Top ARC polymers, method of preparation thereof and top ARC compositions comprising the same
Grant 7,147,994 - Jung December 12, 2 | 2006-12-12 |
Photoresist polymer, photoresist composition and method for manufacturing semiconductor device
App 20060273070 - Jung; Jae Chang | 2006-12-07 |
Polymer for immersion lithography, photoresist composition containing the same, method of manufacturing a semiconductor device, and semiconductor device
App 20060275695 - Jung; Jae Chang ; et al. | 2006-12-07 |
Photoresist coating composition and method for forming fine contact of semiconductor device
App 20060269676 - Jung; Jae Chang | 2006-11-30 |
Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator
Grant 7,138,218 - Lee , et al. November 21, 2 | 2006-11-21 |
Organic anti-reflective coating composition and method for forming photoresist patterns using the same
Grant 7,108,957 - Jung , et al. September 19, 2 | 2006-09-19 |
Composition for an organic hard mask and method for forming a pattern on a semiconductor device using the same
App 20060189150 - Jung; Jae Chang | 2006-08-24 |
Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator
App 20060183050 - Lee; Sung Koo ; et al. | 2006-08-17 |
Organic anti-reflective coating composition and method for forming photoresist patterns using the same
App 20060166139 - Jung; Jae-chang ; et al. | 2006-07-27 |
Photoresist polymer and photoresist composition including the same
Grant 7,081,325 - Lee , et al. July 25, 2 | 2006-07-25 |
Method for fabricating capacitor of semiconductor memory device using amorphous carbon
App 20060141736 - Kong; Keun-Kyu ; et al. | 2006-06-29 |
Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same
App 20060127803 - Jung; Jae Chang ; et al. | 2006-06-15 |
Photoacid generating polymer, its preparation method and top anti-reflective coating composition comprising the same
App 20060127804 - Jung; Jae Chang ; et al. | 2006-06-15 |
Light absorbent agent polymer for organic anti-reflective coating and preparation method and organic anti-reflective coating composition comprising the same
Grant 7,033,729 - Jung , et al. April 25, 2 | 2006-04-25 |
Top anti-reflective coating composition and method for forming the pattern of a semiconductor device using the same
App 20060063104 - Jung; Jae Chang ; et al. | 2006-03-23 |
Top anti-reflective coating composition and method for pattern formation of semiconductor device using the same
App 20060046184 - Jung; Jae Chang ; et al. | 2006-03-02 |
Organic anti-reflective coating polymers, anti-reflective coating composition comprising the same and preparation methods thereof
Grant 6,998,442 - Jung , et al. February 14, 2 | 2006-02-14 |
Polymers for photoresist and photoresist compositions using the same
Grant 6,987,155 - Roh , et al. January 17, 2 | 2006-01-17 |
Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same
App 20060008732 - Jung; Jae-chang | 2006-01-12 |
Top-coating composition for photoresist and process for forming fine pattern using the same
Grant 6,984,482 - Jung , et al. January 10, 2 | 2006-01-10 |
Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same
App 20060004161 - Jung; Jae-chang ; et al. | 2006-01-05 |
Liquid composition for immersion lithography and lithography method using the same
App 20050260528 - Kong, Keun Kyu ; et al. | 2005-11-24 |
Top ARC polymers, method of preparation thereof and top ARC compositions comprising the same
App 20050239296 - Jung, Jae-chang | 2005-10-27 |
Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same
App 20050238991 - Jung, Jae-chang | 2005-10-27 |
Photoresist monomers, polymers and photoresist compositions for preventing acid diffusion
Grant 6,924,078 - Lee , et al. August 2, 2 | 2005-08-02 |
Photoresist monomers, polymers thereof and photoresist compositions containing the same
Grant 6,921,622 - Lee , et al. July 26, 2 | 2005-07-26 |
Overcoating composition for photoresist and method for forming photoresist pattern using the same
Grant 6,916,594 - Bok , et al. July 12, 2 | 2005-07-12 |
Cross-linking polymer for organic anti-reflective coating, organic anti-reflective coating composition comprising the same and method for forming photoresist pattern using the same
App 20050142481 - Jung, Jae-chang ; et al. | 2005-06-30 |
Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same
App 20050130061 - Jung, Jae-Chang ; et al. | 2005-06-16 |
Organic anti-reflective coating composition and method for forming photoresist pattern using the same
App 20050112497 - Jung, Jae-chang | 2005-05-26 |
Photoresist composition for EUV and method for forming photoresist pattern using the same
App 20050106497 - Jung, Jae Chang | 2005-05-19 |
Composition for an organic bottom anti-reflective coating and method for forming pattern using the same
App 20050100818 - Jung, Jae-chang | 2005-05-12 |
Over-coating composition for photoresist and process for forming photoresist pattern using the same
App 20050084795 - Jung, Jae Chang | 2005-04-21 |
Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same
App 20050084798 - Jung, Jae-chang ; et al. | 2005-04-21 |
Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same
App 20050085078 - Jung, Jae Chang ; et al. | 2005-04-21 |
Method of forming photoresist pattern using hot plate oven
Grant 6,875,956 - Kim , et al. April 5, 2 | 2005-04-05 |
Photoresist composition
App 20050069807 - Jung, Jae Chang | 2005-03-31 |
Process for forming a fine pattern using a top-coating composition for a photoresist and product formed by same
App 20050069816 - Jung, Jae Chang ; et al. | 2005-03-31 |
ArF photoresist copolymers
Grant 6,866,984 - Jung , et al. March 15, 2 | 2005-03-15 |
Maleimide-photoresist monomers containing halogen, polymers thereof and photoresist compositions comprising the same
Grant 6,858,371 - Lee , et al. February 22, 2 | 2005-02-22 |
Photoresist polymer and photoresist composition containing the same
App 20050026080 - Jung, Jae Chang | 2005-02-03 |
Photoresist monomers, polymers thereof and photoresist compositions containing the same
Grant 6,849,375 - Lee , et al. February 1, 2 | 2005-02-01 |
Cleaning solution for removing photoresist
Grant 6,841,526 - Lee , et al. January 11, 2 | 2005-01-11 |
Methods for forming fine photoresist patterns
App 20040266203 - Hwang, Young Sun ; et al. | 2004-12-30 |
Photoresist polymer and photoresist composition including the same
App 20040265743 - Lee, Sung Koo ; et al. | 2004-12-30 |
Organic anti-reflective coating composition and method for forming photoresist patterns using the same
Grant 6,835,532 - Jung December 28, 2 | 2004-12-28 |
Photoresist composition for resist flow process
Grant 6,824,951 - Lee , et al. November 30, 2 | 2004-11-30 |
Cross-linker monomer comprising double bond and photoresist copolymer containing the same
Grant 6,818,376 - Lee , et al. November 16, 2 | 2004-11-16 |
Partially crosslinked polymer for bilayer photoresist
Grant 6,811,960 - Lee , et al. November 2, 2 | 2004-11-02 |
ArF photoresist copolymers
Grant 6,808,859 - Jung , et al. October 26, 2 | 2004-10-26 |
Photoresist monomers, polymers thereof and photoresist compositons containing the same
Grant 6,806,025 - Lee , et al. October 19, 2 | 2004-10-19 |
Reflection-inhibiting resin used in process for forming photoresist pattern
Grant 6,797,451 - Hong , et al. September 28, 2 | 2004-09-28 |
Pattern width slimming-inhibiting method of photoresist pattern using photoresist composition containing thermal acid generator
Grant 6,787,285 - Kong , et al. September 7, 2 | 2004-09-07 |
Additive for photoresist composition for resist flow process
App 20040166437 - Jung, Min Ho ; et al. | 2004-08-26 |
Photoresist polymer for top-surface imaging process by silylation and photoresist composition containing the same
Grant 6,770,415 - Lee , et al. August 3, 2 | 2004-08-03 |
Additive for photoresist composition for resist flow process
Grant 6,770,414 - Jung , et al. August 3, 2 | 2004-08-03 |
Organic polymer for organic anti-reflective coating layer and preparation thereof
Grant 6,770,720 - Jung , et al. August 3, 2 | 2004-08-03 |
Overcoating composition for photoresist and method for forming photoresist pattern using the same
App 20040142279 - Bok, Cheol Kyu ; et al. | 2004-07-22 |
Over-coating composition for photoresist, and processes for forming photoresist patterns using the same
Grant 6,764,806 - Jung , et al. July 20, 2 | 2004-07-20 |
Method for forming patterns of a semiconductor device
Grant 6,764,964 - Hwang , et al. July 20, 2 | 2004-07-20 |
Novel ArF photoresist copolymers
App 20040131968 - Jung, Jae Chang ; et al. | 2004-07-08 |
Photoresist additive for preventing acid migration and photoresist composition comprising the same
Grant 6,753,128 - Lee , et al. June 22, 2 | 2004-06-22 |
Photoresist monomers, polymers thereof and photoresist compositions using the same
Grant 6,753,448 - Lee , et al. June 22, 2 | 2004-06-22 |
Chemical amplification photoresist monomers, polymers therefrom and photoresist compositions containing the same
Grant 6,749,990 - Jung , et al. June 15, 2 | 2004-06-15 |
Photoresist overcoating composition
App 20040106071 - Hwang, Young Sun ; et al. | 2004-06-03 |
Photoresist monomers containing fluorine-substituted benzylcarboxylate and photoresist polymers comprising the same
Grant 6,737,217 - Lee , et al. May 18, 2 | 2004-05-18 |
Organic anti-reflective coating polymers, anti-reflective coating composition comprising the same and preparation methods thereof
App 20040091623 - Jung, Min-Ho ; et al. | 2004-05-13 |
Maleimide-photoresist polymers containing fluorine and photoresist compositions comprising the same
Grant 6,720,129 - Lee , et al. April 13, 2 | 2004-04-13 |
Method for forming patterns in a semiconductor device
App 20040067655 - Lee, Sung-Koo ; et al. | 2004-04-08 |
Process for forming a photoresist pattern comprising alkaline treatment
Grant 6,699,644 - Lee , et al. March 2, 2 | 2004-03-02 |
Photoresist composition containing photo radical generator with photoacid generator
Grant 6,692,891 - Jung , et al. February 17, 2 | 2004-02-17 |
Photoresist monomer, polymer thereof and photoresist composition containing the same
Grant 6,686,123 - Lee , et al. February 3, 2 | 2004-02-03 |
Organic anti-reflective coating composition and method for forming photoresist patterns using the same
App 20040018346 - Jung, Jae-Chang ; et al. | 2004-01-29 |
Method for forming patterns of a semiconductor device
App 20040014322 - Hwang, Young-Sun ; et al. | 2004-01-22 |
Organic anti-reflective coating composition and method for forming photoresist patterns using the same
App 20030235784 - Jung, Jae-chang | 2003-12-25 |
Process for forming photoresist pattern by using gas phase amine treatment
Grant 6,664,031 - Jung , et al. December 16, 2 | 2003-12-16 |
Photoresist monomers containing fluorine-substituted benzylcarboxylate and photoresist polymers comprising the same
Grant 6,653,047 - Lee , et al. November 25, 2 | 2003-11-25 |
Partially crosslinked polymer for bilayer photoresist
App 20030207205 - Lee, Geun Su ; et al. | 2003-11-06 |
Polymer-containing photoresist, and process for manufacturing the same
Grant 6,632,903 - Jung , et al. October 14, 2 | 2003-10-14 |
Novel polymers for photoresist and photoresist compositions using the same
App 20030191259 - Roh, Chi Hyeong ; et al. | 2003-10-09 |
Photoresist composition for resist flow process, and process for forming contact hole using the same
Grant 6,627,379 - Kim , et al. September 30, 2 | 2003-09-30 |
Photoresist monomer comprising bisphenol derivatives and polymers thereof
Grant 6,627,383 - Lee , et al. September 30, 2 | 2003-09-30 |
Photoresist composition for resist flow process and process for forming a contact hole using the same
Grant 6,627,384 - Kim , et al. September 30, 2 | 2003-09-30 |
Photoresist polymer and composition having nitro groups
Grant 6,613,493 - Lee , et al. September 2, 2 | 2003-09-02 |
Method for forming micro-pattern of semiconductor device
Grant 6,610,616 - Koh , et al. August 26, 2 | 2003-08-26 |
Copolymer resin, preparation thereof, and photoresist using the same
Grant 6,608,158 - Jung , et al. August 19, 2 | 2003-08-19 |
Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator
App 20030148212 - Lee, Sung Koo ; et al. | 2003-08-07 |
Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and methods of preparation thereof
Grant 6,602,650 - Hong , et al. August 5, 2 | 2003-08-05 |
Novel photoresist monomers, polymers thereof and photoresist compositions using the same
App 20030144567 - Lee, Geun Su ; et al. | 2003-07-31 |
Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and method of preparation thereof
Grant 6,599,678 - Hong , et al. July 29, 2 | 2003-07-29 |
Cleaning solution for removing photoresist
App 20030130148 - Lee, Geun Su ; et al. | 2003-07-10 |
Partially crosslinked polymer for bilayer photoresist
Grant 6,589,707 - Lee , et al. July 8, 2 | 2003-07-08 |
Method of forming photoresist pattern using hot plate oven
App 20030113672 - Kim, Jin Soo ; et al. | 2003-06-19 |
Top-coating composition for photoresist and process for forming fine pattern using the same
App 20030108815 - Jung, Jae Chang ; et al. | 2003-06-12 |
Organic polymer for organic anti-reflective coating layer and preparation thereof
App 20030100695 - Jung, Jae-chang ; et al. | 2003-05-29 |
Polymers for photoresist and photoresist compositions using the same
Grant 6,569,971 - Roh , et al. May 27, 2 | 2003-05-27 |
Photoresist monomers, polymers and photoresist compositions for preventing acid diffusion
App 20030091927 - Lee, Geun Su ; et al. | 2003-05-15 |
Photoresist additive for preventing acid migration and photoresist composition comprising the same
App 20030082481 - Lee, Geun Su ; et al. | 2003-05-01 |
Cleaning solution for removing photoresist
App 20030083215 - Lee, Geun-Su ; et al. | 2003-05-01 |
Photoresist monomers, polymers thereof and photoresist compositions containing the same
App 20030022101 - Lee, Geun Su ; et al. | 2003-01-30 |
Photoresist monomers containing fluorine-substituted benzylcarboxylate and photoresist polymers comprising the same
App 20030022103 - Lee, Geun Su ; et al. | 2003-01-30 |
Photoresist monomers, polymers thereof and photoresist compositions containing the same
App 20030022100 - Lee, Geun Su ; et al. | 2003-01-30 |
Reflection-inhibiting resinn used in process for forming photoresist pattern
App 20030018150 - Hong, Sung Eun ; et al. | 2003-01-23 |
Chemical amplification photoresist monomers, polymers therefrom and photoresist compositions containing the same
App 20030017404 - Jung, Jae Chang ; et al. | 2003-01-23 |
Photoresist monomers containing fluorine-substituted benzylcarboxylate and photoresist polymers comprising the same
App 20030017412 - Lee, Geun Su ; et al. | 2003-01-23 |
Photoresist polymer and composition having nitro groups
App 20030013036 - Lee, Geun Su ; et al. | 2003-01-16 |
Maleimide-photoresist monomers containing halogen, polymers thereof and photoresist compositions comprising the same
App 20030013037 - Lee, Geun Su ; et al. | 2003-01-16 |
Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and methods of preparation thereof
App 20030003397 - Hong, Sung-eun ; et al. | 2003-01-02 |
Photoresist monomers, polymers thereof and photoresist compositons containing the same
App 20030003379 - Lee, Geun Su ; et al. | 2003-01-02 |
Organic anti-reflective coating polymer and preparation thereof
Grant 6,489,432 - Jung , et al. December 3, 2 | 2002-12-03 |
Cross-linking monomers for photoresist, and process for preparing photoresist polymers using the same
App 20020177069 - Jung, Jae Chang ; et al. | 2002-11-28 |
Organic anti-reflective coating polymer, anti-reflective coating composition methods of preparation thereof
Grant 6,486,283 - Hong , et al. November 26, 2 | 2002-11-26 |
Maleimide-photoresist polymers containing fluorine and photoresist compositions comprising the same
App 20020164541 - Lee, Geun Su ; et al. | 2002-11-07 |
Cross-linker monomer comprising double bond and photoresist copolymer containing the same
App 20020160301 - Lee, Geun Su ; et al. | 2002-10-31 |
Novel photoresist monomer, polymer thereof and photoresist composition containing it
App 20020151666 - Jung, Min Ho ; et al. | 2002-10-17 |
Photoresist monomers having stability to post exposure delay, polymers thereof and photoresist compositions containing the same
Grant 6,455,225 - Kong , et al. September 24, 2 | 2002-09-24 |
Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and method of preparation thereof
App 20020127789 - Hong, Sung-Eun ; et al. | 2002-09-12 |
Organic anti-reflective coating polymers, anti-reflective coating composition comprising the same and preparation methods thereof
App 20020128410 - Jung, Min-Ho ; et al. | 2002-09-12 |
Photoresist monomer, polymer thereof and photoresist composition containing it
Grant 6,448,352 - Jung , et al. September 10, 2 | 2002-09-10 |
Organic anti-reflective coating polymer, anti-reflective coating composition methods of preparation thereof
App 20020123586 - Hong, Sung-Eun ; et al. | 2002-09-05 |
Photoresist monomer, polymer thereof and photoresist composition containing it
Grant 6,426,171 - Jung , et al. July 30, 2 | 2002-07-30 |
Organic anti-reflective coating polymer, anti-reflective coating composition and methods of preparation thereof
App 20020093069 - Hong, Sung-Eun ; et al. | 2002-07-18 |
Method for forming micro-pattern of semiconductor device
App 20020090832 - Koh, Cha-Won ; et al. | 2002-07-11 |
Novel photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same
App 20020091216 - Lee, Geun Su ; et al. | 2002-07-11 |
Organic anti-reflective coating polymer, anti-reflective coating composition and methods of preparation thereof
App 20020090452 - Hong, Sung-Eun ; et al. | 2002-07-11 |
Pattern width slimming-inhibiting method of photoresist pattern using photoresist composition containing thermal acid generator
App 20020081504 - Kong, Keun Kyu ; et al. | 2002-06-27 |
Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same
Grant 6,410,670 - Lee , et al. June 25, 2 | 2002-06-25 |
Copolymer resin, preparation thereof, and photoresist using the same
App 20020068803 - Jung, Min Ho ; et al. | 2002-06-06 |
Photoresist composition containing photo base generator with photo acid generator
Grant 6,395,451 - Jung , et al. May 28, 2 | 2002-05-28 |
Photoresist monomer, polymer thereof and photoresist composition containing the same
App 20020061466 - Lee, Geun Su ; et al. | 2002-05-23 |
Photoresist polymer for top-surface imaging process by silylation and photoresist composition containing the same
App 20020061461 - Lee, Geun Su ; et al. | 2002-05-23 |
Polymers and photoresist compositions using the same
Grant 6,391,518 - Jung , et al. May 21, 2 | 2002-05-21 |
Photoresist monomer comprising bisphenol derivatives and polymers thereof
App 20020051940 - Lee, Geun Su ; et al. | 2002-05-02 |
Photoresist composition for resist flow process
App 20020048723 - Lee, Geun Su ; et al. | 2002-04-25 |
Novel Polymers For Photoresist And Photoresist Compositions Using The Same
App 20020049287 - ROH, CHI HYEONG ; et al. | 2002-04-25 |
Copolymer resin, preparation thereof, and photoresist using the same
Grant 6,369,181 - Jung , et al. April 9, 2 | 2002-04-09 |
Photoresist cross-linker and photoresist composition comprising the same
Grant 6,368,773 - Jung , et al. April 9, 2 | 2002-04-09 |
Partially crosslinked polymer for bilayer photoresist
App 20020028406 - Lee, Geun Su ; et al. | 2002-03-07 |
Photoresist composition for resist flow process, and process for forming contact hole using the same
App 20020028405 - Kim, Jin Soo ; et al. | 2002-03-07 |
Additive for photoresist composition for resist flow process
App 20020022197 - Jung, Min Ho ; et al. | 2002-02-21 |
Novel photoresist cross-linker and photoresist composition comprising the same
App 20020019560 - Kong, Keun Kyu ; et al. | 2002-02-14 |
Novel photoresist polymers, and photoresist compositions containing the same
App 20020018960 - Lee, Geun Su ; et al. | 2002-02-14 |
Multi-oxygen containing compound for preventing acid diffusion, and photoresist composition containing the same
App 20020015917 - Lee, Geun Su ; et al. | 2002-02-07 |
Photoresist composition containing photo radical generator with photoacid generator
App 20020012873 - Jung, Jae Chang ; et al. | 2002-01-31 |
Process for forming photoresist pattern by using gas phase amine treatment
App 20010053590 - Jung, Jae Chang ; et al. | 2001-12-20 |
Semiconductor device using polymer-containing photoresist, and process for manufacturing the same
App 20010053834 - Jung, Min Ho ; et al. | 2001-12-20 |
Organic anti-reflective coating polymer and preparation thereof
App 20010049429 - Jung, Min-ho ; et al. | 2001-12-06 |
Photoresist cross-linker and photoresist composition comprising the same
Grant 6,322,948 - Jung , et al. November 27, 2 | 2001-11-27 |
Polymer and a forming method of a micro pattern using the same
Grant 6,316,162 - Jung , et al. November 13, 2 | 2001-11-13 |
Amide- or imide-introduced copolymer, preparation thereof and a photoresist comprising the same
Grant 6,316,565 - Jung , et al. November 13, 2 | 2001-11-13 |
Semiconductor device using polymer-containing photoresist, and process for manufacturing the same
Grant 6,312,865 - Jung , et al. November 6, 2 | 2001-11-06 |
Photoresist cross-linker and photoresist composition comprising the same
Grant 6,312,868 - Kong , et al. November 6, 2 | 2001-11-06 |
Organic anti-reflective coating polymer and preparation thereof
App 20010034427 - Jung, Min-Ho ; et al. | 2001-10-25 |
Partially crosslinked polymer for bilayer photoresist
App 20010031420 - Lee, Geun Su ; et al. | 2001-10-18 |
Monomers for photoresist, polymers thereof, and photoresist compositions using the same
Grant 6,291,131 - Jung , et al. September 18, 2 | 2001-09-18 |
Photoresist polymers of carboxyl-containing alicyclic compounds
Grant 6,265,130 - Lee , et al. July 24, 2 | 2001-07-24 |
Over-coating composition for photoresist, and processes for forming photoresist patterns using the same
App 20010003030 - Jung, Jae Chang ; et al. | 2001-06-07 |
Photoresist monomers, polymers thereof, and photoresist compositions containing the same
Grant 6,235,448 - Lee , et al. May 22, 2 | 2001-05-22 |
Photoresist monomers, polymers thereof, and photoresist compositions containing the same
Grant 6,235,447 - Lee , et al. May 22, 2 | 2001-05-22 |
Polymer and a forming method of a micro pattern using the same
Grant 6,225,020 - Jung , et al. May 1, 2 | 2001-05-01 |
Method for forming photoresist film pattern
Grant 6,190,837 - Jung , et al. February 20, 2 | 2001-02-20 |
Maleimide or alicyclic olefin-based monomers, copolymer resin of these monomers and photoresist using the resin
Grant 6,165,672 - Jung , et al. December 26, 2 | 2000-12-26 |
Oxabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same
Grant 6,150,069 - Jung , et al. November 21, 2 | 2000-11-21 |
Method and photoresist using a photoresist copolymer
Grant 6,143,463 - Jung , et al. November 7, 2 | 2000-11-07 |
ArF photoresist copolymers
Grant 6,132,926 - Jung , et al. October 17, 2 | 2000-10-17 |
Copolymer for photoresist
Grant 6,063,896 - Jung , et al. May 16, 2 | 2000-05-16 |
Method and device using ArF photoresist
Grant 6,045,967 - Jung , et al. April 4, 2 | 2000-04-04 |
Copolymer resin of maleimide and alicyclic olefin-based monomers, photoresist containing the copolymer resin and the preparation thereof
Grant 6,028,153 - Jung February 22, 2 | 2000-02-22 |
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